MCQs – Nanobiotechnology – Units 1,2 – Quiz 1 (Mark only the correct answer/s –
Any change in the answer/s will be considered as wrong answer/s) – G1 Batch
1. New behavior at nanoscale is not necessarily predictable from what we know at
macroscales
a). True
b). False
c). Both a and b
d). None of the above
2. Approximately _________ of the atoms in ___________ are found on the surface
a). 100 %, Bulk materials
b). 50 %, Nanostructures
c). Both a and b
d). None of the above
3. Generally, for semiconductors such as ZnO, CdS, and Si; when the bandgaps lie
in the _________ spectrum, changing bandgap with _______ means a change in
__________.
a). infrared, charge, color
b). visible, size, color
c). ultraviolet, temperature, color
d). None of the above
4. The surface to volume ratio for a cube with a side ‘a’ is
a). a/6
b). 6a
c). 6/a
d). 12a
5. ____________ based processing techniques fail at the ________ because one
cannot succeed in reducing features in the images produced to ________ than the
___________ of the light used
a). Heat, Nanoscale, more, temperature
b). Light image, Nanoscale, less, wavelength
c). Pressure, Macroscale, less, wavelength
d). Velocity, Nanoscale, less, wavelength
6. Nanoscience is dominated by two electron phenomena
a). Quantum Size effect and Tunneling
b). Collision and Velocity
c). Both a and b
d). None of the above
7. Langmuir films, LB films, and SAMs are all examples of ____________ and
_______________ nanostructures
a). Inorganic thin films, 3D
b). Organic thin films, 2D
c). Both a and b
d). None of the above
8. In LbL Self-assembly, the main reasons for charge reversal from _________ to
__________ is because of the ________ and ___________ of polyelectrolyte with
opposite charges
a). positive, negative, absorption, diffusion
b). negative, positive, absorption, capillary action
c). negative, positive, adsorption, overcompensation
d). None of the above
9.
(a)
(b)
a)
b)
Assume you have an oxide layer and a photoresist on top of the substrates in the
top-most portion of the picture above, then a and b would have used ________
and _______ resist respectively
a). Negative and Postitive
b). Positive and Negative
c). Neutral and Positive
d). Negative and Neutral
10.
Identify the process from the schematic given above
a). Sputtering
b). Wet chemical etching
c). Dry chemical etching
d). Evaporation
MCQs – Nanobiotechnology – Units 1,2 – Quiz 1 (Mark only the correct answer/s –
Any change in the answer/s will be considered as wrong answer/s) – G2 Batch
4. Given below are some of the facts and assumptions regarding Chemisorption
a). Langmuir theory is valid which assumes gases form only one monolayer on a
solid
b). Gas molecule collision with solid  inelastic, so the gas
molecule stays in contact with solid, for a time before desorbing
c). Both a and b
d). None of the above
5.
(a)
(b)
(c)
In the schematic given above, the confinement is along __________ dimensions
and the structures formed respectively (from a to c) are _________________.
a). 2,1, and 3; quantum wire, well, and dot
b). 1, 2, and 3;
quantum well, wire, and dot
c). 3, 1, and 2; quantum dot, wire, and well
d). None of the above
6. A relatively common analytical instrument used in nanotechnology, the Quartz
Crystal Microbalance (QCM) uses the ______________ to calculate the
________, ____________, etc. of nanofilms.
a). Whartman’s equation, charge, thickness
b). Sauerbrey’s
equation, mass, thickness
c). Goodman’s equation, viscosity, thickness
d). None of the above
7. ________________ controls energies _________ nanoparticles and _________
controls movement _________ nanoparticles
a). Heat, inside, Pressure, between
b). Quantum size effect, between,
Tunneling, inside
c). Quantum size effect, inside, Tunneling, between
d). None of the above
5. The surface to volume ratio for sphere with a side ‘a’ is
a). 3a
b).3/a
c). 2a
d). a/2
6. Identify the types of etching below and the etchants used in a and b respectively
are mostly
a)
b)
a). a – Anisotropic, alkaline, b – Isotropic, acidic
alkaline, b – Anisotropic, acidic
Anisotropic, alkaline
b). a – Isotropic,
c). a – Isotropic, acidic, b –
d). None of the above
7. During the formation of patterns using the top-down method, the final inspection
step is done to ensure ___________ has been ____________, pattern on wafer
___________ mask pattern (when a negative photoresist is used).
a). photoresist, completely stuck, does not match
b). photostick, completely removed, matches
c). photoresist, completely removed, matches
d). photoresist, completely removed, does not match
8. CVD processes normally exhibit _________ pressure compared with sputtering
and particles arriving on the substrate have a __________ angular distribution,
and their energy is ________
a). higher, broader, low
b). lower, narrower, high
c). higher, narrower, high
d). lower, broader, low
9. ____________ are the most commonly used molecules for SAMs and the
byproduct formed during the formation of SAMs using these commonly used
molecules is ____________
a). silanes, nitrogen
b). silanes, hydrogen
c). Both a and b
d). alkanethiols, hydrogen
10. In the LbL schematic depicted below, nanocapsules may potentially be loaded via
a). capillary action, changing pH and dielectric constant of the solvent
b). capillary action, changing pH and salt concentration of the solvent
c). diffusion, changing pH and dielectric constant of the solvent
d). None of the above