Computational Studies of Silicon Nanostructure Surfaces R. Q. Zhang City University of Hong Kong “International Workshop on High-volume Experimental Data, Computational Modeling and Visualization” October 17th - 19th, 2011, Fragrant Mountain, Beijing, China Outline Why nanosurface Surface effect on band structures Surface doping Surface induced thermal conductivity attenuation Summary Outline Why nanosurface Surface effect on band structures Surface doping Surface induced thermal conductivity attenuation Summary Si Crystal Si (100) Surface Band structure of silicon 10 5 Energy (eV) 0 -5 -10 -15 X U L K point K Intel's roadmap Surface of SiNWs R.Q. Zhang, et al., JCP 123, 144703 (2005); October 24, 2005 issue of VJNST Analysis + DFT <112> wire Remarkable effects of surface dihydride configurations Symmetric Canted HOMO C. S. Guo, X. B. Yang, and R. Q. Zhang, Solid State Commun., 149, 1666(2009). (111) surfaces terminated with SiH3: Symmetric, rotated, and tilted rhombus rhombus symmetric rotated tilted nanowire DDD Ma, et al, Science For both bulk and NW surface, the tilted one is the most stable. The surface states are not at the band edge. Hu Xu, R.Q. Zhang et al., Phys. Rev. B 79, 073402 (2009) SA/V ratio of nanowires: 1/a Area Volume SA/V ratio 4aL a2L 4/a 2aL a2L L a a a L 2/a SA/V ratio increase will enhance • structure change • charge transfer • boundary effect • confinement • …… stability excited-state property band structure doping effect thermal transport Methodologies Surface effect on band structures => DFT, DFT/MD Surface doping => DFT Surface induced thermal conductivity attenuation => Tersoff potential based MD Outline Why surface Surface effect on band structures Surface doping Surface induced thermal conductivity attenuation Summary Band structure tuning of SiNWs Indirect <==>direct? Band structure of silicon 2 10 5 1 Energy(eV) Energy (eV) 0 -5 -10 0 -1 -15 X U L K point K -2 T Si crystal X <112> SiNW Indirect band structure of <112> SiNWs => quasidirect bandgap A.J. Lu, R.Q. Zhang, et al., Nanotechnology, 19, 035708 (2008) Tuning energy band of <112> SiNWs by varying cross-section shape (111) -0.2 (111) Direct 0.0 (110) (eV) 0.2 (110) 0.4 Indirect 0.6 -0.4 0.2 0.4 0.6 0.8 1.0 1.2 1.4 1.6 1.8 Aspect Ratio (111) To (110) side facet ratio A.J. Lu, R.Q. Zhang, et al., Appl. Phys. Lett., 92, 203109 (2008). Tuning energy band of <112> SiNWs by varying cross-section shape (110) (110) (111) (111) 2 Energy(eV) 1 LDOS distribution determines the band gap characteristic. 0 -1 -2 T X Tuning energy band of <112> SiNWs by atomic phosphorus adsorption Why phosphorus? - a similar atomic radius to silicon - the higher electronegativity Tuning energy band of <110> SiNWs by atomic nitrogen adsorption – metallization X. B. Yang and R. Q. Zhang, Appl. Phys. Lett., 94, 113101 (2009). Outline Why surface Surface effect on band structures Surface doping Surface induced thermal conductivity attenuation Summary Conventional n- and p-type Si doping Si B P h+ e- E E Ec Ev Donor level Ec Ev Acceptor level Temperature dependence of carry concentration Ndeee Nanodevices using doped SiNWs - CMOS - Solar cells - Thermoelectrics - Sensors -… Attempted volume doping in SiNWs Experimental observation: Less controllable and also less effective due to the donor deactivation • • M. Diarra, et al., Phys. Rev. B 75, 045301 (2007). M. T. Bjork, et a., Nat. Nanotechnol. 4, 103 (2009). Theoretical: Impurities favor the surface position and such doping reduces the density of carriers • M. V. Fernandez-Serra, et al., PRL 96, 166805(2006). Charge transfer due to surface passivation Nanodot Si35H36 H(SiH) -0.0550 H(SiH2) -0.0670 Si(SiH) 0.0548 Si(SiH2) 0.1733 M.X. He, R.Q. Zhang, et al., J. Theor. Comput. Chem., 8, 299–316 (2009). Surface Passivation Doping of Silicon Nanowires Qp 8q /(a D) 2 q is the partial charge on a surface hydrogen atom = -0.06 |e| , a is the silicon lattice constant 5.43 Å, and D is the diameter = 100 nm . p= 1.61019 cm-3 Hole concentration due to surface doping: 1019 cm-3 C.S. Guo, R.Q. Zhang, et al., Angew. Chem. Int. Ed, 48/52, 9896(2009). IDS (A) Experimental verification 1: FET at Vds = - 2 V in vacuum Original Si wafer H-SiNWs (in vacuum) H-SiNWs (in air) p p 1×109 (intrinsic) 0.235 9.6×1017 0.508 1.25×1018 3.3×106 (n-) 1.83 4.1×1017 4.67 7.3×1017 Carrier Concentration Experimental verification 2: A p-n junction arry by surface passivation doping C.S. Guo, L.B. Luo, R.Q. Zhang, S.T. Lee, et al., Angew. Chem. Int. Ed, 48/52, 9896 (2009) Outline Why surface Surface effect on band structures Surface doping Surface induced thermal conductivity attenuation Summary Theory Green-Kubo expression 1 VkBT 2 m 0 z component of heat current J z (0) J z (t ) dt J (t ) d (ri Ei ) dt i <autocorrelation function> Double exponential approximation 1 m a m o )] ( m ) [ Ao o (1 e ) Aa a (1 e 2 VkBT (small MD simulation time + reduced cut-off artifacts) Fitting For bulk silicon with 512 atoms: 100 20 15 60 (W/mK) (W/mK) 80 40 10 5 20 (b) 1000K (a) 300K 0 0 20 40 60 80 100 m (ps) 0 0 10 20 30 40 m (ps) 50 The fitting parameters Ao, o, Aa and a are then used to calculate the thermal conductivity (red curve) at m. Test For bulk silicon with 512 atoms, The predicted the thermal conductivity: At 300K: ~ 82 W/mK At 1000K: ~ 15.5 W/mK Reported results: At 300K: ~85 W/mK [*] with Tersoff potential; At 1000K: 17.78 2.61W/mK [**] with Stillinger-Weber potential [*] Li X., Maute K., Dunn M. L., and Yang R., Phys. Rev. B, 81 (2010) 245318 [**] Chen J., Zhang G., and Li B., Phys. Lett. A, 374 (2010) 2392 Models Surface nitrogenation induced thermal conductivity attenuation Phonon spectra along the longitude direction Si-Si vibrational characteristic Si-N vibrational modes Summary SA/V ratio – 1/a Surface effect on band structures Surface doping – passivation & transfer Thermal conductivity attenuation Acknowledgements Co-authors: Surface effect on band structures: H. Xu, C.S. Guo, A.J. Lu Surface doping: C.S. Guo, X.B. Yang Surface induced thermal conductivity attenuation: H.P. Li Grants: RGC, CityU Thank You!