Curriculum Vitae &
of
Ioannis Raptis
October 2010
PERSONAL DATA
Name:
Date of Birth:
Work Address:
E-mail:
Ioannis Raptis
20/02/1967
Institute of Microelectronics, National Center for Scientific Research
“Demokritos”, Athens, Greece
raptis@imel.demokritos.gr
EDUCATION
Ph.D. Institute of Microelectronics, NCSR “Demokritos” and Physics Department
of University of Athens 04/1996
Dissertation: “Electron beam lithography simulation and its application on the
characterization of chemically amplified resists”.
B.S. Physics Department of University of Athens 10/1989
Thesis:
”Fabrication and characterization of NMOS capacitors”.
RECENT PROFESSIONAL AND SCIENTIFIC ACTIVITIES
01/2007 – now: Senior Researcher at the Institute of Microelectronics (IMEL),
NCSR “Demokritos”.
Activities
a) Lead the work on polymer based chemical sensors
b) Development of novel optical sensing methodology for bio(chem) applications
c) Lead the work on the simulation of materials and processes for high resolution
lithography
06/2003 – 12/2006: Researcher at the Institute of Microelectronics (IMEL), NCSR
“Demokritos”.
Activities
d) Design and implementation of novel chemical sensors based on polymers
e) Development of novel optical methods for the monitoring of physicochemical
properties of thin polymeric films
f) Development of novel materials and processes for high aspect ratio micro/nano
machining processes
g) Design and implementation of nanoscale electronic devices
1/1998 – 06/2003: Post Doctoral Fellow at IMEL, NCSR “Demokritos”.
Activities
a) Development of novel equipment for monitoring of the lithographic processes
b) Operation, maintenance and upgrade of the EBPG-3 e-beam machine.
c) Development of novel patterning processes for high resolution lithography and high
aspect ratio micromachining
d) Application of electron beam lithography for the fabrication of novel devices with sub
quarter micron resolution
e) In collaboration with Sigma-C GmbH, further optimization (code optimization,
comparison with experimental results) of the e-beam lithography simulation software
SELID, which is based on the LITHOS software developed during my Ph.D. thesis
(see below for details).
10/1997 – 06/2003: Parallel activity: Lecturer at the Electronics Department,
Technological & Educational Institute of Athens (not permanent position).
Activities
a) Teaching and notes of the courses: Programming languages I, II (8 semesters).
b) Supervising the laboratories i) Programming Language II (ANSI C++ language and
Windows Programming using MFC) and ii) Microcontroller Applications (DAQ, Atmel
AVR, Basic Stamp).
c) Supervising of several B.S. theses on i) software development and ii) design &
implementation of data acquisition systems.
MANAGERIAL – SUPERVISION EXPERIENCE
During the last 10 years I am actively involved in the design, preparation, submission
and execution of several research (national and international) projects. In few cases I am
in charge for their execution.
I supervise several M.Sc. theses every academic year. Three Ph.D. theses
accomplished, one in progress.
Establishment of the Spin-off company ThetaMetrisis based on the White Light
Reflectance Spectroscopy developed at IMEL, NCSR ‘Demokritos’
SELECTED RECENT RESEARCH PROJECTS (2002-2010)
COMPLETED PROJECTS
1. Damage Free Submicron Structures of High Temperature Superconducting Thin
Films Funding NATO- SfP
Personal Activity: a) Initiative for the proposal preparation and submission b)
workpackage leader for the development of patterning technologies.
2. Nanoelectronic devices and fault tolerant architectures (FRACTURE) Funding
EU-IST
Personal Activity: Responsible for the development of the necessary patterning
technologies.
3. Fabrication ORganisation & Use of Memories obtained by FIB Funding EU
Personal Activity: Participation in the development of the necessary patterning
technologies.
4. Soaring Funding EU-IST
Personal Activity: Responsible for the characterization (including development of novel
characterization tools) of the fundamental physicochemical properties of the materials
used.
5. Material characterization and process optimization for the fabrication of
nanodevices Funding Greek Ministry of Education
Fundamental study of the parameters affecting resolution and line edge roughness.
Personal Activity: a) Participation in the proposal preparation b) Responsible for the
metrology and dissolution studies.
6. Exploring new limits to More Moore’s law (MoreMoore) Funding EU-IST
Personal Activity: Responsible for the characterization (including development of novel
characterization tools) of the fundamental physicochemical properties of the materials
used.
7. Pattern replication in thin polymeric films with novel lithographic approach
Funding GSRT, Greece-Poland bilateral cooperation
Personal Activity: a) Initiative for the proposal preparation and submission of the
proposal b) Project coordinator for the Greek team.
8. High Aspect Ratio Micromachining using Proton Beam Lithography on
Strippable Resists (HARM.PB) Funding GSRT, Greece-Hungary bilateral cooperation
Personal Activity: a) Initiative for the proposal preparation and submission of the
proposal b) Project coordinator for the Greek team.
9. Critical patterning technologies for the fabrication of CMOS circuits with sub
100nm critical dimension (CMOS-NANO) Funding: GSRT, Greek General Secretariat
for Research & Technology
Personal activity: a) Initiative for the proposal preparation and submission of the
proposal b) Project coordinator (three Universities, a Research Centre, an Industry).
10. Proton Beam NANOlithography for high aspect ratio structures of optical
COMPonents (PB.NANOCOMP) Funding GSRT, Non-EU cooperation
Personal Activity: a) Initiative for the proposal preparation and submission of the
proposal b) Project coordinator for the Greek team.
11. Material Development for Double patterning and Double exposure (MD3)
Funding: EU-FP7-ICT
Personal activity: a) Participation in the proposal preparation b) Simulation of processes
and materials for nanopatterning.
RUNNING PROJECTS
12. Monolithically integrated interferometric biochips for label-free early detection
of human diseases (PYTHIA) Funding: EU-FP7-ICT
Personal Activity: a) Initiative for the proposal preparation and submission of the
proposal b) Project coordinator.
INVITED TALKS
ΑΜO GmbH company, (Aachen, Germany, 08/2004)
Materials Dept., University of Ioannina, (Ioannina, Greece, 09/2004)
Jaggelonian University, (Crakow, Poland, 10/2004)
Resist Limitation Workshop, (Erlangen, Germany, 12/2004)
Resist issues for EUV lithography Workshop, (Athens, Greece, 05/2005)
Technological & Educational Institute of Lamia, (Lamia, 05/2005)
IFN-CNR, (Rome, Italy, 05/2005)
Center for Ion Beam Analysis, National University of Singapore, (Singapore,
05/2007)
9. Micro & Nano Engineering 2007 conference (Copenhagen, Denmark, 09/2007)
10. Multi Beam Systems Inc. (San Jose, California USA, 02/2008)
11. 2o MNBS Workshop (Brussels, Belgium, 03/2008)
12. Prominas Summer School (Rome, Italy, 06/2008)
13. Chemistry Dept. University of Athens, (Athens, 01/2009)
14. NCSR ‘Demokritos’ Summer School (Athens, 07/2009)
15. 4o MNBS Workshop (Neuschatel, Switzerland, 02/2010)
16. University of Basel (Basel, Switzerland, 02/2010)
17. NCSR ‘Demokritos’ Summer School (Athens, 07/2010)
18. Micro & Nano Engineering 2010 conference (Genova, Italy, 09/2010)
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OTHER SCIENTIFIC ACTIVITIES
1.
