Investigation of Defect Free SiGe Nanowire Biosensor Modified by Dual Plasma
Technology
Tai-Yuan Chang,Kow-Ming Chang,賴瓊惠,Chu-Feng Chen,Yi-Ming Chen,Wu-Fan
Lee
Electronics Engineering
Engineering
chlai@chu.edu.tw
Abstract
In this work, SiGe NWs biosensors were fabricated by VLSI technology, especially
through the dual plasma technology by introducing the CF4 plasma pre-treatment and
N2 plasma post-treatment, resulting in the defect repairs as well as sensitivity
improvement.
Keyword：plasma treatment