I300I Factory Guideline Compliance: Factory Integration
Maturity Assessment (FIMA) for 300 mm Production Equipment:
Version 4.01
International SEMATECH
Technology Transfer # 98023468C-TR
SEMATECH and the SEMATECH logo are registered service marks of SEMATECH, Inc.
International SEMATECH and the International SEMATECH logo are registered service marks
of International SEMATECH, Inc., a wholly-owned subsidiary of SEMATECH, Inc.
Product names and company names used in this publication are for identification purposes only and may be trademarks or service
marks of their respective companies.
© 2000 International SEMATECH, Inc.
I300I Factory Guideline Compliance: Factory Integration Maturity
Assessment (FIMA) for 300 mm Production Equipment: Version 4.01
Technology Transfer # 98023468C-TR
International SEMATECH
February 29, 2000
Abstract:
This document is a revised version of the pre-existing FIMA version 4.0 release. This version has
been modified into a modular format to allow for segregated assessments of 300 mm equipment
sub-assemblies and other associated focus areas.
This document is a revised version of the pre-existing FIMA version 4.0 release. This version has
been modified into a modular format to allow for segregated assessments of 300 mm equipment
sub-assemblies and other associated focus areas. This document contains procedures, inquiries,
and corresponding pass/fail criteria to be used during an equipment maturity assessment (EMA) to
evaluate compliance to the guidance, standards, and requirements detailed in the I300I Factory
Guidelines: Version 4.0. It describes the assessment method as well as the pass/fail criteria; a
worksheet for performing the assessment is also included.
Keywords:
300 mm Wafers, Wafer Size Conversion, Equipment Performance, Productivity Analysis
Authors:
Eddy Bass, Steve Fulton, Lorn Christal
Approvals:
Lorn Christal, Author
Jim Ammenheuser, Manager, Demonstration Technology
Randy Goodall, Associate Director, Productivity & Infrastructure
Laurie Modrey, Technical Information Transfer Team Leader
iii
Table of Contents
1
EXECUTIVE SUMMARY....................................................................................................... 1
2
INTRODUCTION..................................................................................................................... 2
2.1 What is this Document?.................................................................................................... 2
2.2 Why is this Document Provided? ..................................................................................... 2
2.3 What Approach? ............................................................................................................... 2
2.4 How Should It Be Used/Deployed?.................................................................................. 2
2.5 Conventions for This Document....................................................................................... 3
3
FACTORY GUIDELINE COMPLIANCE OVERVIEW ........................................................ 4
3.1 Why Should a Supplier Establish a Standards and Guidelines Compliance Program?.... 4
3.2 How Should a Supplier Establish a Standards and Guidelines Compliance Program?.... 4
3.3 How Should a Supplier Prepare for an Assessment?........................................................ 4
3.4 What Are/Will Be the FIMA Outcome(s) and Deliverables?........................................... 5
4
MECHANICAL INTERFACES ASSESSMENT .................................................................... 7
4.1 Load Port Assessment....................................................................................................... 7
4.1.1 Instrumentation/Tools/Prerequisites ...................................................................... 7
4.1.2 Load Port Physical Testing .................................................................................. 10
4.1.3 Load Port Physical Testing Results ..................................................................... 29
4.1.4 Load Port Intelligent Inquiry................................................................................ 37
4.2 Interfaces for Material Delivery Assessment.................................................................. 39
4.2.1 Interfaces for Material Delivery Instrumentation/Tools/Prerequisites ................ 39
4.2.2 Interfaces for Material Delivery Physical Testing ............................................... 39
4.2.3 Interfaces for Material Delivery Physical Testing Results .................................. 47
4.2.4 Interfaces for Material Delivery Intelligent Inquiry............................................. 50
5
BUFFERING ASSESSMENT ................................................................................................ 52
5.1 Buffering Instrumentation/Tools/Prerequisites............................................................... 52
5.2 Buffering Physical Testing ............................................................................................. 52
5.3 Buffering Physical Testing Results................................................................................. 59
5.4 Buffering Intelligent Inquiry........................................................................................... 64
6
EQUIPMENT CAPABILITY REQUIREMENTS ASSESSMENT ...................................... 69
6.1 Equipment Capability Instrumentation/Tools/Prerequisites ........................................... 69
6.2 Equipment Capability Requirement Physical Testing .................................................... 69
6.3 Equipment Capability Requirements Physical Testing Results...................................... 75
6.4 Equipment Capability Requirement Intelligent Inquiry ................................................. 79
7
PRODUCTIVITY ASSESSMENT......................................................................................... 94
7.1 Productivity Instrumentation/Tools/Prerequisites .......................................................... 94
7.2 Productivity Physical Testing ......................................................................................... 94
7.3 Productivity Intelligent Inquiry....................................................................................... 95
8
ENVIRONMENTAL, SAFETY & HEALTH (ESH) ASSESSMENT ................................ 103
8.1 ESH Instrumentation/Tools/Prerequisites..................................................................... 103
8.2 ESH Physical Testing ................................................................................................... 103
8.3 ESH Physical Testing Results....................................................................................... 105
8.4 ESH Intelligent Inquiry................................................................................................. 107
International SEMATECH
Technology Transfer # 98023468C-TR
iv
9
FACILITIES INTERFACES ASSESSMENT...................................................................... 110
9.1 Facilities Interfaces Instrumentation/Tools/Prerequisites............................................. 110
9.2 Facilities Interfaces Physical Testing ........................................................................... 110
9.3 Facilities Interfaces Intelligent Inquiry......................................................................... 111
10 COMMUNICATION INTERFACES ASSESSMENTS...................................................... 117
10.1 Instrumentation/Tools/Prerequisites ............................................................................. 117
10.2 Equipment Communication Interfaces Physical Testing.............................................. 117
10.3 Equipment Communication Interfaces Physical Testing Results ................................. 119
10.4 Equipment Communication Interfaces Intelligent Inquiry ........................................... 121
11 GUIDELINE COMPLIANCE TESTING RESULTS SUMMARY..................................... 135
APPENDIX A
Reference Documents..................................................................................... 137
APPENDIX B
Cross Reference Factory Guidance (GL #) to FIMA Section ........................ 141
APPENDIX C
Cross Reference FIMA Section to Factory Guidance (GL #) ........................ 149
APPENDIX D
Acronyms ....................................................................................................... 157
APPENDIX E
Glossary.......................................................................................................... 159
APPENDIX F
Minienvironment Parametric Test Methods ................................................... 161
Technology Transfer # 98023468C-TR
International SEMATECH
v
List of Figures
Figure 1
Figure 2
Figure 3
Figure 4
Figure 5
Figure 6
Figure 7
Figure 8
Figure 9
Figure 10
Figure 11
Figure 12
Figure 13
Figure 14
Figure 15
Figure 16
Figure 17
Figure 18
The Conformance Flowchart................................................................................... 5
Kinematic Coupling Fixtures .................................................................................. 8
Kinematic Coupling Shaped Template.................................................................... 9
Sample Kinematic Coupling Pin ............................................................................. 9
Forklift Exclusion Zone Blocks ............................................................................ 10
10 mm Lead-In Gauge........................................................................................... 10
Example of Improper FOUP Orientations at Time of Loading............................. 14
Example of Acceptable FOUP Orientations at Time of Loading.......................... 14
Exclusion Volumes for ID Readers/Writers .......................................................... 16
E15.1 Critical Dimension Reference..................................................................... 22
Diagram the Location of all Equipment Load Ports and Buffer ........................... 32
OHT Chimney Exclusion Zone............................................................................. 40
Top View of OHT Chimney Exclusion Zone ........................................................ 40
Side View of Cart Docking Exclusion Zone ......................................................... 42
Exclusion Zone Extending the Full Width of Equipment is Required.................. 43
Example of a Photocoupled Device ...................................................................... 44
Datum Point Reference ......................................................................................... 46
Equipment Footprint ........................................................................................... 114
International SEMATECH
Technology Transfer # 98023468C-TR
vi
List of Tables
I300I Load Port Guideline Compliance Assessment Information ................................................ 29
I300I Interfaces For Material Delivery Guideline Compliance Assessment Information ............ 47
I300I Buffering Guideline Compliance Assessment Information................................................. 59
I300I Equipment Capability Guideline Compliance Assessment Information ............................. 75
I300I Productivity Guideline Compliance Assessment Information............................................. 95
I300I Esh Guideline Compliance Assessment Information ........................................................ 105
I300I Facilities Interfaces Guideline Compliance Assessment Information............................... 111
I300I Equipment Communication Interfaces Guideline Compliance Assessment Information . 119
Table F-1
Visual Inspection .................................................................................................... 162
Technology Transfer # 98023468C-TR
International SEMATECH
1
1
EXECUTIVE SUMMARY
The International 300 mm Initiative (I300I) first published guidelines for 300 mm process tool
mechanical interfaces for wafer lot delivery, buffering, and loading in September 1996. Since
then, revisions and expansions of these guidelines were published in June and December 1997,
as well as in July 1998. The latest version of the I300I Factory Guidelines (Version 4.0) includes
enhancements to computer integrated manufacturing (CIM), minienvironment, non-product
wafer, and facilities-related guidelines. This version continues to embody I300I member
company consensus requirements for 300 mm wafer and/or carrier handling and equipment
interfaces. Consequently, the I300I Factory Guidelines forms the basis of what member
companies must ensure equipment suppliers have incorporated into their equipment.
This document is titled I300I Factory Guideline Compliance: Factory Integration Maturity
Assessment for 300 mm Production Equipment (or FIMA). FIMA provides the methodologies for
assessing the level of compliance of 300 mm production or metrology equipment with the I300I
Factory Guidelines. With this revision, the material has been reorganized and updated to provide
assessment methods in a modular format directed at equipment subsystems.
Guideline compliance assessment results help IC manufacturers to predict the compatibility of
equipment with material handling systems and to plan the overall productivity of their factories.
As a key aspect of equipment maturity, it influences equipment selections by I300I member
companies. Compliance is assessed during the equipment maturity assessment step of the I300I
equipment demonstration process (I300I Demonstration Test Method [DTM]).
The FIMA process can be used to evaluate equipment compliance to the I300I Factory
Guidelines. Results summary worksheets, which are included in the document, can be filled out
during each assessment to record the results of specific assessment items, along with conclusions
about the level of guideline compliance. This summary data can be submitted to International
SEMATECH, where it will be entered into a central database for member companies to analyze
and to use to support equipment or product selections.
Please note that this document is now Revision 4.01. There were no revisions 2.0 or 3.0 FIMA
documents. This release of the FIMA is affiliated with the I300I Factory Guidelines –
Version 4.0.
International SEMATECH
Technology Transfer # 98023468C-TR
2
2
INTRODUCTION
2.1
What is this Document?
This document is an assembly of procedures, intelligent inquiry questions, and corresponding
pass/fail criteria for assessing production equipment compliance with the I300I Factory
Guidelines (Version 4.0) and the referenced SEMI Standards (see Appendix E). The I300I
Factory Guidelines define the position of the I300I members on key productivity and factory
integration issues.
2.2
Why is this Document Provided?
The purpose of this compliance document is to address how equipment should be measured
against the guideline requirements. Consequently, this document can help clarify the I300I
Factory Guidelines requirements by describing how guideline-compliant equipment should look.
It enables suppliers to better prepare their equipment for maturity assessment and performance
demonstrations. To achieve the overall guideline compliance of their equipment, production
equipment suppliers can also use this document when assessing compliance of their own
suppliers’ equipment and components.
2.3
What Approach?
The primary approach in this document is to give clarifying information to suppliers of 300 mm
production metrology and interface equipment. It describes the fundamental I300I Factory
Guidelines requirements and provides references to other sections, to the actual I300I Factory
Guidelines, and to the SEMI standards where detailed requirements are located. It also provides
methods for measuring the equipment’s compliance with each guideline requirement.
The secondary approach of the document is as a guide and worksheet for collecting data and
recording results during an equipment maturity assessment (EMA) for production equipment.
The level of guideline compliance indicates the test phase level of the equipment. Update reports
on previous assessments (i.e., action items and/or non-compliance status) can also be useful in
determining the test phase level of the equipment.
2.4
How Should It Be Used/Deployed?
Equipment suppliers are encouraged to incorporate the included pass/fail criteria in their own test
plans when preparing for the first stage of demonstration testing (i.e., the EMA). FIMA is the
document to follow during an EMA for guideline compliance. This assessment can be conducted
at the equipment suppliers’ sites.
FIMA provides two approaches, intelligent inquiry and physical tests, for assessing equipment or
product. The appropriate responses to the stated success criteria for each assessment type are
“Pass” or “Fail.” It is also appropriate to respond with a “Yes” or a “No.” In that case, a “Yes” is
considered to be equivalent to a “Pass”, and a “No” is considered to be a “Fail.” The resulting
responses (Pass, Fail, Yes, or No) should be recorded as each line item assessment is completed.
It is important to note that, in the case of the intelligent inquiry sections, sample questions are
posed to help determine if the guideline has been met. A “No” response to any one of the sample
questions does not necessarily imply that the guideline “Fails.” Compliance to the guideline is
based on the answers provided to the sample and any other questions that may be asked during
an assessment. If an assessment criterion is not met, the reason why should be noted in the
comment space.
Technology Transfer # 98023468C-TR
International SEMATECH
3
2.5
•
Conventions for This Document
Titles of referenced documents and quotations of referenced documents are indicated by
italics.
International SEMATECH
Technology Transfer # 98023468C-TR
4
3
FACTORY GUIDELINE COMPLIANCE OVERVIEW
3.1
Why Should a Supplier Establish a Standards and Guidelines Compliance
Program?
Global joint guidance and standards for critical items are universally considered essential for
making the transition to 300-mm wafers most efficiently and economically. Some benefits that
may be derived from developing standard and guideline-compliant equipment may be, but not
limited to, the following:
•
The end user gets what they want and need.
•
Suppliers are not forced to develop “custom” equipment as in previous wafer size transitions.
•
Communication is enhanced through common and shared learning.
3.2
How Should a Supplier Establish a Standards and Guidelines Compliance
Program?
Semiconductor equipment suppliers could best develop standard and guideline-conformant
equipment through focused programs to address the challenge of developing compliant
equipment. A thorough understanding of the compliance process is required to achieve success
and to ensure that the best equipment is available for the end user. A flowchart of the compliance
process is presented in Figure 1.
The process begins with a search for the standards and guidelines that are applicable to the
equipment being developed. As product development continues, design engineers are tasked with
understanding the requirements of the industry or end users that apply to the designs they are
responsible for creating. Further on, product assessments (i.e., FIMA) are performed to measure
the level of conformance of the design. This process continues until there is an agreed-to
satisfaction with the level of compliance required by the equipment end user.
3.3
How Should a Supplier Prepare for an Assessment?
Equipment suppliers can prepare for assessment in several ways to reduce the assessment time
and improve the assessment results. First, suppliers can perform their own testing according to
the direction given in the FIMA document. Second, the supplier can develop a list of concerns,
issues, and questions during their own testing and forward these to the assessor before he/she
arrives. If this is a re-assessment or a new assessment on a new version of the equipment type,
forward information updates on action items from the previous assessment(s) and references to
the associated non-compliance. Third, the supplier can assemble a folder/package of information
and results from the supplier tests. Include information regarding equipment layouts (with
overall dimensions) and installation notes.
Technology Transfer # 98023468C-TR
International SEMATECH
5
Conformance & the Product Life Cycle
Start
Product Life Cycle
Determine the
Applicable Standards
& Guidelines
Feasibility
Constant Information Flow
Distribute the Applicable
Standards & Guidelines
Design
Read & Understand
the Standards &
Guidelines
Prototype
Develop & Publish
Preliminary Design
Specification
Pilot Production
Read & Understand
the Design
Specification
Production
Assessment
Activities
Living
Conformance
Document
(i.e., FIMA)
Phase Out
Figure 1
The Conformance Flowchart
Before the planned assessment date, it is recommended that the supplier also provide the
following information to the assessor:
•
Questions regarding the assessment procedures, process, and requirements.
•
The supplier’s pre-assessment (i.e., self-assessment) including the pertinent filled-out
assessment worksheet found at the beginning of each assessment section.
•
The names, phone number, and email address of the proper contact owner of the guideline
and standards compliance in the supplier’s company.
•
Any reference documents – i.e., specific standards and guidelines that the supplier’s
equipment design was based on. This should include dated reference documents.
3.4
What Are/Will Be the FIMA Outcome(s) and Deliverables?
Once the FIMA is scheduled, the supplier should use the appropriate worksheet to prepare its
equipment and documentation to support its response (see Section 3.3) during the assessment. A
worksheet is provided in each assessment section to capture the performance against success
criteria and questions. To document overall pass/fail and level of compliance, this data can be
summarized in the compliance results summary table (see Section 11).
International SEMATECH
Technology Transfer # 98023468C-TR
6
The FIMA produces results that may have major impacts on equipment development. Expected
outcomes and deliverable items are
•
an understanding of nonconforming design approaches,
•
a FIMA report, and
•
a Figure of Merit (FOM).
The first two results are generally easy to understand while the last result, FOM, is not and
requires a more detailed explanation. The FOM uses an algebraic algorithm to quantify the
current level of conformance at the time of the assessment.
Each guideline requirement is individually assessed, and a summary conformance rollup is
generated for the eight functional requirement areas. To pass each assessment section, all
Pass/Fail criteria within that section must receive a “Pass.” These details provide information
about the current level and progress of guideline conformance and act as an early communication
vehicle to the International SEMATECH member companies.
The assessment results for specific equipment will be available only to the associated equipment
supplier and the International SEMATECH member companies. Results will not be shared with
other equipment suppliers.
Technology Transfer # 98023468C-TR
International SEMATECH
7
4
MECHANICAL INTERFACES ASSESSMENT
4.1
Load Port Assessment
This section contains a compilation of all of the I300I Factory Integration Guideline items that
directly and specifically pertain to the number, location, function, format, capabilities, and other
requirements for SEMI E15.1 FOUP-compatible load ports.
4.1.1
•
•
•
•
•
•
•
•
•
•
Instrumentation/Tools/Prerequisites
Any SEMI-compliant, 300-mm, 25-wafer, 10-mm pitch FOUP
Metric scale/tape measure
Kinematic coupling fixture (see Figure 2)
Kinematic coupling shaped template (see Figure 3)
Sample kinematic coupling pin (see Figure 4)
Forklift exclusion zone blocks (see Figure 5)
10 mm lead-in gauge (see Figure 6)
Metric feeler gauge set
Spirit level
Equipment footprint and layout drawings
International SEMATECH
Technology Transfer # 98023468C-TR
8
8.070
SCRIBE VERTICAL
’0’ LINE
1.26 DIA THRU
4.528 ± 0.001
DEEP SCRIBE
HORIZONTAL
'0' LINE
3.622 ± 0.001
1.878
1.378
0.750
0.477 + 0.001/-0.000
Thru 6PL
0
1.378
1.878
3.622 ± 0.001
4.528 ± 0.001
6.535
3.690
3.900
.150 ± 0.001
1.638
.520 ± 0.001
0
0.630
.780 ± 0.001
.724 ± 0.001
7.480
8.070
SCRIBE VERTICAL
’0’ LINE
8.070
1.260 DIA THRU
0.630 DIA THRU
6.500
R = 9.449
4.528
DEEP SCRIBE
HORIZONTAL
’0’ LINE
3.622
2.559
1.378
1.181
0
0.480 6PL
1.181
1.378
0.191 DIA
Thru 4PL
2.559
3.622
4.528
6.500
Figure 2
.535
.690
.150
.520
.638
.984
0
.780
.642
.724
.862
.480
8.070
Kinematic Coupling Fixtures
Technology Transfer # 98023468C-TR
International SEMATECH
9
CL
1.25
0.0787R
± 0.004 BLEND
0.0787R
± 0.004 BLEND
0.512 REF
0.5906 R
± 0.002
0.5906 R
± 0.002
Figure 3
1.50
0.237
0
0.237
1.50
0
0.079 ± 0.001
Kinematic Coupling Shaped Template
0.0787R ± 0.004
BLEND
CL
0.0787R ± 0.004
BLEND
0.5906R
± 0.002
0.512
REF
0.5906R
± 0.002
10-32 UNF-2B X 0.3 DP
Figure 4
International SEMATECH
0.0787 ± 0.001
0.472 DIA ± 0.002
Sample Kinematic Coupling Pin
Technology Transfer # 98023468C-TR
10
0.590
0
10-32 THRU
2 PL
2.950
1.568
Forklift Exclusion Zone Blocks
22.0
0
Figure 5
14.25
9.054
1.180
0
0
Figure 6
4.1.2
10 mm Lead-In Gauge
Load Port Physical Testing
The following procedures are designed for use on the equipment being evaluated to quantify the
physical status and performance to key selected guidelines. They should be performed
comprehensively and sequentially, with the output and results logged on the worksheet at the
beginning of Section 4.1.
4.1.2.1 FOUP Compatibility – 300 mm process/metrology equipment must be designed to
support the front opening unified pod (FOUP). The base equipment design must accept
25-wafer FOUPs and be configured for 13- or 25-wafer FOUPs (GL 2.1.1, GL 2.1.2,
GL 2.3.1, GL 2.4.3). (Note: 25-wafer FOUPs are generally preferred and should be
preferentially supplied.)
1) Visually inspect the equipment to determine FOUP compatibility
2) Determine if the equipment is configured for 13- or 25-wafer FOUPs.
3) Visually inspect that the equipment base design is structured to accommodate 25-wafer
FOUPs in size, spacing, frame design, and other relevant areas.
• Pass Criteria:
i)
The equipment is designed to support FOUPs.
ii)
The equipment is configured for either 13- or 25-wafer FOUPs.
iii) The base equipment design accepts 25-wafer FOUPs.
