TCAD Sentaurus Общий обзор
Радченко Дмитрий
Alternative Solutions Alt-S
Технический директор
Predictable Success
CONFIDENTIAL INFORMATION
The Following Material Is Being Disclosed To You Pursuant To A
Non-disclosure Agreement Between You Or Your Employer And
Synopsys. Some Information Disclosed In This Presentation Is
Pending Patent Application. Information Disclosed In This
Presentation Shall Be Used Only As Permitted Under Such An
Agreement.
LEGAL NOTICE
Information Contained In This Presentation Reflects Synopsys
Plans As Of The Date Of This Presentation. Such Plans Are Subject
To Completion And Are Subject To Change. Products Shall Be
Offered And Purchased Only Pursuant To An Authorized quote And
Purchase Order.
© 2008 Synopsys, Inc. (2)
Predictable Success
Predictable Success
© 2008 Synopsys, Inc. (3)
Predictable Success
Recent TCAD Milestones
Sentaurus Lithography
Launch
PA-DFM Launch
02/08
10/06
SIGMA-C Integration
8/06
Sentaurus Launch
10/05
New Generation Standard for TCAD Simultaion
Robust
numerics &
software
implementimplementations
Advanced,
calibrated
physical
models
TFM Introduction
SelfSelf-consistent
2D & 3D
modeling
capabilities
Accurate &
predictive results
Synopsys
ISE
+
Many New
Features
Sentaurus
5/05
© 2005 Synopsys, Inc. (13) CONFIDENTIAL
ISE Integration
11/04
© 2008 Synopsys, Inc. (4)
Predictable Success
Extending TCAD into Manufacturing & Design
Analyze
• Process variability
• Design for Manufacturing
Technology LifeProcess-Aware
Cycle
CoreProcess
TCAD Process
Module
Device
Research
Development
Explore
Explore
• New processes
• Virtual devices
Integration
DFM
New
Product
Introduction
Optimize
Optimize
• Performance
• Manufacturability
Production
Ramp
Volume
Manufacturing
TCAD for
Control
Manufacturing
Control
• Yield analysis
• Statistical process control
• Advanced process control
• Manufacturing for Design (MFD)
© 2008 Synopsys, Inc. (5)
Predictable Success
Synopsys TCAD Product Portfolio
Sentaurus Workbench
Lithography
Sentaurus Litho.
EUV (8/08)
Sentaurus
Lithography
Sentaurus Litho.
E-Beam (12/08)
Raphael
Example Library
Sentaurus Topography
Sentaurus
Structure
Editor
Sentaurus Process
Sentaurus Device
Technology Development
Raphael NXT
Interconnect
Fammos
Calibration
PCM Studio
Manufacturing
Seismos
Paramos
Process-Aware Design For Manufacturing
© 2008 Synopsys, Inc. (6)
Predictable Success
Core TCAD
© 2008 Synopsys, Inc. (7)
Predictable Success
Sentaurus Process
Sentaurus Process
Mechanical Stress
Multidimensional 2D/3D
 General Purpose Process Simulator
 Multidimensional 1D/2D/3D
 Advanced Models for:
 Implantation
 Diffusion
 Laser/Flash Annealing
 Oxidation
 Deposition and Etching
 Adaptive Meshing
 User-Defined Model Interface
Flash/Laser Annealing
Kinetic Monte Carlo
© 2008 Synopsys, Inc. (8)
Predictable Success
Sentaurus Device
Quantum Effects
Device Monte Carlo
Multidimensional 2D/3D
Optoelectronics
Sentaurus Device
Heterostructure Capabilities
 General Purpose Device Simulator
 Silicon and Compound Semiconductors
 Advanced Transport Models
 State-of-the-Art Linear Solvers
 Efficient, full 3D Meshing
 Full-Wave Electromagnetic Solver
 User-Defined Model Interface
Mixed-Mode Simulation
© 2008 Synopsys, Inc. (9)
Predictable Success
Sentaurus Topography
Tench Filling with Void Formation
RIE
Sentaurus Topography
CMP
 Robust Level-Set Numerical Models
 Deposition Models
 LPCVD, PECVD, HDP-CVD, APCVD
