Press Release
May 26th, 2009 – Watervliet, NY, USA
Vistec Lithography presents the latest version of its EBPG
product line
Vistec’s EBPG5200 features the most advanced electron beam lithography
technology for exposure of substrates – from small fragments to complete 200mm
substrates.
The EBPG5200: Evolution rather than Revolution:
The Vistec EBPG5200 represents the continued development stage of the successful
EBPG product series. With added improvements in resolution, noise reduction, and
stability, the Vistec EBPG5200 is even better adapted to the diverse and ever increasing
nanotechnology requirements of science and research at universities, academic and
industry-related research centers.
The Vistec EBPG5200 enables users to address a multitude of application fields, such as
nanotechnology, biotechnology, integrated optics, security, semiconductor research, X-ray
optics, MEMS and sensor engineering to name but a few of them.
Vistec EBPG5200 system users benefit from more than thirty years of experience that
Vistec has gained in the electron beam lithography business. This is clearly demonstrated
by a large established base of EBPG systems currently installed worldwide.
Safe Investment for the Future:
A “modular” concept for functional features and user needs is the heart of the EBPG5200
scheme. The Vistec EBPG5200ES (Entry System) is the cost-efficient basic version of the
EBPG5200 series. Upgrading to the full EBPG5200 functionality may be performed at any
time, depending on the user’s available budget and application requirements.
This highly flexible concept facilitates adaptation to the latest requirements and future application needs while offering various retrofit modules that are affordably priced.
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
Vistec Electron Beam GmbH
Goeschwitzer Straße 25
D-07745 Jena
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
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Press Release
Extended Platform:
The Vistec EBPG5200 is equipped with a modified platform that supports full exposure of
substrates to a maximum size of 200mm. Like the previous EBPG tools, it can be used to
expose fragments and special substrates in addition to standard substrate types and
sizes. Essential design principles of the previous EBPG systems have been incorporated
into this new 200mm platform.
Leading Edge Lithography:
With further enhancements in resolution, noise reduction and beam stability, the Vistec
EBPG5200 is set to generate structures to less than 8nm on substrates of any size and
type. Its electron-optical column (TFE source) is rated for acceleration voltages of 20, 50,
and 100kV. With the EBPG5200 Vistec offers true 100kV / 1mm performance under regular electron-optical conditions.
However, what makes Vistec’s electron beam lithography of superior standards actually
possible is the perfect match of the various system components such as the electronoptical column, the hardware platform, the data processor and the exposure engine
working together in a flexible and user friendly system.
One example, how this relates to practice is the structuring of fine gates and coarser
connector pads in transistor arrays. By splitting the job into a coarse and fine writing
strategy, throughput can be maximized. Such sub-50nm gates can be structured to run at
optimum exposure current and the coarser pads exposed with a useful beam current
greater than 100nA and a maximum deflection rate of 50MHz in an automatic exposure
cycle. Switching between ultra-high resolution and throughput occurs on a floating basis
and is fully automated. No manual intervention is required, whether at the electron-optical
column or in terms of program sequence.
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
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Press Release
Simple Operation – Highest Fexibility:
The system incorporates an interactive graphical user interface (GUI) that provides the
ease of use for diverse “multi user environments”, as often required in the case of large
user teams.
The EBPG5200 has a proven and reliable load-lock. With a maximum holding capacity of
ten equal or different substrate holders, the load-lock can accomodate a variety of substrate sizes and types as necessary for the particular application task. With this highly
automated operation mode, users may also tailor the exposure sequencing to their
specific requirements. Furthermore, the system includes LINUX based operational software and the user may choose his preferred data preparation scheme.
The EBPG5200 – The System of Choice for Electron Beam Nanolithography:
The EBPG5200 represents a high performance electron beam lithography patterning
system for today’s and future nanotechnology requirements. With its evolutionary design,
advanced lithography specification, performance and software, as well as with its substrate flexibility, compact footprint, and excellent global service support, the EBPG5200 is
the system of choice for all current and future nanotechnology applications.
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
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Press Release
Media information:
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electronbeam lithography systems with applications ranging from nano and bio-technology to photonics
and industrial environments like mask making or direct writing for fast prototype development and
design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam
and Vistec Lithography.
Vistec Lithography
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based
on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced
research laboratories and universities. The company is located in Watervliet, NY (USA), within the
Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam
technology, which is used by leading semiconductor manufacturers and many research institutes
around the world. Their innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research. The company is located in Jena
(Germany).
For downloads of all media releases and images in print quality please visit the website at
www.vistec-semi.com. If you require other formats or images please do not hesitate to
contact us.
Media contact:
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
pr@vistec-semi.com
www.vistec-semi.com
PR Agency
Tower PR
Leutragraben 1
D-07743 Jena (Germany)
Tel.: +49(0)3641/507081
vistec@tower-pr.com
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
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