Digital Integrated Circuit (IC) Layout and Design

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Digital Integrated Circuit (IC) Layout and
Design - Lecture 4
! FIRST LAB this Friday Jan. 20 (tomorrow)
! 2 Lab sections
– M 2:10pm – 5pm ENGR2 128
– F 11:10am – 2pm ENGR2 128
http://www.ee.ucr.edu/~rlake/EE134.html
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Reading and Prelab
" Week
1
! Read Chapter 1 of text.
" Week
2
! Read Chapter 2 of text.
" Prelab
! Read insert A of text, pp. 67 - 71.
! The lab will make more sense if you read this
before lab.
! There is nothing to turn in.
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Agenda
" Last
Lecture
! MOS manufacturing process
! Design rules
" Today’s
!
!
!
!
!
!
Lecture
MOS manufacturing process
Design rules
Layout and Design
Ties to VDD and GND
Padframes
Pin Packages
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The MOS Transistor
Polysilicon
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Aluminum
4
CMOS Process
Circa 1980s
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A Modern Dual-Well CMOS Process
silicide layer on
poly
gate-oxide
TiSi2
AlCu
SiO2
Tungsten
poly
p-well
n+
SiO2
n-well
p-epi
p+
p+
DualDual-Well TrenchTrench-Isolated CMOS Process
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Transistor Layout
Cross-sectional view
Layout view
active
n+
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N-Well CMOS Flow
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N-Well CMOS Flow
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Advanced Metallization
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10
Advanced Metallization
11
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Circuit Under Design
VDD
VDD
M2
M4
Vout
Vin
M1
Vout2
M3
schematic
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CMOS Inverter
Schematic
Layout
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CMOS
Inverter
Layout
In
GND
VD D
A
A’
Out
(a) Layout
A
A’
n
p-substrate
n+
(b) Cross-Section along A-A’
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p+
Field
Oxide
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Sticks Diagram
V DD
3
Out
In
1
GND
Stick diagrams of inverter
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• Dimensionless layout entities
• Only topology is important
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Two Inverters
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A Different Layout of Same 2 inverters
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Design Rules
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Design Rules
"
Interface between designer and process
engineer
"
Guidelines for constructing process masks
"
Unit dimension: Minimum line width
! scalable design rules: lambda parameter
– Less common now
! absolute dimensions (micron rules)
– More the standard now.
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CMOS Process Layers
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Layer
Color
Well (p,n)
Yellow
Active Area (n+,p+)
Green
Select (p+,n+)
Green
Polysilicon
Red
Metal1
Blue
Metal2
Magenta
Contact To Poly
Black
Contact To Diffusion
Black
Via
Black
Representation
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Layers in 0.25 µm CMOS process
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Design Rules
" Intra-layer:
widths, spacing
" Inter-layer:
enclosures, overlaps
! Transistor rules
! Contact and via rules
! Well and substrate contacts
" Special
rules (sub-0.25 µm)
! Area, antenna rules, density rules
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Intra-Layer Design Rules
Same Potential
Different Potential
0
or
6
Well
2
9
Polysilicon
2
10
3
Contact
or Via
Hole
3
2
3
Metal1
Active
2
2
Select
3
4
Metal2
3
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Inter Layer: Transistor Layout
Self-aligned process
Poly-Si Gate
p+-active
1
Transistor
Channel
3
2
n-well
5
Is this an NMOS or PMOS transistor?
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Inter Layer: Vias and Contacts
• Vias connect metal layer 1 (M1) to metal layer 2 (M2)
• Contacts connect M1 to the Si.
• Vias and contacts are always square (2x2 µm)
•For large area contact, use many “contacts” in an array.
2
4
Via
1
1
5
Metal to
Poly Contact
Metal to
1
Active Contact
3
2
2
2
25
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Select Layer
Select layer reverses the sign of the doping for pinning the substrate to ground
(NMOS) or VDD (PMOS)
VDD
select
2
p+ active
select
3
Select
n+
2
1
n+
3
p+ active
3
Poly-Si Gate
n+
2
5
p+ active
n-well
p- Substrate
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Well
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Actual Design Rule Example (MOSIS)
" http://www.mosis.org
http://www.mosis.org/Technical/Designrules/scmos/scmos-active.html
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Cadence Layout Editor
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Design Rule Checker
poly_not_fet to all_diff minimum spacing = 0.14 um.
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2 Types of Checks
" Design
Rule Checking (DRC)
" Layout vs. Schematic (LVS)
Schematic
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=?
Layout
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DRC and LVS
Design Rule Check
Schematic
Layout
Layout vs. Schematic
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Tie n-well to VDD and Substrate to
Ground
In
GND
VD D
A
A’
Out
(a) Layout
V
VDD
A
A’
n
p-substrate
p+
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n+
n+
p+
n+
Field
Oxide
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Reason for GND and VDD Ties
Parasitic Diodes
Vout
p+
n
p-substrate
n+
VDD
n+
p+
n+
p-substrate
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Pin n-well to VDD and p-substrate to GND
VDD
M1
n+
M1
Power
Bus
Ground
Bus
GND
p+ select
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Padframe
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0.9 mm
1.5 mm
Padframe
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40 pin package
Chip
wires
Pin Package
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Packaging
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Packaging Requirements
" Electrical:
Low parasitics
" Mechanical: Reliable and robust
" Thermal: Efficient heat removal
" Economical: Cheap
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Bonding Techniques
Wire Bonding
Substrate
Die
Pad
Lead Frame
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Tape-Automated Bonding (TAB)
Sprocket
hole
Film + Pattern
Solder Bump
Die
Test
pads
Lead
frame
Substrate
(b) Die attachment using solder bumps.
Polymer film
(a) Polymer Tape with imprinted
wiring pattern.
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Flip-Chip Bonding
Die
Solder bumps
Interconnect
layers
Substrate
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Package-to-Board Interconnect
(a) Through-Hole Mounting
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(b) Surface Mount
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Package Types
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Package Parameters
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Flowchart
Define circuit specs
Circuit Schematic
Circuit Simulation
Meet Specs?
No
Layout
Parasitic Extraction (R,C)
Re-simulate with Parasitics
No
Meet Specs?
Prototype Fabrication
Test and Evaluate
No
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Meet Specs?
Yes
Production
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