Technology Transfer # 98023468C-TR
International SEMATECH
11
•
Fail Criteria:
i)
IF: The equipment is not designed to support FOUPs.
ii)
OR: The equipment is not configured for 13- or 25-wafer FOUPs.
iii) OR: The base design does not accept 25-wafer FOUP capacity.
4.1.2.2 Minimum Load Port Requirement – All in-line (in processing route) 300 mm
process, metrology, and probe/testing equipment must have a minimum of two E15.1
load ports to meet the buffering requirement. Offline (not in process route) and/or low
use metrology equipment can be configured with one E15.1 load port. In all cases, the
primary load ports must all be on one side (clean bay aisle side) of the equipment to
support automated material handling system (AMHS). (GL 2.6.2, GL 2.6.4, GL 2.9.1)
1) Determine if the equipment is “in-line” or “offline” equipment.
2) Document the number of primary E15.1 load ports.
3) Visually inspect that the primary load ports are all on the clean bay aisle side.
• Pass Criteria: For offline (metrology) equipment, ≥ 1 primary E15.1 load port on
the clean aisle side.
• Pass Criteria: For in-line (process and metrology) equipment, ≥ 2 primary E15.1
load ports on one side to the clean aisle.
• Fail Criteria:
i)
IF: Inline equipment with <2 primary E15.1 load ports.
ii)
OR: The primary load ports on more than one side of the equipment.
iii) OR: The primary load ports are not on the clean aisle side.
4.1.2.3 Permitted Auxiliary Load Ports – 300 mm process/metrology equipment may have
special purpose auxiliary load ports. These load ports can be of two types: Dedicated
“OHT to buffer” load ports (which are required to be on the same side as the primary
load ports, aligned for OHT, and E15.1-compliant except for the 900 mm height
requirement), and a single “auxiliary exception lot/wafer” load port (allowed to be on an
adjacent side, E15.1 compliant, and configured for PGV interface). The auxiliary load
ports are optional and careful consideration should be given to the footprint,
maintainability, and cost impact of installing them on equipment. (GL 2.4.1.1, GL 2.9.2,
GL 2.9.2.1)
1) Visually inspect the equipment to determine if there are any auxiliary load ports installed.
2) Document the number, type, and location of any auxiliary load ports.
3) Investigate the manual settings and software for the dedicated OHT to buffer load port(s) to
see if any other operational mode can be selected or activated, such as manual or PGV.
4) Evaluate the location and alignment of the dedicated OHT to buffer load port(s) in relation to
the primary load ports.
• Pass Criteria: For dedicated OHT to buffer load ports.
i)
The load port(s) are limited to dedicated function between the OHT and
buffer.
ii)
The load port(s) are located on the same side (clean bay aisle side) as the
primary load ports.
International SEMATECH
Technology Transfer # 98023468C-TR
12
iii)
•
•
The load port(s) datum planes are aligned with the primary load ports for
OHT service.
Pass Criteria: For exception lot/wafer load port.
i)
There is ≤ 1 exception lot/wafer load port.
Fail Criteria:
i)
IF: The dedicated OHT to buffer load port(s) allows the selection of other
interface modes, such as PGV.
ii)
OR: The dedicated OHT to buffer load port(s) are not located on the same
side as the primary load ports.
iii) OR: The FOUP datum plane of the dedicated OHT to buffer load port(s) is
not aligned with the primary load ports.
iv) OR: There is more than one auxiliary exception lot/wafer load port.
4.1.2.4 Load Port Features – Each SEMI E15.1 load port for 300 mm must include the
following functions: bi-directional operation so that each load port can interchangeably
act as an input or output port, kinematic coupling to ensure positive placement and
positioning of the FOUP, exclusion zones for ID reader(s) (for the FOUP/carrier and
wafer) as part of the design to allow for the implementation of a variety of technology
solutions, discrete FOUP present and FOUP in position sensors for positive operational
control, and a configuration to handle FOUPs with 10 mm pitch in size, position, and
transfer mechanisms. (GL 2.4, GL 4.2.1, GL 3.1.6.3, GL 4.2.6, GL 3.1.6.2, GL 2.2.4,
GL 4.2.5, GL 2.2.2)
1) Determine if the equipment has an internal buffer.
2) If it does not, then bi-directional load port functionality will be tested during slot-to-slot
carrier integrity testing in Section 6.2.1; no further testing is required here.
3) If the equipment does include an internal buffer, perform the following steps:
a) Evaluate the equipment ability to use the same port bi-directionally as follows:
i)
Place a FOUP with at least one wafer on load port #1 (LP1).
ii)
Using the standard operating method, have the lot moved into the buffer.
iii) Using the standard operating method, initiate wafer processing.
iv) When wafer processing is complete, the processed FOUP must be
automatically returned back to load port #1 (LP1).
v)
Repeat steps i) through iv) for each load port (for 1 to N), ensuring that in
each case the FOUP is returned to the originating load port and that each
port is capable of acting as a load and unload port, and record the results.
b) Evaluate the equipment’s ability to use different available ports interchangeably as
follows:
i)
Place a FOUP with at least one wafer on load port #1 (LP1).
ii)
Using the standard operating method, have the lot moved into the buffer.
iii) Once the FOUP has been moved into the buffer, make LP1 unavailable by
placing another FOUP on the load port.
iv) Using the standard operating method, initiate wafer processing.
Technology Transfer # 98023468C-TR
International SEMATECH
13
v)
When wafer processing is complete, the processed FOUP must be
automatically returned back to an available load port.
vi) Repeat steps i) through v) for a sample of load port combinations to ensure
that the equipment is capable of interchangeably using available load ports
for load and unload, and record the results.
c) Pass Criteria:
i)
If the equipment does not have an internal buffer and passes slot-to-slot
carrier integrity testing as defined and evaluated in Section 6.2.1.
ii)
If the equipment does have an internal buffer:
a) Every load port is capable of accepting a FOUP as input, loading that lot to the
buffer, after processing return the lot to the same load port as output positioned
at the load port pickup point.
b) The equipment is capable of interchangeably using any available load port as a
load or unload position.
d) Fail Criteria:
i)
IF: The equipment does not have internal buffering and failed the
slot-to-slot carrier integrity test in Section 6.2.1.
ii)
OR: The equipment does have internal buffering, but one or more of the
load port positions cannot act as both an input and an output (same load
port, same FOUP).
iii) OR: The equipment does have internal buffering, but one or more of the
load port positions cannot act as an interchangeable input and output (any
port in to any port out).
4) Inspect the kinematic coupling alignment to the equipment, ensuring that the FOUP door is
parallel to the equipment boundary and load face plane at the time of loading. Figure 7 shows
examples of improperly oriented FOUPs. Figure 8 shows examples of correctly oriented
FOUPs.
5) Evaluate the kinematic coupling placement orientation using the following steps:
a) Place the kinematic coupling fixture on load port #1 (LP1).
b) Does the fixture mate with the coupling correctly?
c) Does the fixture front (straight 16-inch) surface align parallel with the equipment
boundary?
d) Can the fixture rest flush with the horizontal datum plane?
e) Repeat steps a) through d) for each load port (for 1 to N), documenting the results.
6) Inspect the finish of the kinematic coupling pins using the following steps:
a) Visually compare the finish of the load port kinematic coupling pins on load
port #1 to the finish of the kinematic coupling fixture or if necessary the sample
kinematic coupling pin.
b) The finish of the load port pins should be visually equivalent to the fixture or
sample pin.
c) Repeat the above steps for each load port (for 1 to N), documenting the results.
International SEMATECH
Technology Transfer # 98023468C-TR
14
7) Evaluate the shape and dimensions of the kinematic coupling pins using the following steps:
a) Place the kinematic coupling shaped template on each of the pins in load port #1.
b) Is it the right dimensions (diameter and height)?
c) Is it the right shape (taper and rounding)?
d) If necessary, use the sample kinematic coupling pin for comparison.
e) Repeat steps a) through d) for each load port (for 1 to N) and document the
results.
Equipment
Example #1
Equipment
Example #3
Equipment
Example #2
1
25
FO
UP
D+D
25
FO
UP
25 FOUP
25 FOUP
25 FOUP
25 FOUP
Not allowed
Equipment
Example #4
25
FO
UP
Equipment
Example #5
25
FO
UP
Equipment
Example #6
25
FO
UP
25 FOUP
Figure 7
25
FO
UP
25 FOUP
Example of Improper FOUP Orientations at Time of Loading
Some Loadport designs that MEET Standards
Note: Sketches below show loadport orientation at time of FOUP
Load/Unload
D+D-
Equipment
Example A
2
FOU
5
P
Equipment
Example B
2
FOU
5
P
2
F OU
5
P
2
F OU
5
P
Equipment
Example C
2
F OU
5
P
2
F
5 OU
P
2
FOU
5
P
2
F
5 OU
P
2
F OU
5
P
This area by
< 2600 mm
high
Equipment
Example D
2
F OU
5
P
Equipment
Example E
2
F OU
5
P
2
FOU
5
P
2
FOU
5
P
Equipment
Example F
2
FOU
5
P
2
FOU
5
P
2
F OU
5
P
2
FOU
5
P
This area by
< 2600 mm
high
Figure 8
Example of Acceptable FOUP Orientations at Time of Loading
Technology Transfer # 98023468C-TR
International SEMATECH
15
•
Pass Criteria:
i)
The kinematic coupling alignment orientation places the FOUP door
parallel to the equipment boundary.
ii)
Every load port mates with the kinematic coupling fixture correctly.
iii) At every load port the kinematic coupling fixture rests flush with the
horizontal datum plane.
iv) At every load port the finish on the kinematic coupling pins is visually
equivalent to the finish of the kinematic coupling fixture or the sample
kinematic coupling pin.
v)
At every load port the shape and dimensions of the kinematic coupling pins
is correct as measured by the kinematic coupling shaped template and in
comparison to the sample coupling pin.
•
Fail Criteria:
i)
IF: The kinematic coupling alignment orientation does not place the FOUP
door(s) parallel to the equipment boundary.
ii)
OR: Any load port does not mate with the kinematic coupling fixture
correctly.
iii) OR: At any load port the kinematic coupling fixture does not rest flush with
the horizontal datum plane.
iv) OR: Any of the coupling pins at any of the load ports do not have the
correct finish.
v)
OR: The shape and dimensions of any of the coupling pins at any of the
load ports is not correct.
8) Inspect each load port against design parameters to ensure that an exclusion zone has been
reserved for the installation of a FOUP ID reader/writer according to SEMI E15.1. Using a
metric scale, collect the following measurements (as illustrated in Figure 9).
a) For fixed buffer (i.e., load ports only) equipment
i)
For read-only carrier ID technologies the exclusion zone must allow the
reader to be oriented to scan a FOUP when the carrier is at the pickup
position (i.e., load/unload position).
ii)
Verify that the volume width, W4 times 2, for the advance mechanism at the
load/unload position is ≥ 150 mm.
iii) Verify that the volume height, H4 (80 mm), for the ID reader exclusion
volume at the load/unload position, plus H3 (15 mm) is ≥ 95 mm.
iv) For load ports with read/write capability: The exclusion zone must allow the
read/writer to be oriented to scan a carrier when the carrier is at the FIMS
position. The load port must have the capability to lock the FOUP in place
while writing to the ID.
v)
Verify that the volume width, W4 times 2, for the advance mechanism for
reader/writing at the FIMS (docked) position is ≥ 70 mm.
vi) Verify that the volume height, H4 (30 mm), for the ID reader exclusion
volume at the FIMS (docked) position, plus H3 (0) is ≥ 30 mm.
International SEMATECH
Technology Transfer # 98023468C-TR
16
equipment
boundary above
H1
equipment
boundary below
H1
carrier
footprint
C1
≥75
C1
≥75
C2
≥30
C2
≥30
wafer centroid
facial datum plane
3.Exclusion
Volumes
D0
≥110
load
face
plane
W1 ≤130
W2 ≥205
W4
≥75 {35}
[35 (75)]
equipment
boundary above H1
bilateral
datum plane
carrier (cassette or box)
D3
D4
≤190 {165} ≥235 {205}
[136 (136)] [165 (206)]
wafer
Equipment Boundary
below H1
C1
≥75
H1
≤25
H3 ≥ 15 {0} [15 (0)]
≤ 36 {75} [75 (0)]
H0 ≥15
W4
≥75 {35}
[35 (75)]
horizontal
datum
plane
W1 ≤130
bilateral datum plane
(wafer centroid)
Figure 9
W2 ≥205
exclusion volume for fork-lifts
H4
≥80 {30}
[30 (300)]
volume that may be temporarily
occupied by the advance mechanism
exclusion volume for an ID
reader/writer on the rear [bottom] of
the carrier in the undocked {docked}
position on a loadport that advances
(does not advance) the carrier
forward
Exclusion Volumes for ID Readers/Writers
Technology Transfer # 98023468C-TR
International SEMATECH
17
•
Pass Criteria:
i)
There is an identified design exclusion zone for a carrier ID reader at every
load port.
ii)
For read-only carrier ID technologies the exclusion zone is positioned to
allow carrier reading at the load port load/unload pickup position with the
correct exclusion zone height/width dimensions as in ii) and iii) of section
a) above.
iii) For read/writer carrier ID technologies the exclusion zone is positioned to
allow carrier read/writing at the FIMS position with the correct exclusion
zone height/width dimensions as in v. and vi. of section a) above.
iv) For read/writer carrier ID technologies the load port provides a lock down
feature to lock the carrier in place at the FIMS position while writing to the
ID.
v)
The exclusion zone does not infringe on any other critical clearance or
space requirements for the load port as defined in SEMI E15.1.
•
Fail Criteria:
i)
IF: The equipment does not have an identified, designed-in exclusion zone
at each load port for the installation/addition of an FOUP/wafer ID reader.
ii)
OR: The exclusion zone does not allow the reader to read the FOUP ID at
the load station pickup point.
iii) OR: The exclusion zone does not allow the read/writer to read/write the
FOUP ID at the FIMS position
iv) OR: The exclusion zone does not meet critical dimensions, as described in
section a) above.
v)
OR: The load port does not provide a lock down feature to lock down the
carrier at the FIMS position while writing to the ID
vi) OR: The exclusion zone infringes on any other critical dimension,
clearance, or space requirement as defined in SEMI E15.1.
b) For internal buffer equipment
i)
For read-only carrier ID technologies the exclusion zone must allow the
reader to be oriented to scan a FOUP when the FOUP is at the pickup
position (i.e., load/unload position).
ii)
Verify that the volume width, W4 times 2, for the advance mechanism at the
load/unload position is ≥ 150 mm.
iii) Verify that the volume height, H4 (80 mm), for the ID reader exclusion
volume at the load/unload position, plus H3 (15 mm) is ≥ 95 mm.
iv) For carrier ID writing the internal buffer must support an internal position
for the ID writer equipment at all internal FIMS port locations within the
buffer. The internal buffer/FIMS port must have the capability to lock the
FOUP in place while writing to the ID.
International SEMATECH
Technology Transfer # 98023468C-TR
18
•
Pass Criteria:
i)
There is an identified design exclusion zone for a carrier ID reader at every
load port.
ii)
For read-only carrier ID technologies the exclusion zone is positioned to
allow carrier reading at the load port pickup position with the correct
exclusion zone height/width dimensions as in ii) and iii) of section b) above.
iii) For read/writer carrier ID technologies the internal buffer supports an
internal position for the ID write equipment at all internal FIMS port
locations within the buffer.
iv) For read/writer carrier ID technologies the load port provides a lock down
feature to lock the carrier in place at each internal FIMS port location while
writing to the ID.
v)
The exclusion zone does not infringe on any other critical clearance or
space requirements for the load port as defined in SEMI E15.1.
•
Fail Criteria:
i)
IF: The equipment does not have an identified, designed-in exclusion zone
at each load port for the installation/addition of an FOUP ID reader.
ii)
OR: The exclusion zone does not allow the reader to read the FOUP ID at
the load station pickup point.
iii) OR: The exclusion zone does not allow the read/writer to read/write the
FOUP ID at the internal buffer FIMS port location.
iv) OR: The exclusion zone does not meet critical dimensions, as described in
section b) above
v)
OR: The load port does not provide a lock down feature to lock down the
carrier at the internal buffer FIMS port location while writing to the ID
vi) OR: The exclusion zone infringes on any other critical dimension,
clearance, or space requirement as defined in SEMI E15.1.
9) Each load port must have separate and distinct (i.e., independently operating) sensors for
presence and placement. This is important for product safety reasons, because a FOUP could
be present on a load port without being properly positioned, creating a jeopardy situation for
loading/unloading. Evaluate the presence, position, and function of the FOUP present and
FOUP position sensors using the following steps:
a) Place a FOUP correctly on load port 1 (LP1).
b) Is the FOUP present OK indicator light visible while standing facing the load
port?
c) Is the FOUP position OK indicator light visible while standing facing the load
port?
d) Are the indicator lights properly and visibly labeled?
e) Position the FOUP off center to the right by approximately 7 cm. The FOUP
present sensor light should turn ON, and the FOUP position sensor light should
remain OFF.
Technology Transfer # 98023468C-TR
International SEMATECH
19
f) Position the FOUP off center to the left by approximately 7 cm. The FOUP
present sensor light should turn ON, and the FOUP position sensor light should
remain OFF.
g) Position the FOUP off center forward (toward the equipment boundary) by
approximately 3 cm. The FOUP present sensor light should turn ON, and the
FOUP position sensor light should remain OFF.
h) Improperly position the FOUP by rotating it 90° counterclockwise. The FOUP
present sensor light should turn ON, and the FOUP position sensor light should
remain OFF.
i) Improperly position the FOUP by rotating it 90° clockwise. The FOUP present
sensor light should turn ON, and the FOUP position sensor light should remain
OFF.
j) Repeat steps a) through i) for each load port (for 1 to N), documenting the results.
•
Pass Criteria:
i)
The load port has discrete FOUP present and FOUP position sensors and
corresponding indicator lights for each sensor.
ii)
The FOUP present and position indicator lights are visible while standing
facing the load port.
iii) The FOUP present sensor is active any time a FOUP is on the load port,
whether it is positioned correctly or not.
iv) The FOUP position sensor accurately identifies correct and incorrect
positioning.
•
Fail Criteria:
i)
IF: The load ports do not have discrete FOUP present and position sensors.
ii)
OR: The FOUP present and position indicator lights are not visible while
standing in front of the load port.
iii) OR: The FOUP present sensor does not accurately identify that a FOUP is
present.
iv) OR: The FOUP position sensor does not accurately identify when a FOUP
is in the correct position.
10) Observe that the load port(s), buffer, and transport mechanisms are compatible with FOUPs
with 10 mm pitch using the following steps:
a) Place a SEMI compliant 300 mm 25-wafer 10 mm pitch FOUP on load port 1
(LP1).
b) During normal operation, observe that the physical dimensions of the load port,
FOUP transport path, FIMS interface seal area, and any other mechanical
clearance areas of the equipment design are compatible with the size of 10 mm
pitch FOUPs.
c) During normal operation, observe the wafer transfer from the FOUP to the
processing environment, evaluating the compatibility of the wafer transfer
mechanisms to the FOUP 10 mm pitch.
International SEMATECH
Technology Transfer # 98023468C-TR
20
•
•
Pass Criteria:
i)
The equipment mechanical clearances accommodate the size of a FOUP
with 10 mm pitch.
ii)
The wafer transfer mechanism is compatible with 10 mm wafer pitch.
Fail Criteria:
i)
IF: Any mechanical clearance in the FOUP transport/handling pathway
touches any part of the 10 mm pitch FOUP.
ii)
OR: Buffer positions are the wrong size for 10 mm pitch FOUPs.
iii) OR: The wafer transfer mechanism is not properly spaced for 10 mm pitch.
iv) OR: During wafer transfer the transfer mechanism causes or allows
mechanical damage to the wafers because of pitch.
4.1.2.5 E15.1 Compliance – 300 mm process/metrology equipment load port(s) must meet the
requirements of SEMI E15.1 in functionality, critical dimensions, and static testing,
with a specific emphasis on the dimensions “D” and “D1.” For load ports that are
dedicated to OHT to buffer interface, an exemption is granted to the “H” dimension
requirement to allow for this function. The spacing between load ports must
accommodate the size and spacing to allow for the use of human handles. (GL 2.4.1, GL
2.10.2, GL 2.4.1.1, GL 2.3.5)
1) Ensure that the equipment has passed the kinematic coupling alignment to equipment
requirements of Section 4.1.3.4, Step #4 before proceeding with this test.
2) Place the kinematic coupling fixture on each load port sequentially using a spirit level ensure
that each load port is level.
3) Investigate the forklift exclusion zone using the following steps:
a) Place the kinematic coupling fixture on load port 1 (LP1) and when it is correctly
positioned, visually note its specific positioning.
b) Remove the kinematic coupling fixture and attach the forklift exclusion zone
blocks to the bottom.
c) Place the kinematic coupling fixture with forklift exclusion zone blocks onto LP1,
and visually examine that it is in the same position as previously (without the
zone blocks).
d) Note any features or dimensions that interfere with item c) above.
e) Repeat steps a) through d) for each load port (for 1 to N), and record the results.
4) Verify the height of each load port using the following steps:
a) If it is a primary load port or the auxiliary exception lot port.
i)
Using a metric scale, measure the distance from the floor to the horizontal
datum plane of LP1.
ii)
Verify that the height “H” is equal to 900 mm.
iii) Verify that the height “H” can be adjusted between 890 mm and 910 mm.
iv) Repeat steps i) through iii) for each standard height load port (for 1 to N),
and record the results.
