Surface & Coatings Technology 201 (2006) 2326 – 2334 www.elsevier.com/locate/surfcoat Vapor deposition of platinum alloyed nickel aluminide coatings Z. Yu ⁎, K.P. Dharmasena, D.D. Hass, H.N.G. Wadley Department of Materials Science and Engineering University of Virginia Charlottesville, VA 22903, USA Received 14 April 2005; accepted in revised form 3 April 2006 Available online 19 June 2006 Abstract Platinum-doped NiAl coatings are widely used to increase the oxidation resistance of superalloys. These coatings are usually synthesized by a solid state reaction-diffusion process conducted at high temperature. It requires the chemical vapor deposition of aluminum on a nickel rich superalloy substrate that has been pre-coated with several microns of electrodeposited platinum. Here, we show that an electron beam directed vapor deposition (EB-DVD) technique can be used to deposit well bonded, structurally and chemically homogeneous NiAlPt bond coats of any composition onto superalloy substrates. The approach utilized a high voltage, rapid scan frequency electron beam to independently heat elemental nickel, aluminum and platinum melt pools to create three closely spaced vapor plumes. These vapor plumes were then entrained in an inert gas jet flow, which mixed and directed them to a substrate. By adjusting the electron beam current applied to each elemental source, homogeneous, dense, Pt alloyed β-phase NiAl coatings could be synthesized at substrate temperatures of 1050 °C. The width of the substrate–coating interdiffusion zone was controlled by the deposition temperature and time. © 2006 Elsevier B.V. All rights reserved. Keywords: Thermal barrier coating; Bond coat; NiAlPt; EB-DVD 1. Introduction Thermal barrier coating (TBC) systems are widely used for the thermal and oxidation protection of high temperature components used in advanced gas turbine and diesel engines [1,2]. They are currently used to increase engine component lifetimes, but also hold promise for enabling increases of the engine operating temperature and therefore improving engine efficiencies [3,4]. TBCs are complex multilayered systems (Fig. 1). They consist of a low thermal conductivity yttria stabilized zirconia (ceramic) outer layer that provides thermal protection and an underlying metallic bond coat that retards oxidation and hot corrosion [5]. Oxidation resistance is achieved by the creation of a thin thermally grown (α-phase) aluminum oxide (TGO) layer on the bond coat, which slowly grows in thickness when the system is exposed to oxygen at high temperatures. The bond coat oxidation resistance is dependent on the composition and morphology of the coating as well as the thermal exposure conditions [6–8]. The bond coat composition has a ⁎ Corresponding author. E-mail address: zy4r@virginia.edu (Z. Yu). 0257-8972/$ - see front matter © 2006 Elsevier B.V. All rights reserved. doi:10.1016/j.surfcoat.2006.04.020 critical role in the formation of a desirable TGO layer. In particular, bond coat must contain sufficient aluminum to support the continued growth of the protective aluminum oxide layer throughout the intended life of the coating system. Both the formation of the aluminum oxide and substrate alloy–coating interdiffusion can reduce the aluminum content of a bond coat over time. If the aluminum content falls below a critical level, the less protective oxides can form and spallation of the TGO layer can rapidly ensue [9–11]. A significant aluminum reservoir in the bond coat is therefore essential. The initial stages of TGO formation can also be adversely affected by the presence of tramp elements and minor alloy additions that have diffused from the substrate into the bond coat. Elements such as S, Ta and W can deleteriously effect scale adhesion/spallation by increasing the growth rate of the TGO layer and in some cases, promoting the formation of nonprotective oxide scales [4,12,13]. Limiting the extent of interdiffusion between the bond coat and the underlying superalloy is therefore highly desirable during the synthesis of a bond coat. Current bond coats are based on either MCrAlY (where M = Ni, Co) alloys [14] or nickel aluminide intermetallics such as a platinum-modified nickel aluminide [15]. MCrAlY bond coats Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 