Program Chairman of Micro and Nano Engineering 2008 conference (Athens,
Greece, 09/2008).
2. Member of the organizing committee for EuroSensors 2011 (Athens, 09/2011).
3. Member of the organizing committee for International Conference on Materials for
Advanced Technologies (ICMAT2011) (Singapore, 06/2011).
4. Organizer of European workshop «Resist issues for EUV lithography» (Athens,
05/2005)
5. International advisory committee member of the MicroProcess & Nanotechnology
conference 2008 (Fukuoka, Japan,, 10/2008) and (Sapporo, Japan, 11/2009).
6. Program committee member of Micro and Nano Engineering (ΜΝΕ) conferences
2009, 2010 (Gent, Belgium, 09/2009, Genova, Italy, 09/2010).
7. International steering committee member of Electron Beam Technologies
conferences 2003, 2006 και 2009 (Bulgaria, 06/2003, 06/2006, 06/2009)
8. Program committee member of the Electron Ion Photon Beams & nanofabrication
conference (EIPBN) : 2007 (Denver, USA, 05/2007), 2008 (Portland, USA, 05/2008)
2009 (& Section Head, Florida, USA, 06/2009) 2010 (Alaska, USA 06/2010).
9. Session Chairman in MNE2005 (Wien, 09/2005), ΜΝΕ09 (Ghent, 09/09), MNE10
(Genova 09/10).
10. Reviewer in Vacuum (Elsevier), Microelectronic Engineering (Elsevier), Analytica
Chemica Acta (Elsevier), Materials Chemistry & Physics (Elsevier), Optical
Engineering (SPIE), Thin Solid Films (Elsevier), Journal of Vacuum Science &
Technology Β (American Vacuum Society), Sensors & Actuators A (Elsevier),
Sensors & Actuators B (Elsevier), Physica Status Solidi A (Wiley), Applied Optics
(Optical Society of America), Sensors (Mpdi), Polymer(Elsevier).
A. PUBLICATIONS IN INTERNATIONAL JOURNALS
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N.Glezos, I.Raptis, D.Tsoukalas, M.Hatzakis J. Vac. Sci. Technol. B10 2606(1992)
“Application of a new analytical technique of electron distribution calculations to the
profile simulation of a high sensitivity negative electron beam resist”
I.Raptis, N.Glezos, M.Hatzakis Microelectron. Eng. 21 289(1993) “Use of the Boltzmann
transport equation for the evaluation of the energy deposition in the case of electron
sensitive resist films over composite substrates”
I.Raptis, N.Glezos, M.Hatzakis J. Vac. Sci. Technol. B11 2754(1993) “Analytical
evaluation of the energy deposition in electron beam lithography in the case of a
composite substrate”.
N.Glezos, I.Raptis, M.Hatzakis Microelectron. Eng. 23 417(1994) “LITHOS: A fast
electron beam lithography simulator”.
N.Glezos, I.Raptis, M.Hatzakis Microelectron. Eng. 26 131(1995) “LITHOS: A fast
electron beam lithography simulator, Extended Version”.
I.Raptis, M.Gentili, E.DiFabrizio, R.Maggiora, M.Baciocchi, L.Grella, L.Mastrogiacomo,
Microelectron. Eng. 27 417(1995) “Development of a fast and high resolution e-beam
process for the fabrication of X-ray masks with CD of 0.15 μm”.
P.Argitis, I.Raptis, C.J.Aidinis N.Glezos, M.Baciocchi, J.Everett, M.Hatzakis J. Vac. Sci.
Technol. B13 3030(1995) “An advanced epoxy novolac resist for fast high resolution ebeam lithography”.
N.Glezos, I.Raptis IEEE Trans. CAD 15 92(1996) “A fast electron beam lithography
simulator based on Boltzmann transport equation”.
I.Raptis, L.Grella, P.Argitis, M.Gentili, N.Glezos G.Petrocco Microelectron. Eng. 30
295(1996) “Determination of the acid diffusion and energy deposition parameters by point
beam exposure in chemically amplified resists”.
N.Glezos, G.Patsis, I.Raptis, P.Argitis, M.Gentili, L.Grella, M.Hatzakis J. Vac. Sci.
Technol B14 4252(1996) “Application of a reaction diffusion model for negative CARs in
the determination of e-beam proximity correction parameters”.
G.Patsis, I.Raptis, N.Glezos, P.Argitis, M.Hatzakis, C.J.Aidinis, M.Gentili, R.Maggiora
Microelectron. Eng. 35 157(1997) “Gel formation theory approach for the modeling of
negative chemically amplified e-beam resists”.
I.Raptis Jpn. J. Appl. Phys. 36 6562(1997) “Determination of acid diffusion parameters
and proximity effect correction fog highly dense 0.15 μm features on SAL-601”.
I.Raptis, N.Glezos, A.Rosenbusch, G.Patsis, P.Argitis Microelectron. Eng. 41/42
171(1998) “Calculation of energy deposition in thin resist films over multilayer substrates”
E.Tegou, E.Gogolides, P.Argitis, I.Raptis, G.Meneghini, Z.Cui Jpn. J. Appl. Phys. 37
6873(1998) “Silylation and dry development of chemically amplified resists SAL-601,
AZPN114 and EPR for high resolution electron – beam lithography”
A.Rosenbusch, M.Ardito, Z.Cui, E. DiFabrizio, M.Gentili, N.Glezos, G.Meneghini,
B.Nowotny, G.Patsis, P.Prewett, I.Raptis Microelectron. Eng. 46 379(1999) “Simulation
of Chemically Amplified Resists in E-beam lithography”
Y.Seo, K.Lee, M.Yi, E.Seo, B.K.Choi, O.Kim, I.Raptis, P.Argitis, M.Hatzakis
Microelectron. Eng. 46 461(1999) “Evaluation of advanced epoxy novolac resist, EPR,
for sub 100nm synchrotron x-ray proximity lithography”.
G.P.Patsis, N.Glezos, I.Raptis, E.Valamontes J. Vac. Sci. Technol. B17 3367(1999)
“Simulation of roughness and free volume in chemically amplified resists using
percolation theory”
I.Raptis, B.Nowotny, N.Glezos, M.Gentili, G.Meneghini Jpn. J. Appl. Phys. 39 635(2000)
“Electron beam lithography simulation on homogeneous and multilayer substrates”
I.Raptis, D.Velesiotis, M.Vasilopoulou, P.Argitis Microelectron. Eng. 53 489(2000)
“Development mechanism study by dissolution monitoring of positive methacrylate
resists”
P.Argitis, N.Glezos, M.Vasilopoulou, I.Raptis, M.Hatzakis, J.Everett, G.Meneghini,
A.Palumbo, M.Ardito, P.Hudek, I.Kostic Microelectron. Eng. 53 453(2000) “Aqueous
base developable epoxy resist for high sensitivity electron beam lithography”
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G.P.Patsis, A.Tserepi, I.Raptis, N.Glezos, E.Gogolides, E.S.Valamontes, J. Vac. Sci.