Technology Transfer # 98023468C-TR
International SEMATECH
21
b) If it is a dedicated OHT to buffer load port:
i)
Using a metric scale, measure the distance from the floor to the horizontal
datum plane and record the height “H.”
ii)
Place a 25-wafer FOUP on the buffer load port.
iii) Use a metric scale to measure the distance from the floor to the top of the
robot-handling flange on the FOUP.
iv) Verify that the height “H2” is ≤ 2600 mm.
v)
Repeat step i) through iv) for each dedicated OHT to buffer load port (for 1
to N), and record the results.
5) Verify the critical dimensions of each E15.1 load port using the following steps:
a) Place the kinematic coupling fixture on load port #1 (LP1).
b) Using a metric scale and the reference markings on the kinematic coupling
fixture, collect the following measurements (as illustrated in Figure 10 and
Figure 7).
i)
“S” is the distance between load ports, measured between corresponding
coupling pins to the right adjacent port.
ii)
“C1” is the side clearance space between one FOUP envelope (including
human handles) and another, or to a vertical obstruction. It can be measured
between the side edge of the kinematic coupling fixture and the nearest
vertical obstruction or load port outer edge.
iii) “C2” is the rear clearance space between the carrier envelope to a vertical
obstruction. It can be measured between the front edge of the kinematic
coupling fixture and the outer-most protrusion of the equipment (i.e., the
closest vertical equipment surface parallel to the facial datum plane and
above the E15.1 load port).
iv) “H” is the allowable load height to the bottom of the carrier envelope (i.e.,
the distance from the floor to the horizontal datum plane, measured from the
floor to the bottom of the kinematic coupling fixture).
v)
“H1” is the maximum height of a horizontal obstruction above the load
height, “H” (900 mm), between the load face plane and the carrier envelope.
vi) “H2” is the maximum height of any assembly or equipment element
adjacent to the load port (outside of the OHT exclusion zone) and in front of
the equipment boundary (i.e., into the cleanroom).
vii) “D” is the distance from the facial datum plane to the load face plane, where
the load face plane coincides with the equipment feature farthest into the
cleanroom.
viii) “D1” is the distance from the facial datum plane to the equipment boundary
(i.e., the closest vertical equipment surface parallel to the facial datum plane
and above the E15.1 load port).
ix) Repeat step i) through viii) for each load port (for 1 to N), measuring every
critical dimension and recording the results.
International SEMATECH
Technology Transfer # 98023468C-TR
22
overhead
track
clearance
D1 =200+10
–4
bilateral
datum
planes
(wafer
centroids)
volume
for E84
parallel
I/O device
floor
facial
datum
plane
(wafer
centroid)
H2
≤2600
wafer
carrier
horizontal
datum
plane
equipment
boundary
C1
≥75
C2
≥30
H1
≤25
S
≥420 (open cassette)
≥475 (box without handles)
≥505 (box with handles)
W 8≥100
Figure 10
H7 H8
=250 ≥50
H
=900
D =250+0
–10
D7
≤450 D8
≥30
wafer
carrier
front
load
face
plane
docking
interface
(see E64)
E15.1 Critical Dimension Reference
Technology Transfer # 98023468C-TR
International SEMATECH
23
•
•
Pass Criteria:
i)
All load ports are level.
ii)
The forklift exclusion zone is free of obstruction and correct.
iii)
All primary and exception lot load port(s) height “H” = 900 mm.
iv)
All primary and exception lot load port(s) adjustment range is 890 to
910 mm.
v)
All dedicated OHT to buffer load ports height “H2” is ≤ 2600 mm.
vi)
All load ports meet all critical dimension requirements as defined in
paragraph 5 of the procedures.
Fail Criteria:
i)
IF: Any load ports are not level.
ii)
OR: Any load port forklift exclusion zone is incorrect or has obstructions
that prevent proper operation.
iii)
OR: Any primary or exception lot load port height “H” is not 900 mm.
iv)
OR: Any primary or exception lot load port adjustment range is larger than
or outside the boundaries 890 mm to 910 mm.
v)
OR: Any dedicated OHT to buffer load port height “H2” is > 2600 mm.
vi)
OR: Any load port of any type does not meet the E15.1 critical dimension
requirements as defined in paragraph 5 of the procedures and Figure 10.
4.1.2.6 FIMS Compliance – 300 mm process/metrology equipment that does not include an
internal buffer requires that each load port have a dedicated door opening mechanism
that must meet the requirements of the front-opening interface mechanical standard
(FIMS). For equipment with internal buffering, FIMS interface(s) must be present at the
position where the wafers are removed from the pod and enter the processing
environment. The pod open/close functionality must be integrated so that the pod
automatically engages the FOUP hold down and the front opening interface, and the
functional cycle is fully automated. If the equipment requires load locks, the minimum
number, bi-directional requirement, and relationship to the FIMS interface must be met.
(GL 2.3.2, GL 2.6.2.1, GL 2.7.2.1, GL 2.7.2.2, GL 2.6.2.2)
1) Visually inspect the equipment to determine if it has an internal buffer.
2) For equipment without buffering, evaluate the functionality and compliance of the FIMS
interface using the following steps:
a) Note that there should be one FIMS interface for each load port.
b) Place a FOUP on load port 1 (LP1).
c) Ensure that both the FOUP present and position indicators are on.
d) Before the FIMS keys attempt to unlock the FOUP door, test the load port
clamping mechanism by gently pulling on the FOUP to make sure it cannot be
removed from the load port.
International SEMATECH
Technology Transfer # 98023468C-TR
24
e) When the pod has engaged the FIMS interface, and the FOUP door has been
removed, evaluate the position of the FOUP-to-FIMS seal using the following
steps:
i)
Visually inspect the FOUP-to-FIMS mating to ensure that there are no
visible gaps.
ii)
If a gap is visually present use a feeler gauge to measure the size of the gap
and record the value(s).
f) Visually observe that when the FOUP has engaged the FIMS interface, the FIMS
registration pins mate correctly with the FOUP door. Check for missing, damaged,
or misaligned FOUP doors. The equipment should not proceed with processing if
the FOUP door does not mate properly.
g) Visually observe the FIMS door open cycle, using the following steps:
i)
The FIMS keys must engage with the FOUP and unlock the FOUP door.
ii)
The FOUP door should be removed from the FOUP and securely stored in a
location that will not interfere with wafer transfer by a wafer-handling
robot.
iii)
Once the door is open, the FOUP must expose the wafers to a
minienvironment controlled or active process area.
h) After the process cycle has completed and the wafers have been transferred back
to the open FOUP, visually observe the FIMS door close cycle using the following
steps:
i)
The door must return to the FOUP opening, with good alignment.
ii)
The FIMS interface should seal and lock the FOUP door, and disengage the
door opener.
iii)
The load port and FIMS interface should disengage, returning each of them
to the position they held before the load cycle started.
iv)
Once the load port had returned to the pickup point, verify that the clamping
mechanism has disengaged by gently pulling on the FOUP, which should
now be free to move.
i) Using a metric scale, verify that the load port dimensions “D” and “D1” are the
same as previously assessed.
j) Repeat steps a) through h) for each load port (for 1 to N), documenting the results.
3) For equipment with internal buffering, evaluate the functionality and compliance of the
buffer FIMS interface using the following steps:
a) Use the load port to place one or more FOUPs into the equipment buffer.
b) Use the equipment control system to move a FOUP to the buffer FIMS interface,
visually observing that the transfer is without interruption or interference.
c) Visually observe that the buffer FIMS must engage a clamping mechanism to
maintain dimensional stability during opening, transfer and closing.
Technology Transfer # 98023468C-TR
International SEMATECH
25
d) When the pod has engaged the FIMS interface, evaluate the position of the
FOUP-to-FIMS seal using the following steps:
i)
Visually inspect the FOUP-to-FIMS mating to ensure that there are no
visible gaps.
ii)
If a gap is visually present use a feeler gauge to measure the size of the gap
and record the value(s).
e) Visually observe that when the FOUP has engaged the FIMS interface, the FIMS
registration pins mate correctly with the FOUP door.
f) Visually observe the FIMS door open cycle, using the following steps:
i)
The FOUP door should be removed from the FOUP and securely stored in a
location that will not interfere with wafer transfer by a wafer-handling
robot.
ii)
Once the door is open, the FOUP must expose the wafers to a
minienvironment controlled or active process area.
g) Visually observe that during the process cycle the FOUP is handled and stored
correctly using the following steps:
i)
The buffer FIMS should close the empty FOUP, using the following door
close cycle:
a) The door must return to the FOUP opening, with good alignment.
b) The FIMS interface should seal and lock the FOUP door and disengage
the door opener.
c) The FOUP transfer mechanism and FIMS interface should disengage,
returning each of them to the idle position they held before the load cycle
started.
d) Once the FOUP transfer mechanism had returned to the pickup point,
verify that the clamping mechanism has disengaged by gently pulling on
the FOUP, which should now be free to move.
h) After the process cycle has completed, visually observe that the equipment control
system has retrieved the empty FOUP from the buffer (if stored there during
processing) and positioned it at the buffer FIMS interface, having used the steps
in f) to have the FOUP open and ready for post production wafers.
i) After the wafers have been transferred back to the FOUP from the processing
environment, visually observe that the pod door is closed using the steps in g).
j) Visually observe that once the FOUP and FIMS interface have disengaged, the
FOUP transfer mechanism returns the FOUP to a load port as output.
k) Using a metric scale, verify that the load port dimensions “D” and “D1” are the
same as previously assessed after receiving the output FOUP from the buffer.
l) Repeat step a) through k) for each buffer FIMS interface (for 1 to N),
documenting the results.
International SEMATECH
Technology Transfer # 98023468C-TR
26
•
•
Pass Criteria:
i)
The clamping mechanism engages before the FIMS keys attempt to unlock
the FOUP door.
ii)
When the FOUP has engaged the FIMS, the registration pins mate correctly.
iii)
The FOUP door is unlocked and stored securely out of the way.
iv)
At no time are the wafers exposed to an uncontrolled environment outside
the FOUP.
v)
The FOUP door aligns and closes without any problem.
vi)
The FOUP is returned to the initial point, and the clamping mechanism is
disengaged.
vii)
If the equipment includes buffering, the FOUP is returned to the load port
for unloading.
Fail Criteria:
i)
IF: The clamping mechanism does not engage before the FIMS keys
attempt to unlock the FOUP door.
ii)
OR: When the FOUP has engaged the FIMS, the registration pins do not
mate correctly.
iii)
OR: The FOUP door not stored securely out of the way.
iv)
OR: The wafers exposed to an uncontrolled environment outside the FOUP.
v)
OR: The FOUP door does not aligns for closing.
vi)
OR: The clamping mechanism does not disengage.
vii)
OR: The FOUP does not return to the initial point.
viii) OR: If the equipment includes buffering, the FOUP does not return to the
load port for unloading.
4) For equipment with load locks, evaluate the compliance of the load lock, load port and FIMS
interface using the following steps:
a) For equipment with fixed buffer (i.e., no internal buffer):
i)
Determine if there is a corresponding load lock for each load port/FIMS
interface.
ii)
Assess the FIMS interfaces according to section 2) a) through 2) f) above,
using a FOUP at all load ports simultaneously.
iii)
When the wafers are transferred from the FOUPs at each load ports/FIMS
to the load locks, note whether the wafers are transferred to the
corresponding or another load lock.
Technology Transfer # 98023468C-TR
International SEMATECH
27
iv)
Note whether each load port / load lock / FIMS interface groups operate
independently of other load port / load lock / FIMS interface groups. (i.e.,
one load port / load lock / FIMS interface group can operate with the other
load port and/or load lock empty or down.)
v)
Complete assessment of the FIMS interfaces according to section 2) g)
through 2) h).
b) For equipment with an internal buffer:
i)
Determine if there is a corresponding load lock for each load port/FIMS
interface.
ii)
Assess the FIMS interfaces according to section 3) a) through l) above.
c) Determine if another method other than corresponding load port / load lock /
FIMS interfaces with independent operation for each group has been used to
provide continuous processing.
•
Pass Criteria:
i)
There is a corresponding load lock for each load port/FIMS interface.
ii)
The load port/load lock/FIMS interface groups can operate independently
from each other.
iii)
The clamping mechanism engages before the FIMS keys attempt to unlock
the FOUP door.
iv)
The FOUP seals to the FIMS properly.
v)
When the FOUP has engaged the FIMS, the registration pins mate correctly.
vi)
The FOUP door is unlocked and stored securely out of the way.
vii)
At no time are the wafers exposed to an uncontrolled environment outside
the FOUP.
viii) The FOUP door aligns and closes without any problem.
ix)
The FOUP is returned to the initial point, and the clamping mechanism is
disengaged.
x)
If the equipment includes buffering, the FOUP is returned to the load port
for unloading.
International SEMATECH
Technology Transfer # 98023468C-TR
28
•
Fail Criteria:
i)
IF: There is not a corresponding load lock for each load port/FIMS
interface.
ii)
OR: The load lock/load port/FIMS interface groups cannot operate
independently of each other and there is not other equipment internal
support mechanization for continuous processing.
iii)
OR: The clamping mechanism does not engage before the FIMS keys
attempt to unlock the FOUP door.
iv)
OR: The FOUP seal to the FIMS leaves a visible or measurable gap.
v)
OR: When the FOUP has engaged the FIMS, the registration pins do not
mate correctly.
vi)
OR: The FOUP door not stored securely out of the way.
vii)
OR: The wafers exposed to an uncontrolled environment outside the FOUP.
viii) OR: The FOUP door does not aligns for closing.
ix)
OR: The clamping mechanism does not disengage.
x)
OR: The FOUP does not return to the initial point.
xi)
OR: If the equipment includes buffering, the FOUP does not return to the
load port for unloading.
Technology Transfer # 98023468C-TR
International SEMATECH
29
4.1.3
Load Port Physical Testing Results
Complete the assessment information table below.
I300I Load Port Guideline Compliance Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Load Port Supplier
Load Port Model
3rd party Buffer Supplier (if used)
Buffer Model # (if supplied by 3rd party)
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
30
4.1.3.1 FOUP Compatibility: 300 mm process/metrology equipment must be designed to
support the front opening unified pod (FOUP). The base equipment design must accept
25-wafer FOUPs and be configured for 13- or 25-wafer FOUPs. (GL 2.1.1, GL 2.1.2,
GL 2.3.1, GL 2.4.3) (Note: 25-wafer FOUPs are generally preferred and should be
preferentially supplied.)
Assessment Detail
Results
Is the equipment FOUP compatible?
Pass/Fail
Criteria
Compliance
Yes
Is the equipment configured for 13 or 25-wafer FOUPs?
(note which)
13 or 25
Does the base design accept 25-wafer FOUPs?
Yes
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.1.3.2 Minimum Load Port Requirement: All in-line (in processing route) 300 mm process,
metrology, and probe/testing equipment must have a minimum of two E15.1 load ports
to meet the buffering requirement. Offline (not in process route) and/or low use
metrology equipment can be configured with one E15.1 load port. In all cases, the
primary load ports must all be on one side (clean bay aisle side) of the equipment to
support automated material handling system (AMHS). (GL 2.6.2, GL 2.6.4, GL 2.9.1)
Assessment Detail
Is the equipment “in-line” or “offline?”
Results
Pass/Fail
Criteria
Compliance
Either
Number of primary load ports for in-line equipment?
≥2
Number of primary load ports for offline equipment?
≥1
Are the primary load ports on one side of the equipment, for
clean bay aisle access?
Yes
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
31
4.1.3.3 Permitted Auxiliary Load Ports: 300 mm process/metrology equipment may have
special purpose auxiliary load ports. These load ports can be of two types: dedicated
OHT to buffer load ports (which are required to be on the same side as the primary load
ports, aligned for OHT, and E15.1-compliant except for the 900 mm height
requirement) and a single auxiliary exception lot/wafer load port (allowed to be on an
adjacent side, E15.1-compliant, and configured for PGV interface.) The auxiliary load
ports are optional and careful consideration should be given to the footprint,
maintainability, and cost impact of installing them on equipment. (GL 2.4.1.1, GL 2.9.2,
GL 2.9.2.1)
Assessment Detail
Results
Pass/Fail
Criteria
Does this equipment have auxiliary load ports?
N/A
Number of auxiliary dedicated OHT to buffer load ports?
N/A
Number of auxiliary exception-lot load ports?
≤1
Are the dedicated OHT load ports on same side of the
equipment as the primary load ports?
Yes
Are the dedicated OHT load ports’ datum planes aligned
with the primary load ports for OHT service?
Yes
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
32
Label the primary load ports with a “LP” and the port number (i.e., LP1), the dedicated OHT
load ports with “BP” and the port number (i.e., BP3), the auxiliary exception lot load port with
“EP” (if such a port exists) and the port number (i.e., EP6). If the equipment has load locks, draw
and label them with “LL” and the number (i.e., LL1), and label the buffer “Buffer” (see
Figure 11).
Equipment Boundary
To Be Filled Out During Assessment
Pump
Package
LP1
LP2
Buffer
Equipment
Body
(Note:
must be
within 2
meters of
tool body)
BP3
Equipment Boundary
Example of How Drawing Could be Filled Out and Labeled
Figure 11
Diagram the Location of all Equipment Load Ports and Buffer
Technology Transfer # 98023468C-TR
International SEMATECH
33
4.1.3.4 Load Port Features: Each SEMI E15.1 load port for 300 mm must include the
following functions: bi-directional operation so that each load port can interchangeably
act as an input or output port, kinematic coupling to ensure positive placement and
positioning of the FOUP, exclusion zones for ID reader(s) (for the FOUP/carrier and
wafer) as part of the design to allow for the implementation of a variety of technology
solutions, discreet FOUP present and FOUP in position sensors for positive operational
control, and be configured to handle FOUPs with 10 mm pitch in size, position and
transfer mechanisms (see Figure 10). (GL 2.4, GL 4.2.1, GL 3.1.6.3, GL 4.2.6, GL
3.1.6.2, GL 2.2.4, GL 4.2.59, GL 2.2.2)
Assessment Detail
For equipment without buffering, does the
load port meet bi-directional operation as
tested in Section 6.2.1?
For equipment with buffering, does the
load port meet bi-directional requirements
unloading to the same port?
For equipment with buffering, does the
load port meet bi-directional requirements
unloading to a different port?
Does the kinematic coupling position the
FOUP so the door is parallel to the
equipment boundary?
Does the load port mate (i.e., pin and hole
alignment) with the kinematic coupling
fixture correctly?
Is the finish on the kinematic coupling
pins correct?
Are the kinematic coupling pins the
correct size and shape?
Does the FOUP present sensor exist and
work correctly?
Does the FOUP off center left test pass?
Does the FOUP off center right test pass?
Does the FOUP off center forward test
pass?
Does the FOUP off center clockwise test
pass?
Does the FOUP off center
counterclockwise test pass?
Does the FOUP position sensor work
correctly?
Does the load port operate compatibly
with FOUPs that have 10 mm pitch?
LP1*
LP2 LP3 LP4 LP5 LP6
For Fixed Buffer Equipment (i.e., load ports only)
Does the load port design include an
exclusion zone for an FOUP ID reader?
Is the ID reader exclusion zone positioned
to allow the ID reader to read FOUPs at
the pickup position?
International SEMATECH
Pass/Fail
Criteria
Yes
Compliance
Yes
Yes
Yes or N/A, if
the tool has an
internal buffer
Yes
Yes
Yes
Yes
Yes
Yes
Yes
Yes
Yes
Yes
Yes
Yes
Yes
Technology Transfer # 98023468C-TR
34
Assessment Detail
LP1*
Does the ID reader exclusion zone infringe
on any other critical dimension of the load
port?
Does the load port incorporate an ID
reader only or ID reader/writer?
Measure dimension “W4” (≥ 75 mm for
reader only and ≥ 35 mm for reader/writer)
times 2, on the load port.
LP2 LP3 LP4 LP5 LP6
Pass/Fail
Criteria
No
Compliance
N/A
≥ 150 mm for
reader only and
≥ 70 mm for
reader/ writer
≥ 95 mm for
reader only and
≥ 30 mm for
reader/ writer
Yes if ID writer
used
Measure dimension “H4” (≥ 80 mm fore
reader only and ≥ 30 mm for reader/writer)
plus “H3” (≥15 mm for reader only and ≥
0 mm for reader/writer), on the load port.
Does the load port provide a lock down
feature to lock the FOUP in place at the
FIMS position while writing?
For Internal Buffer Equipment
Does the load port design include an
exclusion zone for an FOUP ID reader?
Is the ID reader exclusion zone positioned
to allow the ID reader to read FOUPs at
the pickup position?
Does the ID reader exclusion zone infringe
on any other critical dimension of the load
port?
Does the load port incorporate an ID
reader only or ID reader/writer?
Yes
Yes
No
N/A
≥ 150 mm for
reader only
≥ 95 mm for
reader only
Measure dimension “W4” (≥ 75 mm for
reader only) times 2, on the load port.
Measure dimension “H4” (≥ 80 mm fore
reader only) plus “H3” (≥15 mm for reader
only), on the load port.
Does the internal buffer provide an
internal position for a ID reader/writer at
the FIMS port locations within the buffer?
Does the load port provide a lock down
feature to lock the FOUP in place at the
FIMS position while writing?
Yes if ID writer
used
Yes if ID writer
used
Overall Compliance
* Enter the appropriate load port ID’s using the notation from the layout diagram in additional columns.