2327 Fig. 1. A multilayer thermal barrier coating system consisting of a nickel superalloy substrate, a metallic bond coat and a ceramic top layer. can be applied using either low-pressure plasma spray (LPPS) [16], electron-beam physical vapor deposition (EB-PVD) [17] or by sputtering [18]. The aluminide bond coats are applied using a more complex reaction-diffusion process. Several variants of the process have been developed. They include pack cementation [19], vapor phase aluminiding (VPA) [20] and chemical vapor deposition (CVD) [21]. After deposition of aluminum and a high temperature reaction-diffusion annealing, these processes result in bond coats with two distinct zones: an outer zone, which contains an oxidation resistant β-phase NiAl, and a diffusion zone near the bond coat-superalloy interface, which consists of the oxidation resistant phase and various secondary phases including Ni3Al gamma prime, various carbides and sigma phases [22]. These aluminide coatings are commonly called diffusion coatings. Although these diffusion methods have successfully synthesized β-phase nickel aluminide layers, they require a prolonged thermal exposure of the coating–substrate system to form the appropriate intermetallic β−NiAl B2 phase. When further alloying (for example to add platinum) is required, an extra deposition process, such as electroplating, has to be included in the synthesis process [21]. This further increases the complexity of the technical approach and introduces the opportunity for additional bond coat contamination [17,23]. In these diffusion coatings, the nickel needed to form the intermetallic β-phase comes from the substrate. Outward diffusion of elements from the substrate into the coating layer is therefore required. However, deleterious substrate alloy elements such as W, Ta or Ti, and tramp elements such as S can then also diffuse into the nickel aluminide layer [4,12,13]. The vapor deposition of a NiAlPt alloy onto a superalloy substrate would appear to provide a simpler bond coat synthesis route. However, the high vapor pressure differences of elemental Ni, Al and Pt make it difficult to create alloy coatings by the evaporation of a NiAlPt alloy target. Fig. 2 shows the vapor pressure of these three elements as a function of temperature. It can be seen that, at 2000 K, the vapor pressure of platinum is five orders of magnitude lower than that of the nickel or aluminum [24]. A recently developed directed vapor deposition (DVD) technique [25] might overcome this difficulty. The DVD method Fig. 2. The vapor pressures of aluminum, nickel and platinum. 2328 Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 utilizes a differentially pumped, high voltage electron beam gun capable of operating in a high-pressure environment together with an inert gas jet to entrain and deposit the vapor. By using a high scan frequency electron beam gun, several different materials can be co-evaporated at independently controllable rates. This can be accomplished from sources placed within the inert gas jet, which enables the creation of an alloy vapor plume of controllable composition by independently controlling the evaporation rate of each source. By using a low density, high velocity gas jet to promote gas phase vapor plume diffusion, a homogeneous composition vapor flux can be achieved [26]. We have recently shown that the directed vapor deposition technique can be used to synthesize binary NiAl coatings by independently evaporating nickel and aluminum elemental sources [27]. This enabled coating composition control and demonstrated the growth of layers with a homogeneous β-phase structure, few pores and only a small region of interdiffusion at the coating–substrate interface. Here, we explore the extension of this approach to the deposition of ternary Al–Ni–Pt bond coats and show that by independently evaporating the elemental sources, it is possible to synthesize NiAl + Pt alloy coatings even when the vapor pressure differences are high. We also show that dense, single-phase coatings can be created with minimal interdiffusion with the substrate. 