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Table of Content
1.
2.
3.
4.
5.
6.
Resume
SEM Portfolio
Confocal Portfolio
Profilometer Portfolio
AFM Portfolio
Final Project
Page 3-4
Pages 5-8
Pages 9-11
Pages 12-15
Pages 16-18
Page 19-20
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Jonathan P Bartsch
(206) 715-9750 | jpbartsch3@gmail.com
TECHNICAL | ABILITIES
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CHARACTERIZATION
Aspex Explorer SEM (QuadBSED, SED)
JEOL-7600F Immersion Lens SEM
EDS/EDX Elemental Analysis
Compositional Mapping
Bruker DektakXT Profilometer
Episcopic Optical Microscopy
Knowledge of Electromechanical Micro- Structures
and Functions
Lab Intern
Microfabrication Facility
University of Washington
March 2013-Present
Consultant
Jonathan Bartsch Consulting
March 2013-Present
Micro/Nanofabrication Lab
EE Microfabrication Lab
University of Washington
Jan 2013- March 2013
Lab Technician
SHINE Nanotechnology Lab
North Seattle Community College
Sept 2012- March 2013
Lab Technician
General Sciences
North Seattle Community College
Sept 2011-Sept 2012
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FABRICATION
Physical Vapor Deposition
Sputter Coat Au & Au/Pd
Thermal Evaporation Al & Cr
UV Photolithography
Mask Alignment
Spin Coating: Photoresist
Dry Etch: Ion bombardment/RIE
Wet Etch: BOE/HF
CAD design: Sketchup & AutoDesk
Class 10K Clean Room
TECHNICAL | EXERIENCE
Developing and Fabricating, a copper vacuum capacitor for nuclear
measurments using SU-8 molding and electroplating, for features sizes greater
then 0.7mm. Characterizing Reactive Ion Etcher after the replacement of turbo
pump with a lower vacuum roughing pump.
Performed patent analysis of consumer electronics for large patent holding
firm, while utilizing JEOL 7600F Immersion Lens SEM for imaging of ASIC and
MEMs.
Learned
and
implemented
micro-fabrication
techniques
including
photolithography, physical vapor deposition (PVD), and etching to manufacture
multiple novel photo-sensors.
Standardized Aspex Explorer SEM operation, sample preparation, and imaging
procedures to produce high resolution imaging of standards and various samples.
Additional use of EDX for compositional mapping of samples. Utilized
characterization equipment and techniques including 3D Profilometery, Atomic
Force Microscopy (AFM), and Confocal Microscopy for observations of nano scale
structures. Developed Standard Operating Procedures for SEM use and
maintenance, as well as public advertisements for SHINE Nanotechnology Lab.
Maintained and operated lab equipment, chemicals, and demonstrations for use
in microbiology, chemistry, and physics labs. Oversaw the deployment and
production of over 200 geological rock sample kits, while decreasing production
time by half. Actively worked with lab technicians and teachers on a daily basis.
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EDUCATION
Associate of Applied Science in Nanotechnology
Bachelor of Arts in Sociology
North Seattle Community College
Spring 2013
Seattle Pacific University
December 2008
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Aspex EXplorer Scanning Electron Microscope
Specifications
Detectors
Particle Detection
Range
Accelerating
Voltage
Stage Movement
Lightest Element
Detection
SED, Quad BSED,
SDD EDX
30nm to 5mm
0.2 – 25 KeV
80mm X 100mm
Boron
http://aspexfei.files.wordpress.com/2013/01/fpo-121127-0139-aspex.jpg
General layout of Scanning Electron Microscopy
SEM Imaging
1. Thermionic
emission generates
electron beam
2. Beam is focused
through condensing
lenses
3. Low energy
secondary electrons
are emitted from
sample electron
shells and/or high
energy
backscattered
electrons are
reflected off of
atomic nuclei
4. Secondary or
Backscattered
electrons are
collected and
quantified as
amount per spot size
5. Deflection coils
raster the electron
beam over the
surface thereby
imaging the sample
EDX Analysis
1. Thermionic
emission
generates
electron beam
2. Condensing
electromagnetic
lenses focus beam
on Sample
3. Photons are
emitted as
electrons relax
after being
excited by
electron beam
4. The photons
wavelength are
detected by and xray detector
5. Each atomic
element produces
characteristic xrays (photons),
thus chemical
composition can
be quantified.
