Investigation of DNA induced autocatalytic copper deposition Gyula Jágerszki Department of Inorganic and Analytical Chemistry Budapest University of Technology and Economics H–1111 Budapest Advisors: Klára Tóth Róbert E. Gyurcsányi The sensitive analysis of specific DNA strands involves in most cases labeled probes. To avoid the use of these expensive secondary reagents while still ensuring the high sensitivity of the DNA assay we have been interested to explore the possibility of DNA induced autocatalytic metal deposition. The metallization of DNA strands for the fabrication of metallic nanowires has been already reported, however, the analytical application of the metal deposition is still unexplored. The analytical use of DNA induced metal deposition requires a selective deposition process with considerable amount of metal growth on DNA modified surface. In this work we have investigated the electroless deposition of copper on DNA modified gold surfaces. The autocatalytic copper deposition was studied on gold surfaces modified with different thiols bearing various chemical functionalities to identify functional groups enhancing or resisting to copper deposition. In the same time a careful optimization of the electroless deposition conditions, were performed and adapted for the analytical application. Variation of the oxygen content of the deposition solution was identified as major factor influencing reproducibility of the copper growth on different surfaces and therefore a flow through system was developed in which deaerated deposition could be used. When using backgrounds resisting to the copper deposition, such as mercaptohexanol, we have succeeded to visualize the surface bound DNA strands. Moreover, the methodology developed could differentiate between the different base length DNA sequences. The amount of copper deposited was determined by anodic stripping voltammetry based on calculating the electrical charge involved in the oxidative dissolution process. The method proposed for DNA detection might be useful for peptide nucleic acid and aptamer based assays. -10 8x10 -10 7x10 -10 6x10 nCu, mol -10 5x10 -10 4x10 -10 3x10 -10 2x10 -10 1x10 0 DNA27 DNA81 DNS13 MH MH The amount of copper deposited on gold surfaces modified with 27, 81 and 13 base length DNAs (DNA27, DNA81, DNA13) and mercaptohexanol (MH) [1] [2] [3] [4] Zimmer CH, Fritzsche GL, Triebel H, DNA-copper(II) complex and the DNA conformation. Biopolymers, 1971. 10: p. 441-463. Zangmeister CD, van Zee RD, Electroless deposition of copper onto 4mercaptobenzoic acid self-assembled on gold. Langmuir, 2003. 19(19): p. 8065-8068. Jagannathan R, Krishnan M, Electroless plating of copper at a low pH level. IBM J. of Research and Development, 1993. 37(2): p. 117-123. Freire RS, Kubota LT, Application of self-assembled monolayer-based electrode for voltammetric determination of copper, Electrochimica Acta 2004 (49) p. 3795-3800