2. DVD process description Several processes have emerged for combining the atomic and molecular fluxes created by an evaporation process with rarefied supersonic gas jets [28–30]. In the DVD approach, an inert gas jet is used to direct and transport an electron beam evaporated vapor plume to a substrate [31]. Fig. 3 shows a schematic illustration of this process. An annular nozzle in combination with a fixed upstream pressure (i.e. the gas pressure prior to its entrance into the processing chamber), Pu, of at least twice that of the chamber pressure, Po, was used to form the supersonic gas jet [32,33]. The crucible used to hold the source materials were placed in the exit throat of the nozzle. These source materials were then heated by an electron beam to form a melt pool with a vapor plume above. The inert gas stream then transported the vapor from the nozzle in a gas jet whose initial cross-sectional area was comparable to that of the nozzle. Using appropriate jet flow conditions, most of the vapor can be confined within the jet and directed to the substrate. The carrier gas molecular weight (compared to that of the vapor) Fig. 3. Schematic illustration of the directed vapor deposition processing system. It is possible to evaporate from four individual source materials (two shown). Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 2329 and the carrier gas speed control the effectiveness of the vapor atom redirection (via binary collisions) and transport to the substrate [25]. Optimizing system parameters such as the nozzle diameter, gas flow rate and pumping speed enable a relatively uniform, high efficiency deposition of the evaporant onto a substrate [31]. The system used here utilized a differential pumped electron beam gun (EB-gun) modified to function in a high-pressure environment. A high accelerating voltage (60 kV) e-beam gun was used to reduce the electron scattering cross section, which then facilitates efficient beam propagation in relatively highpressure environments [34,35]. The high-speed (100 kHz) e-beam scanning system, combined with a small beam spot diameter (b 0.5 mm) allowed a multisource crucible to be used to create an alloy vapor plume from its constituent metal components or binary combinations of the metals with similar vapor pressures. Up to four of 3.2 mm diameter sources could be simultaneously evaporated in the DVD chamber. In practice, the electron beam was jumped among each of the sources and the relative dwell time on each source was adjusted to control the individual melt pool temperatures and therefore the evaporation rate. For the high scan frequencies used here, this is equivalent to a splitting of the total electron beam current into three branches, each of which is applied to heat one source continuously (Fig. 4). By adjusting the dwell times of the beam, the individual evaporation rates of the three Ni, Al and Pt sources, and the average plume stoichiometry could be controlled over a wide range of coating compositions. By adjusting the flow conditions used to create the jet, high deposition rates were achievable with a relatively low power Fig. 5. Effect of electron beam current on (a) aluminum, (b) nickel and (c) platinum source material evaporation rates. The corresponding feed rates required to maintain a constant melt pool and vapor stream are also given in the figures. Fig. 4. Using a 100-kHz scan frequency electron gun, a single e-beam can be scanned across multiple, closely spaced sources. The setup is shown schematically for Ni/Al/Pt evaporation. electron beam source. The cross section of the vapor plume at the substrate location could be varied from a diameter roughly equal to that of the nozzle (3 cm for this experiment) to 20 cm or more. Various experiments were conducted to identify the flow conditions that resulted in adequate vapor focusing and vapor mixing for a nozzle diameter of 3 cm and a source–substrate distance of 18 cm. The best regime corresponded to a He flow rate of 4– 8 standard liters per minute (slm), an upstream pressure of 40– 60 Pa and a chamber pressure of 6–10 Pa. These flow conditions resulted in a 50-cm2 cross-sectional plume. Since aluminum, nickel and platinum have different vapor pressures, it was necessary to determine an experimental relationship between each source's material evaporation rate and the 2330 Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 electron beam current applied to it. Fig. 5 shows the