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
35
4.1.3.5 E15.1 Compliance: 300 mm process/metrology equipment load port(s) must meet the
requirements of SEMI E15.1 in functionality, critical dimensions and static testing, with
a specific emphasis on the dimensions “D” and “D1.” For load ports that are dedicated
to an OHT interface, an exemption is granted to the “H” dimension requirement to
allow for this function. The spacing between load ports must accommodate the size and
spacing to allow for the use of human handles (see Figure 10). (GL 2.4.1, GL 2.10.2,
GL 2.4.1.1, GL 2.3.5)
Dimension Reference
Assessment Detail
LP1* LP2 LP3 LP4 LP5 LP6
Pass/Fail
Criteria
Is the load port level?
Yes
Is the forklift exclusion zone correct?
Yes
Measure dimension “H” on standard height
ports
Compliance
900 mm
Is the height adjustment range for “H”
correct?
890 mm to
910 mm
Measure dimension “H” on OHT height
ports
N/A
Measure dimension “H2” on OHT height
ports
≤ 2600 mm (to
top of FOUP)
Measure dimension “S” between ports
≥ 505 mm
Measure dimension “C1” on the load port
≥ 75 mm
Measure dimension “C2” on the load port
≥ 30 mm
Measure dimension “H1” on the load port
≤ 25 mm
Measure dimension “D” on the load port
250 mm +0/-10
Measure dimension “D1” on the load port
200 mm +10/-4
Overall Compliance
* Enter the appropriate load port ID’s using the notation from the layout diagram in additional columns.
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
36
4.1.3.6 FIMS Compliance: 300 mm process/metrology equipment that does not include an
internal buffer requires that each load port have a dedicated door opening mechanism
that must meet the requirements of the FIMS standard. For equipment with internal
buffering, FIMS interface(s) must be present at the position where the wafers are
removed from the pod and enter the processing environment. The pod open/close
functionality must be integrated so that the pod automatically engages the FOUP hold
down and the front opening interface, and the functional cycle is fully automated. If the
equipment requires loadlocks, the minimum number, bi-directional requirement, and
relationship to the FIMS interface must be met. (GL 2.3.2, GL 2.6.2.1, GL 2.7.2.1, GL
2.7.2.2, and GL 2.6.2.2)
Assessment Detail
LP1*
LP2
LP3
LP4
LP5
Pass/Fail
LP6 Criteria Compliance
Is there one FIMS interface for each load port?
Yes
OPENING: Does the FOUP clamping
mechanism engage prior to the FIMS door
key?
Yes
OPENING: Visually inspect the FOUP to
FIMS mating surfaces for visible gaps
N/A
N/A
OPENING: Measure any visible gaps and
record value
N/A
N/A
OPENING: Do the FIMS registration pins
engage properly
Yes
OPENING: Does the FIMS key engage and
unlock the door properly?
Yes
OPENING: Is the FOUP door securely stored
out of the wafer transfer path?
Yes
OPENING: With the FOUP door open, are the
wafers exposed only to active process or
minienvironment areas?
Yes
CLOSING: Does the door return to the FOUP
well aligned?
Yes
CLOSING: Does the FIMS seal, lock and
disengage from the door properly?
Yes
CLOSING: Do the FOUP and FIMS return to
the proper resting-place?
Yes
CLOSING: Does the clamping mechanism
disengage properly?
Yes
After the cycle is complete, measure “D”
250 mm
+0/-10
After the cycle is complete, measure “D1”
200 mm
+10/-4
For equipment with buffers, record if after
wafer transfer, the empty FOUP is returned to
buffer?
N/A
For equipment with buffers, is the empty
FOUP retrieved and positioned properly for
unloading at the buffer port?
N/A
Technology Transfer # 98023468C-TR
International SEMATECH
37
Assessment Detail
LP1*
LP2
LP3
LP4
LP5
Pass/Fail
LP6 Criteria Compliance
For equipment with buffers, after processing is
the FOUP transferred to an output load port?
Yes
For equipment with load locks, is there a
corresponding load lock for each load port?
Yes
For equipment with load locks, can the load
port / load lock / FIMS interface operate
independently?
Yes
Overall Compliance
* Enter the appropriate load port ID’s using the notation from the layout diagram in additional columns.
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.1.4
Load Port Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion and supporting documentation and other materials. Each of the guideline
items represents an expectation or requirement for 300 mm equipment. Sample questions found
below serve as the basis to begin these discussions. The questions should also help to clarify the
intent and expectation of the guideline and the acceptable proof of compliance.
4.1.4.1 Equipment designs must allow cost-effective conversion of equipment from 13- to
25-wafer carriers. (GL 2.1.3)
Sample Questions:
a) Is there a documented conversion procedure?
b) Is there a consolidated and costed conversion parts kit?
c) What is the cost estimate for conversion in materials and labor?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
38
4.1.4.2 Equipment with internal buffers must allow loading/unloading of exception lots in
the same manner as production lots using FOUP and E15.1* load ports. (GL 3.1.2)
Sample Questions:
a) How does your equipment handle exception lots in the buffer?
b) Do they follow the normal production protocol via the primary load ports and
interface?
c) What percentage of load port duty cycle or buffer capacity did you assume for
exception lot handling?
d) What assumptions did you base exception lot handling on for equipment design?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.1.4.3 Equipment Suppliers must design, demonstrate, and ensure that load ports are
interoperable with multiple suppliers of wafer carriers/pods and AMHS systems.
(GL 2.3.3)
Sample Questions:
a) How have you ensured interoperability with FOUPs?
b) How have you ensured interoperability with AMHS systems?
c) What verification methods did you use?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
39
4.1.4.4 All pods are required to have a robotic handling flange; therefore,
process/metrology equipment must be compatible with this pod shape and size.
(GL 2.3.4)
Sample Questions:
a) Does your load port and/or buffer setup move the pod flange inside of the
equipment boundary?
b) If so, do you have an exclusion zone for the robotic flange in the movement path?
c) What is the minimum dimension of the vertical flange clearance in the transfer
path?
d) Where is that minimum clearance?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.2
Interfaces for Material Delivery Assessment
This section contains elements of the I300I Factory Guideline regarding the requirements for the
interfaces between the material delivery equipment and the production equipment. Much of these
requirements involve feature/attributes of equipment load ports and, therefore, compliance may
cite assessment procedures in Section 4.1 on load ports.
4.2.1
Interfaces for Material Delivery Instrumentation/Tools/Prerequisites
None.
4.2.2
Interfaces for Material Delivery Physical Testing
4.2.2.1 OHT Exclusion Zone – All in-line 300 mm process/metrology equipment must be able
to accept delivery from OHT systems. The equipment design must include exclusion zones for
OHT delivery. (GL 2.5.1, GL 2.5.1.1, GL 2.5.2, GL 2.5.3)
1) Visually evaluate the AMHS exclusion zone using the following steps:
a) Verify that there are no obstructions in the OHT chimney (see Figure 12 and
Figure 13) extending vertically along the equipment boundary from the top of the
FOUP to the ceiling.
b) Verify that no assembly or part of the equipment infringes on the OHT chimney,
such as the user interface, door opener registration pins, lightstack, handles, EMO
button, etc.
2) Determine that the equipment supports concurrent interface with OHT as well as floor-based
delivery systems.
International SEMATECH
Technology Transfer # 98023468C-TR
40
Bay wall
Equipment
boundary
There can be no
obstructions,
temporary or
permanent, in this
hatched “chimney.”
D
D1
Load
face
plane
Furthermost permanent
protrusion defines the
“load face plane.”
Could be EMO button,
light tower, display
panels, etc.
E15.1
Load port
E84 Device
Exclusion Space
200
100
FL
100
≤ 450
Figure 12
OHT Chimney Exclusion Zone
Process Equipment
S
Wall
D1
Facial datum plane
D
Load face plane
C1
C1
There can be no
obstructions, temporary
or permanent, in the
hatched region
surrounding the pod
Figure 13
Top View of OHT Chimney Exclusion Zone
Technology Transfer # 98023468C-TR
International SEMATECH
41
•
•
Pass Criteria:
i)
The OHT chimney extends vertically along the equipment boundary from
the top of the FOUP to the ceiling without any infringements or
obstructions.
ii)
The equipment supports concurrent interface with OHT and floor-based
systems.
Fail Criteria:
i)
IF: The OHT chimney does not extend vertically to the ceiling without any
infringements or obstructions.
ii)
OR: The equipment does not support concurrent interface with OHT and
floor-based systems.
4.2.2.2 Cart Docking Interface – All in-line 300 mm process/metrology equipment must be
able to accept delivery from floor based transport systems. The equipment design must include
exclusion zones for PGV interface delivery. The E15.1 load ports must include load face plane
alignment marks or labels to facilitate easy equipment alignment. (GL 2.5.1, GL 2.14.1, GL
2.14.2, and GL 2.14.3)
1) Visually evaluate the AMHS exclusion zone using the following steps:
a) Verify that there are no potential obstructions between the load face plane and the
position of any potential floor-based delivery system (see Figure 14).
b) Inspect the load face plane for temporary (e.g., retractable keyboards,
maintenance panels, keys, or diskette) and permanent obstructions (e.g.,
keyboards, user interface screens, light stacks, EMO buttons, etc) (see Figure 14).
2) Using a metric scale and visual inspection, verify the critical dimensions of the cart docking
exclusion zone using the following steps:
a) Measure the cart docking interface exclusion zone height, “Lh” ≥ 100 mm (see
Figure 14).
b) Measure the cart docking interface exclusion zone depth, “Ld” ≥ 100 mm (see
Figure 14).
c) Measure the photocoupled device exclusion zone height, nominally ≥ 300 mm
(see Figure 14).
d) Visually verify that the cart docking interface exclusion zone extends the full
equipment width and is free of obstructions (see Figure 15). Note: Equipment
features (i.e. tool leveling supports, wiring harnesses, etc) should not encroach
upon or compromise the cart docking exclusion zone.
e) Visually verify that the cart docking interface area is free of trip hazards.
International SEMATECH
Technology Transfer # 98023468C-TR
42
Equipment Boundary
Load Face Plane
E84 Communication
Device
SEMI E15.1
Load Port
Bottom of Communication Device = 200 mm
Top of Docking Exclusion Zone = 100 mm
Floor
Depth of Dock Ex. Zone = 100 mm minimum
Figure 14
•
Lh
Ld
Side View of Cart Docking Exclusion Zone
Pass Criteria:
i)
The load face plane is free of potential temporary and permanent
obstructions that may interfere with floor based delivery systems.
ii)
The cart docking interface exclusion zone height, “Lh” ≥ 100 mm.
iii) The cart docking interface exclusion zone depth, “Ld” ≥ 100 mm.
iv) The photocoupled device exclusion zone height is nominally from 200 mm
to 300 mm above floor, “H7” ± “H8”.
v)
The cart docking interface exclusion zone extends the full equipment width.
vi) The cart docking interface exclusion zone is free of trip hazards.
Technology Transfer # 98023468C-TR
International SEMATECH
43
Tool 1
Tool 3
Chase
Side
Tool 2
Wall
Bay
Side
Docking
Exclusion Zone
Required Under
Port
Figure 15
•
Docking
Exclusion Zone
Required Along
Full width of
Tool
Docking
Exclusion Zone
Required Under
User Interface
Exclusion Zone Extending the Full Width of Equipment is Required
Fail Criteria:
i)
IF: The load face plane has any potential temporary and permanent
obstructions that may interfere with floor based delivery systems.
ii)
OR: The cart docking interface exclusion zone height, “Lh” < 100 mm.
iii)
OR: The cart docking interface exclusion zone depth, “Ld” < 100 mm.
iv)
OR: The photocoupled device exclusion zone height does not include the
vertical space from 200 mm to 300 mm above the floor.
v)
OR: The cart docking interface exclusion zone does not extend the full
equipment width.
vi)
OR: The cart docking interface exclusion zone is not free of trip hazards.
4.2.2.3 Photocoupled Interface – All in-line 300 mm process/metrology equipment must
include photocoupled devices (refer to SEMI Draft 2913A) at each load port and as a parallel I/O
capability for OHT interface (see Figure 16). (GL 2.13.3, GL 2.13.3.1, GL 4.2.2).
1) Visually evaluate the photocoupled interface using the following steps:
a) Visually inspect each load port to verify that the equipment has a photocoupled
sensor/connection for interface communication to the transport device at each
port.
b) Visually inspect that there is an photocoupled sensor/connection for interface
communication to the OHT transport device or a connection for installation that
meets the parallel I/O requirements.
International SEMATECH
Technology Transfer # 98023468C-TR
44
•
•
Pass Criteria:
i)
The equipment has a photocoupled sensor at each load port.
ii)
There is a photocoupled sensor or a connection for installation of that
sensor that meets the parallel I/O requirement for communication to the
OHT transport device.
Fail Criteria:
i)
IF: The equipment does not have a photocoupled sensor at each load port.
ii)
OR: The equipment does not have a photocoupled sensor or connection for
installation that meets the parallel I/O requirement for communication to the
OHT transport device.
Figure 16
Example of a Photocoupled Device
4.2.2.4 Equipment Installation Alignment – All in-line 300 mm process/metrology equipment
must be able to accept delivery from floor-based and OHT systems. The E15.1 load ports must
include load face plane (front most surface of equipment, including load ports – see Figure 12)
alignment marks or labels to facilitate easy equipment alignment. A variety of alignment and
positioning distances and relationships must be evaluated to facilitate equipment alignment. (GL
2.10.1, GL 2.10.1.1, GL 2.10.1.2, GL 2.10.2)
1) Visually inspect that a mark or label on the load ports identifies the load face plane.
2) Using equipment drawings, evaluate the footprint dimensions for installation alignment using
the following steps
a) Record the distance between the load face plane and the equipment datum point,
Ay, from the equipment drawings provided by the supplier (see Figure 17).
Technology Transfer # 98023468C-TR
International SEMATECH
45
b) Record the distance between each bilateral datum plane and the equipment datum
point; Bx1, Bx2, Bx3, Bx4 from the equipment drawings provided by the
supplier, if applicable (see Figure 17).
c) Record the distance between the equipment outside boundary and the equipment
datum point; Ax, from the equipment drawings provided by the supplier, if
applicable (see Figure 17).
d) Record the distance between the facial datum plane, equipment boundary and the
equipment datum point, By and Cy, from the equipment drawings provided by the
supplier (see Figure 17).
e) Ensure that the drawing number, revision number, and revision date are recorded
for each of the drawings used above.
•
Pass Criteria:
i)
•
A procedure exists that allows for easy alignment of the tool and load ports.
Fail Criteria:
i)
IF: A procedure does not exist that allows for easy alignment of the tool and
load ports.
International SEMATECH
Technology Transfer # 98023468C-TR
46
Ax
Bx1
Use Bx3, Bx4 for
load ports 3 and 4
Bx2
Equipment
Datum Point
Cy
By
Ay
Equipment
Boundary
Facial Datum
Plane
25 FOUP
25 FOUP
Bilateral Datum
Planes
Figure 17
Technology Transfer # 98023468C-TR
Load Face
Plane
Datum Point Reference
International SEMATECH
47
4.2.3
Interfaces for Material Delivery Physical Testing Results
Complete the assessment information in the table below.
I300I Interfaces for Material Delivery Guideline Compliance Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Supplier
Model
3rd party Buffer Supplier (if used)
Buffer Model # (if supplied by 3rd party)
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
48
4.2.3.1 OHT Exclusion Zone: All in-line 300 mm process/metrology equipment must be able
to accept delivery from overhead hoist transport (OHT) systems. The equipment design
must include exclusion zones for OHT delivery. (GL 2.5.1, GL 2.5.1.1, GL 2.5.2, and
GL 2.5.3)
Assessment Detail
Results
Pass/Fail
Criteria
No obstructions in the OHT easement chimney.
Yes
No equipment infringements to OHT easement chimney.
Yes
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.2.3.2 Cart Docking Interface: All in-line 300 mm process/metrology equipment must be
able to accept delivery from floor-based transport systems. The equipment design must
include exclusion zones for PGV interface delivery. (GL 2.5.1, GL 2.14.1, GL 2.14.2,
GL 2.14.3)
Assessment Detail
Results
Pass/Fail
Criteria
The load face plane is clear for floor based AMHS access?
Yes
Measure the cart docking exclusion zone dimension “Lh”.
≥ 100 mm
Measure the cart docking exclusion zone dimension “Ld”.
≥ 100 mm
Measure the photocoupled sensor exclusion zone dimension
per SEMI E15.1.
200 mm to
300 mm
(minimum)
Cart docking exclusion zone runs across the full equipment
width? Note: Equipment features (i.e. tool leveling
supports, wiring harnesses, etc) should not encroach upon
or compromise the cart docking exclusion zone.
Yes
Cart docking exclusion zone free of trip hazards?
Yes
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
49
4.2.3.3 Photocoupled Interface: All in-line 300 mm process/metrology equipment must
include photocoupled devices at each load port and as a parallel I/O capability for an
OHT interface. (GL 2.13.3, GL 2.13.3.1, GL 4.2.2)
Assessment Detail
LP1* LP2 LP3 LP4 LP5 LP6
Pass/Fail
Criteria
Is there an exclusion zone identified for a
photocoupled (or equivalent) device?
Yes
Does each load port have a photocoupled
device attached?
Yes
Do any I/O, software, and/or wire runs exist
on the primary load ports? Note in comment
section below.
N/A
Is there a photocoupled device or connection
for each load port meeting the parallel I/O
requirement for OHT interfaces?
Yes
Compliance
Overall Compliance
* Enter the appropriate load port ID’s using the notation from the layout diagram in additional columns.
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.2.3.4 AMHS Installation Alignment: All in-line 300 mm process/metrology equipment
must be able to accept delivery from floor-based and OHT systems. The E15.1 load
ports must include load face plane alignment marks or labels to facilitate easy
equipment alignment. A variety of alignment and position distances and relationships
must be evaluated to facilitate equipment alignment. (GL 2.5.1, GL 2.10.1, GL 2.10.1.1,
GL 2.10.1.2)
Assessment Detail
Results
Pass/Fail
Criteria
Do you have a procedure that facilitates alignment of the tool
and load ports?
Yes
Obtain the equipment dimension “Ay.”
N/A
Obtain the equipment dimension “By.”
N/A
Obtain the equipment dimension “Cy.”
N/A
Obtain the equipment dimension “Ax” (equipment width).
N/A
Record the drawing number used for equipment dimensions.
N/A
Record the drawing revision number.
N/A
Record the drawing revision date.
N/A
International SEMATECH
Compliance
Technology Transfer # 98023468C-TR
50
Assessment Detail
LP1* LP2 LP3 LP4 LP5 LP6
Obtain the equipment dimension “Bx_” for each
of the load ports, including auxiliary ports.
Pass/Fail
Criteria
Compliance
N/A
Overall Compliance
* Enter the appropriate load port ID’s using the notation from the layout diagram in additional columns.
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.2.4
Interfaces for Material Delivery Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion with the support of documentation and other materials. Each of the
guideline items represents an expectation or requirement for 300 mm equipment. Sample
questions below serve as the basis to begin these discussions. The questions also help to clarify
the intent and expectation of the guideline and the acceptable proof of compliance.
4.2.4.1 Load Ports must be capable of physical connection and use by overhead hoist transport
(OHT) and floor-based (manual and/or automated) material delivery systems. Design
considerations should be in place that prohibits simultaneous access of the load port at
any given time. (GL 2.5.1.)
Sample Questions:
a) Are the primary load ports capable of supporting both OHT and PGV interface?
b) Are the primary load ports capable of supporting both AGV and PGV interface?
c) What design considerations are present that disallow simultaneous access of the
load port at any given time?
d) What approach or solution did you use?
e) Has the capability been demonstrated?
f) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
51
4.2.4.2 Equipment that includes vertical buffers may include supplemental load ports at the top
dedicated to OHT to buffer transfer. (GL 2.5.4)
Sample Questions:
a) Does your equipment design include supplemental OHT to buffer load ports?
b) If so, how many?
c) Are these ports E15.1*-compliant except for the 900 mm height requirement?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
4.2.4.3 Alignment of equipment for OHT is based on the alignment of the equipment front face.
It must be possible to line up the load face plane of all load ports of all equipment along
one side of a bay to support ground based transport vehicle delivery. The load face
plane must be identified by a mark or label on load ports to allow for easy alignment of
equipment. (GL 2.10.1)
Sample Questions:
a) What are the tool and load port alignment procedures?
b) What is the method and are all required marks, fixtures, etc. available?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
52
5
BUFFERING ASSESSMENT
This section contains a compilation of all of the I300I Factory Guideline items that directly and
specifically pertain to the requirement for and evaluation of the size of process material
buffering, to ensure continuous processing. It requires that the previous evaluation sections be
completed as a precursor.
5.1
•
Buffering Instrumentation/Tools/Prerequisites
Equipment footprint and layout drawings.
5.2
Buffering Physical Testing
5.2.1
Requirement for Buffering – 300 mm in-line process/metrology equipment is required
to handle and store enough production material at the local level to ensure continuous
(non-stop) processing capability for a 25 minute worst case AMHS delivery scenario
(i.e., 95% of all lots will be delivered in 25 minutes or less). The minimum acceptable
solution is two E15.1 primary load ports, with additional load port(s) or internal buffer
requirements being identified through analysis of throughput rate, batch size,
material/empty FOUP/exception lot handling, and other capability/implementation
variables. The requirements for the handling/storage of empty FOUPs, exception lots,
and non-production wafers should not be overlooked. The width of the load ports or
buffer must not exceed the maximum width of the equipment (GL 2.6.2). Note: These
requirements are based on the “process chamber” being at a 100% duty cycle.
NOTE: The buffer calculations use the variables defined in the I300I Factory Integration Guidelines.
The variables must be used as defined for correct results. Any additional variables are
defined in the procedure where it is used.
1) Visually determine that the equipment meets the minimum requirement of two primary E15.1
load ports, in a “1 + 1” (in process + queue) layout.
