Press Release
June 1st, 2010 - University Park, Pennsylvania / Watervliet, New York
Vistec’s Advanced EBPG5200 Electron Beam Lithography System
Ordered by Penn State
Vistec Lithography Inc., a world leader in electron beam lithography, announced a
major order with the Pennsylvania State University, University Park, PA, for one of
Vistec’s EBPG5200 electron beam lithography systems. The instrument will become
part of the National Science Foundation's National Nanotechnology Infrastructure
Network to support advanced nanotechnology research across the nation.
The Vistec EBPG5200 will allow fabrication of a diverse set of devices supporting
fundamental and applied research for emerging nanotechnology applications. With the
acquisition of the lithography system and its unique nanoscale patterning capabilities, the
Penn State Nanofabrication Laboratory will have one of the most advanced electron beam
lithography systems for nanotechnology research and development. Through the National
Nanotechnology Infrastructure Network (NNIN), the EBPG5200 will also be available to
other academic institutes, industries and government entities desiring high performance
electron beam lithography and nanotechnology fabrication services.
The EBPG5200 system will be installed in the University's new Millennium Science
Complex and will be a cornerstone for current and future Penn State nanotechnology
research. The system is a result of an NSF Major Research Instrumentation award under
the American Recovery and Reinvestment Act of 2009. Additional funding comes from
Penn State and the Commonwealth of Pennsylvania.
The Vistec EBPG5200 is the latest version of the highly successful EBPG5000plus
electron beam lithography system technology. The EBPG52000 system with both 50 and
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
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Press Release
100 keV accelerating voltages, 50 MHZ pattern generator and full 20 bit address
technology has the demonstrated ability to routinely pattern to 6-8 nm, address field sizes
to 1mm, and accommodate varying substrates sizes from piece parts of a few millimeters
to full patterning across a 200 millimeter diameter. The EBPG5200 electron optics and
column design provides not only high resolution, but also delivers high beam currents
resulting in very high throughput, high resolution patterning. Further, the EBPG5200
system that will be installed at Penn State has been designed with a unique z-axis feature
allowing it to accommodate thick or curved substrates and making it ideal for emerging
nanotechnology applications. Coupled with its extremely flexible Linux based software and
associated GUI’s, it is ideal for multiuser, university applications. The various features of
EBPG series have made it a leader for university, research institute and industry
environments where ease of use, high resolution, throughput and system reliability are
required.
“The Vistec team is extremely proud to have been selected by Penn State and to be
associated with the Materials Research Institute and the Penn State Nanofabrication
Laboratory. We are looking forward to our relationship and to further advance the
EBPG5200 system and its capabilities for Penn State’s advanced nanotechnology
research”, said Rainer Schmid, General Manager of Vistec Lithography Inc., Watervliet,
NY, where the system will be fabricated. “Vistec has been a partner with Penn State over
many years. We welcome the opportunity to have Penn State as a customer and to be
associated with its nanotechnoloy research, its faculty and students.”
“We are very excited about our NSF Instrumentation award and the acquisition of the
Vistec EBPG5200", said Theresa S. Mayer, Professor of electrical engineering and
Director of the Penn State Nanofabrication Facility. "The instrument is the perfect match
for our demanding and unique research needs. It will provide us with a flexible, user
friendly, state-of-the-art patterning capability to explore many new avenues of
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
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Press Release
nanotechnology research and development using electron beam lithography. We are very
pleased to be partnering with Vistec and look forward to our continued interactions."
Media information:
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electronbeam lithography systems with applications ranging from nano and bio-technology to photonics
and industrial environments like mask making or direct writing for fast prototype development and
design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam
and Vistec Lithography.
Vistec Lithography
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based
on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced
research laboratories and universities. The company is located in Watervliet, NY (USA), within the
Capital Region of New York.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam
technology, which is used by leading semiconductor manufacturers and many research institutes
around the world. Their innovative electron-beam systems are used for microchip production and
integrated optics as well as for scientific and commercial research. The company is located in Jena
(Germany).
For downloads of all media releases and images in print quality please visit the website at
www.vistec-semi.com or http://www.tower-pr.com/de/vistec-semi. If you require other
formats or images please do not hesitate to contact us.
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
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Press Release
Media contact:
A'ndrea Elyse Messer, Ph.D.
Sr. Science & Research Information Officer Research Communications University Relations Penn State
Tel.: +1 814 865 9481
aem1@psu.edu
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
Vistec Lithography, Inc
125 Monroe Street
Watervliet, NY 12189 (USA)
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Electron Beam GmbH
Goeschwitzer Strasse 25
D-07745 Jena (Germany)
Vistec Lithography, Inc.
125 Monroe Street
Watervliet, NY 12189 (USA)
pr@vistec-semi.com
www.vistec-semi.com
PR Agency
Tower PR
Leutragraben 1
D-07743 Jena (Germany)
Tel.: +49(0)3641/507082
vistec@tower-pr.com
www.tower-pr.com
Ines Stolberg
Manager Strategic Marketing Litho
Tel.: +49(0)3641/651955
Fax: +49(0)3641/651922
ines.stolberg@vistec-semi.com
www.vistec-semi.com
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