dependence of the evaporation rate (and the equivalent source rod feed rate) upon electron beam current for the three elemental sources. These relationships enabled identification of the appropriate combinations of beam current (dwell time) to achieve a desired elemental source evaporation rate and therefore a target coating layer composition. Commercial RENÉ N5 superalloy [36] coupons with a diameter of 2.54 cm were used as the substrates. A flat-plate heater with tungsten filament was used to heat the substrate from the backside. The substrates were pre-heated to 450 °C for 1 h to clean the surface and then heated to 1050 °C for deposition. A helium gas jet with a flow rate of 7 slm was used. This corresponded to an upstream pressure of 56 Pa and a chamber pressure of 8.9 Pa. The deposition duration was varied from 30 to 40 min. Using a 3 kW beam power, the three source materials combined evaporation rate was about 2.7 × 10− 3 mol/min and the measured deposition rate was 1.0 ± 0.2 μm/min. After the deposition process, the samples were cooled to ambient within the deposition chamber in an inert gas environment. The resulting as deposited alloy coating morphologies were observed using scanning electron microscopy (SEM) and the coating compositions were analyzed using energy dispersive spectroscopy (EDS) measurements. The coating phase structures were identified with standard X-ray diffraction techniques. ability of platinum on NiAl surfaces [37]. Experiments indicated that pore-free deposition of platinum-modified NiAl could be achieved at a substrate temperature of 1050 °C. Consequently, the results reported below were conducted at this deposition temperature. 3.1. Coating composition and phases Fig. 6 shows a recently proposed Al–Ni–Pt ternary phase diagram at temperature 1100/1150 °C [38]. The experimental coating compositions synthesized using the DVD approach are superimposed on this diagram. Each alloy composition was depicted by a data point circle, which was the result of an evaporation experiment using a different combination of beam currents on the individual melt pools. By careful selection of the “effective” beam current and thereby evaporation rate for each material, different phases of the NiAlPt bond coat material were obtained. As illustrated in Fig. 6, four β-phase (NiAl) alloys and one γ′phase (Ni3Al) alloy were deposited by this approach. EDS testing was performed to measure the composition homogeneity of the coating surface. These measurements indicated that the coating surface of sample #1 contained 26 at.% Al, 56 at.% Ni and 18 at.% Pt. Fig. 7 showed that the composition variation along two orthogonal directions passing across each other at the center of the 2.54-cm diameter substrate was within ±2% of the average composition. 3. Results and discussion 3.2. Bond coat structure and morphology A series of initial coating trials were conducted to identify the preferred deposition temperature. Earlier studies have indicated that the deposition of pore-free NiAl could be achieved at a deposition temperature of 1000 °C and a deposition rate of 0.5– 1 μm/min [27]. In the platinum-modified system, these conditions resulted in coatings containing a significant volume fraction of isolated pores that was thought to be a result of the poor migration A sample with a composition centered in the β-phase field of Fig. 6 (sample #7) was selected for detailed structure and morphology analysis. This sample had a homogeneous composition consisting of 48 at.% Al, 43 at.% Ni and 9 at.% Pt measured on the sample surface by EDS. The Ni–Al–Pt ternary phase diagram in Fig. 6 indicates that the coating should be a single β-phase alloy. Fig. 6. Ni–Al–Pt ternary alloy phase diagram at 1100/1150 °C. Compositions of coating deposited using different beam current combinations are shown in the phase diagram. Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 Fig. 7. EDS measured composition variation with substrate position in two orthogonal directions. The XRD analysis was consistent with the composition analysis made by EDS and the phase diagram shown in Fig. 6. Fig. 8 shows that only the β-NiAl phase was present in this Ni43 Al48Pt9 coating layer. The intensities along the 〈111〉 and 〈211〉 directions were higher than the corresponding standard powder diffraction card, indicating the NiAlPt coating is textured, with a significant fraction of the grains having a surface normal in the 〈111〉 and 〈211〉 directions. Similar fiber texture has also been observed in NiAl coatings made by DVD [27] and in many other metallic coatings [39,40]. Fig. 9 shows the cross-sectional structure of the NiAlPt coating. The coating layer thickness was 27 μm. No pores were observed within the coating's cross section. An interdiffusion (ID) zone with a width of about 12 μm was observed at the coating layer–substrate interface. It appeared to have been formed by the outward diffusion of Ni from this region. The elongated bright contrast phases in the ID zone were rich in refractory elements [17,41]. After etching, β-phase grain boundaries could be resolved in the bond coat. The coating consisted of elongated grains with a distinct change in grain size about midway through the 2331 coating. Small grains were formed at the coating/interdiffusion zone interface. They were about 5 μm wide and extended 10– 15 μm in growth direction. Some terminated at this distance while the remainder expanded to create a zone of much larger grain size extending to the sample surface. These larger grains had an average width of about 20–25 μm (Fig. 9(b)). EDS measurement of the composition variation through the coating cross section (Fig. 10) revealed a region of significant Cr and Co in first 10–15 μm of the bond coat layer. This covered the region where small crystal grains were observed, suggesting refractory metal inhibition of surface diffusion during the early stages of the bond coat deposition. The composition as a function of depth in the coating (Fig. 10) also indicated that the Al and Pt concentration in the ID zone was higher than that of the substrate, which is consistent with inward diffusion of these elements. The Ni composition exhibited the reverse trend in the ID zone consistent with outward diffusion. The composition fluctuations in the ID zone were associated with the segregation of refractory elements. We note that the interdiffusion zone observed here was about 12 μm. This was somewhat wider than that of NiAl coatings made by EB-DVD at 1000 °C (about 7 μm). But it was narrower than those made by conventional diffusion methods. In those cases, the ID zones were typically over 20 μm [42,43]. The different substrate temperatures and the deposition time are considered to be the reason for these ID zone thickness differences. During the DVD process, bond coat deposition was completed within 30 min at 1050 °C, whereas the conventional diffusion methods required hours of processing time at the similar temperature [19,21]. We also note that, unlike CVD or pack cementation, all the required bond coat elements are supplied by condensation from the vapor phase in the DVD approach. Interdiffusion is therefore not necessary and the outward diffusion of elements such as nickel from the substrate is also inhibited to some extent by the high nickel concentration vapor plume supplied by the source pool. Beneath the interdiffusion zone, the concentration of Al quickly decreased to 13 at.% and Ni increased to 67 at.%, values that are consistent with the composition of the RENÉ N5 alloy substrate. Fig. 8. XRD pattern of a NiAlPt bond coat deposited at 1050 °C and its comparison with the NiAl peaks given by JCPDS card. 2332 Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 Fig. 9. SEM cross-section observation on AlNiPt bond coat sample deposited at 1050 °C revealed a pore-free coating layer. (a) Before etching and (b) after etching in 5HCl:1HNO3 for 10 s. lower diffusion coefficient of platinum relative to nickel in NiAl compound [37] implied weaker migration ability of platinum adatoms, which could cause morphology difference between the AlNiPt and NiAl coatings. Further studies using atomic simulation techniques are needed to resolve these differences. The experiments described above indicate that multi source evaporation in an inert gas jet is an effective approach for the deposition of pore-free, chemically homogenous, β-phase platinum-modified NiAl bond coats. Since all three elements (Al, Ni and Pt) are deposited on the substrate simultaneously, bond coat synthesis by this route is a single-step process. Unlike