Technol B18 3292(2000) “Surface and line-edge roughness in wet and dry developable
negative tone systems: experiment and simulation”
N.Glezos, P.Argitis, D.Velessiotis, I.Raptis, M.Hatzakis, P.Hudek, I.Kostic J. Vac. Sci.
Technol B18 3431(2000) “Aqueous base development and acid diffusion length
optimisation in negative epoxy resist for electron beam lithography”
I.Raptis, N.Glezos, E.Valamontes, E.Zervas, P.Argitis Vacuum 62 263(2001) “Electron
beam lithography simulation for high resolution and high density patterns”
I.Raptis Microelectron. Eng. 57-58 525(2001) “Free volume effects in resist lithographic
performance”
C.D.Diakoumakos, I.Raptis, A. Tserepi P. Argitis Microelectron. Eng. 57-58 539(2001)
“Negative (meth)acrylate resist materials based on novel crosslinking chemistry”
I.Raptis Jpn. J. Appl. Phys 40 5310(2001) “Resist lithographic performance
enhancement based on solvent removal measurements by optical interferometry”
I.Raptis, M.Chatzichristidi, C.Diakoumakos, A.Douvas, D.Niakoula, P.Argitis J.
Photopolym. Sci. Technol. 14 445(2001) “Application of a novel aqueous base
developable resist in micromachining”
G.Mladenov, K.Vutova, I.Raptis, P.Argitis, I.Rangelow Microelectron. Eng. 57-58
335(2001) “Simulation of latent image formation for ion beam projection lithography”
A.Tserepi, E.Valamontes, E.Tegou, I.Raptis, E.Gogolides Microelectron. Eng. 57-58
547(2001) “Surface and line edge roughness in dry developable resists”
C.D.Diakoumakos, A.Douvas, I.Raptis, S.Kakabakos, D.Dimotikalli, G.Terzoudi, P.Argitis
Microelectron. Eng. 61-62 819(2002) “Dilute aqueous base developable resists for
environmentally friendly and biocompatible processes”
D.F.Stamatialis, M.Sanopoulou, I.Raptis J. Appl. Polym. Sci. 83 2823(2002) “Swelling
and dissolution behavior of poly(methyl methacrylate) films in methyl ethyl ketone/methyl
alcohol mixtures studied by optical techniques”
I.Raptis, C.D.Diakoumakos Microelectron. Eng. 61-62 829(2002) “Non destructive
method for monitoring glass transitions in thin photoresist films”
C.D.Diakoumakos, I.Raptis, A.Tserepi, P.Argitis Polymer 44 1103(2002) “Free radical
synthesis of narrow polydispersed 2-hydroxyethyl methacrylate based tetrapolymers for
dilute aqueous base developable negative photoresists”
M.Chatzichristidi, I.Raptis, C.D.Diakoumakos, N.Glezos, P.Argitis, M.Sanopoulou
Microelectron. Eng. 61-62 729(2002) “Strippable aqueous base developable negative
photoresist for high aspect ratio micromachining”
D.Eon,
L.dePoucques,
M.C.Peignon,
C.Cardinaud,
G.Turban,
A.Tserepi,
G.Gordoyiannis, E.Valamontes, I.Raptis, E.Gogolides Microelectron. Eng. 61-62
901(2002) “Surface modification of Si containing polymers during etching for bilayer
lithography”
M.Chatzichristidi, I.Raptis, P.Argitis J. Everett J. Vac. Sci. Technol. B20 2968(2002)
“Partially hydrogenated poly(vinyl phenol) based photoresist for near UV, high aspect
ratio micromachining”
V.Bellas, E.Tegou, I.Raptis, E.Gogolides, P.Argitis, E.Iatrou, N.Hadjichristidis,
E.Sarantopoulou, A.C.Cefalas J. Vac. Sci. Technol. B20 2902(2002) “Evaluation of new
siloxane and silsesquioxane copolymers for 157 nm lithography”
C.D.Diakoumakos, I.Raptis Polymer 44 251(2003) “In-situ monitoring of thermal
transitions in thin polymeric films via optical Interferometry”
I.Raptis, D.Niakoula, V.Bellas, E.Tegou, E.Gogolides, P.Argitis, K.G.Papadokostaki,
A.Ioannidis Microelectron. Eng. 67-68 283(2003) “Resist process issues related to the
glass transition changes in thin conventional and chemically amplified resist films”
A.Tserepi, E.Gogolides, V.Constantoudis, G.Cordoyiannis, I.Raptis, E.Valamontes J.
Adhes. Sci. Technol. 17 1039(2003)“Surface roughness induced by plasma etching of
Si containing polymers”
L.Vescan, T.Stoica, B.Hollander, A.Nassiopoulou, A.Olzierski, I.Raptis, E.Sutter Appl.
Phys. Let. 82 3517(2003) “Self-assembling of Ge on finite Si(001) areas comparable with
the island size”
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A.Olzierski, I.Raptis Microelectron. Eng. 73–74 244(2004) “Development and molecular
weight issues on the lithographic performance of poly(methylmethacrylate)”
D.Davazoglou, I.Raptis, A.Gleizes, M.Vasilopoulou J. Vac. Sci. Technol. B22 859(2004)
“Fabrication of very fine copper lines on silicon substrates patterned with
poly(methylmethacrylate) via selective chemical vapor deposition”
A.Olzierski, K.Vutova, G.Mladenov, I.Raptis, T.Donchev Supercond. Sci. Technol. 17
881(2004) “Electron beam lithography simulation for sub quarter micron patterns on
superconducting substrates”
D.Niakoula, I.Raptis, D.Goustouridis, P.Argitis Jpn. J. Appl. Phys. 43 5247(2004) “Glass
transition temperature monitoring in bilayer and patterned photoresist films“
M.Vasilopoulou, S.Boyatzis, I.Raptis, D.Dimotikalli, P.Argitis J. Mater. Chem. 14
3312(2004) ”Mechanistic studies on PHEMA imaging chemistries and evaluation for
micropatterning applications”
A.Olzierski, A.G.Nassiopoulou, I.Raptis T.Stoica, L.Vescan Nanotechnology 15
1695(2004) “2-D arrays of nanometer scale holes and nano V-groves in oxidized Si
wafers for the selective growth of Ge dots or Ge/Si hetero-nanocrystals”
I.Rajta E.Baradacs, M.Chatzichristidi, E.S.Valamontes, I.Uzonyi, I.Raptis Nucl. Instrum.
