Background Statement for SEMI Draft Document 4589A REVISION TO SEMI C62-1107 SPECIFICATION FOR POROGEN PRECURSORS USED IN LOW K CVD PROCESSES Note: This background statement is not part of the balloted item. It is provided solely to assist the recipient in reaching an informed decision based on the rationale of the activity that preceded the creation of this document. Note: Recipients of this document are invited to submit, with their comments, notification of any relevant patented technology or copyrighted items of which they are aware and to provide supporting documentation. In this context, “patented technology” is defined as technology for which a patent has issued or has been applied for. In the latter case, only publicly available information on the contents of the patent application is to be provided. Porogen precursors are required to deposit porous low k dielectric layers for the 45 nm node and beyond. At the present time there is no standardization on either the specification for the materials or the analytical methods used to certify these materials. The standard will be useful for all materials suppliers to this market. The draft was balloted and approved as the Guideline at SEMICON West, July 2007. This ballot is being proposed to validate analytical methodologies since these test methods have been shown to give statistically valid results. Data to support validated methodologies may be reviewed at the following website at http://teams.semi.org/stds_chem This letter ballot will be reviewed by the Analytical Methods Task Force and adjudicated by the Liquid Chemicals Committee at their meetings at SEMI HQ in San Jose, CA, during the week of 3rd November, 2008. Note: Additions are indicated by underline and deletions are indicated by strikethrough Semiconductor Equipment and Materials International 3081 Zanker Road San Jose, CA 95134-2127 Phone:408.943.6900 Fax: 408.943.7943 DRAFT SEMI Draft Document 4589A REVISION TO SEMI C62-1107 SPECIFICATION FOR POROGEN PRECURSORS USED IN LOW K CVD PROCESSES 1 Purpose 1.1 The purpose of this document is to provide specifications for porogen precursors used in Low K CVD processes for which a need has been identified. 2 Scope 2.1 The scope of this document lists the proposed impurity limits for porogen precursors (e.g., Alpha-Terpinine, Limonene, Bicycloheptadiene, and Cyclooctane) used in the semiconductor industry. NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use. 3 Limitations 3.1 None. 4 Referenced Standards and Documents 4.1 SEMI Standard SEMI C1 — Guide for the Analysis of Liquid Chemicals NOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions. 5 Terminology 5.1 None. 6 Physical Property (for information only) Alpha-Terpinine Limonene Bicycloheptadiene Cyclooctane Chemical Formula C10H16 C10H16 C7H8 C8H16 CAS# 99-86-5 138-86-3 121-46-0 292-64-8 Appearance Clear liquid Clear liquid Clear Liquid Clear Liquid 0.845 gm/mL 0.840 gm/mL 0.906 gm/mL 0.834 gm/mL Mol. Wt 136 g/mol 136.23 g/mol 92.14 g/mol 112.21 g/mol Boiling Point 172–175ºC 175–176ºC 88–90ºC 151–153ºC Density 7 Requirements 7.1 The requirements for porogen precursors for Grade 1 are listed in Table 1. 8 Grade 1 Procedures 8.1 Assay — The following method has given satisfactory results in determining assay at the value specified in these chemicals. Alternative methods may be used as long as appropriate method validation as per SEMI C1 can be demonstrated. This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an offi cial or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited. Page 0 Doc. 4589A SEMI LETTER (YELLOW) BALLOT Document Number: 4589A Date: 3/9/2016 Semiconductor Equipment and Materials International 3081 Zanker Road San Jose, CA 95134-2127 Phone:408.943.6900 Fax: 408.943.7943 DRAFT 8.1.1 Since most impurities in each of these porogens have the same empirical formula as the main component, the concentration of each component is directly proportional to the peak areas and no external calibration is necessary. 8.1.2 Program a gas chromatograph fitted with a 30m long x 250 m ID x 0.5 m 5% phenyl – 95% polydimethylsiloxane film column, a split injection port, and a flame ionization detector (FID) according to the parameters in the Table. Parameter Oven Initial Temp [C] Initial Time [min] Ramp1 [C/min] Temp1 [C] Time1 [min] Ramp2 [C/min] Temp2 [C] Time2 [min] Column Flow Setting 60 2 4 100 2 15 250 2 Parameter Inlet Temperature [C] Mode Split Ratio Detector (FID) Temperature [C] Hydrogen Flow [mL/min] Air Flow [mL/min] Mode Makeup Flow [mL/min] Setting 200 Split 50-1 260 40 450 Const Makeup 45 1.3 mL/min 8.1.3 Identify the retention time of eucalyptol (CAS# 470-82-6) or any other oxygen-containing impurity using these conditions. Oxygen compounds are NOT to be included in the assay 8.1.4 Inject 0.1 L of neat liquid. 8.1.5 For alpha-terpinene, sum the area of all peaks eluting between 10 and 15 minutes (monoterpenes with formula C10H16, similar vapor pressure). Subtract the area of eucalyptol which elutes in this time range. Divide the area of the monoterpenes by the total area of all compounds detected and multiply by 100% to calculate the ATRP assay. 8.1.6 For other porogens, establish the retention time range which includes all the isomers of the main component and sum all these peaks. Subtract the area of any oxygen-containing impurity which may elute in this time range. Divide the area of the porogens by the total area of all compounds detected and multiply by 100% to calculate the porogen assay. 8.2 Water — The following method has given satisfactory results in determining water at the value specified in these chemicals. Alternative methods may be used as long as appropriate method validation as per SEMI C1 can be demonstrated. 