the current CVD approach, which involves Pt-electroplating and heat treatment processes, we have been able to deposit NiAlPt coatings whose composition is simply controlled by adjusting the electron beam residence time on each melted source pool. Fig. 2 indicates that platinum has a vapor pressure that is 4 to 6 orders less in magnitude than the vapor pressure of nickel and aluminum over a wide range of temperature. In conventional EB-PVD, a NiAlPt alloy melt pool becomes enriched in platinum as evaporation progresses due to the difference in elemental vapor pressures and the coating becomes lack of platinum correspondingly. This DVD approach overcomes this well-known problem of alloy deposition with conventional EB-PVD when the alloy elements have widely varying vapor pressures. A series of deposition trials indicated that the deposition of pore-free Pt-modified NiAl coatings required the use of slightly higher growth temperatures (1050 °C) compared to those needed for the growth of pore-free NiAl. We suspect that Pt increases the activation barriers for surface diffusion during NiAl film growth. Atomistic simulations are needed to resolve this issue [37]. Nevertheless, the combination of growth temperature and deposition rate were such that interdiffusion with the substrate was significantly less than that encountered in conventional NiAl + Pt synthesis processes [41]. Finally, it is interesting to note that other elements can be added to coatings by the process described here. For example, solute or 3.3. Surface structures The surface morphology of this NiAlPt coating is shown in Fig. 11. The as-deposited NiAlPt surface consisted of relatively large roughly equiaxed crystalline grains with an average grain size of 22 μm (Fig. 11(a)). The surface of each grain had a grooved substructure (Fig. 11(b)). The grooves changed direction and angle at the grain boundaries and deeper grain boundary grooves were observed at these locations (Fig. 11(c)). Further observations at higher magnification (30,000×) revealed that the grooves were actually part of terrace structure on the coating surface (Fig. 11(d)). Such terraces are consistent with a step flow mode of growth [27,44]. However, unlike the terraces observed on NiAl samples deposited at 1000 °C, the edges of the terraces on the NiAlPt samples were rougher and small pits at the inside edge of the step were observed. These phenomena are thought to be a consequence of the significant platinum content in the coating, which appears to reduce atom mobility on the growth surface. The Fig. 10. The EDS measured composition distribution on the cross section of the NiAlPt coating deposited at 1050 °C. Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 2333 Fig. 11. Surface morphologies of NiAlPt bond coats deposited at 1050 °C. (a) NiAlPt surface consists of crystalline grains with average grain size 22 μm. (b) Grain surface morphology at 10,000× magnification. (c) The strikes change their direction and twist at the grain boundary. (d) Grain surface morphology at 30,000× magnification. precipitation strengthening by the addition of elements such as Hf, Cr, Zr or Y might enable increases in the yield/creep strength of the coatings [1,4,45]. The vapor pressures of these elements vary widely, but the multi evaporation source approach described here holds some promise for expanding the range of compositions that can be successfully deposited. 4. Conclusion We have utilized a multi source evaporation method together with gas jet enhanced mixing to deposit NiAlPt coatings of controlled composition and morphology. The approach utilizes closely spaced multisource crucible and an electron beam whose dwell time on individual source materials can be modified to control the individual source evaporation rate. An inert gas jet flow promotes vapor mixing and the deposition of homogeneous, pore-free NiAlPt coatings without the assistance of post-deposition heat treatments. Coatings with a single β-phase structure and no surface contamination by substrate alloy elements have been fabricated. Acknowledgement We are grateful to Profs. Carlos Levi, Anthony Evans and David Clarke of University of California, Santa Barbara, Dr. David Wortman, GE Corporate R&D, Schenectady, New York, and Yossi Marciano, Nuclear Research Center-Negev, Israel for useful discussions. We thank Prof. Brian Gleeson, Iowa State University for granting permission to use his Ni–Al–Pt phase diagram. This work was supported by an ONR MURI program on Prime Reliant Coatings (Program Manager, Steve Fishman), ONR Contract # N00014-00-1-0438. References [1] C.G. Levi, Curr. Opin. Solid State Mater. Sci. 8 (2004) 77. [2] Coatings for High-Temperature Structural Materials, National Research Council Report, National Academy Press, Washington, DC, 1996. [3] G.W. Goward, Surf. Coat. Technol. 