Meth. B 231 423(2005) “Proton beam micromachining on strippable aqueous base
developable negative resist”
F.A.Zacharatos, A.Olziersky, I.Raptis, E.Hristoforou J. Optoelectron. Adv. Mater. 7
1121(2005) “Imprint lithography on poly(2-hydroxyethyl methacrylate), (PHEMA), and
epoxydised novolac, (EPN) polymers”
S.Chatzandroulis, D.Goustouridis, I.Raptis Microelectron. Eng. 78-79 118(2005)
“Polymeric film characterization for use in bimorph chemical sensors”
D.Goustouridis, K.Manoli, S.Chatzandroulis, M.Sanopoulou, I.Raptis Sens. Act. B 111112, 549(2005) ”Characterization of Polymer Layers for Silicon Micromachined Bilayer
Chemical Sensors Using White Light Interferometry”
L.Castaldi, I.Raptis, E.Manios, D.Niarchos J. Optoelectron. Adv. Mater. 7 1605(2005)
“Fabrication and characterization of magnetically hard CoPt ordered sub-micron
structures”
J.Raczkowska, P.Cyganik, A.Budkowski, A.Bernasik, J.Rysz, I.Raptis, P.Czuba,
K.Kowalski Macromolecules 38 8486(2005) “Composition effects in polymer blends
spin-cast on patterned substrates”
M.Kitsara, M.Chatzichristidi, D.Niakoula, D.Goustouridis, K.Beltsios, P.Argitis, I.Raptis
Microelectron. Eng. 83 1298(2006) “Layer by layer UV microlithography for the
fabrication of embedded microchannels”
G.P.Patsis, N.Tsikrikas, I.Raptis, N.Glezos Microelectron. Eng. 83 1148(2006) “Electron
beam lithography simulation for the fabrication of EUV masks”
E.N.Zois, I.Raptis, V.Anastassopoulos Microchim. Acta 155 323(2006) “Off line
metrology on SEM images using gray scale morphology”
J.Raczkowska, A.Bernasik, A.Budkowski, P.Cyganik, J.Rysz, I.Raptis, P.Czuba Surf.
Sci. 600 1004(2006) “Pattern guided structure formation in polymer films of asymmetric
blends”
S.Marceau, J.-H.Tortai, J.Tillier, N.Vourdas, E.Gogolides, I.Raptis, K.Beltsios, K.van
Werden Microelectron. Eng. 83 1073(2006) “Thickness-dependent glass transition
temperature of thin resist films for high resolution lithography”
M.Kitsara, D.Goustouridis, S.Chatzandroulis, K.Beltsios, I.Raptis Microelectron. Eng. 83
1192(2006) “A Lithographic Polymer Process Sequence for Chemical Sensing Arrays”
M.Vasilopoulou, I.Raptis, P.Argitis, I.Aspiotis, D.Davazoglou Microelectron. Eng. 83
1414(2006) “Polymeric electrolytes for WO3-based electrochromic displays”
K.Manoli, D.Goustouridis, S.Chatzandroulis, I.Raptis, E.S.Valamontes, M.Sanopoulou,
Polymer 47 6117(2006) “Vapor sorption in thin supported polymer films studied by white
light interferometry”
N.Vourdas, G.Karadimos, D.Goustouridis, E.Gogolides, A.G.Boudouvis, J.-H.Tortai,
K.Beltsios, I.Raptis J. Appl. Polym. Sci. 102 4764(2006) “Multi-wavelength
interferometry and competing optical methods for the thermal probing of thin polymeric
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films”
M.Zavali, P.S.Petrou, S.E.Kakabakos, M.Kitsara, I.Raptis, K.Beltsios, K.Misiakos Micro
Nano Lett. 1 94(2006) “Label free kinetic study of biomolecular interactions by white light
reflectance spectroscopy”
D.Drygiannakis, G.P.Patsis, I.Raptis, D.Niakoula, V.Vidali, E.Couladouros, P.Argitis,
E.Gogolides Microelectron. Eng. 84 1062(2007) “Stochastic simulation studies of
molecular resists”
J.Jaczewska, A.Budkowski, A.Bernasik, I.Raptis, J.Raczkowska, D.Goustouridis, J.Rysz,
M.Sanopoulou J. Appl. Polym. Sci. 105 67(2007) “Humidity effects in spin-coated films
of polythiophene-polystyrene blends”
N.Andreadis, S.Chatzandroulis, D.Goustouridis, K.Beltsios, I.Raptis Microelectron. Eng.
84 1211(2007) “Fabrication of conductometric chemical sensors with a novel lithographic
method”
I.Rajta, M.Chatzichristidi, E.Baradács, C.Cserháti, I.Raptis, K.Manoli, E.S.Valamontes
Nucl. Instrum. Meth. B 260 414(2007) “Proton beam micromachined buried
microchannels in negative tone resist materials”
M.Chatzichristidi, Th.Speliotis, I.Raptis, I.Haritantis, D.Niarchos, C.Christides
Microelectron. Eng. 84 1528(2007) “Effect of magnetic-field on metal-insulator
transitions in Bi wire structures”
K.Vutova, G.Mladenov, I.Raptis, A.Olziersky J. Mater. Process. Tech. 184 305(2007)
“Process simulation at electron beam lithography on different substrates”
N.Tsikrikas, D.Drygiannakis, G.P.Patsis, I.Raptis, S.Stavroulakis, E.Voyiatzis Jpn. J.
Appl. Phys. B 46 6191(2007) “Stochastic simulation of material and process effects on
the patterning of complex layouts”
S.Chatzandroulis, N.Andreadis, D.Goustouridis, L.Quercia, I.Raptis, K.Beltsios Jpn. J.
Appl. Phys. B 46 6423(2007) “Composite Chemical Sensors Based on Carbon-Filled,
Patterned Negative Resists”
I.Raptis, J.Kovač, M.Chatzichristidi, E.Sarantopoulou, Z.Kollia, S.Kobe, A.C.Cefalas J.
Laser Micro/Nanoengineering 2 200(2007) “Enhancement of sensing properties of thin
poly(methyl methacrylate) films by VUV surface modification”
M.Kitsara, K.Beltsios, D.Goustouridis, S.Chatzandroulis, I.Raptis Eur. Polymer J. 43
4602(2007) “Sequential polymer lithography for chemical sensor arrays”
M.Kitsara, D.Goustouridis, S.Chatzandroulis, M.Chatzichristidi, I.Raptis, Th.Ganetsos,
R.Igreja, C.J.Dias Sens. Act. B. 127 186(2007) “Single chip interdigitated electrode
capacitive chemical sensor arrays”
J.Jaczewska, I.Raptis, A.Budkowski, D.Goustouridis, J.Raczkowska, M.Sanopoulou,
E.Pamuła, A.Bernasik, J.Rysz Synth. Met. 157 726(2007) “Swelling of poly(3alkylthiophene) films exposed to solvent vapours and humidity: Evaluation of solubility
parameters”
N.Tsikrikas, D.Drygiannakis, G.P.Patsis, I.Raptis, A.Gerardino, S.Stavroulakis,
E.Voyiatzis J. Vac. Sci. Technol. B 25 2307(2007)“Pattern matching, simulation and
metrology of complex layouts fabricated by electron beam lithography”
Ch.Kokkinos, A.Economou, I.Raptis, C.E.Efstathiou, Th.Speliotis Electrochem.