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Scanning Electron Imagery
Fig. 1 Astigmatism Correction Standard
Fig. 2 Gold Particles on Carbon
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Fig. 3 Feature size standard
Fig. 4a Macro image of AFM Tip
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Fig. 4b Micro image of AFM tip with EDX Scan area in yellow
Fig. 4c EDX Spectra with KLM Silicon marker indicated, Analysis indicates AFM tip is >99% Silicon
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Olyumpus FV10i Laser Scanning Confocal
Specifications
UV laser
wavelengths
Scanning Method
Pixel Resolution
Scanning Speed
Detector Module
Optical Zoom
405nm, 473nm,
635nm
2 galvanometer
scanning mirrors
256 x 256 -> 1024 x
1024
1.1 s/ frame
2 fluorescence
channels and 1
phase contrast
10x and 60x
General Layout of Confocal
Fig. 1 Elements of a Confocal Microscope
Fig. 2 Fluorescence
Laser Scanning Confocal Microscopy is a optical method to obtain high resolution images with depth
selectivity. It can produce 2D cross sections of optically transparent samples as well as compliational 3D
images of many cross sections. Confocal Micoscopy relies on certain atoms/ molecules emitting photons
(flourecense) at opitical wavelengths when higher energy light raises an electron to an excited state. In
the Olympus FV10i confocal a laser source with a specific spot size is raster over a certain cross section
(focal plane) of a transparent sample. As the sample abosorbs the energy given by the lasers photons
the sample will then emitt a photon with a shorter wavelength. This photon is then observed with a light
detector. The laser then rasters over the sample and an image is compiled.
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Confocal Imagery
Fig. 3 Fern Spore
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Fig. 4 Munjac Muscle Cell
Fig. 5 3D Compiled Picture of Lily Pollen
Image is 240 microns by 240 microns and 65 microns tall
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Bruker Dektak XT Profilometer
Specifications
Measurement
Technique
Capability
Stylus Force
Stylus Radius
Scan Length Range
Vertical Resolution
Stylus Profilometry
(Contact)
2D surface profile;
3D measurement &
analysis
1 to 15mg
2μm
55mm;200mm with
stitching
1Å max
http://mmrc.caltech.edu/DektakXT/pictures/Dektak%20interior.jpg
General layout of a Profilometer
Profilometery is a surface measurement tool using a diamond tip stylus to physically press and drag
across a specimen’s topography. The tool can produce two dimension path data or when paths are
compiled can render three dimension surfaces. The Bruker Dektak XT specifically uses a Linear Variable
Differential Transducer (LVDT) to apply a constant force upon the surface. As the stylus moves across
the surface of the sample the LVDT measures the difference in its capacitance as its height moves
proportionally with the stylus head. Heights between tens of nanometers and a few microns can be
measured, albeit with rounding of smaller features as resolution is dependent on tip size. Profilometery
is a great tool for measuring large surfaces accurately, but the sample must be uniform in the macro.
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Profilometery Imagery
Fig. 1 Integrated Circuit with Stylus Path Indicated
Fig. 1b Line scan profile of Fig. 1a
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Objective
To observe the relationship between spin speed of applied photoresist PEDOT and
its thickness using profilometery to measure thickness.
Procedure
Test Study; Measurement of Resist Compared to Spin Speed at Application
The water soluble nanofilm PEDOT/PSS was spun until five small glass slides with
five different spin speeds and then baked on a hot plate for one minute. A needle
was used to scratch a mark through the film on each of the samples. The step
height of the film to the glass slide was measured with the Bruker Dektak XT
Profilometer giving an accurate measure of the film thickness. The data was then
plotted and compared to previous research.
