Investigation of Defect Free SiGe Nanowire Biosensor Modified by

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Investigation of Defect Free SiGe Nanowire Biosensor Modified by

Investigation of Defect Free SiGe Nanowire Biosensor Modified by Dual Plasma
Technology
Tai-Yuan Chang,Kow-Ming Chang,賴瓊惠,Chu-Feng Chen,Yi-Ming Chen,Wu-Fan
Lee
Electronics Engineering
Engineering
chlai@chu.edu.tw
Abstract
In this work, SiGe NWs biosensors were fabricated by VLSI technology, especially
through the dual plasma technology by introducing the CF4 plasma pre-treatment and
N2 plasma post-treatment, resulting in the defect repairs as well as sensitivity
improvement.
Keyword：plasma treatment

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