Lot 2 Field Emission Gun Scanning Electron Microscope
The decision to purchase a FEGSEM in preference to an EPMA will be taken on the ability of
the SEM to perform quantitative and qualitative x-ray microanalysis to an acceptable
precision and accuracy and the relative costs of each system. Preference will be given to
instruments which can demonstrate high spatial analytical resolution using stable and high
beam currents across a range of accelerating potentials (1-25kV). Variable Pressure is not a
requirement but if offered without compromise to rest of the instrument is a desired
component. Lot 2a, the x-ray microanalysis system may be incorporated with lot 2 or bid for
separately.
Category (weighting)
2. SEM – vendor
supplied
specifications (5%)
2.1 Electron Column
2.2 Imaging and
Electron Detection
System
2.3 CL detector
2..4 Computing
Hardware
Required
Vendor must supply specifications for:
Beam current stability/drift
% Accuracy of accelerating voltage at range of
voltages
Beam diameter at set voltage/beam current
Faraday Cup measurement stability
Absolute accuracy of magnification readouts
SE/BSE resolution
FE source lifetime
System must be able to incorporate 1 vertically
mounted WDS, 2 EDS, 1 EBSD, 1 CL detector,
1 IR chamberscope.
Field Emission Gun demonstrating high
stability
kV range of 0.5-30kV
beam current 1-200nA (at 10kV)
Long term beam current stability (0.2% per
hour)
Automated pulsed faraday cup and current
measurement.
Externally selectable final aperture
Low magnification (x20)
Desirable
Additional port for STEM
detector
EDS ports ideally opposing.
0.5-40kV
Regulated to 500nA
x5
System for reduction of
landing energy
Everhardt-Thornley type Secondary electron Additionally, in-lens
detector
secondary or energy filtering
detector
Multiple diode solid-state backscatter detector. Shadowed/3D BSE image
Switching between diodes to provide
topographic image
Absorbed Current Imaging
Dual live imaging from two detectors
Analogue video output
Variable Pressure secondary
electron detector
A monochromatic CL detection system and
control unit. To feed into the video processing
system of the microscope as an auxiliary
detector.
High specification PC platform
2.5 Software Control
Package
Minimum of two dedicated screens for software
package
Complete software system to perform image
acquisition (from all detectors) and processing
options. Include all optional components for
measurement, 3D observation and stereo
anaglyph production.
Image Processing options to
be supplied with two licences
for off-line processing of
images.
Stage navigation software. Ability to produce
montage of images from preset stage
positions.
Free upgrades to latest version for 10 years
including change to new operating systems.
2.6 Stage, Specimen
Chamber
Stage Control
2.7 Documentation
(5%)
2.8 Chamberscope
2.9 Vacuum System
2.10 Support and
Warranty (10%)
2.11 Training
2.12 Demonstration
(60%)
2.13 Final Acceptance
2.14 Pricing and
Delivery (20%)
2.15 Options
Large specimen chamber with airlock for
sample exchange. Motor driven eucentric 5
axis stage. 100mm movement in X , Y and Z.
360degree rotation and 0-90degree tilt.
High precision X,Y and Z stage movement with
dedicated trackball/joystick to move in X and Y.
All mechanical and electrical drawings to be
included. All manuals for third party items
supplied by the vendor (e.g. vacuum products).
List of all spare parts and catalogue/order
information.
All documentation to be in English
Full documentation and drawings of required
laboratory specifications
Paper copy of all instruction manuals
IR illumination and camera for observing inside
specimen chamber
Fully automated vacuum system. Sufficient
length to extend rotary pumps into adjacent
room (5m)
Warranty to last 12 months after final
acceptance. Fully comprehensive service
contract for four years, post-warranty.
On-site training required for lab manager.
See below
0.5 micron reproducibility in
X, Y and Z..
Variable pressure mode
operation
All components must be operational before
final acceptance – no exceptions. All vendor
supplied specifications must be exceeded.
Acceptance granted upon repeat analysis of
demonstration tests to the approval of lab
manager to be undertaken after all
specification checks have been performed.
Variable Pressure
Demonstration required will evaluate those components not weighted above. Proportional
weightings in brackets:
1) (30%) SE imaging at (1, 5 and 25kV) – foram. Evaluation of scan speeds, magnification,
resolution at a range of working distances, beam currents and apertures. Also under VP if
applicable at a range of pressures.
2) (30%) BSE image to demonstrate high Z contrast – using oscillatory zoned mineral at
range of accelerating voltages at long and short working distances. Use of BSE under VP if
applicable.
3) (15%) Software evaluation. Ability to acquire montage of images. Multiple image mode
display.
4) (15%)Hardware evaluation, stage drive, vacuum control, aperture control, gun
management.
4) (10%)Cathodoluminescence imaging. On zircon and carbonate at 10 and 20kV for a
range of wavelengths.