2) Visually determine that the width of the installed load ports or buffer does not exceed the
maximum width of the equipment.
3) Determine if the equipment needs more than the minimum of two primary load ports, using
the following steps:
a) Record the equipment process throughput in wafers per hour (WPH).
b) Record the wafer capacity of the FOUP being used as Bsize.
c) Determine that the process batch size is ≤ Bsize.
d) Calculate the number of AMHS deliveries required per hour (DR) using the
formula WPH/Bsize = DR.
e) If DR ≤ 2.4, then no additional load ports or buffering is required beyond the
minimum.
Technology Transfer # 98023468C-TR
International SEMATECH
53
4) For equipment that requires more than the minimum two primary load ports, but does not
include internal buffering, determine if the continuous processing capability is met using the
following steps:
a) For equipment with process batch sizes less than the FOUP load size:
i)
Record the number of primary load ports (#P).
ii)
Calculate the number of AMHS deliveries required per hour (DR) using the
formula WPH/Bsize = DR.
iii) Calculate the number of worst case AMHS deliveries possible (DP) using
the formula DP = 60 (min/Hr)/25 (min) * (#P - 1) or DP = 2.4 * (#P – 1).
iv) If DR is ≤ DP, then the number of primary load ports meets or exceeds the
design requirement.
b) For equipment with process batch sizes larger than the FOUP load size:
i)
Record the number of primary load ports (#P).
ii)
Calculate the number of lots per process batch (X) using the formula X =
L/Bsize, where L = process batch size in wafers per process batch.
iii) Calculate the number of full process batches (BP) supported by the number
of primary load ports using the formula BP = #P/X, rounding down to the
nearest integer.
iv) Calculate the number of worst case AMHS batch deliveries possible (DPb)
using the formula DPb = (2.4/1 - 1/2.4) * (BP - 1) or DPb = 2 * (BP - 1).
v)
Calculate the number of AMHS batch deliveries required per hour (DRb)
using the formula DRb = (WPH/L).
vi) If DRb is ≤ DPb, then the number of primary load ports meets or exceeds
the design requirement.
5) For equipment with at least the minimum two load ports and internal buffering, evaluate the
size of the wafer buffer in the worst case delivery time (DT = 25 minutes) scenario using the
following steps:
a) Record the number of internal buffer positions available for lots in process and in
internal buffer production queue (B). Load Port positions NOT included.
b) Calculate the number of lots per process batch (X) using the formula X = L/Bsize.
c) Determine and record the number of batches in process simultaneously, IPX.
d) Calculate the queue (Y), or number of lots that can be processed during 1 average
delivery time period (DT), where Y = X * N, with N (number of batches
processed during 1 average delivery time period, DT) calculated as below:
i)
N = (DT * WPH)/(L * 60) rounded up to the nearest integer, and
ii)
Using worst-case (wc) delivery time DT=25 min, Nwc = WPH/(L * 2.4),
rounded up to the nearest integer.
e) Calculate the worst-case buffering requirements (Br) using the formula Br = (X *
IPX) + (X * Nwc).
f) If B ≥ Br, then the buffer size meets or exceeds the design requirements.
International SEMATECH
Technology Transfer # 98023468C-TR
54
NOTE: Any equipment that has only two primary load ports must use a process batch size equal to or smaller
than the number of wafers in one FOUP (Bsize).
NOTE: In the two load port case, only one port is available for interaction with the AMHS, so the worst case
delivery rate is equal to the 1 hour divided by the worst case delivery time, i.e., 60 min/25 min = 2.4
deliveries per hour.
NOTE: For equipment that has more that two primary load ports, but no internal buffer, the delivery rate is an
independent multiple of the two load port rate, modified by the batch size. So if the process batch size
for the equipment is ≤ Bsize, then the delivery rate (DR) would be: # not in process ports * 2.4. For
equipment with a process batch size > Bsize, determine the number of port locations required for one
batch, then divide the number of load ports available by the number of ports required for each batch
(rounding down to a whole integer) to determine virtual batch ports (BP), and apply a linked dependent
multiple of 2.4 to the virtual batch port combinations available, DPb = (2.4/1 - 1/2.4) * (BP - 1) or
DRb = 2 * (BP - 1). The expression (2.4/1 - 1/2.4) represents a reduction in delivery rate based on the
probability of worst case delivery interaction to deliver a partial rather than a full batch.
•
Pass Criteria:
i)
If the equipment has the required minimum of two E15.1 load ports in a “1
+ 1” layout.
ii)
The equipment has two load ports that meet the buffering requirement, or
iii) The equipment has more than two load ports and no internal buffer, but the
number of load ports meets the buffering requirement, or
iv) The equipment has an internal buffer in addition to the two or more load
ports, and the size of the buffer meets the buffering requirement.
v)
The width of the installed load ports or buffer does not exceed the
maximum width of the equipment.
•
Fail Criteria:
i)
IF: The equipment does not have the minimum required load ports.
ii)
OR: The two load ports do not meet the buffering requirement, and no other
solution has been designed in (see below).
iii) OR: The number of load ports installed without an internal buffer does not
meet the buffering requirement.
iv) OR: The internal buffer size does not meet the buffering requirement size.
v)
OR: The width of the installed load ports or buffer exceeds the maximum
width of the equipment.
Technology Transfer # 98023468C-TR
International SEMATECH
55
5.2.2
Buffer FIMS Compliance – 300 mm equipment, that includes an internal buffer in the
design, is required to include at least two bi-directional FIMS interfaces between the
buffer and the active process area or other equipment internal support mechanism for
continuous processing/duty cycle and to incorporate an operator-selectable local or
maintenance mode so that lots can be removed from the buffer in case equipment fails
(GL 2.6.2.1, GL 3.2.1.3)
1) Verify that the internal buffer includes at least two bi-directional FIMS interfaces or other
equipment internal support mechanism for continuous processing/duty cycle, using the
following steps:
a) Visually inspect the internal buffer, and document the number of FIMS interfaces.
b) Verify that the FIMS interfaces meet compliance requirements and are bi-directional as
tested in Section 4.1.3.6, paragraph 3.
c) Determine if other equipment, in lieu of two FIMS interfaces, has been incorporated to
support continuous processing.
2) Verify that the control system includes a local/maintenance mode for the internal buffer using
the following steps:
a) Visually inspect the user interface for a clearly identified buffer local/maintenance mode.
b) Evaluate if the local/maintenance mode is available on all user interfaces, including the
auxiliary.
3) Evaluate the operation of the buffer local/maintenance mode using the following steps:
a) Use the control system to enter the local/maintenance mode, recording the number of
steps required to enter the mode.
b) Evaluate if the local/maintenance mode supports single step operation.
c) Evaluate if the local/maintenance mode supports semi-automated operation.
d) Verify the operation of the local/maintenance mode by using it to move material from the
buffer to one or more load ports.
•
Pass Criteria:
i)
The internal buffer has at least two bi-directional FIMS interfaces.
ii)
The buffer FIMS interfaces meet the compliance criteria in section 4.1.2.6,
paragraph 3.
iii) The control system includes a local/maintenance mode for use in unloading
the buffer during equipment failure.
iv) The local/maintenance mode is available on the primary user interface as a
minimum.
v)
The local/maintenance mode supports both single step and semi-automated
operation.
vi) The local/maintenance mode is able to move lots to the load port for
disposition.
International SEMATECH
Technology Transfer # 98023468C-TR
56
•
Fail Criteria:
i)
IF: The internal buffer has < two FIMS interfaces.
ii)
OR: The FIMS interfaces are not bi-directional
iii) OR: The FIMS interfaces do not meet compliance criteria in Section
4.1.3.6, paragraph 3.
iv) IF: The equipment does not have a buffer local/maintenance mode.
v)
OR: The local/maintenance mode is not available at the primary user
interface.
vi) OR: The local maintenance mode does not allow single step and semiautomated operation.
vii) OR: During testing it is unable to move a lot from the buffer to a load port.
5.2.3
Buffer Kinematic Couplings Compliance –Inspect the kinematic couplings at each
internal FIMS interface port employed inside internal buffers. (GL 2.2.4, GL 4.2.7)
1) Evaluate the kinematic coupling placement orientation using the following steps:
a) Place the kinematic coupling fixture on an internal FIMS port location.
b) Does the fixture mate with the coupling correctly?
c) Can the fixture rest flush with the horizontal datum plane?
d) Repeat steps a) through c) and internal FIMS port location, documenting the
results.
2) Inspect the finish of the kinematic coupling pins using the following steps:
a) Visually compare the finish of the kinematic coupling pins at the internal FIMS
port #1 to the finish of the kinematic coupling fixture or if necessary the sample
kinematic coupling pin.
b) The finish of the kinematic coupling pins should be visually equivalent to the
fixture or sample pin.
c) Repeat the above steps for each internal FIMS port (for 1 to N), documenting the
results.
3) Evaluate the shape and dimensions of the kinematic coupling pins using the following steps:
a) Place the kinematic coupling shaped template on each of the pins in internal
FIMS port #1.
b) Is it the right dimensions (diameter and height)?
c) Is it the right shape (taper and rounding)?
d) If necessary, use the sample kinematic coupling pin for comparison.
e) Repeat steps a) through d) for each load port (for 1 to N), documenting the results.
•
Pass Criteria:
i)
Every internal FIMS port location mates with the kinematic coupling fixture
correctly.
ii)
At every internal FIMS port location the kinematic coupling fixture rests
flush with the horizontal datum plane.
Technology Transfer # 98023468C-TR
International SEMATECH
57
iii)
iv)
•
At every internal FIMS port location the finish on the kinematic coupling
pins is visually equivalent to the finish of the kinematic coupling fixture or
the sample kinematic coupling pin.
At every internal FIMS port location the shape and dimensions of the
kinematic coupling pins is correct as measured by the kinematic coupling
shaped template and in comparison to the sample coupling pin.
Fail Criteria:
i)
IF: Any internal FIMS port location does not mate with the kinematic
coupling fixture correctly.
ii)
OR: At any internal FIMS port location the kinematic coupling fixture does
not rest flush with the horizontal datum plane.
iii) OR: Any of the coupling pins at any of the internal FIMS ports do not have
the correct finish.
iv) OR: The shape and dimensions of any of the coupling pins at any of the
internal FIMS port location is not correct.
5.2.4
1)
2)
3)
4)
5)
6)
7)
8)
Simple, Reliable Buffers – 300 mm equipment internal buffer design, compliant with
E15.1 easement space requirements, must be simple and reliable as well as consume
minimal footprint (GL 2.6.5, GL 2.12.1, GL 2.12.5).
Determine and document the total number of FOUP storage bins in the internal buffer.
Determine and document the number of FOUP movement mechanisms in the buffer.
Determine and document the average number of movement axes per FOUP movement
mechanism.
Calculate the number of FOUP movement mechanisms per FOUP storage bin.
Determine and document the number of maintenance access panels and doors on the nonload port sides of the buffer.
Determine and document the number of maintenance access panels and doors on the load
port sides of the buffer.
Estimate the percentage of maintenance tasks that require access at the load port side of the
buffer.
Using equipment footprint and layout drawings, evaluate the following buffer dimensions
and ratios:
a) Record the number of FOUP storage locations per buffer, Nlb.
b) Record the maximum buffer width, “Wb.”
c) Record the maximum buffer depth, “Db.”
d) Record the maximum buffer height, “Hb.”
e) Calculate the maximum footprint per internal buffer, Ab = Wb * Db.
f) Calculate the maximum buffer footprint area per equipment, Abt = Wb * Db
*Nb, where Nb is the number of buffers in the equipment design.
g) Record the total equipment footprint area, At = Wt * Dt.
h) Calculate the ratio of buffer footprint to equipment footprint area = Abt/At.
International SEMATECH
Technology Transfer # 98023468C-TR
58
i) Calculate the ratio of FOUP storage locations to the buffer footprint =
Nlb*Nb/Abt.
j) Record the total test time of the buffer design.
k) Record the number of failures during testing of the buffer design.
l) Calculate the buffer MTBF from testing, MTBF = Test time/Test Failures.
•
Pass Criteria: There are no pass criteria for this section. The purpose is to collect
data to allow for various post assessment analysis methods.
•
Fail Criteria: There are no fail criteria for this data collection section.
Technology Transfer # 98023468C-TR
International SEMATECH
59
5.3
Buffering Physical Testing Results
Complete the assessment information table below.
I300I Buffering Guideline Compliance Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Supplier
Model
3rd party Buffer Supplier (if used)
Buffer Model # (if supplied by 3rd party)
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
60
5.3.1
Requirement for Buffering: 300 mm in-line process/metrology equipment is required
to handle and store enough production material at the local level to ensure continuous
(non-stop) processing capability for a 25 minute worst case AMHS delivery scenario
(i.e., 95% of all lots will be delivered in 25 minutes or less). The minimum acceptable
solution is two E15.1 primary load ports, with additional load port(s) or internal buffer
requirements being identified through analysis of throughput rate, batch size, material/
empty FOUP/exception lot handling, and other capability/implementation variables.
The requirements for the handling/storage of empty FOUPs, exception lots, and nonproduction wafers should not be overlooked. The width of the load ports or buffer must
not exceed the maximum width of the equipment. (GL 2.6.2)
Assessment Detail
Results
Pass/Fail
Criteria
Compliance
Does this equipment have a minimum of 2 primary E15.1 load ports
in a “1 + 1” layout? (Note: 1 primary load port required for offline
metrology tools)
Yes
The installed/combined width of the installed load ports or the buffer
do not exceed the maximum width of the equipment.
Yes
For two primary load ports only, record WPH (wafers/hour).
N/A
N/A
For two primary load ports only, record Bsize (wafers/lot).
N/A
N/A
Do the two primary load ports meet the buffering requirement?
DR ≤ 2.4
For equipment with more than two primary E15.1 load ports, load
size ≤ Bsize, and no buffer: record the number of primary load ports.
N/A
N/A
For equipment with more than two primary E15.1 load ports, load
size ≤ Bsize, and no buffer: record WPH
N/A
N/A
For equipment with more than two primary E15.1 load ports, load
size ≤ Bsize, and no buffer: record Bsize
N/A
N/A
For equipment with more than two primary E15.1 load ports, load
size ≤ Bsize, and no buffer, do the number of load ports meet the
buffering requirement? Record DR (=WPH/Bsize) and DP [=2.4*(#P1)].
DR is ≤ DP
For equipment with more than two primary E15.1 load ports, load
size > Bsize, and no buffer: record the number of primary load ports.
N/A
N/A
For equipment with more than two primary E15.1 load ports, load
size > Bsize, and no buffer: record WPH
N/A
N/A
For equipment with more than two primary E15.1 load ports, load
size > Bsize, and no buffer: record Bsize
N/A
N/A
For equipment with more than two primary E15.1 load ports, load
size > Bsize, and no buffer, do the number of load ports meet the
buffering requirement? Record DRb [=WPH/process batch size] and
DPb [=1.9 *(BP-1)]
DRb is ≤
DPb
For equipment with internal buffering: record the number of buffer
positions available (B)
N/A
N/A
For equipment with internal buffering: record the number of wafers
per process batch (L)
N/A
N/A
For equipment with internal buffering: Calculate the lots per process
batch (X) [=L/Bsize]
N/A
N/A
Technology Transfer # 98023468C-TR
International SEMATECH
61
Pass/Fail
Criteria
Compliance
For equipment with internal buffering: record the number of batches
in process (IPX) simultaneously
N/A
N/A
For equipment with internal buffering: Calculate the number of lots
that can be processed during 1 average delivery time (Y)
[=X*(DT*WPH)/(L*60)]. For DT = 25 min, Y=X*WPH/(L*2.4)
N/A
N/A
For equipment with internal buffering, does the buffer size meet the
buffering requirements? Record Br [=(X*IPX)+(X*Nwc)], where
Nwc =WPH/(L*2.4)
B ≥ Br
Assessment Detail
Results
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
5.3.2
Buffer FIMS Compliance: 300 mm equipment that includes an internal buffer in the
design is required to include at least two bi-directional FIMS interfaces between the
buffer and the active process area or other equipment internal support mechanism for
continuous processing/duty cycle and to incorporate an operator-selectable local or
maintenance mode so that lots can be removed from the buffer in the case of an
equipment failure. (GL 2.6.2.1, GL 3.2.1.3)
Assessment Detail
Results
Pass/Fail
Criteria
How many bi-directional FIMS interfaces does the internal buffer
have? Record the number of FIMS interfaces.
≥2
Does the internal buffer FIMS interfaces meet the compliance and
are bi-directional as tested in Section 4.1.3.6, paragraph 3?
Yes
Does the control system include a local/maintenance mode for
buffer operation?
Yes
Document the number of steps required to enter
local/maintenance mode.
N/A
Does the local/maintenance mode support single step operations?
Yes
Does the local/maintenance mode support semi-automated
operation?
Yes
Does the local mode adequately allow for movement to the load
ports in case of an equipment failure?
Yes
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
62
5.3.3
Buffer Kinematic Couplings Compliance: Kinematic couplings at each internal FIMS
interface port must meet standards requirements. (GL 2.2.4, GL 4.2.7)
Assessment Detail
FIMS
1
FIMS FIMS FIMS FIMS FIMS
2
3
4
5
6
Pass/Fail
Criteria Compliance
Does the load port mate (i.e., pin and hole
alignment) with the kinematic coupling
fixture correctly?
Yes
Is the finish on the kinematic coupling pins
correct?
Yes
Are the kinematic coupling pins the correct
size and shape?
Yes
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
5.3.4
Simple, Reliable Buffers: 300 mm equipment internal buffer design, compliant with
E15.1 easement space requirements, must be simple and reliable as well as consume
minimal footprint (GL 2.6.5, GL2.12.1, GL 2.12.5)
Assessment Detail
Results
Pass/Fail
Criteria
Compliance
Document the number of FIMS interfaces in the buffer.
≥2
Buffer FIMS interfaces meet compliance requirements and are
bi-directional as tested in Section 4.1.3.6, paragraph 3.
Yes
Determine and document the total number of FOUP storage bins
in the internal buffer.
N/A
N/A
Determine and document the number of FOUP movement
mechanisms in the buffer.
N/A
N/A
Determine and document the average number of movement axes
per FOUP movement mechanism.
N/A
N/A
Calculate the number of FOUP movement mechanisms per
FOUP storage bin.
N/A
N/A
Determine and document the number of maintenance access
panels and doors on the non-load port sides of the buffer.
N/A
N/A
Determine and document the number of maintenance access
panels and doors on the load port sides of the buffer.
N/A
N/A
Estimate the percentage of maintenance tasks requirement
access at the load port side of the buffer.
N/A
N/A
Record the number of FOUP storage locations per buffer, Nlb.
N/A
N/A
Record the maximum buffer width, “Wb”.
N/A
N/A
Record the maximum buffer depth, “Db”.
N/A
N/A
Record the maximum buffer height, “Hb”.
N/A
N/A
Technology Transfer # 98023468C-TR
International SEMATECH
63
Pass/Fail
Criteria
Compliance
Calculate the maximum footprint per internal buffer, Ab = Wb *
Db. Calculate the maximum buffer footprint area per equipment,
Abt = Wb * Db *Nb.
N/A
N/A
Record the total equipment footprint area, At = Wt * Dt.
N/A
N/A
Calculate the ratio of buffer footprint to equipment footprint
area = Abt/At.
N/A
N/A
Calculate the ratio of FOUP storage locations to the buffer
footprint = Nlb*Nb/Abt.
N/A
N/A
Record the total test time of the buffer design.
N/A
N/A
Record the number of failures during testing of the buffer
design.
N/A
N/A
Calculate the buffer MTBF from testing, MTBF = Test time/Test
Failures.
N/A
N/A
Assessment Detail
Results
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
64
5.4
Buffering Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion with the support of documentation and other materials. Each of the
guideline items represents an expectation or requirement for 300 mm equipment. Sample
questions found below serve as the basis to begin these discussions. The questions should also
help to clarify the intent and expectation of the guideline and the acceptable proof of compliance.