Line
Scan 1
Line
Scan 2
Line
Scan 3
Line
Scan 4
Average
Line
Scan 5
Height
nm
1500
197
196
205
194
195
197.4
1750
189
192
191
189
193
190.8
2250
178
182
165
160
170
171
2500
132
148
142
139
139
140
3000
129
130
119
115
Fig. 1 Data of Spin speed vs PEDOT thicknesses
130
124.6
Spin Speed vs PEDOT Height
250
Thickness (nm)
Data
Spin
Speed
200
150
100
50
0
1000
1500
2000
2500
3000
Spin Speed (rpm)
Fig. 2 Observed data
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Conclusion
Fig. 3 Comparison data from previous work (Ultra-thin conductive free-standing
PEDOT/PSS nanofilms)1
A similar trend can be observed in Fig.2 and Fig.3, or as spin speed increases a
decrease in film height occurs. A noticeable flattening should be expected, as in fig.
3 but this experiment did not record data at +3000 rpm and therefore was not
observed. A significant difference in the actual height of resist can be seen
between this experiment and the research done by Greco as a factor of ten. This
could be because of the lack of precise control in amount of PEDOT deposited and
the recipe used.
Greco, F. (2011, October 11). Ultra-thin conductive free-standing PEDOT /PSS nanofilms - Soft Matter
(RSC Publishing) DOI:10.1039/C1SM06174G. RSC Publishing Home – Chemical Science Journals, Books and
Databases. Retrieved June 9, 2013, from http://pubs.rsc.org/en/content/articlehtml/
1
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NanoSurf EasyScan 2 Atomic Force Microscopy
Specifications
Tip size
Scan Speed
Scan area
Maximum z-range
Drive Resolution
10 µm , 70 µm,
119µm
60 ms/ line at 128
datapoints / line
Up to 2048 x 2048
points
2 µm, 14 µm, 22
µm (tip
dependent)
0.15 nm, 1.1 nm,
1.7 nm (tip
dependent)
General layout of Atomic Force Microscopy
In general, an AFM measures surface topography,
i.e. a comparison of height to a reference point.
AFM uses piezo crystals to move sample stage,
which allows for sub nanometer precise
movement. AFM then is essentially the most
precise method of topographical measurement.
AFM are fairly versatile however samples must be
fairly small and thin. The input of an AFM is the
angle of deflection of a laser light bounced off the
AFM tip and detected by the Photo-detector as the
tip travels over the surface of a sample. This
reading then allows for precise height readings(z)
of the sample. The AFM rasters over the surface of
the sample taking a reading corresponding to each
pixel. The image produced then represents height
at each pixel (location), or high features (light) or
low features (dark).
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tomic Force Microscopy Imagery
Fig.1 Calibration Standard 3D Image
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Fig.2 Phototransistor 2D image
Fig. 3 Phototransistor 3D image
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Final Project
Overview: An acoustic and electromagnetic isolation chamber was designed and fabricated for
the enclosure of the Nanosurf Atomic Force Microscope. The primary materials used were
acrylic sheets and 2” sound proofing foam. The acoustic profile of the room was measured and
compared to the acoustic profile inside the enclosure.
Deliverables:
1. Sketchup 3D CAD File/Design
2. Formated CAD file for laser cutter
3. Bill of sale for purchased parts
4. Acoustic Isolation chamber
5. Acoustic profile of room/Inside of chamber
Timeline:
Project Step
Estimated Time of
Completion
Updated Time of
Completion
CAD Design and formatting
5/10/2013
5/10/2013
Purchase supplies
5/3/2013
5/13/2013
Construction complete
5/17/2013
5/24/2013
Acoustic Profiles
5/24/2013
5/31/2013
Portfolio write up
6/7/2013
6/7/2013
Materials:
1. Acrylic sheets
2. Acoustic Foam
3. Acrylic Hinges
4. Rubber Tubing
5. Acrylic glue
6. Double sided Velcro
Additional Resources
1. Phone
2. Computer
3. Measuring Tape
4. Laser Printer
5. Pen
6. Sketchup
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SketchUP Design
Picture of Built Chamber
Vibrational Profile Comparison
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