8.2.1 Prepare and operate a Karl Fischer coulometric titrator according to the manufacturer’s instructions. Insure that there is minimal background drift due to moisture permeating into the titration cell. 8.2.2 Using a dry syringe, draw 1 mL of sample and inject into the titration cell. 8.2.3 Calculate the sample weight from the density and volume of liquid delivered to the cell. 8.2.4 Divide the g of water found by the sample weight to calculate the water content in ppmw. 8.3 Chloride — The following method has given satisfactory results in determining chloride at the value specified in these chemicals. Alternative methods may be used as long as appropriate method validation as per SEMI C1 can be demonstrated. 8.3.1 Accurately weigh and transfer approximately 50 g of chemical into a separatory funnel. Add 10 mL of distilled deionized water to the separatory funnel and shake thoroughly to extract the hydrolysable chloride from the sample. Vigorous manual shaking for 5 minutes is sufficient. An automatic shaker may also be used. If an automatic shaker is used, shake at a minimum speed of 120 RPM for a minimum of 15 minutes. 8.3.2 Analyze the aqueous layer by ion chromatography (see SEMI C1) using conditions suitable to separate the chloride peak from other anionic peaks in the sample 8.4 Trace Metal Analysis — The following method has given satisfactory results in determining trace metal impurities at the value specified for the following trace metals: aluminum (Al), antimony (Sb), arsenic (As), barium (Ba), boron (B), cadmium (Cd), calcium (Ca), chromium (Cr), copper (Cr), iron (Fe), lead (Pb), lithium (Li), magnesium (Mg), manganese (Mn), nickel (Ni), potassium (K), sodium (Na), tin (Sn), titanium (Ti), vanadium (V), and zinc (Zn). Alternative methods may be used as long as appropriate method validation as per SEMI C1 can be This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an offi cial or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited. Page 1 Doc. 4589A SEMI LETTER (YELLOW) BALLOT Document Number: 4589A Date: 3/9/2016 Semiconductor Equipment and Materials International 3081 Zanker Road San Jose, CA 95134-2127 Phone:408.943.6900 Fax: 408.943.7943 DRAFT demonstrated. Since the metals are not expected to exist in organic forms in these chemicals, spiking with metal salts is satisfactory. 8.4.1 Transfer 50-100g of porogen from the bubbler to a separatory funnel. Add 10 mL of DDI water to a separatory funnel. 8.4.2 Agitate the separatory funnel for 10-20 minutes at about 125 rpm. Allow phases to separate. 8.4.3 Remove aqueous (bottom) layer into a 15 mL centrifuge tube that has been acid-soaked, rinsed with UPW. 8.4.4 Analyze the aqueous layer for metals and boron by ICP-MS. Due to the potential presence of dissolved organic compounds in the aqueous phase, the addition of oxygen to the nebulizer gas to combust organic compounds and keep the ICP-MS cones free of carbon is recommended. . 9 Grade 2 Procedures 9.1 This section does not apply to this chemical. 10 Grade 3 Procedures 10.1 This section does not apply to this chemical. 11 Grade 4 Procedures 11.1 This section does not apply to this chemical. 12 Grade 5 Procedures 12.1 This section does not apply to this chemical. 13 Tier A Procedures 13.1 This section does not apply to this chemical. 14 Tier B Procedures 14.1 This section does not apply to this chemical. 15 Tier C Procedures 15.1 This section does not apply to this chemical. 16 Tier D Procedures 16.1 This section does not apply to this chemical. Table 1 Impurity Limits and Other Requirements for Porogen Precursors Grade 1 (Specification) 99.5% Assay This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an offi cial or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited. Page 2 Doc. 4589A SEMI LETTER (YELLOW) BALLOT Document Number: 4589A Date: 3/9/2016 Semiconductor Equipment and Materials International 3081 Zanker Road San Jose, CA 95134-2127 Phone:408.943.6900 Fax: 408.943.7943 DRAFT Water 50 ppm max Chloride 1 ppm max Aluminum (Al) 1 ppb max Antimony (Sb) 1 ppb max Arsenic (As) 1 ppb max Barium (Ba) 1 ppb max Boron (B) 1 ppb max Cadmium (Cd) 1 ppb max Calcium (Ca) 2 ppb max Chromium (Cr) 1 ppb max Copper (Cu) 1 ppb max Iron (Fe) 2 ppb max Lead (Pb) 1 ppb max Lithium (Li) 1 ppb max Magnesium (Mg) 2 ppb max Manganese (Mn) 1 ppb max Nickel (Ni) 1 ppb max Potassium (K) 1 ppb max Sodium (Na) 5 ppb max Tin (Sn) 1 ppb max Titanium (Ti) 1 ppb max Vanadium (V) 1 ppb max Zinc (Zn) 2 ppb max Particles in bottles: size, #/mL LETTER (YELLOW) BALLOT Document Number: 4589A Date: 3/9/2016 Note 1 Note 1: Due to the limitations of current particle counters, particle size and number are to be agreed upon between supplier and user. See SEMI C1, “Calibration and Measurement Method for Particles in Liquids.” NOTICE: SEMI makes no warranties or representations as to the suitability of the standard(s) set forth herein for any particular application. The determination of the suitability of the standard(s) is solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant literature respecting any materials or equipment mentioned herein. These standards are subject to change without notice. By publication of this standard, Semiconductor Equipment and Materials International (SEMI) takes no position respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and the risk of infringement of such rights are entirely their own responsibility. This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an offi cial or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited. Page 3 Doc. 4589A SEMI