Fullerenes, Nanotubes, and Carbon Nanostructures, ??: ?-?, 2012 Copyright # Taylor & Francis Group, LLC ISSN DOI: Simulation of fast electron transport in thin fullerite C60 films Petrenko E.O., Makarets N.V. Taras Shevchenko Kyiv National University, 01033, Kyiv, Ukraine Mikoushkin V.M. Ioffe Institute, 194021, St.-Petersburg, Russia Abstract: Monte-Carlo simulation of the C60-fullerite film irradiation by 5 keV electron beam at normal incidence has been performed. Average transverse coordinates of the primary and secondary electrons as well as the density of collisions of several types were drawn in dependence on the penetration depth. It was shown that a swarm of low energy secondary electrons provides efficient excitation of valence electrons and gives the main contribution to polymerization of C60-fullerite. Key words: Fullerite; C60; Electron beams; Polymerization, Computer simulation. INTRODUCTION Polymerization and other processes of modification induced by electron beams radically change solubility and evaporability of fullerite C60 [e.g.1]. These processes already have enabled using the fullerite films as an electron beam resist in electron lithography, though the better understanding the modification mechanisms is necessary for optimization of the technology. The Monte-Carlo simulation of electron transport in fullerite C60 performed in Ref. [2, 3] qualitatively described the main features of the fullerite polymerization. The aim of this work was to develop the Monte-Carlo description of interaction between irradiating electrons and fullerite C60 to obtain quantitative characteristics of the interaction and propagation of electrons in this material. Trajectories of primary and secondary electrons in the C60-fullerite were modeled by straight lines between the points at which electrons participated in one of the following random events: 1) elastic collision with atoms, 2-4) ionization of one of the carbon core-level, 5-6) plasmon or phonon generation. Details of the cross section calculations for these processes were described in [2, 3]. Elastic scattering was calculated according to the Mott-theory by using the optical potential model which takes into account screening, exchange, correlation and the nearest neighbors according to 1 the muffin-teen model. Ionization cross sections of electron shells were calculated according to [4], generation of plasmons – according to [5] and phonons – according to the Pines-theory. Scattering angles of the primary and ejected electrons were determined by the energy and momentum conservation laws, and they were equal zero in the cases 5-6). The plasma frequency and electron density were calculated on the basis of experimental data for the dielectric constants. The analysis of all cross sections showed that elastic scattering dominates at low energies, whereas plasmon generation and valence band ionization are the most effective at the mid and high energies. The probability of two core-hole excitation and phonon generation were estimated to be negligible. RESULTS AND DISCUSSIONS Trajectories of several thousands of primary and secondary electrons and a few dozen millions of their collisions were considered in the simulation. Then various average values were calculated for the following samplings: all electrons, primary electrons, secondary electrons of different generations. The energy of primary electrons was equal to 5 keV. Fig. 1. Dependence of transverse average coordinates of the primary electrons and electrons ejected in first and second generations in dependence on the penetration depth: a) for electrons with energies above 25 eV; b) with energies above 5 eV. Fig. 1 shows the transverse average coordinates (X,Y) of the primary electrons with initial energy of 5 keV and ejected secondary electrons of the first and second generations in dependence on the penetration depth along the direction of the primary electrons (Z). Trajectories were traced until the electron energy decreases below 25 eV and 5 eV. Strictly speaking, the concept of the trajectory of an electron with the energy below 100 is not correct since its de Broglie wavelength is comparable with the interatomic distance. But the possible interference effects were assumed to be averaged in the case of disordered atomic system and a huge number of electrons considered. The figure demonstrates that secondary electrons leave the beam axis area much more efficiently than the primary ones. Analysis of the data showed that electrons can efficiently ionize the valence band 2 when their energy becomes less than the plasmon’s (~ 25 eV). But when the electron energy diminishes below the ionization potential (~ 9 eV), only excitation of fullerite valence electrons and phonon generation remain as energy loss channels. However, the cross sections of these channels are one order of magnitude smaller than of the elastic