光 電 科 技 LED: Materials and Device Aspects 授課教師: 龔 志 榮 教授 國立中興大學物理學系 中華民國一○二年四月二十二日 1 § 1-1 Optical Semiconductor Materials *Elemental semiconductors: Si, Ge,(used in photodiodes only) *Compound semiconductors Ⅲ-Ⅴ compounds & alloys Ⅳ compounds & alloys Ⅰ-Ⅲ-Ⅵ2 compounds Ⅱ-Ⅳ-Ⅴ2 compounds Ⅳ-Ⅳ compounds For applications in light emitting devices like LEDs and LDs as well as photodiodes (solar cells & photodetectors) 2 *Bonding and Band structure in semiconductors 3 4 5 6 Physical Properties of Optical Semiconductors 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 cross-section of diffusion fabricated LED light emitting in the pn junction 42 EQE of LEDs in the visible spectrum Table 1: III-V semiconductor LEDs’ wavelength, Color and Efficiency LED material Substrate Type Wavelength(nm) Color Efficiency InGaN Sapphire D 370-680 UV-Red Medium-High AlGaInP GaAs D 560 Green Medium AlGaInP GaP D 570 Green Medium AlGaInP GaP D 590 Yellow High AlGaInP GaP D 607 Orange High AlGaInP GaP D 620-650 Red High AlGaAs GaAs D 650-675 Red Medium LED material Substrate Type Wavelength(nm) Color Efficiency GaAsP:N GaP I 589 Yellow Low GaAsP:N GaP I 632 Red Low GaAsP GaAs D 649 Red Low GaP GaP I 555 Green Low GaP:N GaP I 565 Green Low GaP:N,N GaP I 590 Yellow Low GaP:ZnO GaP I 699 Red Medium AlGaAs:Si GaAs D 820-890 IR High GaAs:Si GaAs D 920-950 IR High Cross-sectional schematic of a flip chip (覆晶) GaN LED InGaAs LED containing a photonic crystal 48 49 光 電 科 技 LED: Recent Advances and Applications 授課教師: 龔 志 榮 教授 國立中興大學物理學系 中華民國一○二年五月二十日 50 Internal Quantum Efficiency Enhancement 52 Cheng-Liang Wang, Jyh-Rong Gong,* Ming-Fa Yeh, Bor-Jen Wu, Wei-Tsai Liao, Tai-Yuan Lin, and Chung-Kwei Lin * Department of Physics, National Chung Hsing University, TAIWAN, R.O.C. IEEE Photonic Technology Letters 18 (2006) 1497 53 GaN-based LED structures w/wo SPSLs Ni/Au Ti/Al p-GaN MQWs n-GaN (4mm) Sample A Undoped GaN u-GaN ( 0.4mm) Sample B u-GaN ( 0.4mm) Sample C u-GaN + SPSL 5-pair AlGaN(2nm)/ GaN(2nm) SPSL u-GaN ( 0.1mm) sapphire substrate u-GaN ( 0.4mm) Sample D u-GaN ( 0.1mm) u-GaN ( 0.1mm) u-GaN ( 0.4mm) C. L. Wang et al. IEEE Photon. Tech. Lett. 18 (2006) 1497 C. L. Wang et al. IEEE Photon. Tech. Lett. 18 (2006) 1497 C. L. Wang et al. IEEE Photon. Tech. Lett. 18 (2006) 1497 p-GaN InGaN/GaN multi-quantum wells n-GaN n-GaN 100nm 2 sets of short period superlattices u-GaN C. L. Wang et al. IEEE Photon. Tech. Lett. 18 (2006) 1497 500nm C. L. Wang et al. IEEE Photon. Tech. Lett. 18 (2006) 1497 Cheng-Liang Wang , Ming-Chang Tsai, Jyh-Rong Gong,* Wei-Tsai Liao, Ping-Yuan Lin, KuoYi Yen, Chia-Chi Chang, Hsin-Yueh Lin , and Shen-Kwang Hwang * Department of Physics, National Chung Hsing University, TAIWAN, R.O.C. Materials Science & Engineering B 138 (2007) 180 59 According to the standard Shockley model , the I–V relationship of a forward-biased p–n junction can be approximated by I = Is exp(q V/ηkT), where Is, q, k, η and T, respectively, are saturation current of the diode, electron charge, Boltzmann constant, and ideality factor and absolute temperature of the diode. 