Commun. 9 2795(2007) “Novel disposable bismuth-sputtered electrodes for the
determination of trace metals by stripping voltammetry”
A.Kokkinis, E.S.Valamontes, D.Goustouridis, Th.Ganetsos, K.Beltsios, I.Raptis
Microelectron. Eng. 85 93(2008) “Molecular weight and processing effects on the
dissolution properties of thin poly(methyl methacrylate) films”
P.Theodoni, V.Em.Vamvakas, Th.Speliotis, M.Chatzichristidi, P.Bayiati, I.Raptis,
P.Pananicolaou Phys. Stat. Sol. A 205 2581(2008) “Efficient infrared emission from
patterned thin metal films on a Si photonic crystal”
D.Drygiannakis, G.P.Patsis, K.vanWerden, A.Boudouvis, I.Raptis Microelectron. Eng.
85 955(2008) “Processing effects on the dissolution properties of thin chemically
amplified photoresist films”
E.Sarantopoulou, Z.Kollia, A.C.Cefalas, K.Manoli, M.Sanopoulou, D.Goustouridis,
S.Chatzandroulis, I.Raptis Appl. Surf. Sci. 254 1710(2008) “Surface nano/micro
functionalization of PMMA thin films by 157 nm irradiation for sensing applications”
M.Chatzichristidi, E.Valamontes, N.Tsikrikas, P.Argitis, I.Raptis, J.A.van Kan, F.Zhang,
F.Watt, Microelectron. Eng. 85 945(2008) “High-aspect-ratio micro/nano machining with
proton beam writing on aqueous developable - easily stripped negative chemically
amplified resists”
A 83. K.Misiakos, E.Makarona, M.Kitsara, I.Raptis Microelectron. Eng. 85 1074(2008)
“Monolithic Silicon Optocoupler Engineering for Advanced Sensing Applications”
A 84. P.Theodoni,
P.Bayiati,
M.Chatzichristidi,
T.Speliotis,
V.Vamvakas,
I.Raptis,
N.Papanikolaou Microelectron. Eng. 85 1112(2008) “Patterned thin metal films on a Si
photonic crystal for efficient IR emission”
A 85. C.Christides, Th.Speliotis, M.Chatzichristidi, I.Raptis Microelectron. Eng. 85 1382(2008)
“Large asymmetries of magnetoresistance loops in Co-line structures”
A 86. D.Drygiannakis, G.P.Patsis, N.Tsikrikas, G.Kokkoris, I.Raptis, A.Boudouvis, E.Gogolides,
P.Argitis Microelectron. Eng. 85 949(2008) “Stochastic simulation studies of molecular
resists for the 32nm technology node”
A 87. E.Sarantopoulou, J.Kovač, Z.Kollia, I.Raptis, S.Kobe, A.C.Cefalas Surf. Interface Anal.
40 400(2008) “Surface modification of polymeric thin films at SiO 2 interfaces with vacuum
ultraviolet light”
A 88. M.Chatzichristidi, I.Rajta Th.Speliotis, E.Valamontes, D.Goustouridis, P.Argitis, I.Raptis
Microsyst. Technol. 14 1423(2008) “Aqueous base developable - easy stripping, high
aspect ratio negative photoresist for optical and proton beam lithography”
A 89. Ch.Kokkinos, A.Economou, I.Raptis, C.E.Efstathiou Electroch. Acta. 53 5294(2008)
“Lithographically-fabricated disposable bismuth-film electrodes for the trace
determination of Pb(II) and Cd(II) by anodic stripping voltammetry”
A 90. N.Tsikrikas, G.P.Patsis, I.Raptis, A.Gerardino, E.Quesnel Jpn. J. Appl. Phys. 47
4909(2008) “Electron beam lithography simulation for the patterning of EUV masks”
A 91. C.Christides, Th.Speliotis, M.Chatzichristidi, I.Raptis J. Magn. Magn. Mater. 320
e720(2008) “Magneto-transport properties of [Co/Bi]n wire structures”
A 92. E.Valamontes, M.Chatzichristidi, N.Tsikrikas, D.Goustouridis, I.Raptis, C.Potiriadis,
J.A.vanKan, F.Watt Jpn. J. Appl. Phys. 47 8600(2008) “Realization and simulation of
high aspect ratio micro/nano structures by proton beam writing”
A 93. Ch.Kokkinos, A.Economou, I.Raptis, Th.Speliotis Anal. Chem. Acta 622 111(2008)
“Disposable mercury-free cell-on-a-chip devices with integrated microfabricated
electrodes for the determination of trace nickel(II) by adsorptive stripping voltammetry”
A 94. P.Argitis, D.Niakoula, A.M.Douvas, E.Gogolides, I.Raptis, V.P.Vidali, E.A.Couladouros
Int. J. Nanotechnol. 6 71(2009) “Materials for lithography in the Nanoscale”
A 95. J.Jaczewska, A.Budkowski, A.Bernasik, I.Raptis, E.Moons, D.Goustouridis, J.Haberko,
J.Rysz Soft Matter 5 234(2009) “Ordering domains of spin-cast blends of conjugated and
dielectric polymers on surfaces patterned by soft- and photo-lithography”
A 96. G.Dendrinos, L.Quercia, I.Raptis, S.Chatzandroulis, D.Goustouridis, K.Beltsios
Microelectron. Eng. 86 1289(2009) “Optical and electrical evaluation of polymer
composites for chemical sensing applications”
A 97. Ch.Kokkinos, A.Economou, I.Raptis, Th.Speliotis Electrochem. Comm. 11 250(2009)
“Novel disposable microfabricated antimony-film electrodes for adsorptive stripping
analysis of trace Ni(II)”
A 98. P.Oikonomou, K.Manoli, D.Goustouridis, I.Raptis, M.Sanopoulou Microelectron. Eng. 86
1286(2009) “Polymer/BaTiO3 nanocomposites based chemocapacitive sensors”
A 99. G.P.Patsis, D.Drygiannakis, I.Raptis, E.Gogolides, A.Erdmann Microelectron. Eng. 86
513(2009) “Advanced lithography models for strict process control in the 32nm
technology node”
A 100. K.Misiakos, I.Raptis, A.Gerardino, H.Contopanagos, M.Kitsara Lab on a Chip 9
1261(2009) “A Monolithic Photonic Microcantilever Device for in-Situ Monitoring of
Volatile Compounds”
A 101. C.Christides, Th.Speliotis, M.Chatzichristidi, I.Raptis Microelectron. Eng. 86 1050(2009)
“Large magnetoresistance in [Co(1 nm)/Bi(2.5 nm)]10 line structures”
A 102. P.S.Petrou, D.Ricklin, M.Zavali, I.Raptis, S.E.Kakabakos, K.Misiakos, J.D.Lambris
A 82.
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Biosens. Bioelectron. 24 3359(2009) “Real-time label-free detection of complement
activation products in human serum by white light reflectance spectroscopy”
K.Manoli, D.Goustouridis, I.Raptis, E.Valamontes, M.Sanopoulou J. Appl. Polym. Sci.
116 184(2010) “Vapor-induced swelling of supported methacrylic and siloxane polymer
films: determination of interaction parameters”
G.P.Patsis, N.Tsikrikas, D.Drygiannakis, I.Raptis Microelectron. Eng. 87 1575(2010)
“Simulation of Shot Noise effect on CD and LER of Electron Beam Lithography in 32nm
Designs”
M.Zavali, P.S.Petrou, D.Goustouridis, I.Raptis, K.Misiakos, S.E.Kakabakos J.
