th
Shanghai Institute of Microsystem and Information Technology (SIMIT), Chinese Academy of Sciences
Shanghai Institute of Optics and Fine Mechanics (SIOM), Chinese Academy of Sciences
National Natural Science Foundation of China
Chinese Academy of Sciences (CAS)
Science and Technology Commission of Shanghai Municipality
Jiangsu University of Technology
IWIS/ISOS 2016—the 2016 International Workshop on Information Storage/10 th International
Symposium on Optical Storage will be held on April 10-13, 2016 in Changzhou, Jiangsu Province,
China. The previous nine symposia of ISOS series were successfully held in Shanghai 1988,
Chongqing 1990, Kunming 1992, Shenzhen 1996, Shanghai 2000, Wuhan 2002, Zhanjiang 2005,
Wuhan 2008, and Shanghai 2012, respectively. The purpose of this symposium and workshop is to provide a forum for the update review of recent progresses in the field of information data storage
(including information storage and optical storage) from material development to related technologies and applications. The symposium and workshop will serve to enhance interactions between researchers, engineers and product developers of the world-wide and to promote progress in this field.
We believe that those who attend this symposium will enjoy both the exchange of scientific and technical information and the memorable experience of the beauty Changzhou city of China.

IWIS/ISOS 2016 will discuss the present status of information data storage media, components, systems and applications. In addition to contributed papers, a number of invited talks will be presented.
The topics to be covered include, but are not restricted to:
1.
Materials for data storage
2.
Non-volatile memory
3.
Optical storage
4.
Magnetic and hybrid recording
5.
Digital holographic storage
6.
Near-field and super-resolution technology
7.
Network storage
8.
Drive technology and test methods
9.
Manufacture technology
10.
Standardization
11.
New media and concept for data storage
12.
Consumer products and marketing
13.
Brain-inspired-computing and storage
14.
Optical imaging and photolithography
Authors are requested to submit a 500-word abstract.
Abstracts should be typed single spaced on a separate sheet of paper and arranged with the title at top of the page, followed by the authors name, affiliation, complete mailing address, tel. and fax numbers, email and the body of the abstract. In case of multiple authors, individual author’s names and addresses should be listed separately after the title. The abstract will appear in the Advance Program if it is accepted.
Deadline for submission of abstracts: January 31, 2016.
Abstracts (in MS word format) should reach IWIS/ISOS 2016 secretariat before January 31, 2016 by email to: iwis2016@mail.sim.ac.cn
Authors will be notified electronically of acceptance before February 15, 2016 .
Submission of manuscripts: before March 15, 2016.
Fuxi Gan, Shanghai Institute of Optics and Fine Mechanics, CAS, China
Shanghai Institute of Microsystem and Information Technology, CAS, China
Matthias Wuttig , RWTH Aachen, Germany

Songlin Feng , Shanghai Advanced Research Institute, CAS, China
Members:
Fuxi Gan , Shanghai Institute of Optics and Fine Mechanics, CAS, China
Lisong Hou , Shanghai Institute of Optics and Fine Mechanics, CAS, China
Hongsik Jeong , Samsung Electronics Co., Ltd, Korea
Masud Mansuripur , University of Arizona, USA
Takeo Ohta , Ovonic Phase-Change Lab., Japan
Young-Pil Park , Yonsei University, Korea
Luping Shi , Tsinghua University, China
Junji Tominaga , National Institute of Advanced Industrial Science & Technology, Japan
Din Ping Tsai , National Taiwan University, Taipei, China
Jian-Ping Wang , University of Minnesota, USA
Noboru Yamada , Kyoto University, Japan
Ze Zhang , Zhejiang University, China
David Zhang , Fudan University, China
Rong Zhao , Singapore University of Technology & Design, Singapore
Shining Zhu , Nanjing University, China
Xiaoming Xie , Shanghai Institute of Microsystem and Information Technology, CAS, China
Jianda Shao , Shanghai Institute of Optics and Fine Mechanics, CAS, China
Zhongqiu Xie, Jiangsu University of Technology, China
Jingshi Fu , Dalian Hualu Optical Technology Co., Ltd., China
Donghong Gu , Shanghai Institute of Optics and Fine Mechanics, CAS, China
Qing Pan , National Natural Science Foundation of China
Tiewei Luo , Amethystum Optoelectronics Co., Ltd., China
Longfa Pan , Optical Memory National Engineering Research Center, China
Koukou Suu , ULVAC, Japan
Wendong Xu, Shanghai Institute of Optics and Fine Mechanics, CAS, China
Lin Shen, Jiangsu University of Technology, China
Zhitang Song , Shanghai Institute of Microsystem and Information Technology, CAS, China
Yiqun Wu , Shanghai Institute of Optics and Fine Mechanics, CAS, China
Dan Feng , Huazhong University of Science and Technology, China
Xiaodong Han , Beijing University of Technology
Xiufeng Han , Institute of Physics, CAS, China
Jinfeng Kang , Peking University, China
Runwei Li , Ningbo Institue of Industrial Technology, CAS, China
Yinyin Lin , Fudan University, China
Bo Liu , Shanghai Institute of Microsystem and Information Technology, CAS, China
Ming Liu , Institute of Microelectronics, CAS
Qian Liu , National Center of Nano Science and Technology, China
Xiangshui Miao, Huazhong University of Science and Technology, China
Xiudong Sun , Harbin Institute of Technology, China
Zhimei Sun, Beihang University, China

Xiaodi Tan, Beijing Institute of Technology, China
Yang Wang , Shanghai Institute of Optics and Fine Mechanics, CAS, China
Jingsong Wei, Shanghai Institute of Optics and Fine Mechanics, CAS, China
Huaqiang Wu, Tsinghua University, China
Hongyu Yu, South University of Science and Technology of China
Changsheng Xie , Optical Memory National Engineering Research Center, China
Xiaoqin Zhu, Jiangsu University of Technology, China
Bo Liu, Shanghai Institute of Microsystem and Information Technology, CAS, China
Yang Wang, Shanghai Institute of Optics and Fine Mechanics, CAS, China
Xiaoqin Zhu, Jiangsu University of Technology, China
Sannian Song, Shanghai Institute of Microsystem and Information Technology, CAS, China
Kui Zhang, Shanghai Institute of Optics and Fine Mechanics, CAS, China
Yifeng Hu, Jiangsu University of Technology, China
IWIS/ISOS 2016 secretariat
Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences
Room 403, Building No. 8, 865 Changning Road, Shanghai 200050, China
Tel: +86-21-62511070-8403
Fax: +86-21-62134404
E-mail: iwis2016@mail.sim.ac.cn
Website: http://www.iwis2016.com