60 Semilogarithmic I–V plots of the forward-biased In0.2Ga0.8N/GaNMQWLEDs having (a) zero-set, (b) one-set, (c) two-set, and (d) three-set Al0.3Ga0.7N/GaN SPSL insertion. C. L. Wang et al. MSE B 138 (2007) 180 Typical optical surface morphologies of etched In0.2Ga0.8N/GaN MQW LEDs having (a) zero-, (b) one-, (c) two-, and (d) three-set Al0.3Ga0.7N/GaN SPSL insertion. C. L. Wang et al. MSE B 138 (2007) 180 Typical I–V characteristics of the reverse-biased In0.2Ga0.8N/GaNMQW LEDs (1) without SPSL insertion, (2) with one set of Al0.3Ga0.7N/GaN SPSL insertion, (3) with two sets of Al0.3Ga0.7N/GaN SPSL insertion, and (4) with three sets of Al0.3Ga0.7N/GaN SPSL insertion, respectively. The inset exhibits plots of the corresponding EL intensity vs. emissionwavelength of the two LEDs having no SPSL and two sets of SPSL operated at 20 mA. C. L. Wang et al. MSE B 138 (2007) 180 C. L. Wang et al. MSE B 138 (2007) 180 Wei-Tsai Liao, Jyh-Rong Gong,* Cheng-Liang Wang, Wei-Lin Wang, Chih-Chang Tsuei, Cheng-Yen Lee, Keh-Chang Chen, Jeng-Rong Ho, and Ren C. Luo * Department of Physics, National Chung Hsing University, TAIWAN, R.O.C. Electrochemical and Solid-State Letters, 10 1 H5-H7 (2007) 65 Typical 0002 DCXRD curves of the In0.1Ga0.9N/Al0.03Ga0.97N MQW LED structures grown on c- and a-plane sapphire substrates. Insets: the corresponding XTEM micrographs of the LEDs near MQW area, respectively W. T. Liao et al. Electrochem. Solid-State Lett. 10 (2007) H5 Characteristics of the In0.1Ga0.9N/Al0.03Ga0.97N MQW LEDs grown on c- and a-plane sapphire substrates W. T. Liao et al. Electrochem. Solid-State Lett. 10 (2007) H5 Plots of EL intensity vs forward current of the In0.1Ga0.9N/Al0.03Ga0.97N MQW LEDs grown on c- and a-plane sapphire substrates. Inset: a typical room-temperature EL spectra measured at 20 mA for the In0.1Ga0.9N/Al0.03Ga0.97N MQW LEDs grown on c- and a-plane sapphire substrates. W. T. Liao et al. Electrochem. Solid-State Lett. 10 (2007) H5 Typical FESEM surface morphologies of the etched In0.1Ga0.9N/Al0.03Ga0.97N MQW LEDs grown on a c- and b a-plane sapphire substrates W. T. Liao et al. Electrochem. Solid-State Lett. 10 (2007) H5 External Quantum Efficiency Enhancement 70 Kuo-Yi Yen, Chien-Hua Chiu, Chun-Wei Li, Chien-Hua Chou, Pei-Shin Lin, Tzu-Pei Chen,Tai-Yuan Lin, and Jyh-Rong Gong* * Department of Physics, National Chung Hsing University, TAIWAN, R.O.C. IEEE PhotonicTechnologyLett.ers 24 (2012) 2105 71 72 Typical I-V curves of (a) N2-annealed n+-GZO contacts along with an ITO contact on p-GaN/sapphire templates and (b) forward-biased InGaN/GaN MQW LEDs with an as-deposited n+-GZO TCL, an ITO TCL and n+-GZO TCLs being N2-annealed at 400 °C, 500 °C, 600 °C, 700 °C, and 800 °C. K. Y. Yen et al. IEEE Photon.Tech.Lett. 24 (2012) 2105 Schematic showing electron tunneling in a reverse-biased n+GZO/p-GaN hetero-junction K. Y. Yen et al. IEEE Photon. Tech. Lett. 24 (2012) 2105 (a)–(f) θ-2θ XRD plots of asdeposited n+-GZO TCL and n+-GZO TCLs on GaN/c-sapphire substrates being annealed at 400 °C, 500 °C, 600 °C, 700 °C, and 800 °C for 5 min in N2 ambient. K. Y. Yen et al. IEEE Photon.Tech.Lett. 24 (2012) 2105 Light output powers of InGaN/GaN MQW LEDs with as-deposited n+-GZO, 400 °C N2-annealed n+-GZO and commercial ITO TCLs K. Y. Yen et al. IEEE Photon. Tech. Lett. 24 (2012) 2105 Optical transmittances of as-deposited n+-GZO, 400 °C N2-annealed n+-GZO and ITO films deposited on c-sapphire substrates K. Y. Yen et al. IEEE Photon. Tech. Lett. 24 (2012) 2105 78