Chromatograph. B 878 237(2010) “Regenerable flow-through affinity sensor for label–
free detection of proteins and DNA”
D.Goustouridis, I.Raptis, E.Valamontes, M.Chatzichrisitidi Microelectron. Eng. 87
1115(2010) “Integrated tool for the spreading, thermal treatment and in-situ process
monitoring of thick photoresist films”
M.Kitsara, P.Petrou, D.Kontziampasis, K.Misiakos, E.Makarona, I.Raptis, K.Beltsios
Microelectron. Eng. 87 802(2010) “Biomolecular Layer Thickness Evaluation using
White Light Reflectance Spectroscopy”
G.Patsis, D.Drygiannakis, I.Raptis Microelectron. Eng. 87 989(2010) “Detailed Resist
Film Modelling in Stochastic Lithography Simulation for Line-Edge Roughness
Quantification”
M.Kitsara, K.Misiakos, I.Raptis, E.Makarona, Optics Express 18 8193(2010) “Integrated
optical frequency-resolved Mach-Zehnder interferometers for label-free affinity sensing”
M.Kitsara, D.Goustouridis, E.Valamontes, P.Oikonomou, K.Beltsios, I.Raptis J.
Optoelectron. Adv. Mater. 12 1147(2010) “Polymer based chemical sensor array
fabricated with conventional microelectronic processes”
G.P.Patsis, D.Drygiannakis, V.Constantoudis, I.Raptis, E.Gogolides Eur. Polym. J. 46
1988(2010) “Stochastic Modeling and Simulation of Photoresist Surface and Line-Edge
Roughness Evolution”
Ch.Kokkinos, I.Raptis, A.Economou, Th Speliotis Electroanalysis (accepted for
publication) “Determination of Trace Tl(I) by Anodic Stripping Voltammetry on Novel
Disposable Microfabricated Bismuth-Film Sensors”
S.Dimopoulos, M.Kitsara, D.Goustouridis, S.Chatzandroulis. I.Raptis Sensor Lett.
(accepted for publication) “A Chemocapacitive Sensor Array System for gas sensing
applications”
B. PUBLICATIONS IN INTERNATIONAL CONGRESSES
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B 2.
B 3.
B 4.
B 5.
A.Rosenbusch, N.Glezos, M.Kalus, I.Raptis 16th BACUS Symp. on Photomask
Technology and Management Proc. SPIE 2884 435(1996) “SELID: A new 3D simulator
for e-beam lithography”.
G.Patsis, N.Glezos, I.Raptis, P.Argitis C.Aidinis 6th Eur. Polymer Feder. Symp.
Polymeric Mat. (09/1996) “Simulation of electron beam induced gel formation in radiation
sensitive polymer films”.
P.Argitis, S.Boyatzis, I.Raptis, N.Glezos, E.Tegou, E.Gogolides, M.Hatzakis 6th Eur.
Polymer Federation Symp. of Polymeric Materials (09/1996) “Radiation induced
cationic polymerization in epoxy novolac resists: A reaction kinetics study for optimized
microlithography”.
P.Argitis, S.Boyatzis, I.Raptis, N.Glezos, M.Hatzakis ACS Symp. Polymeric Materials
Science and Engineering Vol. 77 p. 471 Las Vegas (09/1997) “Post exposure Bake
kinetics in epoxy novolac chemically amplified resists”.
I.Raptis, G.Meneghini, A.Rosenbusch, N.Glezos, R.Palumbo, M.Ardito, P.Argitis Proc.
SPIE 3331 431(1998) “Electron beam lithography on multilayer substrates: experimental
and theoretical study”
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B 7.
B 8.
B 9.
B 10.
B 11.
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B 15.
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B 23.
B 24.
B 25.
E.Tegou, E.Gogolides, P.Argitis, I.Raptis, N.Glezos, Z.C.H.Tan, K.Lee, P.Le, Y.Hsu,
M.Hatzakis Proc. SPIE 3339 1181(2000) “An epoxidised novolac resist (EPR) for high
resolution negative and positive tone electron beam lithography”
N.Glezos, P.Argitis, D.Velessiotis, I.Raptis, P.Hudek, I.Kostic Advanced Semiconductor
Devices and Microsystems ASDAM 2000 conf. p. 231 (Slovakia, 10/2000) “Process
optimisation and diffusion length evaluation of a new aqueous base developable negative
epoxy electron beam resist”
A.Tserepi, G.Cordoyiannis, K.Boukouras, E.S.Valamontes, I.Raptis E.Gogolides D.Eon,
M.C.Peignon, Ch.Cardinaud, G Turban CIP 2001 conference (France 09/2001) “Plasma
etching of Si-containing polymers for 193-157 nm lithography”.
I.Raptis, N.Glezos Proc. SISPAD 2001 p. 404 “Electron beam lithography simulation for
subquartermicron and high density patterns”
K.Vutova, G.Mladenov, I.Raptis Proc. SISPAD 2001 p. 440 “Determination of the
Radiation Efficiency, Contrast and Sensitivity in Electron and Ion lithography”
M.Chatzichristidi, I.Raptis, C.D.Diakoumakos, N.Glezos, P.Argitis IUPAC Int.
Symposium (IP 2001) on ionic polymerization (Greece 10/2001) “Strippable negative
thick photoresist for micromachining applications”
C.Tsamis, D.Skarlatos, I.Raptis, D.Tsoukalas, B.Colombeau, A.Claverie MRS Spring
meeting (San Fransisco, USA 04/2002) “Annealing behavior of locally confined
dislocation loops under inert and oxidizing ambient”
D.Eon,
G.Cartry,
M.C.Peignon
Ch.Cardinaud,
A.Tserepi,
G.Cordoyiannis,
E.S.Valamontes, I.Raptis, E.Gogolides 29th IEEE Int. Conf. Plasma Sciences (Canada,
05/2002) “Resist Plasma Etching for 157 nm Lithography”
I.Raptis, D. Niakoula, E. Tegou, P. Argitis, E. Gogolides C. Cefalas, E. Sarantopoulou Int.
