Background Statement for SEMI Draft Document 5535
Reapproval of SEMI P35-1106, TERMINOLOGY FOR
MICROLITHOGRAPHY METROLOGY
Notice: This background statement is not part of the balloted item. It is provided solely to assist the recipient in
reaching an informed decision based on the rationale of the activity that preceded the creation of this Document.
Notice: Recipients of this Document are invited to submit, with their comments, notification of any relevant
patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this
context, “patented technology” is defined as technology for which a patent has issued or has been applied for. In the
latter case, only publicly available information on the contents of the patent application is to be provided.
Background
SEMI P35 is due for 5-year review. At the meeting of the Japan Micropatterning Committee on December 11, 2012,
the committee agreed to ballot SEMI P35 for reapproval without changes.
This letter ballot contains only the Purpose, Scope, and Referenced Standards and Documents sections of the
Standard being proposed for approval. Full copy of this Standard is available upon request. Voter requests for access
to the full Standards must be made at least three business days before the voting deadline.
Review and Adjudication Information
Task Force Review
5-year-review Task Force
Group:
2013/4/9
Date:
Time & Timezone: TBD
SEMI Japan Office
Location:
City, State/Country: Tokyo, Japan
Iwao Higashikawa (Toshiba)
Leader(s):
Naoko Tejima (SEMI Japan)
Standards Staff:
81.3.3222.5804
ntejima@semi.org
Committee Adjudication
Japan Micropattening Committee
2013/4/9
15:30-17:30
SEMI Japan Office
Tokyo, Japan
Iwao Higashikawa (Toshiba)
Naoko Tejima (SEMI Japan)
81.3.3222.5804
ntejima@semi.org
This meeting’s details are subject to change, and additional review sessions may be scheduled if necessary. Please
contact Standards staff (Naoko Tejima at ntejima@semi.org) for confirmation.
Semiconductor Equipment and Materials International
3081 Zanker Road
San Jose, CA 95134-2127
Phone: 408.943.6900, Fax: 408.943.7943
SEMI Draft Document 5535
Reapproval of SEMI P35-1106, TERMINOLOGY FOR
MICROLITHOGRAPHY METROLOGY
1 Purpose
1.1 Clear and commonly accepted definitions are needed for efficient communication and to prevent
misunderstanding between buyers and vendors of metrology equipment. The purpose of this document is to provide
a consistent terminology for the understanding and discussion of metrology issues important to microlithography.
2 Scope
2.1 The scope of this document is limited to the definitions of metrology terms used in microlithography. Every
attempt is made to keep these definitions consistent with relevant international standards and common usage. This
document is not intended to describe a measurement procedure, but rather an approach to defining a measurand in a
useful and unambiguous way.
2.2 The present focus of this document is on feature-related metrology and measurands important for the definition
and control of lithographic processes.
2.3 This document does not attempt to discuss statistical considerations, which are covered in SEMI E89 and
elsewhere.
2.4 This document is expected to grow as more terms are added in future revisions.
NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the
responsibility of the users of this standard to establish appropriate safety and health practices and determine the
applicability of regulatory or other limitations prior to use.
3 Referenced Standards and Documents
3.1 SEMI Standards
SEMI P28 — Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture
SEMI E89 — Guide for Measurement System Analysis (MSA)
3.2 ANSI/NCSL Standards1
Z540-2-1997 — US Guide to the expression of Uncertainty in Measurement, ANSI/NCSL standard (the US version
of Guide to the expression of Uncertainty in Measurement, ISO, 1995, 110 p., ISBN 92-67-10188-9)
NOTICE: Semiconductor Equipment and Materials International (SEMI) makes no warranties or representations as
to the suitability of the Standards and Safety Guidelines set forth herein for any particular application. The
determination of the suitability of the Standard or Safety Guideline is solely the responsibility of the user. Users are
cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant literature,
respecting any materials or equipment mentioned herein. Standards and Safety Guidelines are subject to change
without notice.
By publication of this Standard or Safety Guideline, SEMI takes no position respecting the validity of any patent
rights or copyrights asserted in connection with any items mentioned in this Standard or Safety Guideline. Users of
this Standard or Safety Guideline are expressly advised that determination of any such patent rights or copyrights,
and the risk of infringement of such rights are entirely their own responsibility.
1
American National Standards Institute, Headquarters: 1819 L Street, NW, Washington, DC 20036, USA. Telephone: 202.293.8020; Fax:
202.293.9287, New York Office: 11 West 42nd Street, New York, NY 10036, USA. Telephone: 212.642.4900; Fax: 212.398.0023; Website:
http://www.ansi.org
This is a Draft Document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted Standard or Safety Guideline.
Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document
development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.
Page 2
Doc. 5535  SEMI
LETTER (YELLOW) BALLOT
DRAFT
Document Number: 5535
Date: 2/10/2016