5.4.1
Equipment designs must support the handling of sufficient process material (WIP) to
ensure continuous (non-stop) processing with a 25-minute worst case delivery time (i.e.,
95% of all lots will be delivered in 25 minutes or less). This need may be met by the
load ports or by the incorporation of both load ports and an internal buffer. (GL 2.6.1)
Sample Questions:
a) Does your equipment require a buffer?
b) What model and assumptions did you use to evaluate the continuous processing
requirement for your equipment?
c) What size and configuration of buffer is integrated into the equipment design?
d) Does the equipment managing and store the empty carriers while the associated
wafers are being processed?
e) Has the buffer capacity been verified with a variety of run rates and process
recipes?
f) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
5.4.2
Equipment that processes wafers in large batches, such as furnaces, wet benches,
implanters and litho tracks, may require buffering sizes beyond the minimum
requirement. (GL 2.6.3.1)
Sample Questions:
a) Does your equipment process batches larger than one lot size?
b) What impact does batch sizes have on buffer size for your equipment? For partial
lots? For exception lots?
c) How does batch sizes effect the storage capacity for empty FOUPs?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
65
5.4.3
Continuous processing requires that the first wafer of a lot begins processing before or
immediately after the last wafer of the previous lot finishes processing. (GL 2.6.1.1)
Sample Questions:
a) Is there a processing station/module delay between wafers of different
lots/batches beyond that normally associated with load and/or transfer overhead?
b) Does such an interaction occur when the equipment is fully loaded, i.e. every
load, process station, transfer mechanism and unload position is full or in use?
c) Have various scenarios been tested to verify this capability?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
5.4.4
The recipe associated with a wafer lot must be loaded and ready to run before
processing the first wafer of that lot, including when other lots and recipes are in
process. (GL 2.6.1.2)
Sample Questions:
a) Is there a processing delay between wafers of different lots/batches beyond that
normally associated with load/transfer overhead when the lots/batches are run on
different process recipes?
b) How does your control system handle/manage running more than one process
recipe simultaneously?
c) What is the maximum number of process recipes that can be simultaneously
running in the equipment?
d) Does running multiple recipes simultaneously effect efficiency or run rate?
e) Has this capability been demonstrated?
f) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
66
5.4.5
The equipment buffer must be designed to accommodate all wafers required for
continuous processing (including non-production wafers, baffles, dummy wafers for
furnaces, etc.) not just production wafers. (GL 2.6.1.3)
Sample Questions:
a) What routine requirements for non-production wafers are there for this
equipment?
b) What number of positions or percentage of the buffer size is designed for nonproduction wafer handling?
c) How does the requirement for non-production wafers in the buffer affect the
product wafer capacity and its ability to meet the continuous processing
requirement?
d) Has the integration of non-product wafers into the processing stream been
effectively demonstrated?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
5.4.6
The equipment must manage all carriers at the load ports or within the internal buffer,
including empty carriers while the associated wafers are being processed. (GL 4.11)
Sample Questions:
a) What is the maximum number of empty FOUPs the buffer is designed to support?
b) What is the maximum number of lots that can be simultaneously in process?
c) How does the number of empty FOUPs in the buffer affect the product wafer
capacity and its ability to meet the continuous processing requirement?
d) How does the control system track and manage empty FOUPs in the buffer?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
67
5.4.7
Equipment may use positions in the buffer to store exception wafer types 1–5 as
described in the guidelines, which include particle test wafers, monitor wafers,
equipment-related wafers, metrology reference/standards wafers, and dummy wafers.
(GL 3.1.2.1)
Sample Questions:
a) What method is used to accommodate and handle exception lots in the equipment
buffer?
b) What is the maximum number of exception lots the buffer is designed to support?
c) Does your control system distinguish between types of exception lots?
d) If so, what is the design support limit for each type?
e) How does the number of exception lots in the buffer affect the product wafer
capacity and its ability to meet the continuous processing requirement?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
5.4.8
The size of the internal buffer for a equipment should comprehend the need for all
exception lot type handling and/or storage in addition to the production and empty
FOUP requirements. (GL 3.1.5)
Sample Questions:
a) Were exception lots comprehended in sizing the buffer in the design?
b) Did this requirement add to the buffer size?
c) If so, how much? What method was used to determine this size?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
68
5.4.9
Equipment that includes vertical buffers are required to have a robust, structured error
and/or failure recovery capability designed in. (GL 2.6.7)
Sample Questions:
a) Is the top of the equipment buffer above the load port level?
b) If so, what design approach and method were selected to provide robust recovery
support?
c) Describe the structured approach to recovery and the conditions covered.
d) Has the recovery capability been adequately tested?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
5.4.10
If process/metrology equipment fails, the equipment should reposition the FOUP at the
load port pick-up point. (GL 3.2.1.2)
Sample Questions:
a) Does the equipment include a designed-in capability to reposition FOUPs at the
load port during equipment failure? What is the approach or method?
b) Does the equipment include a designed-in capability to allow AMHS handling
during equipment failure? What is the approach or method?
c) Has a formal analysis of failure mechanism impact on these capabilities been
conducted? A risk assessment?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
69
6
EQUIPMENT CAPABILITY REQUIREMENTS ASSESSMENT
This section summarizes functions to be included in the equipment design and required by the
I300I Factory Integration Guideline so that the needs of 300 mm factories can be met,
specifically in CIM and integrated factory systems.
6.1
Equipment Capability Instrumentation/Tools/Prerequisites
• Four SEMI-compliant FOUPs marked for identification.
• Seventy-five wafers marked for identification.
6.2
Equipment Capability Requirement Physical Testing
6.2.1
Slot and Carrier Integrity and Alignment – 300 mm process/metrology equipment
designs must include the capability and programmable option to return wafers to the
same slot in the same physical carrier from which they were removed. Additionally,
during the wafer transfer, notch alignment of the wafers must be maintained, through
active pre-alignment or positive positional controls (GL 1.1.10, GL 1.4.1, GL 2.8.1,
GL 2.8.2, GL 4.4.5)
1) Create four test lots, using the following steps:
a) For 25-wafer FOUPs:
i)
Lot A = 25 wafers
ii)
Lot B = 25 wafers
iii) Lot C = 10 wafers
iv) Lot D = 15 wafers
b) For 13-wafer FOUPs:
i)
Lot A = 13 wafers
ii)
Lot B = 13 wafers
iii) Lot C = 5 wafers
iv) Lot D = 9 wafers
2) Use the appropriate lot size to test that the wafers are returned to the same slot in the same
FOUP using the following steps:
a) For equipment without internal buffers:
i)
Use the test lots in the following order: A, B, C, D, A, B.
ii)
Place lots on every load station.
iii) Use the control system to begin normal operational processing.
iv) Visually inspect that the correct wafer is returned to the correct slot of the
correct FOUP.
v)
When a lot has been completed, remove it and replace it with the next
sequential lot.
vi) Visually verify that the transition between lots is smooth and without
additional overhead or setup time, allowing the first wafer of the next lot to
immediately follow the last wafer of the previous lot.
International SEMATECH
Technology Transfer # 98023468C-TR
70
vii)
Continue testing until two lots per load port or a maximum of six lots has
been cycled.
b) For equipment with internal buffers:
i)
Use the test lots in the following order: A, B, C, D, A, B.
ii)
Use the control system to move all four lots into the buffer.
iii) Use the control system to begin normal operational processing.
iv) Visually inspect that the correct wafer is returned to the correct slot of the
correct FOUP.
v)
When a lot has been completed, normal buffer operation should sequence
the lots correctly or i.e., (same order/sequence as FOUPs were entered into
the system).
vi) Visually verify that the transition between lots is smooth and without
additional overhead or setup time, allowing the first wafer of the next lot to
immediately follow the last wafer of the previous lot.
vii) Continue testing until two lots per FIMS interface or a maximum of six lots
have been cycled.
3) Visually verify that notch alignment is performed, or investigate that a positive notch position
control system is in use.
•
Pass Criteria for equipment with and without internal buffer:
i)
The equipment returned each wafer to the correct slot of the correct FOUP.
ii)
There was no interruption to continuous flow processing between lots.
iii) The equipment performed notch alignment or used a positive notch position
control system.
iv) For equipment with buffers, the control system correctly sequenced the lots
in processing them from the buffer.
•
Fail Criteria:
i)
IF: A wafer was returned to the wrong slot.
ii)
OR: A wafer was returned to the wrong FOUP.
iii) OR: There was an interruption in continuous processing between lots.
iv) OR: There was no pre-alignment or control for notch position
v)
OR: The equipment buffer did not sequence the lots in the right order.
6.2.2
User Interfaces – The 300 mm process/metrology equipment primary user interface
must be at the front of the equipment, and the design must include an option for an
alternative user interface connection that is functionally equivalent to the primary at the
rear of the equipment. These user interfaces must be configured to be mutually
exclusive; that is, only one station can have active control of the equipment at any given
time (GL 2.11.1, GL 2.11.2)
1) Verify that the primary user interface is at the front of the equipment.
2) Determine if the primary user interface is separate (standalone) from the rest of the
equipment.
Technology Transfer # 98023468C-TR
International SEMATECH
71
3) Visually verify that the primary user interface is easily accessible to the user and that no part
of the equipment will interfere with the user’s interaction with the UI controls.
4) Verify that the equipment has an auxiliary user interface connection at its rear.
5) Verify that the auxiliary user interface is functionally equivalent to the primary interface,
with all functions and screens present and enabled.
6) Visually verify that the auxiliary user interface is easily accessible to the user and that no part
of the equipment will interfere with the user’s interaction with the UI controls.
7) Verify that the operation of the user interfaces is mutually exclusive by attempting to use
both stations simultaneously.
•
Pass Criteria:
i)
The primary user interface is on the front of the equipment.
ii)
There is an auxiliary user interface connection at the rear of the equipment.
iii) The auxiliary user interface is functionally equivalent to the primary UI.
iv) Each of the interfaces is easily accessible to the user and no part of the
equipment will interfere with the user’s interaction with the UI controls.
v)
The user interfaces operated mutually exclusively.
•
Fail Criteria:
i)
IF: The primary user interface is not on the front of the equipment.
ii)
OR: There is no auxiliary user interface connection at the rear of the
equipment.
iii) OR: The auxiliary user interface is not functionally equivalent to the
primary UI.
iv) OR: Either UI is not easily accessible or is obstructed by part of the
equipment.
v)
OR: The use of the UIs is not mutually exclusive.
6.2.3
Mini-environments – 300 mm process/metrology equipment must have minienvironment integrated into the equipment design at a fundamental level, so that first
generation equipment includes it as a standard, and wafer and operational cleanliness is
universally maintained. The clean wafer environment must meet the process needs and
maintained inside pods at the load ports and during all wafer handling and processing.
(GL 2.7.1, GL 2.7.2, GL 2.7.2.3, GL 2.7.3.2, 2.7.6, 2.7.9, 2.7.10, 2.7.13, 2.7.14, 2.7.15)
1)
Verify that the FOUP to FIMS seal passed Section 4.1.3.6, paragraphs 2e and/or 3d.
2)
Verify minienvironment coverage for all exposed wafer areas.
3)
Verify that FOUP storage (internal FOUP buffers) and internal exposed wafer storage areas
do not share the same environment.
4)
Check frame and panel surfaces for finish integrity, smoothness, scratches, and defects.
5)
Verify materials used for wall and frame.
6)
Verify the minienvironment has no bare metal surfaces. All surfaces must be anodized,
painted using powder coat paint, or stainless steel.
International SEMATECH
Technology Transfer # 98023468C-TR
72
7)
Check component joints, connections and corners for strength, integrity, tightness and
smoothness.
8)
Check operation of seals on doors, hinges, latches and removable panels.
9)
Verify operation and ease of adjustment of relief grilles and baffles (dampers) for adjusting
air balance and over-pressurization.
10) Verify minienvironment dimensions.
a) Dimensions – must be no larger than and included in the equipment footprint.
b) Height – cannot exceed 3500 mm.
11) Verify that electrical services for the minienvironment fan/filter unit are incorporated in the
equipment electrical service and are not separate.
12) Verify filter type: Efficiency of filter = 99.99995% at 0.1 µm particle size.
13) Determine if the minienvironment meets the process requirements of the equipment and
that there is adequate lighting that is compatible with the process performed. Also verify
that the lighting does not degrade minienvironment performance.
14) Verify filter material is solvent and acid resistant, and boron free (e.g., PTFE).
15) Verify that filter challenge testing used PSL spheres.
16) Determine the existence of any differential pressure visual indicators on the equipment.
17) Verify that the equipment does not require any air duct connection from a ceiling air
handling system.
18) Determine if the minienvironments have been tested and meet the performance
requirement, as defined in Appendix G, Minienvironment Parametric Test Methods.
•
Pass Criteria:
i)
FOUP to FIMS seal passed Section 4.1.2.6, paragraphs 2e and/or 3d.
ii)
Minienvironment covers all exposed wafer areas.
iii)
FOUP storage (internal FOUP buffers) and internal exposed wafer storage
areas do not share the same environment.
iv)
Frame and panel surface integrity is good.
v)
Materials used for the walls and frames are compatible with the
environment.
vi)
The minienvironment is designed with low outgassing materials and
compounds?
vii) The minienvironment has no bare metal (non-stainless steel) surfaces.
viii) Component joints are acceptable.
ix)
All operational seals are acceptable.
x)
Adjustment and relief grilles (dampers) operate correctly.
xi)
The minienvironment is designed to allow for ease of airflow adjustment
through the minienvironment.
Technology Transfer # 98023468C-TR
International SEMATECH
73
xii) The minienvironment dimensions are contained inside the equipment
footprint.
xiii) The minienvironment height is ≤ 3500 mm.
xiv) Minienvironment utilities are incorporated into the equipment design.
xv) The minienvironment uses the proper filter ≥ 99.99995% efficient at
0.1 µm particle size.
xvi) The minienvironment meets the process needs.
xvii) Minienvironment filter is made of material that is solvent and acid
resistant, and without boron.
xviii) The filter challenge testing used PSL spheres.
xix) The minienvironment does not require a separate air supply duct
connection from a ceiling air handling system.
xx) A port is present that allows test measurement probes to be placed within
the minienvironment.
xxi) The minienvironment has been tested and meets the performance
requirements of Appendix G, Minienvironment Parametric Test Methods.
•
Fail Criteria:
i)
IF: FOUP to FIMS seal did not pass Section 4.1.2.6, paragraphs 2d and/or
3m.
ii)
Minienvironment does not cover all exposed wafer areas.
iii)
FOUP storage and internal exposed wafer storage areas share the same
environment.
iv)
Frame and panel surface are scratched or damaged.
v)
Materials used for the walls and frames are not compatible with the
environment.
vi)
The minienvironment is not designed with low outgassing materials and
compounds?
vii) The minienvironment has bare metal (non-stainless steel) surfaces.
viii) Component joints are misaligned or unacceptable.
ix)
All operational seals are compromised, missing, or unacceptable.
x)
Adjustment and relief grilles (dampers) do not operate easily or correctly.
xi)
The minienvironment is not designed to allow for ease of airflow
adjustment through the minienvironment.
xii) The minienvironment dimensions are not contained inside the equipment
footprint.
xiii) The minienvironment height is > 3500 mm.
International SEMATECH
Technology Transfer # 98023468C-TR
74
xiv) Minienvironment utilities are not incorporated into the equipment design,
but are separately routed.
xv) The minienvironment uses a filter < 99.99995% efficient at 0.1µm particle
size.
xvi) The minienvironment does not meet the process needs.
xvii) Minienvironment filter is acid and solvent resistant, or contains boron.
xviii) The filter challenge testing used DOP or mineral oil only.
xix) The minienvironment requires a separate air supply duct connection for air
supply from a ceiling air handling system.
xx) A port is not present that allows test measurement probes to be placed
within the minienvironment.
xxi) The minienvironments have not been tested and/or do not meet the
performance required by Appendix G, Minienvironment Parametric Test
Methods.
Technology Transfer # 98023468C-TR
International SEMATECH
75
6.3
Equipment Capability Requirements Physical Testing Results
Complete the assessment information table below.
I300I Equipment Capability Guideline Compliance Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Supplier
Model
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
76
6.3.1
Slot and Carrier Integrity and Alignment: 300 mm process/metrology equipment
designs must include the capability and programmable option to return wafers to the
same slot in the same physical carrier from which they were removed. Additionally,
during the wafer transfer, notch alignment of the wafers must be maintained, through
active pre-alignment or positive positional controls. (GL 1.4.1, GL 2.8.1, GL 2.8.2)
Assessment Detail
Document the number of load ports on the equipment.
Results
Pass/Fail
Criteria
In-line ≥ 2
Off-line ≥ 1
For equipment without internal buffering, did the wafers return
to the same slot?
Yes
For equipment without internal buffering, did the wafers return
to the same FOUP?
Yes
For equipment with internal buffering, did the wafers return to
the same slot?
Yes
For equipment with internal buffering, did the wafers return to
the same FOUP?
Yes
In all cases, did the first wafer of the next lot follow the last
wafer of the old lot smoothly and without additional overhead or
setup time?
Yes
For equipment with internal buffering, did normal buffer
operation sequence the lots correctly?
Yes
For equipment with internal buffering, when the lot was
completed processing was it returned to a load port for
unloading?
Yes
Does the equipment perform notch pre-align?
Does the equipment provide positive notch position control
during transfer and processing? If not Yes in previous
Compliance
Yes or see next
Yes
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
77
6.3.2
User Interfaces: 300 mm process/metrology equipment primary user interface must be
at the front of the equipment, and the design must include an option for an alternative
user interface connection that is functionally equivalent to the primary at the rear of the
equipment. These user interfaces must be configured to be mutually exclusive; that is,
only one station can have active control of the equipment at any given time. (GL 2.11.1,
GL 2.11.2)
Assessment Detail
Results
Pass/Fail
Criteria
Is the primary user interface on the front of the machine?
Yes
Is the primary user interface a stand-alone unit, separate from
the rest of the machine?
N/A
Is the primary user interface easily accessible to the user and
free of obstacle and interference?
Yes
Does the equipment have an auxiliary user interface connection
at the rear of the equipment?
Yes
Is the auxiliary user interface functionally equivalent to the
primary user interface in function, access and control?
Yes
Is the auxiliary user interface easily accessible, with no
obstruction or interference with its use?
Yes
Is the operation of the user interfaces mutually exclusive, so that
only one is in control at a time?
Yes
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.3.3
Mini-environments: 300 mm process/metrology equipment must have minienvironments integrated into the equipment design at a fundamental level, so that first
generation equipment includes it as a standard, and wafer and operational cleanliness is
universally maintained. The clean wafer environment must be maintained inside pods,
at the load ports, and during all wafer handling and processing. (GL 2.7.1, GL 2.7.2, GL
2.7.2.3, GL 2.7.3.2, GL 2.7.6, GL 2.7.9, GL 2.7.10, GL 2.7.13, GL 2.7.14, GL 2.7.15)
Assessment Detail
Results
Pass/Fail
Criteria
Did the FOUP to FIMS seal pass Section 4.1.3.6?
Yes
Does a controlled minienvironment cover all exposed wafer
handling and transfer areas?
Yes
Are the internal FOUP buffer storage and handling area (if they
exist) and the open wafer storage and handling areas separated from
each other?
Yes
International SEMATECH
Compliance
Technology Transfer # 98023468C-TR
78
Assessment Detail
Results
Pass/Fail
Criteria
Are the frame and panel surface finishes free of damage and
acceptable?
Yes
Are the wall and frame materials compatible with the process
environment and acceptable for minienvironment applications?
Yes
Is the minienvironment designed with low outgassing materials and
compounds?
Yes
Is there any bare metal (non-stainless steel) showing in the
minienvironment area?
No
Are the component joints, connections and corners tight, smooth
and well sealed?
Yes
Are all door, hinge, latch and removable panel seals operational and
in good shape?
Yes
Are the relief grilles and baffles easily adjustable?
Yes
Is the minienvironment designed to allow for ease of airflow
adjustment through the minienvironment?
Yes
Do the minienvironment dimensions meet requirements?
Yes
Record the minienvironment height.
Are electrical services for the minienvironment including fan/filter
units designed into the equipment power supply? No separate power
feed is required?
Is the filter element the right type and efficiency?
Compliance
≤ 3500 mm
Yes
≥99.99995
% @ 0.1µ
Is the filter membrane material acid and solvent resistant and free of
boron? (e.g., PTFE)
Yes
Did filter challenge testing use PSL spheres?
Yes
Does the minienvironment require a separate air supply duct
connection from a ceiling mounted air handling system?
No
Are there any visible differential pressure gauges on the
minienvironment? Note indication of pressure drop across filter and
blower operation in comment section below.
N/A
Is a port present that allows for test measurement probes to be
placed within the minienvironment.
Yes
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
79
6.4
Equipment Capability Requirement Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion with the support of documentation and other materials. Each of the
guideline items represents an expectation or requirement for 300 mm equipment. Sample
questions below serve as the basis to begin these discussions. The questions should also help to
clarify the intent and expectation of the guideline and the acceptable proof of compliance.
6.4.1
All 300 mm process/metrology equipment must support a maximum edge exclusion of
3 mm. The desired edge exclusion is 0. (GL 1.1.9)
Sample Questions:
a) What, if any, edge exclusion is required by this equipment?
b) Why does the process require an edge exclusion zone?
c) Has process conformance to 3 mm been verified? How?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.2
300 mm process/metrology equipment should incorporate electrical voltage dropout
immunity compliant to the SEMI Draft Doc. 2844A. (GL 1.3.2.3)
Sample Questions:
a) Does this equipment have voltage dropout immunity designed in?
b) By what method?
c) Describe any testing that has been performed which demonstrates compliance to
SEMI Draft Doc. 2844A?
d) Are test results available that demonstrate compliance to SEMI Draft Doc.
2844A
e) Has testing been performed using SEMI F42-Test Method for Semiconductor
Processing Equipment Voltage Sag Immunity?
f) What verification testing has been done?
g) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
80
6.4.3
300 mm process/metrology equipment should incorporate some designed-in level of
immunity to fluid and exhaust pressure drop and/or flow drop. This means a tolerance
for a limited range of variation in fluid and exhaust pressure and/or flow without
causing process impacts, or machine interlocks and downtime. (GL 1.3.2.4)
Sample Questions:
a) Does this equipment have fluid pressure/flow drop immunity designed in?
b) Does this equipment have exhaust pressure/flow drop immunity designed in?
c) By what methods?
d) What verification testing was done
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.4
300 mm equipment must include design considerations for any vibration requirements
beyond current 200 mm factory requirements. This includes the attenuation of any
generated vibration and additional isolation from the 200 mm factory baseline. (GL
1.3.4, 2.7.16)
Sample Questions:
a) Does this equipment produce or is it sensitive to vibration?
b) What design considerations have been evaluated or included specifically related
to vibration control and isolation?
c) What verification testing was done, and what were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
81
6.4.5
300 mm process/metrology equipment must be designed to dissipate electrical static
charge (ESC) from wafer and/or carriers at any load ports and material handling areas.
(GL 1.3.5)
Sample Questions:
a) Does this equipment include the designed-in capability to dissipate electrical
static charge from load ports?
b) Does this equipment include the designed-in capability to dissipate electrical
static charge from the wafer handling components and areas?
c) Other than grounding, what methods of ESC dissipation are incorporated into this
equipment?
d) What verification testing was done, and what were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.6
The equipment supplier is responsible for providing any “internal wafer carrier(s)” (i.e.,
process carriers) required to perform wafer processing and to provide the necessary
wafer transfer mechanism between the internal carrier and the standard FOUP.