Lot 2a X-ray Microanalysis System and EBSD system (option) to sit on FEG-SEM of lot
2.
Bidders please note EBSD is an optional component.
Category (weighting)
2a Microanalysis
System – vendor
supplied
specifications (5%)
2a.1 Energy
Dispersive X-ray
Analyser
2a.2 Wavelength
Dispersive X-ray
Analyser
2a.3 Computing
Software
2a.4 Documentation
(5%)
Required
Integrated ED/WD quantitative and qualitative
x-ray microanalysis and x-ray mapping system.
Vendor must supply specifications for:
ED, FWHM resolution across spectrum at
range of process times and count rates
WD resolution at range of wavelengths
WD dead time
Peak reproducibility (repeat peaking after
spectrometer offsets)
WD Spectrometer drive speed
Control of microscope operating parameters
Control of Stage
Dual SDD-type large area EDS detectors
At least 129eV resolution at MnKa with ultra
thin window for observation of Boron x-rays.
Vertically mounted multiple crystal wavelength
detector. To contain TAP, PET, LIF and a large
d-space crystal for light element analysis. Must
permit analysis of wavelengths from
50Angstroms (C Ka) to 1 Angstrom (Se KB)
Gas Flow Proportional Counter including
supply of appropriate gas regulator
Hardware and software to integrate ED and
WD into a single analysis. Must be able to
control microscope parameters – high voltage,
beam current control and stage positioning(
X,Y,Z) .Quantitative ZAF and phi-rho-z
correction algorithms.
To be supplied with all optional components
identified including post-analysis processing
and any phase recognition options.
All mechanical and electrical drawings to be
included. All manuals for third party items
supplied by the vendor (e.g. vacuum products).
List of all spare parts and catalogue/order
information.
All documentation to be in English
Paper copy of all instruction manuals
Desirable
EBSD system
6 crystal - spectrometer
Additional Xenon counter
2a.5 Support and
Warranty (10%)
Training
2a.6 Demonstration
(60%)
2a.7 Pricing (20%)
2a.8 Final Acceptance
2a.9 Options
Electron Backscatter
Diffraction system
Warranty to last 12 months after final
acceptance. Four years full service cover to
follow 12 month warranty period.
On-site training required for lab manager.
See below
All components must be operational before
final acceptance – no exceptions. Full
integration with SEM must be demonstrated.
Upon repeat analysis of demonstration tests to
the approval of lab manager to be undertaken
after all specification checks have been
performed.
High Speed camera with forescatter detector.
Integrated acquisition software and thorough
post-processing software capability.
2 licences for post-processing
Free upgrades, including change of operating
system for 10 years.
3 licences
Software integrated with
EDS analysis software.
Demonstration required (to be confirmed prior to testing) will evaluate those components not
weighted above. Proportional weightings in brackets:
1) (10%) WDS qualitative scans on sample of Monazite (20kV, 20nA 5micron spot, to take 1
hour)
a) PET across range of U-Th on both gas flow counters (at more than one pressure
where applicable and xenon counters)
b) LIF in range Ce-Gd L lines
c) PET in range La-Nd (if possible)
2) (10%) WDS qualitative scans on Apatite across Fluorine peak using both integral and
differential PHA modes on TAP and 60Angstrom spaced crystal (e.g. PC0) at 15kV, 10nA,
10micron spot, to take 30mins)
3) (15)X-ray image of orthopyroxene acquired at highest possible spatial resolution using
10kV, 200nA beam for Al, Mg, Fe, Ca, Na on WDS and simultaneous acquire full spectrum
image on EDS. Image to be quantified (i.e with background correction and ZAF processed).
Slow scan image to run for several hours overnight.
4) (10%)Spectral EDS imaging at low magnification (x100) on multiphase polished rock
sample. WD (single element) and spectral EDS imaging at low magnification on multiphase
polished rock sample under stage motion. Evaluation of post-processing software
5) (5%)Acquisition of montage of low mag x-ray images.
6) (10%) (Line profile across orthopyroxene (same elements and conditions as above).
Maximium resolution across a 50micron line (stage and beam move) to take 30mins.
7) (20%) Quantitative analysis of 3 mineral specimens – monazite, kaersutite, olivine.
Repeat of 10 analyses on each at 10kV and 20kV.
8) (10%) Evaluation of count rates on EDS. To establish maximum usable count rate for
mapping at a reasonable process time (loss of resolution). Evaluation of resolution at range
of count rates.
9) (5%) Software evaluation. Multiple image mode display. Demonstration of x-ray mapping
post processing package - phase recognition software options if applicable.
10) (5%) Hardware evaluation. Integration into microscope, control of stage and other
microscope functions – e.g. column control, voltage, beam current.
All samples and primary calibration standards will be supplied by UoB.