Extreme UV Lithography (EUVL) Symp. (Texas, USA, 10/2002) “Resist Process Issues
at EUV Related to the Glass Transition Changes Accompanying Film Thickness
Reduction”
V.Bellas, E.Tegou, I.Raptis, E.Gogolides, P.Argitis, E.Sarantopoulou, A.C.Cefalas 3rd
International Symp. For 157nm Lithography (Belgium, 09/2002) “New Silsesquioxane
and Siloxane Based Resist Copolymers for 157nm Lithography”
D.Niakoula, I.Raptis, V.Bellas, P.Argitis Proc. SPIE 5039 357(2003) ”Glass transition
temperature studies in thin photoresist films”
M.Vassilopoulou, D.Pappas, I.Raptis, D.Davazoglou, I.Kostic EUROCVD 14 (Paris,
France, 04/2003) “Fabrication of Electrochromic Displays by Chemically Vapor
Depositing and Patterning WO3 Films on SnO2:F Covered Glass Substrates”
I.Raptis, A.Olzierski, E.N.Zois Electron Beam Technologies 2003 (Varna, Bulgaria,
06/2003) “Processing issues on the e-beam lithographic performance of PMMA”
K.Vutova, G.Mladenov, I.Raptis, A.Olzierski, Electron Beam Technologies 2003
(Varna, Bulgaria, 06/2003) “Simulation of exposure and development at EBLithography
on high temperature superconducting samples”
M.Chatzichristidi, A.Douvas, K.Misiakos, I.Raptis, C.D.Diakoumakos, P.Argitis,
P.S.Petrou, S.E.Kakabakos, 2nd Int Workshop Multianalyte Biosensing Devices
(Taragona, Spain, 02/2004) ”Sub-10μm protein microarray fabricated using new near UV
photoresist & novel multi-step lithographic scheme”
L.Castaldi, I.Raptis, E. Manios, D.Niarchos JEMS 04 conference (Dresden, Germany,
09/2004) “Fabrication and characterization of magnetically hard CoPt ordered sub-micron
structures”
D.Goustouridis, S.Chatzandroulis, I.Raptis, E.S.Valamontes IEEE Sensors 2004
(Vienna, Austria, 10/2004) “Modification of polymer swelling by UV irradiation for use in
chemical sensing”
M.Chatzichristidi, A.Douvas, K.Misiakos, I.Raptis, C.D.Diakoumakos, P.Argitis,
P.S.Petrou, S.E.Kakabakos 2nd MMN Int. Conf. (Athens, Greece, 11/2004) “New
lithographic process and resist capable for fabrication of submicron protein microarrays“
A.Kokkinis, E.S.Valamontes, I.Raptis J. Phys. Conf. Ser. 10 401(2005) “Dissolution
properties of ultrathin photoresist films for the fabrication of nanostructures”
S.Chatzandroulis, D.Goustouridis, I.Raptis J. Phys. Conf. Ser. 10 297(2005)
B 26.
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B 28.
B 29.
B 30.
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B 33.
B 34.
B 35.
B 36.
B 37.
B 38.
B 39.
B 40.
B 41.
B 42.
B 43.
“Characterization of polymer films for use in bimorph chemical sensors”
A.Kokkinis, D.Goustouridis, E.S.Valamontes, I.Raptis 5th Int. Conf. Polymer Surface
Modification (Toronto, Canada, 06/2005) “Material and processing effects on the
dissolution properties of thin resist films for high resolution lithography”
D.Goustouridis, M.Kitsara, S.Chatzandroulis, K.Beltsios, I.Raptis EuroSensors 2005
(Barcelona, Spain, 09/2005) “A simple process for the deposition of polymer arrays for
use in chemical sensing”
N.Vourdas, G.Karadimos, E.Gogolides, A.G.Boudouvis, I.Raptis 4th Int. Conf.
Instrumental Methods of Analysis (Iraklion, Greece, 10/2005) ”Evaluation of optical
methods for the glass transition temperature measurement of thin polymeric films”
K.Manoli, D.Goustouridis, S.Chatzandroulis, I.Raptis, M.Sanopoulou 4th Int. Conf.
Instrumental Methods of Analysis (Iraklion, Greece, 10/2005) “Sorption of vapors in
thin polymer films studied by white light interferometry”
D.Goustouridis, S.Chatzandroulis, I.Raptis, E.S.Valamontes 4th Int. Conf. Instrumental
Methods of Analysis (Iraklion, Greece, 10/2005) “UV irradiation as a means of
engineering polymer swelling properties used in chemical sensors”
K.Vutova, G.Mladenov, T.Tanaka, K.Kawabata, I.Raptis Micro & Nano Engineering
2005 Conf. (Vienna, Austria, 09/2005) “Modelling of resist exposure and development
for optimization of sub-quarter-micron patterns”
N.Tsikrikas, G.P.Patsis, I.Raptis, N.Glezos Electron Beam Technologies 2006 (Varna,
Bulgaria, 06/2006) "Electron Beam lithography simulation on EUV mask blank"
D.Drygiannakis, G.P.Patsis, I.Raptis, D.Niakoula, V.Vidali, E.Couladouros, P.Argitis,
E.Gogolides Micro & Nano Engineering conf. (Barcelona, Spain, 09/2006) 3ο Βραβείο
Καλύτερης Αφίσας “Stochastic simulation studies of molecular resists”
D.Niakoula, D.Drygiannakis, I.Raptis, G.P.Patsis, P.Argitis, E.Gogolides, V.P.Vidali,
D.R.Gautam, E.A.Couladouros, W.Yueh, J.Roberts, R.Meagley MicroProcess &
Nanotech Conf. (Kanagawa, Japan, 10/2006) “Dissolution studies of polycarbocyclebased aqueous base developable molecular resists”
M.Chatzichristidi, P.S.Petrou, A.M.Douvas, C.D.Diakoumakos, I.Raptis, K.Misiakos,
S.S.Kakabakos, P.Argitis Mater. Res. Soc. Symp. Proc. 950 0950-D15-15(2007)
“Photolithographic process based on high contrast acrylate photoresist for multi-protein
patterning”
D.Drygiannakis, N.Tsikrikas, G.P.Patsis, G.Kokkoris, I.Raptis, E.Gogolides SPIE
Advanced Lithography conf. (Jan Jose, USA, 02/2007) “Stochastic simulation of
material and process effects on the patterning of complex layouts with e-beam and EUV
lithography”
D.Drygianakis, M.D.Nijkerk, G.P.Patsis, G.Kokkoris, I.Raptis, L.H.A.Leunissen,
E.Gogolides Proc. SPIE 6519 65193T(2007) (Jan Jose, USA, 02/2007) “Simulation of
the combined effects of polymer size, acid diffusion length and EUV secondary electron
blur on resist line-edge roughness”
N.Tsikrikas, D.Drygiannakis, G.P.Patsis, I.Raptis, A.Gerardino, S.Stavroulakis,
E.Voyiatzis EIPBN 2007 (Denver, USA, 05/2007) “Pattern matching, simulation and
metrology of complex layouts fabricated by electron beam lithography”
E.Sarantopoulou, Z.Kollia, K.Manoli, M.Sanopoulou, D.Goustouridis, S.Chatzandroulis,
I.Raptis Transducers 2007 (Lyon, France, 06/2007) “Modification of sensing properties
of thin polymer films by VUV irradiation”
J.Jaczewska, A.Budkowski, J.Raczkowska, I.Raptis, D.Goustouridis IXth Int. Conf. Front.
Pol. Adv. Mater. 2007 (Cracow, Poland 07/2007) “Swelling of Poly(3-alkylthiophene)
films exposed to solvent vapors and humidity: effects of head to tail regioregularity”
J.Jaczewska, A.Budkowski, J.Raczkowska, I.Raptis, D.Goustouridis 46th Microsymp.
Nanostruct. Polym. & Polym. Nanocomp.(Prague, Czech Republic, 07/2007)
“Swelling of Poly(3-alkylthiophene) films exposed to solvent vapors and humidity: effects
of head to tail regioregularity”
C.Christides, Th.Speliotis, M.Chatzichristidi, I.Raptis 18th Soft Magnetic Materials Conf.
