Cadence QRC Extraction Better, faster design convergence with in-design and signoff parasitic extraction Cadence® QRC Extraction is the industry’s fastest, most accurate 3D full-chip parasitic extractor, delivering in-design and signoff extraction. It supports both transistor-level and cell-level extractions during design implementation and signoff, and it integrates seamlessly with both Cadence Virtuoso® custom design and Cadence Encounter® digital implementation platforms. This tight integration ensures ease of use, enables rapid analysis to accelerate design closure, and provides better and faster convergence by using the same engine during implementation and signoff. Cadence QRC Extraction As advanced process geometries continue to shrink, parasitic extraction becomes a necessity throughout the design implementation flow and the validation phase. Cadence QRC Extraction is an integrated extraction solution for design implementation and validation at 90nm and below. It includes full-spectrum, production-proven technologies for all nanometer-scale design styles including RF, analog, cell, mixedsignal, custom-digital, and thin-film transistor liquid-crystal display (TFT-LCD). It offers advanced capabilities such as multi-mode/multi-corner (MMMC) extraction, RLCK extraction, advanced process modeling, signoff ECO, substrate analysis, statistical extraction, distributed processing, netlist reduction, DFM effects support, and substrate parasitics extraction, and it includes an integrated, foundryqualified field solver (QRC-FS). QRC Extraction models physical effects found in advanced process technologies to ensure that extracted parasitics match those on silicon. By delivering higher quality parasitics, it helps designers reduce overall design cycle times and significantly enhance the quality of silicon in complex designs. Integrated with the Virtuoso custom design platform and the Encounter digital implementation platform, QRC Extraction is the most complete and efficient path to accurate parasitic extraction for all mainstream and advanced node designs. Benefits Better, faster, and predictable convergence • Performs efficient analysis of parasitic effects on circuit performance with pre- and post-layout simulation analysis • Extracted View enables easy and efficient simulation with Virtuoso ADE • Reduces ECO loops by using same extraction engines in implementation and signoff to provide predictable timing closure Productivity and time to market • Delivers best-in-class performance for both single- and multi-process corner extraction including multiple temperatures • Delivers the best performance on both full-chip and hierarchical designs without compromising accuracy • Unparalleled reduction technology improves productivity without impacting simulation time or timing closure Seamless integration with custom design, digital implementation, and signoff tools • Shortens design cycles using an in-design methodology with Virtuoso and Encounter design and analysis environments • Features production-proven in-design incremental extraction in Encounter Digital Implementation System Cadence QRC Extraction Design Convergence Silicon Virtual Prototype Power-Grid Synthesis Early Prototyping Default Extraction Placement perform parasitic extraction, backannotation, crossprobing, re-simulation, and analysis within a single design environment for increased productivity. Used in-design with the Encounter environment, QRC Extraction allows designers to reduce design turnaround time dramatically by performing incremental extraction, and to reach timing closure faster by using signoff-accurate extraction data for timing and noise optimization. Integrated QRC Extraction QRC Extraction provides silicon-accurate resistance (R) and capacitance Clock-Tree Synthesis (C) interconnect parasitic extraction for all process Post-CTS Optimization technologies for transistorlevel designs including Routing RF, analog, mixed-signal, Post-Route custom, and memory. It Post-Route Optimization provides highly accurate Timing/SI Optimization + SI Optimization parasitics of both dense and Incremental Signoff Extraction sparse layouts for circuit Extraction/ECO simulation and analysis. Timing, SI, Power QRC Extraction integrates Signoff Signoff Extraction with Cadence layout-vs.schematic verification Figure 1: Enabling in-design in the Encounter digital technologies (Assura® LVS, implementation platform Physical Verification System); with Mentor Graphics • Speeds convergence on design closure Calibre; and with Cadence simulation via tight links with other Cadence technologies (Virtuoso Spectre Circuit signoff analysis technologies (Virtuoso Simulator, Virtuoso Spectre RF Simulation UltraSim Full-Chip Simulator, Virtuoso Option, Virtuoso UltraSim Full-Chip Spectre® Circuit Simulator, Encounter Simulator). Power System, Physical Verification System, Encounter Timing System, and Integration with the Encounter Virtuoso Power System) Power Routing Support for all advanced node functionality required at 28/20nm • Supports all foundries At advanced nodes with multi-million instances designs, it is imperative that parasitic load, read, and analysis turnaround time is not a bottleneck. QRC Extraction provides a binary interface and format, RCDB, with Encounter Timing RF Analog Mixed Signal Custom Digital Model-Based CMP and Litho Hierarchical Extraction Cell Field Solver L and K Extraction Manufacturing Effects QRC Extraction’s advanced cellbased 3D technology extracts full-chip designs quickly and has the capacity and accuracy for signoff extraction on the largest nanometer designs. Accurate coupling capacitance extraction is a must for crosstalk and power analysis of sub-90nm designs. Integrated with the Encounter design environment, QRC Extraction provides seamless solutions for timing, IR, EM, and signal integrity analyses, and for power verification. It can output distributed or lumped, and coupled or decoupled RC data. Substrate www.cadence.com QRC–Encounter Timing System binary interface Reduction An integral part of the silicon analysis function inside the Virtuoso custom design environment, QRC Extraction supplies the critical parasitic information for optimizing chip performance and yield. Built on a foundation of patented algorithms and proprietary extraction technologies, QRC Extraction brings the physics of interconnect parasitics into the Virtuoso environment for