(GL 2.3.6)
Sample Questions:
a) Does this equipment use a process carrier during normal operation?
b) What is the maximum number of process carriers required for fully loaded
continuous processing operation?
c) What is the maximum number of process carriers that the equipment is capable of
storing, using, or managing?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
82
6.4.7
“Internal wafer carrier(s)” required to perform wafer processing may have any
technically appropriate pitch between wafers, alignment methodology, or other
characteristic that the supplier deems appropriate. (GL 2.2.3)
Sample Questions:
a) Does this equipment use a commercial or proprietary design for the process
carrier?
b) Describe the specifications and features of the process carrier.
c) Has this process carrier been characterized for repeated process usage? What
method was used?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.8
To be compatible with typical facilities distribution systems, point of use gas delivery
systems internal to 300 mm processing equipment should be designed to performance
specifications in SEMI E49.9. Where possible, systems should contain standardized
components that allow for modularity and interchangeability. (GL 1.3.6.1)
Sample Questions:
a) Does this equipment include an internal point-of-use gas delivery system?
b) If so, does it meet the requirements of E49.9 for performance specifications?
c) What method was used to verify this conformance?
d) What were the results?
e) Do the gas distribution systems use modular interchangeable components?
f) Are they from commercial, widely available sources?
g) What percentage of components are standard designs? What percentage are custom or
special designs?
h) Has the interchangeability of components been verified? What method was used?
i) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
83
6.4.9
To be compatible with typical facilities distribution systems, point-of-use ultrapure
water and liquid chemical delivery systems internal to 300 mm processing equipment
should be designed to performance specifications in SEMI E49.3. Point-of-use solvent
delivery systems internal to 300 mm processing equipment should be designed to
performance specifications in SEMI E49.5. Where possible, systems should contain
standardized components that allow for modularity and interchangeability. (GL 1.3.6.2)
Sample Questions:
a) Does this equipment include internal point-of-use ultrapure water or liquid
chemical delivery systems?
b) If so, does it meet they requirements of E49.3 for performance specifications?
c) What method was used to verify this conformance?
d) What were the results?
e) Does this equipment include an internal point-of-use solvent delivery system?
f) If so, does it meet the requirements of E49.5 for performance specifications?
g) What method was used to verify this conformance?
h) What were the results?
i) Do the liquid distribution systems use modular interchangeable components?
j) Are they from commercial, widely available sources?
k) What percentage of components are standard designs? What percentage are
custom or special designs?
l) Has the interchangeability of components been verified? What method was used?
m) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
84
6.4.10
Where possible, standardized equipment interfaces for support equipment should be
used. Specifically for equipment with vacuum pumps, standard interface connections
should be used. Therefore, vacuum pump interfaces should conform to SEMI E73 for
Turbomolecular Pumps and SEMI E74 for Dry Pumps. (GL 1.3.6.3)
Sample Questions:
a) Does this equipment have support equipment?
b) Does the support equipment conform to standardized equipment interfaces?
c) Describe how SEMI E73 and/or E74 were used to implement the design of
vacuum pump interfaces in this equipment?
d) What method was used to verify the conformance?
e) Were there any exceptions?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.11
300 mm equipment designs must include the capability to internally handle and/or store
exception wafer types 1–5 as defined in the guideline, which include particle test
wafers, monitor wafers, equipment-related wafers, metrology reference/standards
wafers, and dummy wafers. (GL 3.1.1)
Sample Questions:
a) Does the equipment design include the ability to internally handle and/or store
exception wafer types 1–5?
b) What method or approach was used to provide this capability?
c) How was the capability tested?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
85
6.4.12
I300I supports and recommends the use of advanced process control and in situ sensors
(GL 1.1.7.1)
Sample Questions:
a) Does the equipment use a fixed set-point strategy for process control?
b) If so, describe how power, pressure, gas flow, temperature, and other similar
parameters are fixed to a single value called for in the recipe?
c) Does the equipment include in situ sensors, in-line sensors, or integrated
metrology tools in addition to the traditional list of measured parameters, such as
RF forward power, RF reflected power, temperature, gas flow rates, reliability,
availability, maintainability, etc?
d) What in situ sensors have been characterized and can that characterization data be
made available (especially those sensors that reduce non-product wafers such insitu sensors and film thickness sensors)?
e) How does your control system use in situ data to modify the behavior of the
process?
f) Have any of these capabilities been demonstrated?
g) If so, what were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.13
300 mm equipment must include the designed-in capability to identify FOUPs
containing or suspected of containing broken, damaged, cross-slotted, etc. wafers and
return those FOUPs to the load port pick-up point for disposition. (GL 3.1.3)
Sample Questions:
a) Does the equipment have the designed-in capability to identify FOUPs containing
broken, damaged, cross-slotted, etc. wafers?
b) What approach or method is used for this capability?
c) Once such a FOUP is identified, is the equipment designed to deliver it back to
the load port pick-up point?
d) Has this capability been adequately tested?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
86
6.4.14
300 mm equipment designs should include operator-selectable modes (e.g.,
local/manual, automated, etc.) to return wafers to the appropriate FOUPs in case of
equipment failure. These selectable modes must be commensurate with personnel,
equipment, and product safety requirements. (GL 3.2.1.1)
Sample Questions:
a) Does the equipment design include operator-selectable modes for returning wafers
to the appropriate FOUP in case of equipment failure?
b) What method or approach was used to provide this capability?
c) Does the method support slot and carrier integrity requirements?
d) Has the capability been tested? To what extent and in what conditions?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.15
During equipment failures, the equipment should reposition FOUP(s) at the load port
pickup point to allow handling by AMHS. (GL 3.2.1.2)
Sample Questions:
a) Does the equipment design include the capability to reposition FOUP(s) to the
load port pick-up point in case of equipment failure?
b) What method or approach was used to provide this capability?
c) Does the method support AMHS interface during equipment failure?
d) Has the capability been tested? To what extent and for what conditions?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
87
6.4.16
Equipment with internal buffering must have operator-selectable maintenance or local
mode(s) to allow lots to be retrieved and placed back on the load port in case of
equipment failure. No particular retrieval order is required. (GL 3.2.1.3)
Sample Questions:
a) Does the equipment have operator-selectable maintenance or local mode(s) to
allow retrieval of lots in case of equipment failure?
b) Is this capability automated or single step?
c) Are there sufficient interlocks to prevent equipment, FOUP, and wafer damage
during the retrieval of lots to the load port?
d) Has this capability been tested? In what conditions?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.17
300 mm process/metrology equipment control systems must include the designed-in
capacity to collect and analyze equipment productivity performance metrics. Data
collection must be compliant with SEMI E58 automated reliability, availability, and
maintainability system (ARAMS) requirements, and analysis must support SEMI E10
reliability, availability, and maintainability (RAM) statistics, overall equipment
efficiency (OEE) metrics, and intrinsic equipment efficiency (IEE) measures.
(GL 1.1.2.1)
Sample Questions:
a) Does the control system include designed in ARAMS data collection capability?
b) Does this capability include all of the state models and decision/handling points
required? What are the exceptions?
c) Does the control system include analytical procedures for E10 RAM statistics
from the collected ARAMS data?
d) Does the control system include analytical procedures for OEE metrics from the
collected ARAMS data?
e) Does the control system include analytical procedures for IEE metrics from the
collected ARAMS data?
f) Is all of the data and analytical output capable of being communicated to the host
system?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
88
6.4.18
All 300 mm process/metrology equipment must be designed so that when facing the
front of the equipment, load port numbers are assigned sequentially from the left, with
the left most being “1,” incrementally to the right. The equipment must also be
configured so that the slot number for each carrier is assigned incrementally from the
bottom, so that the bottom wafer is “1,” counting sequentially to the top of the carrier.
(GL 4.5)
Sample Questions:
a) Facing the front of the equipment is the left most load port #1?
b) Are the load ports numbered incrementally to the right?
c) Is the equipment designed to identify the bottom slot of the carrier as #1?
d) Does the equipment identify slot number counting sequentially from the bottom to
top of the carrier?
e) Do auxiliary load ports conform to these requirements?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.19
Minienvironments for 300 mm equipment must be capable of very high-speed recovery
after scheduled maintenance and unscheduled maintenance downtime events. The
equipment must be able to recover and attain processing level cleanliness inside the
minienvironment and wafer movement paths within one minute after the equipment has
been re-introduced into production status. (GL 2.7.4)
Sample Questions:
a) Is the minienvironment designed for high-speed recovery?
b) Is it able to attain processing levels of cleanliness within one minute?
c) How long does it take for environmental (temperature and humidity) stability to
be achieved?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
89
6.4.20
The integrated minienvironment must be designed so a FOUP engaged and opened at
the FIMS interface will not degrade minienvironment performance. (GL 2.7.2.1)
Sample Questions:
a) Is the minienvironment designed to maintain expected performance levels as the
FOUP is engaged and opened at the FIMS interface?
b) Did any testing performed address a static mode with no FOUP?
c) Did any testing performed address a FOUP with the door in an opened position?
d) Did any testing performed address a situation where the FOUP/FIMS interface was
engaged?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.21
The integrated minienvironment must be designed to maintain differential pressure
(positive relative to factory cleanroom ambient pressure) during all static and
operational equipment conditions. Internal air pressure and balance must be adjustable
using means such as variable speed control fans, grilles, baffles, louvers, and/or other
measures as necessary. (GL 2.7.7)
Sample Questions:
a) Is the minienvironment designed to maintain differential pressure during all static and
operational equipment conditions?
b) Have these capabilities been tested? In what conditions?
c) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
90
6.4.22
For process/metrology equipment that is equipped with exhaust, the integrated
minienvironment must comprehend the effects of the exhausted air. Minienvironment
and exhaust functions must be balanced so that the exhaust function must not degrade
minienvironment performance and the minienvironment function must not degrade
exhaust system performance. (GL 2.7.8)
Sample Questions:
a) What compounds are present in the exhausted air of this tool?
b) How does the minienvironment design comprehend the effects of the exhausted
air?
c) Have these capabilities been tested? In what conditions?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.23
The integrated minienvironment must be designed to dissipate electrostatic charges both
internal and external to the equipment. This may include the use of dissipative
materials, conductive materials and/or dissipative methods. (GL 2.7.11)
Sample Questions:
a) What materials are used to dissipate electrostatic charges both internal and
external to the equipment?
b) How does the minienvironment design dissipate electrostatic charges both internal
and external to the equipment?
c) Have these capabilities been tested? In what conditions?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
91
6.4.24
The integrated minienvironment design must comprehend heat generated from
minienvironment components, equipment processes, and equipment operation. (GL
2.7.12)
Sample Questions:
a) How does the minienvironment compensate for heat generated from the
equipment process, operation, or other subsystems within the system?
b) What materials are used?
c) Have these capabilities been tested? In what conditions?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.25
The integrated minienvironment must be designed to allow for equipment installation in
both a ballroom and bay/chase factory configurations. The integrated minienvironment
must be designed for ease of maintenance in both ballroom and bay/chase
configurations to include removable panels and access to internal components.
(GL 2.7.18)
Sample Questions:
a) Describe the differences between the installation of this tool in a bay/chase
configuration vs. that of a ballroom layout.
b) How is routine maintenance expected to be different in one configuration
compared to the other?
c) What are the expected time differences relating to routine maintenance in a
bay/chase configuration vs. that of a ballroom?
d) Do any maintenance records exist on current 300 mm designs?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
92
6.4.26
The operational status of the integrated minienvironment should be monitored and
indicators of appropriate status conditions should be provided for equipment operators.
This includes but is not limited to differential pressure indicators. SECS/GEM messages
used for reporting equipment status to factory CIM systems should comprehend
minienvironment status (see CIM Guidelines, Section 4). (GL 2.7.20)
Sample Questions:
a) Describe the means by which the minienvironment is monitored for operational
status.
b) What minienvironment status conditions are provided for equipment operators?
c) Are the status conditions present on the equipment limited to differential pressure
indicators?
d) How do the SECS/GEM messages used for reporting equipment status to factory
CIM systems comprehend minienvironment status?
e) Have these capabilities been tested?
f) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.27
To reduce non-product wafers used for process monitoring use product wafer test sites.
Inline metrology equipment should analyze product wafer test sites and communicate
the results to the host system through the single communication link using standard
communication protocols as expressed in the CIM guidelines 4.1.1 and 4.1.2. (GL
1.1.7.2)
Sample Questions: (Note: These questions apply to inline metrology tool manufacturers or
process equipment manufacturers with embedded metrology. A critical point to note is that some
IC manufacturers have wafer test sites designed into their respective processes)
a) What product wafer test sites (e.g., between die, special die, edge exclusion, etc)
have been defined for your tool?
b) Describe the process that provides product wafer test site data to the host system?
c) Have these capabilities been verified?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
93
6.4.28
To reduce non-product monitor wafers used for equipment health and maintenance
monitoring, semiconductor process equipment should be designed so that all equipment
parameters are available to the end user for real-time equipment monitoring. A second
communication link must not be required for this function. (GL 1.1.7.3)
Sample Questions:
a) Are these equipment data and parameters available to the host via the communication
interface?
b) What is the maximum # of parameters that can be requested and delivered per second?
c) Describe the method that allows the existing communication link to be used for this
purpose?
d) What set point and/or alarm capabilities are available for these data and parameters through
the host communication interface (to support equipment self-diagnosis)?
e) Have these capabilities been verified?
f) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
6.4.29
All monitoring data should be communicated to the host system through the single
communication link using standard communication protocols as expressed in the CIM
Guidelines 4.1.1 and 4.1.2. Internally to the equipment the communication from sensors
to the equipment controller should comply with one of the SEMI E54 sensor bus
communication standards. (GL 1.1.7.4)
Sample Questions:
a) Is all monitoring data provided through the single communication link?
b) Describe the process that communicates equipment parameters to the host system
via a single communication link.
c) Are internal sensors connected to the controller via a sensor bus?
d) If a sensor bus interface is provided, can the end user add on additional sensors
(possibly with supplier support)?
e) Have you evaluated the need for buses specifically designed for add on sensors?
f) Do you have algorithms for analysis of the data from the add-on sensors to modify
equipment behavior?
g) Can new algorithms be added as new sensors are added?
h) Is the equipment compliant to SEMI E54?
i) How was compliance to SEMI E54 demonstrated?
j) What were the test results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
94
7
PRODUCTIVITY ASSESSMENT
The primary driving factors for implementation of 300 mm capacity are cost and productivity, as
detailed in the I300I Factory Guidelines. This section contains the specific areas of key interest
and quantifies the factors that are highest leverage in determining the timing and performance to
those needs.
7.1
Productivity Instrumentation/Tools/Prerequisites
None.
7.2
Productivity Physical Testing Results
None.
Technology Transfer # 98023468C-TR
International SEMATECH
95
7.3
Productivity Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion with the support of documentation and other materials. Each of the
guideline items represents an expectation or requirement for 300 mm equipment. Sample
questions found below should serve as the basis to begin these discussions. The questions should
also help to clarify the intent and expectation of the guideline and the acceptable proof of
compliance.
Complete the assessment information table below.
I300I Productivity Guideline Compliance Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Supplier
Model
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
96
7.3.1
Relative 300 mm process/metrology equipment capital cost per wafers processed per
hour must be < 1.3X. This means that the capital cost per 300 mm wafers processed per
hour by each equipment must be less than 1.3X the same ratio for the like 200 mm
equipment. (GL 1.1.1)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm capital cost for this equipment?
N/A
What is the process throughput of this 300 mm equipment?
N/A
Calculate the 300 mm cost per wafers processed per hour.
N/A
What was the capital cost of the like 200 mm equipment?
N/A
What was the process throughput of the like 200 mm equipment?
N/A
Calculate the 200 mm cost per wafers processed per hour
N/A
<1.3 X
Is the 300 mm capital cost per wafers processed per hour < 1.3 X the 200 mm
cost (per wafers processed per hour)?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
7.3.2
300 mm process/metrology equipment availability must be greater than 90% for process
equipment and greater than 95% for metrology equipment, based on SEMI E10
calculations for availability. (GL 1.1.2)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current availability performance for this equipment?
N/A
Is the availability > 90% for process equipment?
Yes
Is the availability > 95% for metrology equipment?
Yes
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
97
7.3.3
300 mm process/metrology equipment installation and qualification costs must be less
than 6% of 300 mm equipment capital cost. (GL 1.1.3)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What are the current equipment installation and qualification costs?
N/A
What are the details of these costs?
N/A
Is the cost < 6% of the capital cost?
<6%
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
7.3.4
Relative process/metrology equipment installation and qualification duration must be
< 0.7X. This means that 300 mm equipment installation and qualification duration must
be less than 70% of like 200 mm equipment. (GL 1.1.4)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current equipment installation and qualification duration?
N/A
What was the installation and qualification duration for the like 200 mm
equipment?
N/A
Is the 300 mm equipment duration < 0.7X the 200 mm duration?
< 0.7 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
98
7.3.5
Relative process/metrology equipment maintenance and spares costs per wafers
processed per hour must be < 1.0X. This means that 300 mm equipment maintenance
and spares costs per wafers processed per hour must be less than the same ratio for like
200 mm equipment. (GL 1.1.5)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm equipment maintenance and spares cost for this
equipment?
N/A
Use the 300 mm throughput from Section 7.2.1 to calculate the 300 mm cost
per wafers processed per hour
N/A
What was the equipment maintenance and spares cost for the like 200 mm
equipment?
N/A
Use the 200 mm throughput from Section 7.2.1 to calculate the 200 mm cost
per wafers processed per hour.
N/A
Is the 300 mm equipment maintenance and spares cost per wafers processed
per hour < 1.0 X the 200 mm cost (per wafers processed per hour)?
< 1.0 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
7.3.6
300 mm process/metrology equipment consumables (production materials and facility
utilities) usage per wafers processed per hour must be less than the same ratio for like
200 mm equipment. (GL 1.1.6)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm equipment consumables usage?
N/A
Use the 300 mm throughput from Section 7.2.1 to calculate the 300 mm
consumables per wafers processed per hour.
N/A
What was the equipment consumables usage for the like 200 mm equipment?
N/A
Use the 200 mm throughput from Section 7.2.1 to calculate the 200 mm
consumables per wafers processed per hour.
N/A
Is the 300 mm equipment consumables and usage per wafers processed per
hour < 1.0 X the 200 mm (per wafers processed per hour)?
< 1.0 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
99
7.3.7
Relative process/metrology equipment monitor wafer usage per wafers processed per
hour must be < 0.25X. This means than 300 mm equipment monitor wafer usage per
wafers processed per hour must be less than 0.25X the same ratio for like 200 mm
equipment. (GL 1.1.7)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm equipment monitor usage?
N/A
Use the 300 mm throughput from Section 7.2.1 to calculate the 300 mm
monitor usage per wafers processed per hour.
N/A
What was the equipment monitor usage for the like 200 mm equipment?
N/A
Use the 200 mm throughput from Section 7.2.1 to calculate the 200 mm
monitor usage per wafers processed per hour.
N/A
Is the 300 mm equipment monitor usage per wafers processed per hour <
0.25X the 200 mm usage (per wafers processed per hour)?
< 0.25 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
7.3.8
300 mm process/metrology equipment software reliability must be better than current
200 mm equipment. (GL 1.1.8)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm equipment software reliability?
N/A
What was the equipment software reliability for the current 200 mm
equipment?
N/A
Is the 300 mm software reliability better than the 200 mm performance?
> 200 mm
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
100
7.3.9
300 mm process/metrology equipment footprint minimization is important. Overall
equipment design must minimize footprint to support minimizing fab area growth in
300 mm fabs during installation, operation, and maintenance. (GL 2.12.2)
Sample Questions:
a) What methods were used to minimize the equipment footprint of this equipment
during the design phase.
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
7.3.10
First priority for equipment suppliers is to reduce/control the width (i.e., bay length)
dimension to maximize the number of equipment that can be placed along the bay wall.
(GL 2.12.3)
Sample Questions:
a) What methods were used to reduce and control the equipment width dimension?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
101
7.3.11
Relative 300 mm process/metrology equipment utilities consumption (power, water,
exhaust and house gases) per wafers processed per hour must be ≤ 1.0X. This means
that 300 mm equipment utility consumption per wafers processed per hour must be less
than or equal to the same ratio for like 200 mm equipment. (GL 1.3.2.1)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm equipment utility consumption?
N/A
Use the 300 mm throughput from Section 7.2.1 to calculate the 300 mm
equipment utility consumption per wafers processed per hour.
N/A
What was the equipment utility consumption for the like 200 mm equipment?
N/A
Use the 200 mm throughput from Section 7.2.1 to calculate the 200 mm
equipment utility consumption per wafers processed per hour.
N/A
Is the 300 mm equipment utilities consumption per wafers processed per hour
< 1.0X the 200 mm usage (per wafers processed per hour)?
< 1.0 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
7.3.12
Relative 300 mm process/metrology equipment scrubbed exhaust per wafers processed
per hour must be ≤ 0.8X. This means that 300 mm equipment scrubbed exhaust per
wafers processed per hour (as measured at the outlet of the equipment) must be less
than or equal to 0.8X the same ratio for like 200 mm equipment. (GL 1.3.2.2)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm equipment scrubbed exhaust usage?
N/A
Use the 300 mm throughput from Section 7.2.1 to calculate the 300 mm
scrubbed exhaust per wafers processed per hour.
N/A
What was the equipment scrubbed exhaust for the like 200 mm equipment?
