Agilent 7500 ICP-MS
Date: 28JUL2005
What is ICP-MS?
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1
H
2
Li
Be
B
C
N
O
3
Na
Mg
Al
Si
P
4
K
Ca
Sc
Ti
V
Cr
Mn
Fe
Co
Ni
Cu
Zn
Ga
Ge
5
Rb
St
Y
Zr
Nb
Mo
Tc
Ru
Rh
Pd
Ag
Cd
In
6
Cs
Ba
L
Hf
Ta
W
Re
Os
Ir
Pt
Au
Hg
Tl
7
Fr
Ra
A
Rf
Db
Sg
Bh
Hs
Mt
L
La
Ce
Pr
Nd
Pm
Sm
Eu
Gd
Tb
Dy
Ho
Er
Tm
Yb
Lu
A
Ac
Th
Pa
U
Np
Pu
Am
Cm
Bk
Cf
Es
Fm
Md
No
Lr
Page 2
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He
1
F
Ne
2
S
Cl
Ar
3
As
Se
Br
Kr
4
Sn
Sb
Te
I
Xe
5
Pb
Bi
Po
At
Rn
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Atomic Spectroscopy (I)
Atomic Absorption Spectroscopy
Graphite Furnace AAS
ICP-Mass Spectroscopy
Inductively Coupled Plasma Optical Emission Spectroscopy
Nucleus
Electron
Page 3
Atomic Spectroscopy (II)
High Precision
FAAS
ICP-MS
Quantitation
High Sensitivity
Sensitivity
Low Detection Limits
GFAAS
ICP-OES
Multi-element Simultaneous Analysis
Page 4
Spectral Interferences
ICP-MS Schematic Diagram
5. Isolation Valve
8. Detector
3. Plasma
2. Spray Chamber
4. Off-axis Lens
6. ORS
1. Nebulizer
Page 5
7. Mass Filter
Sample Introduction Device
Ar blend gas
Sample solution
Babington
Nebulizer
To ICP
Al insulation
cover
Ar carrier gas
Peltier cooling device
Cooling water
Page 6
Mass flow Control
2. Spray Chamber
4. Interface
6. Ion Lenses
Auxiliary Gas (1L/min)
Carrier Gas (1.2L/min) +
Sample Blend Gas (0.6L/min)
Plasma Gas (15~16L/min)
Page 7
Ionization by Plasma
2. Spray Chamber
ID 2.5mm, Flow 0.2~0.4ml/min
1. Drying
3. Atomization
+
2. Decomposition
Page 8
4. Ionization
Distribution of Plasma
27.12MHz
Sample
S
Intensity(%)
40MHz
27.12MHz
S
-8
-6
-4
-2
0
2
4
6
8
Distance from Center(mm)
40MHz
Page 9
Cool Plasma
Interference
Work coil
39K
38Ar1H
40Ca
40Ar
56Fe
40Ar16O
Torch
18
Potential
Shield plate
12
6
0
K
Ca
Fe
Element
Page 10
Ar
Cool Plasma
Normal Plasma
Cool Plasma
Shield plate
• Forward Power: 1300W
• Forward Power: 900W
• Sampling Depth: 7mm
• Sampling Depth: 13mm
• Carrier Gas Flow: 1.2ml/min
• Carrier Gas Flow: 1.7ml/min
Page 11
Ionization Efficiency
100
Ionization Efficiency(%)
10
1
0.1
Mg
Mg, Fe, As
Fe
Cl
As
Ar
0.01
0.001
0.0001
Cl
0.00001
0.000001
0.0000001
4,500
Ar
5,000
5,500
6,000
6,500
Electron Temperature(K)
Page 12
7,000
7,500
Optimum gas flow
Sensitivity
Co
ArH
ArO
Carrier gas flow
Page 13
Extraction Lens
Sampling cone
Twin Extraction
Lenses
Skimmer cone
Page 14
Why need ORS?

Interference
Matrix
39K
38Ar1H
UPW
40Ca
40Ar
UPW
56Fe
40Ar16O
UPW
51V
35Cl16O
HCl
52Cr
35Cl16O1H
HCl
75As
40Ar35Cl
HCl
48Ti
32S16O
H2SO4
64Zn
32S16O16O
H2SO4
63Cu
31P16O16O
H3PO4
68Zn
31P18O18O1H
H3PO4
24Mg
12C12C
Organics
52Cr
40Ar12C
Organics
There are some applications where
cool plasma does not meet current and
future required performance levels for
certain analytes:

several interfered analytes in high
(100-1000ppm) Si matrices

interfered analytes (Ti, Zn) in high
matrix acids H2SO4 and H3PO4
Agilent’s Octopole Reaction Cell can remove these interferences…
Page 15
Off-axis Lens
Page 16
Dissociation
He
As
75amu
75amu
Ar
40amu
Ar
Ar
Cl
75amu
Cl
Cl
35amu
Page 17
Energy Transfer
75amu
As
He
Ar
75amu
Cl
Electric Potential
(Quadrupole)
Page 18
Reaction mode
Charge Transfer
Ar+ + H2
H2+ + Ar
(neutral)
Proton Transfer
Ar2+ + H2
(80amu)
Ar2H+ + H
(81amu)
Page 19
Mass Filter
• True Hyperbolic Quadrupole
• 3MHz RF Generator
• Peak Shape
• Abundance Sensitivity
3MHz
Page 20
Dual Electron Multiplier
M+
e
e
Dynode
Page 21
Fast Analogue
Pulse Counting
Detection
Detection
Wide Dynamic Range
1000ppm
• Dynamic Range: 9 orders
• Analog Mode
1ppt
• Pulse Counting Mode
• Solid type Multiplier
Page 22
ICP-MS Schematic Diagram
5. Isolation Valve
8. Detector
3. Plasma
2. Spray Chamber
4. Off-axis Lens
6. ORS
1. Nebulizer
Page 23
7. Mass Filter
Flexibility
[I-Autosampler]
[HPLC-ICP-MS]
[ORS Technology]
[GC-ICP-MS]
[Organic Kit]
Page 24
Sample Type
•
Waters
•
Chemicals
•
Semiconductor
•
Food
•
Geological
•
Clinical
•
Forensic
•
Petrochemical
•
Nuclear
Page 25