designing, characterizing, and optimizing chip layouts. Seamless integration with Virtuoso technology enables designers to With the exploding number of process corners at advanced nodes, design convergence is becoming a bottleneck in the design flow process. For example, signal integrity issues can occur at hightemperature conditions and thus requires efficient multi-corner extraction performance including temperature corners. QRC Extraction provides the best and most efficient solution to extract multiple corners simultaneously while significantly reducing overall runtime without compromising accuracy Digital Implementation Platform Distributed Processing Integration with the Virtuoso Custom Design Platform Multi-corner/temperature extraction Multi-Corner / Statistical • Enables double-patterning technology (DPT) –aware extraction, litho bias, multi-value SPEFs, etc. Features R and C Extraction Figure 2: Key functionalities of Cadence QRC Extraction 2 Cadence QRC Extraction Advanced CMP modeling support QRC Extraction interfaces with innovative Cadence chemical-mechanical polishing (CMP) technology for modeling full-chip thickness variation and accurately predicting systematic variations in interconnect layer thickness. QRC Extraction uses the resulting thickness information to generate more precise estimates of parasitic capacitance and resistance, and thus more accurate timing analysis and simulation results. By precisely predicting CMP effects with this new capability, designers targeting sub-65nm processes can achieve more accurate timing analysis and simulation, while manufacturing teams can optimize yield. w/o substrate n-well VDD p-substrate Vss n-well p-substrate Figure 3: RF interconnect loss System and the Encounter digital implementation platform. RCDB is a randomaccess format that reduces memory footprint. It offers up to 120x better performance while reading in the SPEF file into Encounter Timing System, and 1.7x overall runtime performance improvement for extraction and SPEF read times without compromising accuracy. Wafer-Level Variation Wafer Surface Advanced substrate modeling capability RF designers need a tool that not only extracts parasitic inductance accurately, but also evaluates the impact of substrate parasitics on their designs. Substrate noise coupling is a growing concern due to higher frequencies, higher integration, smaller feature sizes, and lower supply voltages. Including the p-substrate and n-well as part of the substrate model has an effect on the extraction result and leads to RF interconnect loss. QRC Extraction includes substrate Rs and Cs for accurate simulation and analysis of RF IC circuits, and allows designers to perform what-if analysis for substrate noise distribution. Metal layers compound the topographical impact Wire Global Via Intermediate Local Within-Chip Variation Chip Surface Oxide Loss Dishing Isolated Isolated Thin-Lines Wide-Lines Erosion Total Copper Loss Dense Array Thin-Lines Dense Array Wide-Lines Figure 4: CMP interconnect variation Distributed processing QRC Extraction offers a distributed processing capability to extract multimillion gate chips efficiently. It partitions the extraction task into multiple independent tasks that can be executed in parallel using multiple CPUs and/or machines. Distributed processing can significantly reduce extraction runtimes, especially during the final signoff stages. www.cadence.com Lightly doped substrate, no guard ring Lightly doped substrate with guard ring connected to ideal power supply Heavily doped substrate, no guard ring Figure 5: What-if analysis with noise contour map (Cadence QRC Extraction GXL) 3 Cadence QRC Extraction Cadence Services And Support What you design is not what you get! • Cadence application engineers can answer your technical questions by telephone, email, or Internet—they can also provide technical assistance and custom training As drawn As fabricated Timing difference with and without litho effect Figure 6: Litho-aware extraction Lithography-aware extraction support Foundry support QRC Extraction interfaces with Cadence silicon-correlated electrical designfor-manufacturing (DFM) analysis technologies. Cadence Litho Electrical Analyzer allows designers to optimize and control the impact of lithography, mask, etch, RET, and OPC effects on chip parameters. Its contour-based analysis technology provides an accurate, model-based solution for designers to minimize the impact of manufacturing variations on design performance. It also uses fab-certified technology to predict contours across the process window and to predict device and interconnect electrical behavior. • Cadence QRC Extraction process files are: –– Certified and supported by leading merchant foundries –– Flow tested and qualified with foundry process design kits (PDKs) –– Complemented by development services (available from Cadence) • Cadence certified instructors teach more than 70 courses and bring their real-world experience into the classroom • More than 25 Internet Learning Series (iLS) online courses allow you the flexibility of training at your own computer via the Internet • Cadence Online Support gives you 24x7 online access to a knowledgebase of the latest solutions, technical documentation, and software downloads and more Format support • Design input: GDSII, LEF/DEF, DFII, OA • LVS data from Assura Physical Verification, Physical Verification System (PVS), and Calibre • Design output: Extracted View, DSPF, xDSPF, SPICE, SPEF, xSPEF, SSPEF • Direct binary interface to Encounter Timing System—RCDB Specifications Packaging • Cadence QRC Extraction is available in L and XL configurations for basic extraction • On top of the base licenses, Cadence QRC Extraction has GXL options for advanced analysis, nodes, and display technologies Platforms • Sun Solaris (32-bit, 64-bit) • Linux (32-bit, 64-bit) • IBM AIX (32-bit, 64-bit) Cadence is transforming the global electronics industry through a vision called EDA360. With an application-driven approach to design, our software, hardware, IP, and services help customers realize silicon, SoCs, and complete systems efficiently and profitably. www.cadence.com © 2012 Cadence Design Systems, Inc. All rights reserved. Cadence, the Cadence logo, Assura, Encounter, Spectre, and Virtuoso are registered trademarks of Cadence Design Systems, Inc. All others are properties of their respective holders. 22544 1/12 MK/MV/PDF