GaAs band gap engineering by colloidal PbS quantum dots Bruno Ullrich Instituto de Ciencias Físicas, Universidad Nacional Autónoma de México, Cuernavaca, Morelos C.P. 62210, Mexico Acknowledgements • • • • Joanna Wang (WPAFB) Akhilesh Singh (UNAM) Puspendu Barik (UNAM) DGAPA-UNAM PAPIIT project TB100213-RR170213 (PI Bruno Ullrich) Motivation • Work in 2009 showed that PbS quantum dots (QDs) notably alter the emission of GaAs • Tailored photonic applications? • Ullrich et al., J. Appl. Phys. 108, 013525 (2010) Presentation’s outline Essentially, two points will be covered: a) Optical properties of colloidal PbS QDs on GaAs b) Absorption edge engineering of GaAs with PbS QDs Sample preparation Oleic acid capped PbS QDs are dispersed on GaAs either by a supercritical CO2 method*) or by spin coating. *)Wang et al., Mat. Chem. Phys. 141, 195 (2013). Why PbS, why GaAs? • PbS possesses a large Bohr radius (20 nm). Emission covers the attractive range for optical fibers • GaAs is “fast” and meanwhile a main player in optoelectronics SEM image of a typical sample Particle size: 2.00.4 nm 20 nm We are dealing with a size-hybrid • Sample can be considered – to a certain extend – as free standing (regularly arranged) energy confinement potentials with similarities to superlattices. • Indeed, electronic states of the QDs are coupled via tunneling. Photoluminescence 250 PL intensity (arb. units) 2 120 W/cm 200 5K 2 90 W/cm 2 72 W/cm 150 2 60 W/cm 2 48 W/cm 100 2 30 W/cm 2 18 W/cm 2 50 12 W/cm 2 6 W/cm 0 0.9 1.0 1.1 1.2 Energy (eV) 1.3 1.4 Experimental setup Photo-doping 1.180 E PL (eV) 1.175 1.170 1.165 1.160 1.155 0 20 40 60 80 2 I (W/cm ) ex 100 120 140 Burstein-Moss effect • Doping by excited charge carriers increases the QD band gap • Generation of at least one electron-hole pair per QD • Reversible band gap alteration proportional to Iex2/3 • Ullrich et al., J. Appl. Phys. 115, 233503 (2014) Transmittance (normalized) Transmittance 300 K 4 3 200 K 100 K 2 10 K 1 PbS/GaAs 0 1.0 1.1 1.2 1.3 1.4 Energy (eV) GaAs 1.5 1.6 Absorption edge manipulation 1.2 E TR (normalized) 1.0 g GaAs 0.8 0.6 PbS/GaAs 0.4 RT 0.2 0.0 1.0 1.1 1.2 1.3 1.4 Energy (eV) 10 K 1.5 1.6 Slope of the edge Normalized slope (1/eV) -0.30 -0.40 GaAs -0.50 -0.60 -0.70 PbS/GaAs -0.80 -0.90 -1.00 -1.10 0 50 100 150 200 250 Temperature (K) 300 350 Band gap shift 0 dTR/dE (1/ev) -10 3.0 nm QDs (Spin-coating) -20 RT -30 -40 -50 2.0 nm QDs (CO ) 2 -60 -70 -80 1.35 SI-GaAs PbS/GaAs 1.36 1.37 1.38 1.39 1.40 Energy (eV) 1.41 1.42 ?Reasons? • • • • • Charge transfer (Urbach tail alteration) Superposition of absorption spectra Interfacial impurities Vibronic mode manipulation Influence of preparation method and doping of the substrate (currently ongoing studies) • Change of reflectance Conclusion and future • QDs alter the optical properties of the host • Concentration on the emission properties for technological applications (emission from the interface?) • Possible influence of the QD size on the optical properties of the host • Formation of opto-electronically active junctions Thank you! bruno@fis.unam.mx