Semiconductor Device Modeling and Characterization – EE5342 Lecture 8 – Spring 2011 Professor Ronald L. Carter ronc@uta.edu http://www.uta.edu/ronc/ First Assignment • e-mail to listserv@listserv.uta.edu – In the body of the message include subscribe EE5342 • This will subscribe you to the EE5342 list. Will receive all EE5342 messages • If you have any questions, send to ronc@uta.edu, with EE5342 in subject line. ©rlc L08-11Feb2011 2 Second Assignment • Submit a signed copy of the document that is posted at www.uta.edu/ee/COE%20Ethics%20Statement%20Fall%2007.pdf ©rlc L08-11Feb2011 3 Additional University Closure Means More Schedule Changes • Plan to meet until noon some days in the next few weeks. This way we will make up for the lost time. The first extended class will be Monday, 2/14. • The MT changed to Friday 2/18 • The P1 test changed to Friday 3/11. • The P2 test is still Wednesday 4/13 • The Final is still Wednesday 5/11. ©rlc L08-11Feb2011 4 Shockley-ReadHall Recomb Indirect, like Si, so intermediate state ET ©rlc L08-11Feb2011 E Ec Ef Efi Ec Ev Ev k 5 S-R-H trap 1 characteristics • The Shockley-Read-Hall Theory requires an intermediate “trap” site in order to conserve both E and p • If trap neutral when orbited (filled) by an excess electron - “donor-like” • Gives up electron with energy Ec - ET • “Donor-like” trap which has given up the extra electron is +q and “empty” ©rlc L08-11Feb2011 6 S-R-H trap char. (cont.) • If trap neutral when orbited (filled) by an excess hole - “acceptor-like” • Gives up hole with energy ET - Ev • “Acceptor-like” trap which has given up the extra hole is -q and “empty” • Balance of 4 processes of electron capture/emission and hole capture/ emission gives the recomb rates ©rlc L08-11Feb2011 7 S-R-H recombination • Recombination rate determined by: Nt (trap conc.), vth (thermal vel of the carriers), sn (capture cross sect for electrons), sp (capture cross sect for holes), with tno = (Ntvthsn)-1, and tpo = (Ntvthsn)-1, where sn~p(rBohr)2 ©rlc L08-11Feb2011 8 S-R-H recomb. (cont.) • In the special case where tno = tpo = to the net recombination rate, U is d p dn URG dt dt U pn ni2 ET Efi to p n 2ni cosh kT where n no n, and p po p, (n p) ©rlc L08-11Feb2011 9 S-R-H “U” function characteristics • The numerator, (np-ni2) simplifies in the case of extrinsic material at low level injection (for equil., nopo = ni2) • For n-type (no > n = p > po = ni2/no): (np-ni2) = (no+n)(po+p)-ni2 = nopo - ni2 + nop + npo + np ~ nop (largest term) • Similarly, for p-type, (np-ni2) ~ pon ©rlc L08-11Feb2011 10 S-R-H “U” function characteristics (cont) • For n-type, as above, the denominator = to{no+n+po+p+2nicosh[(Et-Ei)kT]}, simplifies to the smallest value for Et~Ei, where the denom is tono, giving U = p/to as the largest (fastest) • For p-type, the same argument gives U = n/to • Rec rate, U, fixed by minority carrier ©rlc L08-11Feb2011 11 S-R-H net recombination rate, U • In the special case where tno = tpo = to = (Ntvthso)-1 the net rec. rate, U is d p dn URG dt dt U pn ni2 ET Efi to p n 2ni cosh kT where n no n, and p po p, (n p) ©rlc L08-11Feb2011 12 S-R-H rec for excess min carr • For n-type low-level injection and net excess minority carriers, (i.e., no > n = p > po = ni2/no), U = p/to, (prop to exc min carr) • For p-type low-level injection and net excess minority carriers, (i.e., po > n = p > no = ni2/po), U = n/to, (prop to exc min carr) ©rlc L08-11Feb2011 13 Minority hole lifetimes. Taken from Shur3, (p.101). ©rlc L08-11Feb2011 14 Minority electron lifetimes. Taken from Shur3, (p.101). ©rlc L08-11Feb2011 15 Parameter example • tmin = (45 msec) 1+(7.7E-18cm3Ni+(4.5E-36cm6Ni2 • For Nd = 1E17cm3, tp = 25 msec – Why Nd and tp ? ©rlc L08-11Feb2011 16 M. E. Law, E. Solley, M. Liang, and D. E. Burk, “Self-Consistent Model of Minority-Carrier Lifetime, Diffusion Length, and Mobility,” IEEE Electron Device Lett., vol. 12, pp. 401-403, 1991. ©rlc L08-11Feb2011 17 M. E. Law, E. Solley, M. Liang, and D. E. Burk, “Self-Consistent Model of Minority-Carrier Lifetime, Diffusion Length, and Mobility,” IEEE Electron Device Lett., vol. 12, pp. 401-403, 1991. ©rlc L08-11Feb2011 18 ©rlc L08-11Feb2011 19 S-R-H rec for deficient min carr • If n < ni and p < pi, then the S-R-H net recomb rate becomes (p < po, n < no): U = R - G = - ni/(2t0cosh[(ET-Efi)/kT]) • And with the substitution that the gen lifetime, tg = 2t0cosh[(ET-Efi)/kT], and net gen rate U = R - G = - ni/tg • The intrinsic concentration drives the return to equilibrium ©rlc L08-11Feb2011 20 The Continuity Equation • The chain rule for the total time derivative dn/dt (the net generation rate of electrons) gives dn n n dx n dy n dz . dt t x dt y dt z dt The definition of the gradient is n i j k n, x y z ©rlc L08-11Feb2011 21 The Continuity Equation (cont.) The definition of the vector velocity is dx dy dz v i j k. dt dt dt Since A B AxBx AyBy AzBz , dn n then n v dt t ©rlc L08-11Feb2011 22 The Continuity Equation (cont.) The gradient operator can be distributed as n v n v n v . Considering the second term on the RHS, dx dy dz v 0, since x dt y dt z dt dx d x 0, etc. x dt dt x ©rlc L08-11Feb2011 23 The Continuity Equation (cont.) Consequently, since Jn qn v , we have n 1 dn n J n . So n v t q dt t dp p 1 dn n 1 Jp J n , and dt t q dt t q are the " Continuity Equations". ©rlc L08-11Feb2011 24 The Continuity Equation (cont.) dp dn The LHS, or -V, of the Continuity Eq. dt dt represents the Net Generation Rate of n or p at a particular point in space (x, y, z). n p The first term on the RHS, or , is t t the " explicit" Local Rate of Change of n or p at (x, y, z). ©rlc L08-11Feb2011 25 The Continuity Equation (cont.) 1 The second term on the RHS, J n q 1 or J p is the local rate of n or p q concentrations flowing " out of" the point (x, y, z). Note the difference in signs for electrons (-q) and holes ( q). ©rlc L08-11Feb2011 26 The Continuity Equation (cont.) So, we can re - write the continuity equation for the holes as : p dp 1 Jp t dt q Which can be interpreted as : Local rate of change net generation rate rate of inflow ©rlc L08-11Feb2011 27 References *Fundamentals of Semiconductor Theory and Device Physics, by Shyh Wang, Prentice Hall, 1989. **Semiconductor Physics & Devices, by Donald A. Neamen, 2nd ed., Irwin, Chicago. M&K = Device Electronics for Integrated Circuits, 3rd ed., by Richard S. Muller, Theodore I. Kamins, and Mansun Chan, John Wiley and Sons, New York, 2003. • 1Device Electronics for Integrated Circuits, 2 ed., by Muller and Kamins, Wiley, New York, 1986. • 2Physics of Semiconductor Devices, by S. M. Sze, Wiley, New York, 1981. • 3 Physics of Semiconductor Devices, Shur, PrenticeHall, 1990. ©rlc L08-11Feb2011 28