Hyeon Su Jeong
1,4
, Hwan-Jin Jeon
1,4
, Yun Ho Kim
2
, Moon Bee Oh
3
, Shin-Woong Kang
3* and Hee-Tae Jung
1,
*
1
Department of Chemical and Biomolecular Engineering, Korea Advanced Institute of
Science and Technology, 373-1, Guseong-dong, Yuseong-gu, Daejeon 305-701, Korea
2
Advanced Functional Materials Research Group, Korea Research Institute of Chemical
Technology, Daejeon, Korea
3
Department of BIN Fusion Technology, Chonbuk National University, Jeonju 561-756,
Korea
* To whom corresponding should be addressed. heetae@kaist.ac.kr
and swkang@jbnu.ac.kr
4
Theses authors contributed equally.

Maximum high aspect ratio of ITO pattern
Figure S1. SEM image showing maximum high aspect ratio around 18 based on the measurements of 11.8 nm width and 210 nm height.

Substrates possessing high resolution ITO-pattern with high aspect ratio for liquid crystal cell (ECB and TN cell)
Figure S2.
ITO patterned substrates for ECB and TN cell. AFM images and the linecut analysis of the patterned ITO substrates with the dimension of 20 nm ITO line width, 98 nm height, and 500 nm spacing in a 5 mm x 5 mm area. The ITO substrates were used for the fabrication of (a) ECB and (c) TN cells, respectively. (b, d) The transformed 3-dimensional images of ITO line pattern, corresponding to (a) and (c), respectively.

Effect of cell thickness on LC alignment induced by the ITO patterns
Figure S3.
Aligning capability nano-patterned ITO surfaces for large cell gap (100 μm)
POM images of the ECB cell with a 100 μm thick LC layer, measured between crossed polarizers. The red arrow in the images represents the direction of ITO-pattern. POM images exhibit optical transmittance of the cell for the direction of ITO-patterns (a) parallel and (b)
45° to polarizer, respectively.

Precise control of pattern dimension
Figure S4.
Precise control of pattern dimension for each period. Representative AFM images showing various heights of ITO for each period (200, 500 and 1000 nm), corresponding line-profiles and SEM images of the patterned-ITO layer. As described in the text, the line height is varied by controlling PS-coating and RIE conditions.

Characteristic of LC alignment affected by the dimension of ITO patterns
Figure S5.
LC alignment affected by height control of ITO patterns for a fixed 200 nm period.
Depolarized optical images of ECB cells taken with orientations of 0° and 45° with respect to the polarizer and AFM images of the ITO-layer. The cells are comprised of two
ITO substrates that both have the same height with a fixed width (20 nm) and period (200 nm) over 5 mm × 5mm area. The height of ITO-pattern was varied for each cell. AFM analysis shows different heights of ITO-pattern for each cell. Note that the thin walls separated by 200 nm period are indistinguishable in the AFM image and corresponding profile because the probe tip is unable to reach to the bottom of substrate due to the high altitude of the thin walls and relatively fast scan rate. The red arrow indicates the direction of the ITO line.

Figure S6.
LC alignment affected by height control of ITO patterns for a fixed 500 nm period.
Depolarized optical images of ECB cells taken with orientations of 0° and 45° with respect to the polarizer and AFM images of the ITO-layer. The cells were constructed by using two ITO-substrates that both possess the same height with a fixed width (20 nm) and

period (500 nm) over 5 mm × 5mm area. The height of ITO pattern was varied for each cell.
The AFM images and profiles for the patterned substrates confirm the different heights of the
ITO-patterns for each cell. The red arrow indicates the direction of ITO line.
Figure S7.
LC alignment affected by height control of ITO patterns for a fixed 1000 nm period.
POM images of an ECB cell taken with orientations of 0° and 45° under a crossed polarizers. The cells consisted of two ITO substrates possessing the same height with a fixed width (20 nm) and period (1000 nm) over 5 mm × 5mm area. The height of the ITO-pattern

was varied for each cell from 25 to 85 nm. The AFM images and profiles for the substrates show that different heights for the ITO patterns. The red-arrow indicates the direction of the ITO line.