(Cardiff, UK, 09/2007) “Magnetotransport properties of [Co/Bi]n wire structures”
K.Manoli, E.Karonis, D.Goustouridis, S.Chatzandroulis, I.Raptis, M.Sanopoulou
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B 61.
Instrumental Methods of Analysis (IMA 2007) (Patras, Greece, 10/2007) “A
chemocapacitive sensor array for the detection of volatile compounds and humidity”
M.Zavali, P.S.Petrou, S.Kakabakos, I.Raptis, K.Misiakos Instrumental Methods of
Analysis (IMA 2007) (Patras, Greece, 10/2007) “Real time monitoring of biomolecular
interactions by a label-free reflectance spectroscopy sensor”
Ch.Κokkinos, A.Economou, I.Raptis, Th.Speliotis, C.E. Efstathiou Instrumental Methods
of Analysis (IMA 2007) (Patras, Greece, 10/2007) “Disposable Fabrication,
characterization and applications of bismuth-sputtered sensors for trace metals
monitoring by stripping voltametry”
N.Tsikrikas, G.P.Patsis, I.Raptis, A.Gerardino Eur. Mask Lithography Conf. (EMLC
2008) (Dresden, Germany, 01/2008) “High Resolution Patterning and Simulation on
Mo/Si Multilayer for EUV Masks”
Ch.Kokkinos, A.Economou, I.Raptis, Th.Speliotis Sensing in Electroanalysis, Uni.
Pardubice (Czech Republic) 3 91(2008) “Lithographically-Fabricated Bismuth-Film
electrodes as disposable Mercury-Free voltammetric sensors for trace analysis of Pb(II)”
G.P.Patsis, D.Drygiannakis, N.Tsikrikas, I.Raptis Proc. SPIE (2008) “Electron-BeamPatterning Simulation and Metrology of Complex Layouts on Si/Mo Multilayer substrates”
D.Drygiannakis, N.Tsikrikas, G.P.Patsis, G.Kokkoris, I.Raptis, E.,Gogolides, Proc. SPIE
6518 651836.E(2008) “Stochastic simulation of material and process effects on the
patterning of complex layouts”
D.Niakoula, D.Drygiannakis, G.P.Patsis, E.Gogolides, I.Raptis, P.Argitis, V.P.Vidali,
D.R.Gautam, E.A.Couladouros EIPBN Conf. (Portland, USA, 06/2008) “Dissolution
optimization of highly etch-resistant, anthracene-based molecular resists”
M.Kitsara, I.Raptis, K.Misiakos, E.Makarona EuroSensors 2008 (Dresden, Germany,
09/2008) “Integrated biochemical broad-band Mach-Zehnder sensors”
K.Manoli,
P.Oikonomou,
D.Goustouridis,
E.Karonis,
I.Raptis,
M.Sanopoulou
EuroSensors 2008 (Dresden, Germany, 09/2008) “Interdigital chemicapacitive sensors
based on polymer/BaTiO3 composites”
I.Mathioudakis, C.Boutopoulos, I.Raptis, I.Zergioti ΜΝΕ08 Conf. (Athens, Greece,
09/2008) “Direct laser lithography on silicon substrate using phase mask”
K.Manoli, E.Karonis, M.Chatzichristidi, D.Goustouridis, S.Chatzandroulis, I.Raptis,
M.Sanopoulou IEEE Sensors 2008 (Lecce, Italy, 10/2008) “Evaluation of a
chemocapacitive sensor array for the detection of vapor analytes and their mixtures”
M.Kitsara, I.Raptis, K.Misiakos, E.Makarona IEEE Sensors 2008 (Lecce, Italy, 10/2008)
“Broad-band Mach-Zehnder Interferometry as a detection principle for label-free
biochemical sensing”
N.Tsikrikas, D.Drygiannakis, E.Valamontes, I.Raptis, G.P.Patsis MNC08 conf.
(Fukuoka, Japan, 10/2008), “Simulation of E-Beam Edge Acuity Effect on the Resolution
and LER of Chemically Amplified Resists”
D.Goustouridis, I.Raptis, E.Valamontes, I.Karanikas, M.Chatzichrisitidi MNC08 conf.
(Fukuoka, Japan, 10/2008) “Development and Characterization of an Integrated Thick
Resist Film Processing Tool”
K.Manoli, D.Goustouridis, P.Oikonomou, S.Chatzandroulis, M.Sanopoulou, I.Raptis
EuroSensors 2009 (Lausanne, Switzerland, 09/2009) “Capacitive sensor arrays with
controllable deposition of the sensing polymer area for VOCs applications: Design and
measurement considerations”
Ch.Kokkinos, I.Raptis, A. Economou, Th. Speliotis EuroSensors 2009 (Lausanne,
Switzerland, 09/2009) “Disposable micro-fabricated electrochemical bismuth sensors for
the determination of Tl(I) by stripping voltammetry”
P.Oikonomou, K.Manoli, D.Goustouridis, E.Valamontes, I.Raptis, M.Sanopoulou IEEE
Sensors 2009 (Christchurch, New Zealand, 10/2009) “Monitoring of must fermentation
progress by polymer coated capacitive vapour sensor arrays”
K.Misiakos, I.Raptis, D.Goustouridis, A.Gerardino, H.Contopanagos, E.Valamontes,
M.Kitsara IEEE Sensors 2009 (Christchurch, New Zealand, 10/2009) “Ultraminiaturized monolithically integrated polymer coated Si optoelectronic cantilevers for gas
sensing applications”
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P.S.Petrou, M.Zavali, I.Raptis, K.Beltsios, S.E.Kakabakos, D.Ricklin, J.D.Lambris, K.
Misiakos IEEE Sensors 2009 (Christchurch, New Zealand, 10/2009) “A flow-through
optical sensor system for label-free detection of proteins and DNA”
M.Kitsara, P.Petrou, K.Beltsios, I.Raptis, S.Kakabakos Instrumental Methods of
Analysis (IMA 2009) (Athens, Greece, 10/2009) “Evaluation of biomolecular film
thickness using white light reflectance spectroscopy”
P.Oikonomou, K.Manoli, D.Goustouridis, I.Raptis, M.Sanopoulou Instrumental Methods
of Analysis (IMA 2009) (Athens, Greece, 10/2009) “In-situ monitoring of must
fermentation by polymer coated interdigitated sensor arrays”
M.Kitsara, K.Misiakos, I.Raptis, R.Stoffer, P.S.Petrou, S.E.Kakabakos, E.Makarona
EuroPtrode 2010 (Prague, Czech Republic, 03/2010) “Monolithically integrated broadband Mach-Zehnder interferometer arrays for real-time label-free monitoring of
biomolecular interactions”
M.Kitsara, I.Raptis, A.Botsialas, D.Kontziampasis, K.Misiakos, P.S.Petrou EuroPtrode
2010 (Prague, Czech Republic, 03/2010) “Characterization of ultra thin biomolecular
layer stacks via white light reflectance spectroscopy”
K.Manoli, P. Oikonomou, D.Goustouridis, I.Raptis, M. Sanopoulou 8th Hellenic Polymer
Soc. Symp. (Crete, Greece, 10/2010) “Characterization of the vapor sorption properties
of methacrylic and siloxane polymers by an optical method”