Name:________________________
PHGN/CHEN/MLGN 435/535 Pre-lab Assignment #3
Due Tuesday, February 2, 2016 at the beginning of class (12:00)
Focus: Photolithography
Your answers can be short, but should include the main point. For calculations, don't just
put down a numerical answer. Provide an idea of how you got it!
Reading:
Modules 3, 4 on course website
Campbell ch. 8 (skim)
1. What are the two most useful parameters for characterizing the performance of a
photoresist?
2. What is the difference between positive and negative photoresist? How would this
difference affect your mask design?
3. You’re going to be designing a mask for use in Module 3. What are three things to
consider when you create a mask or mask set (i.e. a collection of multiple masks which
you’ll use to gradually build up a device over multiple processing steps)? You can use
Campbell or online references for this information.
Note that for Module 3, you are just following a single-mask process.
4. Campbell #8.5
7. Campbell #8.6