 Spin-on-Glass
 Reflow
 Etching Models
 Wet etching
 High-density plasma
 Reactive ion etching
 Ion milling
 Chemical Mechanical Polishing
Ion Milling
 External ion angular/energy distributions
 Interface to Sentaurus Process
Topography simulation of
NAND flash cell
© 2008 Synopsys, Inc. (10)
Predictable Success
Sentaurus Structure Editor
 Easy to use GUI
 Scripting Language
 Advanced Geometric Modeling
 Process Emulation Capability
 Analytic Doping Definitions
 Direct Interface to Meshing Engines
Sentaurus
Structure
Editor
Process Emulation Mode
Advanced Geometric Operations: Swadowing, etc
Sweeping of 2D Structures
Complex 3D Device Structures
© 2008 Synopsys, Inc. (11)
Predictable Success
Sentaurus Workbench
Sentaurus Workbench
 TCAD framework environment
 Project management
 Design-of-Experiments
 Job Farming
 Advanced Visualization
Advanced Visualization
X-Y Data Plotting
TCAD Project Management
© 2008 Synopsys, Inc. (12)
Predictable Success
Sentaurus Lithography
SENTAURUS LITHOGRAPHY
Rigorous EM Simulation of  Lithography simulator for process development
Simulation of Topography
Wafer Topography
 Accounts for optical aberrations
on Wafer
3D topographic mask simulation
Rigorous calculations of electromagnetic field on wafer
 Full range of resist systems, including chemically amplified resists
 Models exposure, reaction, amplification and diffusion during post-exposure bak
 Rigorous models for image formation and resist development
Cell size imaging simulations and hot spot detection at resist level
Efficient algorithms enable
large cell simulation
Imaging contours with
hot spot detection
Rigorous Simulation of 3D Masks
© 2008 Synopsys, Inc. (13)
Predictable Success
Raphael
Process Effects
Flexible Structure Generation with
Sentaurus Structure Editor
Capacitance Extraction
Raphael
 Gold standard interconnect field solver
 Capacitance
 Resistance
 Inductance
 Automatic generation of Parasitic Database
 Calibration of LPE rule decks
 Sentaurus Structure Editor interface
Advanced Visualization
L and R Extraction
© 2008 Synopsys, Inc. (14)
Predictable Success
Raphael NXT
4500
4000
Time (min)
3500
3000
2500
2000
1500
1000
500
0
1
Lithography Based Extraction
2
4
6
8
Processors (#)
Distributed Processing
Periodic Boundary Conditions
Layout
Raphael NXT
StarXtract
Star-RCXT
RANXT DB
Star-RCXT DB
Critical Nets
Parasitic Netlist
RA NXT
 Chip-level critical net capacitance extractor
xTractor
 Seamless integration with Star-RCXT
 Highly accurate full 3D capacitance extraction
 Efficient Floating Random Walk Algorithm
 High capacity: handles layouts with millions of polygons
 Distributed processing with excellent scaling
Comparison Report
Final Parasitic Netlist
© 2008 Synopsys, Inc. (15)
Predictable Success
TCAD for Manufacturing
© 2008 Synopsys, Inc. (16)
Predictable Success
Calibration
Wafer Processing
Initial Lots
Integration
Optimization
Manufacturability
Next Generation
Technology
Initial Scaling
Process/Device Modeling
Performance Optimization
TCAD
Process compact model
Baseline Technology
Ion5[ A/um]
800
600
400
200
0
0.01
0.1
1
Lact[um]
10
Calibration
Vth5[V]
0.34
0.3
0.26
0.22
0.18
0.01
0.1
Lact[um]
1
Electrical Data
10
 Saves technology development time
 Reduces number of development wafers
 Optimizes technology performance
 Improves manufacturability and yield
SIMS Profiles
© 2008 Synopsys, Inc. (17)
Predictable Success
Sentaurus TFM