108/109 (1998) 73. [4] N.P. Padture, M. Gell, E.H. Jordan, Science 296 (2002) 280. [5] B.J. Gill, R.C. Tucker Jr., Mater. Sci. Technol. 2 (1986) 207. [6] V.K. Tolpygo, D.R. Clarke, Acta Mater. 48 (2000) 3283. 2334 Z. Yu et al. / Surface & Coatings Technology 201 (2006) 2326–2334 [7] P. Kofstad, High Temperature Corrosion, Elsevier Applied Science, London, 1988. [8] U.R. Evans, The Corrosion and Oxidation of Metals, Matthew Arnold, London, 1960. [9] E.A.G. Shillington, D.R. Clarke, Acta Mater. 47 (1999) 1297. [10] M. Gell, K. Vaidyanathan, B. Barber, J. Cheng, E. Jordan, Metall. Mater. Trans., A Phys. Metall. Mater. Sci. 30 (1999) 427. [11] M.R. Brickey, J.L. Lee, Oxid. Met. 54 (2000) 237. [12] B.A. Pint, I.G. Wright, W.Y. Lee, et al., Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 245 (1998) 201. [13] J.G. Smeggil, Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 87 (1987) 261. [14] R. Darolia, U.S. Patent 6,255,001, July 2001. [15] R. Mevrel, C. Duret, R. Pichoir, Mater. Sci. Technol. 2 (1986) 201. [16] G.Y. Kim, W.Y. Lee, J.A. Haynes, T.R. Watkins, Metall. Mater. Trans., A Phys. Metall. Mater. Sci. 32 (2001) 615. [17] D.R. Mumm, A.G. Evans, Acta Mater. 48 (2000) 1815. [18] R.S. Parzuchowski, Thin Solid Films 45 (1977) 349. [19] S.R. Choi, J.W. Hutchinson, A.G. Evans, Mech. Mater. 31 (1999) 447. [20] P.K. Wright, A.G. Evans, Curr. Opin. Solid State Mater. Sci. 4 (1999) 255. [21] W.Y. Lee, Y. Zhang, I.G. Wright, B.A. Pint, P.K. Liaw, Metall. Mater. Trans., A Phys. Metall. Mater. Sci. 29 (1998) 833. [22] M.J. Stiger, N.M. Yanar, M.G. Topping, F.S. Pettit, G.H. Meier, Metallk 90 (1999) 1069. [23] Y. Zhang, W.Y. Lee, J.A. Haynes, I.G. Wright, B.A. Pint, K.M. Cooley, P.K. Liaw, Metall. Mater. Trans., A Phys. Metall. Mater. Sci. 30 (1999) 2679. [24] Vapor pressure of the chemical elements, Nesme‘i’anov, An. N. (Andrei Nikolaevich), 1911-(1963), in: R. Gary (Ed.), Elsevier Pub. Co, Amsterdam, 1963. [25] D.D. Hass, K. Dharmasena, H.N.G. Wadley, International Conference on High-Power Electron Beam Technology, vol. 8–1, 2002. [26] D.D. Hass, P.A. Parrish, H.N.G. Wadley, J. Vac. Sci. Technol. A 16 (6) (1998) 339. [27] Z. Yu, D.D. Hass, H.N.G. Wadley, Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 394 (2005) 43. [28] B.L. Halpern, J.J. Schmidt, J. Vac. Sci. Technol. A 12 (1994) 1623. [29] J.J. Schmidt, B.L. Halpern, U.S. Patent 4788082 (1988). [30] J.F. Groves, H.N.G. Wadley, Compos., Part B Eng. 28B (1997) 57. [31] J.F. Groves, G. Mattausch, H. Morgner, D.D. Hass, H.N.G. Wadley, Surf. Eng. 16 (2000) 461. [32] T.C. Adamson Jr., J.A. Nicholls, J. of the Aerospace Sciences, 26(1) (1959) 16. [33] J.F. Groves, “Directed vapor deposition”, PhD dissertation, p34–39, University of Virginia (1998). [34] Y. Arata, Plasma, Electron, and Laser Beam Technology, Metals Park, OH, ASM, 1986. [35] J.F. Groves, “Directed vapor deposition”, PhD dissertation, p60–63, University of Virginia (1998). [36] J.A. Haynes, M.J. Lance, B.A. Pint, I.G. Wright, Surf. Coat. Technol. 146–147 (2001) 140. [37] Y. Minamino, Y. Koizumi, N. Tsuji, M. Morioka, K. Hirao, Y. Shirai, Sci. Technol. Adv. Mater. 1 (2000) 237. [38] B. Gleeson, W. Wang, S. Hayashi, D. Sordelet, Mat. Sci. Forum 461–464 (2004) 213. [39] N. Schell, W. Matz, J. Bøttiger, J. Chevallier, P. Kringhøj, J. Appl. Phys. 91 (2002) 2037. [40] C.E. Murray, K.P. Rodbell, J. Appl. Phys. 89 (2001) 2337. [41] P.C. Patnaik, Mater. Manuf. Process. 4 (1989) 133. [42] B. Ning, M.E. Stevenson, M.L. Weaver, R.C. Bradt, Surf. Coat. Technol. 163–164 (2003) 112. [43] J. angenet, K. Stiller, Mater. Sci. Eng., A Struct. Mater.: Prop. Microstruct. Process. 316 (2001) 182. [44] P. Gambardella, K. Kern, Surf. Sci. 475 (2001) L229. [45] J.R. Nicholls, MRS Bull. 28 (2003) 659.