scattering. Therefore electrons undergo predominantly elastic collisions without energy losses, and only sometimes inelastic ones. Their movement becomes similar to the diffusion of particles with finite lifetime. Angular dependence of the elastic scattering probability is almost isotropic for low energy electrons (dozen eV). Therefore the transverse coordinate of the secondary electrons stops to grow as it can be seen in Fig. 1. As a result, primary energetic electrons are concentrated in the area near the beam axis and the low energy secondary ones are accumulated fare away from the axis and undergo many collisions finally resulting to valence band excitation. Fig. 2. Dependence of the average number of collisions per primary electron on the projected depth for different collision types: a). for electrons with energies above 100 eV; a). for electrons with energies above 5 eV. Fig. 2 shows dependence of the average number of collisions per primary electron on the projected depth for three collision types: elastic, inelastic with plasmon excitation and ionization. The data in the panel a) and b) were obtained with taken into account electrons with energies above 100 eV and 5 eV correspondingly. Comparison of these panels shows that the number of elastic collisions increases by two orders of magnitude with decreasing the electron energy and that electrons undergo a lot of elastic collisions at the end of the path. Fig. 2 a) also shows that the plasmon generation is the dominating process at the beginning of the primary electron trajectory. After retarding below ionization threshold, electrons can lose their energy only on excitation of valence electrons during its random walk. Some of these excitations should lead to formation of double carbon bonds [6]. It should be noted that evolution of plasmons was not considered in the work, though they can accumulate essential part of the primary electron energy as it follows from the analysis of Fig. 2 3 a). Besides the material heating due to electron-phonon interaction, plasmons can decay into electron-hole pairs generating additional secondary electrons, which can shape the resulting picture. Therefore, the role of plasmons in energy balance should be further investigated. CONCLUSIONS Numerical simulation of the C60-fullerite irradiation by 5 keV electrons revealed existence of two areas which are characterized by different kinds of electrons and different balance of the energy transmission into the target. The first one is located near the beam axis where fast electrons dominate providing in turn dominating the processes of plasmon generation and ionization. The second area with domination of slow secondary electrons is distanced from the axis. These electrons have a diffusion character of motion and lose their energy due to excitation of valence electrons followed by fullerite dimerization and polymerization. REFERENCES [1] Snitov V. V.; Mikoushkin, V. M.; Gordeev Yu. S., Fullerite C60 as electron-beam resist for “dry” nanolithography, Microelectronic Engineering, 2003, 69, 429-435. [2] Makarets N.V., Prylutskyy Yu.I., Mikoushkin V.M., Shnitov V.V., Gordeev Yu.S., Computer Simulation of Fullerite C60 Modification by a Swarm of Secondary Electrons Generated by Bombarding Electrons in keV Energy Range, Fullerenes, Nanotub. Carbon Nanostruct, 2006, 14(23), 513-518. [3] Makarets N.V., Prylutskyy Yu.I., Zaloyilo O.V., Gordeev Yu.S., Mikoushkin V.M., Shnitov V.V., Simulation of fullerite C60 polimerisation under particle beams irradiation, Mol. Cryst. & Liquid Cryst., 2005, 426, 171-178. [4] Kim Y.-K., Rudd M.E., Binary-encounter-dipole model for electron-impact ionization, Phys. Rev, 1994, A50(5), 3954-3967. [5] Ferrell R.A., Angular Dependence of the Characteristic Energy Loss of Electrons Passing Through Metal Foils, Phys. Rev., 1956, 101(2), 554-563. [6] Stafström S., Fagerström J., Electronic structure and stability of fullerene polymers, Appl. Phys. A: Mater. Sci. Process, 1997, A64, 307-314. 4 Manuscript information table Refer. Number, type of the presentation Correspondin g author, e-mail Title of the manuscript Key words Word count (figure is equal to 200 words, table - 200 words, equation 40 words) 3 preferred reviewers from the organizers or the participants of the Conference (please specify the status). The appropriate info is available at the following web-site Remarks http://www.ioffe.ru/ACN2011 A206 Poster Dr Makarets N.V. mmv@univ.k iev.ua Simulation of fast electron transport in thin fullerite C60 films Fullerite; C60; Electron beams; Polymerizatio n, Computer simulation 4 figures (x200) = 800 1305 words text = 1305 Total = 2105 1. Adamchuk V.K., St Petersburg State University, Russia. Program Committee 2. Sheka E.F., Peoples’ Friendship University of Russia, 117198 Moscow, Russia Chairman, Oral, A006 3. Shnitov V.V., Ioffe Institute, Russia Invited lecture, A379 5