Parallel Coordinate Plots
Process
Parameters
ri= f(fi)
Correlation Studies
Device
Characteristics
Sentaurus TFM
Process Compact Models
 Process window optimization
 Manufacturing control
 Process variation to device performance correlation
 Process Compact Models derived from TCAD simulations
© 2008 Synopsys, Inc. (18)
Predictable Success
TCAD-Driven Process Control
Slow
Parts
High
Leakage
Parts
Power
Gate
oxide
Gate CD
Controlled
Uncontrolled
Good
Parts
Slow
Parts
slow
Halo
implant
Frequency
Good
Parts
Controlled
Number of Parts
Frequency
Uncontrolled
S/D XT
implant
good
Power
leaking
RTA temp
High
Leakage
Parts
Ioff
Ion
Spec
limit
Nominal
Spec
limit
Measure
Control
© 2008 Synopsys, Inc. (19)
Predictable Success
Process-Aware DFM
© 2008 Synopsys, Inc. (20)
Predictable Success
Paramos
Lg
Manufacturing
Calibration
Nchannel
Tox
TCAD
I-V, C-V database
Process Parameters
Some Variability Sources in CMOS
SPICE Extraction
Process-Aware Compact
SPICE Model
SPICE
Simulation
Paramos
Model Extraction Flow using Paramos
Delay Variation
30%
Gate oxidation temperature (Pox)
20%
n-Halo implant (Phn)
10%
L (Plg)
0%
-10%
analysis of the impact of global variations at the circuit level
 Based on rigorous TCAD simulations
 Provides bi-directional link between process information and
circuit behavior
100%
50%
0%
-50%
 Extracts process-aware SPICE parameters for detailed
-100%
-20%
Normalized process variation
Correlating Delay Variation to Process
Paramos
© 2008 Synopsys, Inc. (21)
Predictable Success
TCAD for
Manufacturing
Seismos LX and Seismos CX
Gate
Spacer
Layout
Cap layer
STI
Schematic
Runset
SiGe S/D
Drawn GDSII
Z
Hercules LVS
X
Y
Star-RCXT
PrimeYield LCC
Netlist (RC, xy)
Contour GDSII
Seismos LX + CX
Annotated Spice Netlist
Baseline BSIM
HSPICE / HSIM / Nanosim
 Simulates and analyses changes to transistor characteristics
due to proximity variations arising from layout-induced
stress, well proximity and Lithography effects
Seismos
 Annotates compact models to reflect impact on Vt and mobility
 Integrates into existing design flows
© 2008 Synopsys, Inc. (22)
Predictable Success
Fammos
Visualization of Stress Components
Stresses in Metal 2 and Metal 3 Cu Lines
 Simulates mechanical stress in BEOL process flows
 Accounts for all major stress sources, including external stresses
 Design specifically for semiconductor applications
 Models key problems affecting process design and reliability
of Cu/low k interconnect structures
Fammos
Stress Gradient at Bottom of Via
© 2008 Synopsys, Inc. (23)
Predictable Success
TCAD Applications
CMOS
•Deep submicron transistors
•Sophisticated models
•Atomistic modeling
Opto
•LEDs, LASERs
•Image sensors
•Photodetectors
Memory
Synopsys
TCAD
Products
RF
•Flash
•DRAM
Emitter
•High-speed devices
Al0.3Ga0.7As
Base
•Compound semiconductors
Power
GaAs
Collector
•Complex structures & processes
•Mixed mode simulation
© 2008 Synopsys, Inc. (24)
Predictable Success
Synopsys TCAD
Used by 19 out of 20 top semiconductor
companies worldwide
Synopsys
TCAD
Today
Technical and market leadership across all
technologies: DSM, Power, Memory,
Analog and Optoelectronics
Strong R&D program with research &
academia
Dedicated support organization focusing
on customer success
Complementary Consulting and
Engineering Service Offerings
© 2008 Synopsys, Inc. (25)
Predictable Success
Predictable Success
© 2008 Synopsys, Inc. (26)
Predictable Success