1/f noise in devices 2004-30348 전광선 What is the 1/f noise? • A fluctuation in the conductance with a power spectral density proportional to f The cause of 1/f noise 1 • The conductance is g qn L • If conductance fluctuation is occurred which is fluctuated among the total carrier number or the mobility or both? • The reason is not revealed clearly. Number Fluctuation • Fluctuation of carrier number by traps. • In homogeneous bulk devices, Number fluctuation is not observed • In n-type MOST, Number fluctuation is observed because of the interface of bulk and oxide Mobility Fluctuation • Caused by scattering in the bulk region. • Depending on the phonon number fluctuation in bulk. • In MOST devices, mobility fluctuation is not fit to explain 1/f noise but ptype MOST devices. Frequency up-conversion • Considered in oscillator and mixer. • Generation of phase noise of output signal to mix the current with impulse sensitivity function(ISF). • To consider power spectral density at the carrier frequency, the frequency range of 1/f noise is shifted upwardly. Frequency up-conversion Generation of phase noise Frequency upconversion of 1/f noise to carrier frequency 1/f noise in GaAs HBT • At low forward current (<100uA), the 1/f noise density gm2 SVE is determined by S Ic , SVB / r 2 by S Ib ( SI ~ I B1.5 , SI ~ Ic1.4 ) B c • At high forward current (>100uA) the steep increase is due to the noise in the parasitic resistance.( SV I 2 Sr ) 1/f noise in HBT • Can not observe a change in the current dependence of SVC because of setting RB RC guessed from 2 RC 2 2 SVC [ I B S rb I E S re ] RB 1/f noise in GaAs HBT • From the equation gm2 SVE [1 gmc (rb RB )]2 SIb ~ SIc ~ If RB gmc 1 rb then the noise contribution from the base current is zero. • But there are no minimum point.→ S Ib can be neglected 1/f noise in GaAs HBT • Sometimes a G-R noise contribution (leveling off of the spectral density) was observed at frequencies above 1kHz due to traps with a time constant lower than 0.1ms. • Comparing the 1/f noise of HBT with npn microwave silicon transistor, at the same current the 1/f noise (SIb , SIc )is much higher in HBT.In silicon npn transistor, 1/f base current noise is dominant and 1/f collector current noise is neglected. 1/f noise in BJT • Mainly discussed in terms of mobility fluctuation(no oxide interface) • In small BJT, the internal base and emitter series resistance became more important than emitter and base current at high current. 1/f noise in BJT • At low frequencies 1/f component is proportional to inverse frequency. • At high frequencies white component is independent to frequency. • Most of the spectra have corner frequencies fc in the range of 10Hz – 10kHz 1/f noise in BJT • Common collector configuration. • At 1Hz • Both noise have a changeover of the current dependence at I E ~ 30 A 1/f noise in BJT • At low current ( I E <30uA) the 1/f noise can be strongly reduced by adjusting RB gm1 rb and from SV T2[ gm1 (rb RB )]2 SI ~ E eb S Ieb is dominant. 2 r • At high current ( I E >30uA) from Sr ( f ) fN the internal resistance is more important than frequency in 1/f noise. 1/f noise in MOSFET (n-type) • Mainly explained by carrier number fluctuation by tunneling of free charge into oxide trap close to the interface • Proportional to trap density. • Degradation by hot electron and ionizing irradiation as recent origin of number fluctuation 1/f noise in MOSFET (p-type) • Generally thought by mobility fluctuation. • Because of larger distance from the interface, less noisy and independent to number fluctuation SG • Satisfying empirical relation G 2 fN where alpha is constant 1/f noise in MOSFET • Input noise is proportional to interface state density at fermi level and oxide trap density. • It explains that noise occurred by number fluctuation is affected to traps on oxide trap , oxide interface trap. 1/f noise in MOSFET • 1/f noise in n-type MOS is independent to gate bias. • It means that 1/f noise in n-type is independent to mobility fluctuation and affected by carrier number fluctuation. 1/f noise in MOSFET • 1/f noise in p-type MOS is dependent on the gate bias. • The gate bias dependence is explained by buried channel conduction. • It says 1/f noise in p-type MOS is explained by mobility fluctuation. 1/f noise in MOSFET • P-type MOS suffers from mobility fluctuation generally but at high field condition, carrier fluctuation phenomenon is dominant. Conclusion • 1/f noise in electronic devices is explained by both number fluctuation and mobility fluctuation. • To reduce 1/f noise by number fluctuation, growing pure oxide(little trap) and new technique of surface etching are needed. • To reduce 1/f noise by mobility fluctuation, pure bulk is needed to make less scattering in bulk devices. Reference [1] Kleinpenning, “Location of Low-Frequency Noise Source in Submicron Bipolar Transistors”,IEEE on ED vol. 39 no.6 1992 [2] Vandamme, Xiaosong Li,and D. Rigaud, “1/f noise in MOS Devices, Mobility or Number Fluctuation?”, IEEE on ED vol. 41, no. 11, 1994 [3] Kleinpenning and A.J.Holden, “1/f Noise in n-p-n GaAs/AlGaAs Heterojunction Bipolar Transistor: Impact of Intrinsic Transistor and Parasitic Series Resistances”, IEEE on ED vol. 40, no. 6, 1993 [4] Hooge, “1/f Noise Sources”, IEEE on ED vol. 41, no. 11, 1994 [5] Thomas H. Lee and A.Hajimiri, “Oscillator Phase Noise : A Tutorial”, IEEE on Solid State Circuits, vol. 35, no. 3, 2000 [6] Chang, Abidi and Viswanathan, “Flicker Noise in CMOS Transistor from Subthreshold to Strong Inversion at Various Temperature”, IEEE on ED vol. 41, no. 11, 1994 [7] Herman et al, “Correlation between 1/f noise and interference state density at the Fermi level in field effect transistor”, J. Appl. Phy., vol. 57, pp48114813, 1985 Etc…..