N/A
Use the 200 mm throughput from Section 7.2.1 to calculate the 200 mm
scrubbed exhaust per wafers processed per hour.
N/A
Is the 300 mm equipment scrubbed exhaust per wafers processed per hour <
0.25X the 200 mm usage (per wafers processed per hour)?
< 0.25 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
102
7.3.13
Side-by-side (i.e., zero clearance) installation is preferred for 300 mm equipment,
consistent with equipment design for maintainability. (GL 2.12.4)
Sample Questions:
a) Does this equipment allow for side-by-side installation?
b) What is the minimum side clearance for permanent installation?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
7.3.14
Side access for maintenance must be minimized since it negatively impacts equipment
packing density. Designs support overlapping maintenance space for adjacent
equipment. (GL 2.12.6)
Sample Questions:
a) Does this equipment design minimize side access and maintenance space?
b) What method was used to minimize the access?
c) What impact did this have on the equipment design?
d) How much space as saved (in m2)
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
103
8
ENVIRONMENTAL, SAFETY & HEALTH (ESH) ASSESSMENT
This section includes the specific requirements of the I300I Factory Guidelines for ESH,
focusing primarily on certification of safety compliance and a significant effort to control the
environmental impact of semiconductor manufacturing equipment.
8.1
ESH Instrumentation/Tools/Prerequisites
None.
8.2
ESH Physical Testing
8.2.1
1)
2)
3)
4)
5)
6)
7)
ESH Standards Compliance – 300 mm process/metrology equipment must meet the
standards certification requirements of SEMI S2, SEMI S8, and CE Mark. Additionally,
increased focus on emissions levels require constantly improving performance
(GL 1.2.1, GL 1.2.2)
Determine if the equipment has completed a third-party survey for SEMI S2 compliance.
Determine if the equipment has been determined to be fully SEMI S2-compliant.
Determine if the equipment has completed a third-party survey for SEMI S8 compliance.
Determine if the equipment has been determined to be fully SEMI S8-compliant.
Determine if the equipment has completed a survey for CE Mark compliance.
Determine if the equipment has been certified as CE Mark-compliant.
Procure a copy of S2, S8, and if possible CE Mark results
• Pass Criteria:
i)
A third party has surveyed the equipment for SEMI S2-compliance.
ii)
A third party has certified the equipment as SEMI S8-compliant.
iii) The equipment has been certified as CE Mark-compliant.
• Fail Criteria:
i)
IF: The equipment has not been surveyed for SEMI S2-compliance by a
third party.
ii)
OR: The equipment is not certified as SEMI S8-compliant by a third party.
iii) OR: The equipment is not certified as CE Mark-compliant.
8.2.2
1)
2)
3)
4)
Minienvironment ES&H Compliance – As an integrated part of the equipment, the
integrated minienvironment must comply with all ES&H guidelines for equipment (see
Section 1.2 – Environmental, Safety, and Health; in addition, see SEMI S11 [GL
2.7.19])
Determine if the minienvironment complies with all ES&H guidelines for equipment (see
Environmental, Safety, and Health section 1.2)
Determine if the minienvironment been assessed for SEMI S11 compliance.
Determine if the minienvironment complies with SEMI S11.
Procure a copy of S11 results.
International SEMATECH
Technology Transfer # 98023468C-TR
104
•
•
Pass Criteria:
i)
A third party has surveyed the minienvironment for SEMI S11 compliance.
ii)
A third party has certified the equipment as SEMI S11 compliant.
Fail Criteria:
i)
IF: The equipment has not been surveyed for SEMI S11 compliance by a
third party.
ii)
OR: The equipment is not certified as SEMI S11 compliant by a third party.
Technology Transfer # 98023468C-TR
International SEMATECH
105
8.3
ESH Physical Testing Results
Complete the assessment information table below.
I300I ESH Guideline Compliance Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Load Port Supplier
Load Port Model
3rd party Buffer Supplier (if used)
Buffer Model # (if supplied by 3rd party)
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
106
8.3.1
ESH Standards Compliance: 300 mm process/metrology equipment must meet the
standards certification requirements of SEMI S2, SEMI S8, and CE Mark. Additionally,
increased focus on emissions levels require constantly improving performance.
(GL 1.2.1, GL 1.2.2)
Assessment Detail
Results
Pass/Fail
Criteria
Has the equipment completed a third party survey for SEMI S2
compliance?
N/A
Has the equipment been determined to be fully SEMI S2
compliant?
Yes
Has the equipment completed a third party survey for SEMI S8
compliance?
N/A
Has the equipment been determined to be fully SEMI S8
compliant?
Yes
Has the equipment completed a survey for CE Mark compliance?
N/A
Has the equipment been certified as CE Mark compliant?
Yes
Has I300I received a copy of S2, S8, and if possible CE Mark
results?
N/A
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
8.3.2
Minienvironment ES&H Compliance: As an integrated part of the equipment, the
integrated minienvironment must comply with all ES&H guidelines for equipment (see
Environmental, Safety, and Health, GL section 1.2) and in addition SEMI S11. (GL
2.7.19)
Assessment Detail
Results
Pass/Fail
Criteria
Does the minienvironment comply with all ES&H guidelines for
equipment (see Environmental, Safety, and Health, GL section
1.2)?
Yes
Has the minienvironment been assessed for SEMI S11
compliance?
N/A
Does the minienvironment comply with SEMI S11?
Yes
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
107
8.4
ESH Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion with the support of documentation and other materials. Each of the
guideline items represents an expectation or requirement for 300 mm equipment. Sample
questions found below should serve as the basis to begin these discussions. The questions should
also help to clarify the intent and expectation of the guideline and the acceptable proof of
compliance.
8.4.1
All national and local safety code requirements for installation, operation, and
maintenance of 300 mm process/metrology equipment must be met. (GL 1.2.1.1)
Sample Questions:
a) What method is used to meet national and local code requirements for this
equipment?
b) Are these requirements treated as “customs and specials” for each equipment
order?
c) What method is used to minimize the amount of variation driven by differing
requirements?
d) How are the configuration changes by equipment order tracked?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
8.4.2
300 mm process/metrology equipment noise level emissions must be less than or equal
to like 200 mm equipment and must comply with the SEMI S2 (Safety) guidelines. (GL
1.2.3)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current noise emission level of this 300 mm equipment?
N/A
What was the like 200 mm equipment noise emission level baseline?
N/A
Is the noise emission level for 300 mm equipment equal to or less than the
200 mm level?
≤1X
Does this level for 300 mm comply with SEMI S2 requirements?
Yes
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
108
8.4.3
Relative 300 mm process/metrology equipment emissions of hazardous air pollutants
(HAPS) per wafers processed per hour must be ≤ 0.5X. This means that 300 mm
equipment HAPS emissions per wafers processed per hour must be less than or equal to
0.5X the same ratio for like 200 mm equipment. (GL 1.2.4)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current HAPS emission level for this 300 mm equipment (per
wafers processed per hour)?
N/A
What was the like 200 mm equipment HAPS emission baseline (per wafers
processed per hour?
N/A
What method was used to measure these levels?
N/A
Is the relative HAPS emission level for 300 mm equipment ≤ 0.5X the
200 mm baseline level?
≤ 0.5 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
8.4.4
Relative 300 mm process/metrology perfluorocarbon (PFC) emissions per wafers
processed per hour must be ≤ 0.5X. This means that 300 mm equipment PFCs
emissions per wafers processed per hour must be less than or equal to 0.5X the same
ratio for like 200 mm equipment. (GL 1.2.5)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current PFC emission level for this 300 mm equipment (per wafers
processed per hour)?
N/A
What was the like 200 mm equipment PFC emission baseline (per wafers
processed per hour)?
N/A
What method was used to measure these levels?
N/A
Is the relative PFC emission level for 300 mm equipment ≤ 0.5X the 200 mm
relative baseline level?
< 0.5 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
109
8.4.5
Relative 300 mm process/metrology volatile organic compound (VOC) emissions per
wafers processed per hour must be ≤ 0.5X. This means that 300 mm equipment VOC
emissions per wafers processed per hour must be less than or equal to 0.5X the same
ratio for like 200 mm equipment. (GL 1.2.6)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current relative VOC emission level for this 300 mm equipment
(per wafers processed per hour)?
N/A
What was the like 200 mm equipment relative VOC emission baseline (per
wafers processed per hour)?
N/A
What method was used to measure these levels?
N/A
Is the relative VOC emission level for 300 mm equipment ≤ 0.5X the 200 mm
relative baseline level?
< 0.5 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
8.4.6
SEMATECH Application Guide for SEMI S2 and S8 may be used for instructions and
information in interpreting these standards. (GL 1.2.1.2)
Sample Questions:
a) Describe how the SEMATECH Application Guide for SEMI S2 and S8 was
referenced as an aid for S2 and S8 interpretation?
b) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
110
9
FACILITIES INTERFACES ASSESSMENT
This section contains a compilation of all of the I300I Factory Guideline items that directly and
specifically pertain to cleanroom compatibility and the requirements for installation,
qualification and long-term support of equipment in a high volume-manufacturing environment.
9.1
Facilities Interfaces Instrumentation/Tools/Prerequisites
None.
9.2
Facilities Interfaces Physical Testing
None.
Technology Transfer # 98023468C-TR
International SEMATECH
111
9.3
Facilities Interfaces Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion with the support of documentation and other materials. Each of the
guideline items represents an expectation or requirement for 300 mm equipment. Sample
questions found below should serve as the basis to begin these discussions. The questions should
also help to clarify the intent and expectation of the guideline and the acceptable proof of
compliance.
Complete the assessment information table below.
I300I Facilities Interfaces Guideline Compliance Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Load Port Supplier
Load Port Model
3rd party Buffer Supplier (if used)
Buffer Model # (if supplied by 3rd party)
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
112
9.3.1
300 mm process/metrology equipment should be designed to operate in Class 5 and
Class 6 cleanrooms (as defined in ISO 14644-1) without adverse impact to equipment
availability and maintainability performance. Equipment designs that include integrated
minienvironments should measure performance using the ISO classifications and
clearly meet the needs of the process technology. (GL 1.3.3)
Sample Questions:
a) What design considerations or decisions were made specifically to ensure that the
equipment could operate in Class 5 and 6 cleanrooms without adverse availability
and maintainability impacts?
b) Were any support equipment decisions made to move “dirty” machine functions
out of the cleanroom?
c) What material selection or maintenance method changes were made to avoid
contamination or longer downtime due to cleanliness requirements?
d) Is there any testing or characterization data evaluating or quantifying equipment
cleanroom compatibility? What method was used?
e) What were the results?
f) If this equipment includes an integrated minienvironment, does it meet the
appropriate ISO rating classification?
g) Does the minienvironment meet the needs of the process technology? In what
way?
h) Has the rating and process compatibility been tested? Using what method?
i) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
113
9.3.2
300 mm process/metrology equipment should be designed to operate in a cleanroom
with a designed controlled temperature between 21 C and 24 C and a designed
controlled relative humidity between 35% and 55%. (GL 1.3.3.1)
Sample Questions:
a) Is the equipment designed to operate in defined temperature and humidity
environment?
b) Has the equipment design been optimized for heat load contribution? What
method or approach was used?
c) Has the equipment design been optimized for relative humidity contribution?
What method or approach was used?
d) Has testing or characterization for temperature and humidity performance and
contribution been conducted? Using what method?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
9.3.3
Relative 300 mm process/metrology equipment height, floor loading, and move-in size
should conform to SEMI E72. (GL 1.3.1.2)
Sample Questions:
a) Does the tool meet the requirements of SEMI E72 for equipment height, floor
loading, and move-in size?
b) Do the equipment drawings visibly show the dimensions?
c) What method was used to verify this conformance?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
114
9.3.4
Relative 300 mm process/metrology equipment footprint per wafers processed per hour
must be < 1.0 X. This means that 300 mm equipment footprint per wafers processed per
hour must be less than the same ratio for like 200 mm equipment. Compliance on this
guideline will be measured on a per-wafers-processed-per-hour basis (Note: Equipment
footprint is defined as cost footprint by SEMI E72). (GL 1.3.1)
Data Collection:
Assessment Detail
Results
Pass/Fail
Criteria
What is the current 300 mm footprint for this equipment (see Figure 18)?
N/A
What is the process throughput of this 300 mm equipment (in wafers per
hour)?
N/A
Calculate the 300 mm footprint per wafers processed per hour.
N/A
What was the footprint of the equivalent 200 mm equipment?
N/A
What was the process throughput of the 200 mm equipment (in wafers per
hour) ?
N/A
Calculate the 200 mm footprint per wafers processed per hour.
N/A
Is the 300 mm footprint per wafers processed per hour < 1.0 X the 200 mm
footprint per wafers processed per hour?
< 1.0 X
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
easement space
(required space
around the tool)
shadow footprint
(includes all
parts of the tool)
rear user
interface
utilities supply
access door
swing-out
E15.1-compliant
load ports and
carrier buffers
Dt Ds
front user
interface
possible wall
locations (if any)
load face plane
of the tool
Wt
Ws
Figure 18
Technology Transfer # 98023468C-TR
Equipment Footprint
International SEMATECH
115
9.3.5
Similarly, associated support equipment footprint located in the sub-fab should not
exceed the equipment footprint in the fab cleanroom per SEMI E72. (GL 1.3.1.1)
Sample Questions:
a) Does this tool include support equipment?
b) If so, does it meet the sub-fab footprint requirements of SEMI E72?
c) What method was used to verify this conformance?
d) Does the tool meet the requirements of SEMI E72 for equipment height, floor
loading, and move-in size?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
9.3.6
300 mm process/metrology equipment should be designed, configured, and documented
to support the factory accommodation process defined in SEMI E70, including the
facilities connection layout meeting the guidance of SEMI E76 and the documentation
of facilities interface specifications meeting the requirements of SEMI E6. (GL 1.3.6)
Sample Questions:
a) Does this equipment have all of the elements to meet the SEMI E70 factory
accommodation process?
b) Do the facilities layout and connections meet the SEMI E76 requirements?
c) Does the documentation meet the SEMI E6 requirements?
d) Has the accommodation process been used to install this type of equipment
before?
e) What were the results and learning’s from that installation?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
116
9.3.7
Where possible, 300 mm process/metrology equipment should be designed to operate
using typical semiconductor facility utilities (water services, gas services, chemical
drain, bulk chemical distribution, exhaust, and electrical services) as defined in SEMI
E51. (GL 1.3.2)
Sample Questions:
a) Describe how the SEMI E51 was used to design your equipment such that it could
operate with typical facilities utilities.
b) How was SEMI E51 used during system development of facilities interfaces?
c) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
117
10
COMMUNICATION INTERFACES ASSESSMENTS
This section evaluates the availability of the equipment communication functions defined in the
I300I Factory Guidelines. It focuses on the key connectivity, protocol, and messaging structure
required for CIM and factory integration.
10.1
Instrumentation/Tools/Prerequisites
None.
10.2
Equipment Communication Interfaces Physical Testing
10.2.1
1)
2)
3)
4)
Communications Interface – 300 mm process/metrology equipment is required to
have a single communication link, or point of connection to a host. This link must
support local network connectivity for HSMS and comply with the SECS-II/GEM
standard protocols (GL 2.13.1, GL 2.13.2, and GL 4.1.1, GL 4.1.2)
Determine, by examination, where the SECS-II communication port is located and that one
and only one port exists.
The port must be configured for HSMS TCP/IP communications, NOT RS-232 SECS-I.
Review the equipment communications manual for a list of SECS-II streams and functions
supported by the equipment.
Verify basic GEM design using the following steps:
a) Review the physical equipment interface (e.g., operator interface, configuration
interface, etc.) for SECS/GEM configuration screens.
b) Review the equipment communications interface manual for a list of GEM
capabilities supported by the equipment control system.
c) Review the equipment communications interface manual or other document for
SECS-II messages for scenarios describing the equipment’s operational situations,
along with the corresponding resulting activity.
d) Review the equipment communications interface manual for the detailed GEM
message scenarios (e.g., establish communication, remote commands, etc.) and
the corresponding equipment responses.
5) Verify basic HSMS design using the following steps:
a) Review the physical equipment interface (i.e., operator interface, configuration
interface, etc.) for HSMS configuration screens.
b) Determine, by examination and documentation for equipment, the communication
port’s configuration. It should be a standard TCP/IP connection (e.g., Ethernet
IEEE 802.3, thin coax 10-BASE-2)(RFC 793 - Transmission Control Protocol).
c) Verify that the HSMS configuration screens contain selections for setting the
equipment to operate in either Active or Passive mode.
d) Verify that the HSMS configuration screens contain selections for setting the
equipment and host IP addresses.
e) Document the designed communication speed (MBits/second).
International SEMATECH
Technology Transfer # 98023468C-TR
118
•
•
Pass Criteria:
i)
There is a single TCP/IP communications port.
ii)
A listing of SECS-II streams and functions supported is available.
iii)
The physical interface includes SECS/GEM configuration screens.
iv)
The documentation lists GEM capabilities supported and detailed SECS-II
and GEM message scenarios.
v)
The physical interface includes HSMS configuration screen.
vi)
The HSMS configuration screens allow selections for Active/Passive mode
and for setting equipment/host IP addresses.
Fail Criteria:
i)
IF: There is more than one communication link.
ii)
OR: The communication link is not TCP/IP based.
iii)
OR: There is no documented listing of SECS-II streams and functions.
iv)
OR: The physical interface does not include SECS/GEM configuration
screens.
v)
OR: There is no documentation listing GEM capabilities supported and/or
detailing SECS-II and GEM message scenarios.
vi)
OR: The physical interface does not include HSMS configuration screen.
vii)
OR: The HSMS configuration screens do not allow selection for Active or
Passive mode, or the setting of equipment/host IP addresses.
Technology Transfer # 98023468C-TR
International SEMATECH
119
10.3
Equipment Communication Interfaces Physical Testing Results
Complete the assessment information table below.
I300I Equipment Communication Interfaces Guideline Compliance
Assessment Information
Company
Address
Phone number
Equipment Type
Equipment Model #
Equipment Serial #
Configuration
Load Port Supplier
Load Port Model
3rd party Buffer Supplier (if used)
Buffer Model # (if supplied by 3rd party)
Date
Location
Assessment Team Leader
Assessor
Assessor
Assessor
Supplier Team Leader
Supplier member 1
Supplier member 2
Supplier member 3
International SEMATECH
Technology Transfer # 98023468C-TR
120
10.3.1
Communications Interface: 300 mm process/metrology equipment is required to have
a single communication link or point of connection to a host. This link must support
local network connectivity for HSMS and comply with the SECS-II/GEM standard
protocols. (GL 4.1, GL 2.13.1, GL 2.13.2)
Assessment Detail
Results
Pass/Fail
Criteria
Is there one, and only one, SECS-II communication port?
Yes
Is the port configured for HSMS TCP/IP communications?
Yes
Does the communication manual include definitions of the
SECS-II streams and functions?
Yes
Does the physical equipment have a GEM configuration
screens?
Yes
Do the communication manuals include detailed GEM function
and message scenarios?
Yes
Does the equipment have designed in GEM function?
Yes
Does the physical equipment have an HSMS configuration
screens?
Yes
Do the HSMS configuration screens contain selections for
setting the equipment to operate in either Active or Passive
mode?
Yes
Do the HSMS configuration screens contain selections for
setting the equipment and host IP addresses?
Yes
Record the HSMS communication speed (MBits/second).
N/A
Compliance
Overall Compliance
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
121
10.4
Equipment Communication Interfaces Intelligent Inquiry
Some aspects of guideline implementation and compliance will be investigated through
interactive discussion with the support of documentation and other materials. Each of the
guideline items represents an expectation or requirement for 300 mm equipment. Sample
questions found below should serve as the basis to begin these discussions. The questions should
also help to clarify the intent and expectation of the guideline and the acceptable proof of
compliance.
10.4.1
300 mm process/metrology equipment designs must include software interlocks
between OHT and PGV operation modes to prevent simultaneous access of the same
load port. The equipment should comprehend the access mode and allow exclusive use
by that mode for that lot/load port, rejecting requests other than the authorized mode.
(GL 4.3.3)
Sample Questions:
a) Does the equipment include software interlocks to prevent simultaneous access to
the load port by OHT and PGV?
b) What approach was used?
c) Has the function been tested?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.2
300 mm production equipment must be capable of communicating via parallel I/O with
all AMHS transport equipment. (GL 4.2.2)
Sample Questions:
a) Is the equipment designed to communicate to a variety of AMHS components?
What method or approach was used for this capability?
b) Does the communication capability meet all current standardized protocols, state
models, and interfaces for AMHS?
c) What testing or characterization of this capability has been conducted?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
122
10.4.3
300 mm process/metrology equipment must be capable of tracking and managing
exception lots by the assigned CIM system lot or carrier identification. (GL 3.1.6.1)
Sample Questions:
a) Does this equipment treat exception lot ID’s assigned by the CIM system, the
same as any other production lot?
b) Is the slot-to-slot, same carrier integrity maintained for exception lots/wafers?
c) Is the slot-to-slot integrity maintained if less that the full exception lot is
processed at one time or if wafers are distributed between multiple runs?
d) Has this capability been tested? Using what method and to what extent?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.4
300 mm process/metrology equipment must be capable of tracking and managing
exception wafers by the assigned CIM system wafer identification. (GL 3.1.6.2)
Sample Questions:
a) Does this equipment treat exception wafer ID’s assigned by the CIM system, the
same as any other production wafers?
b) Has this capability been tested? Using what method and to what extent?
c) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
123
10.4.5
300 mm process/metrology equipment should be designed to act as part of the CIM
system in physically and logically tracking exception lots and wafers in the same
manner as production materials. (GL 3.1.6)
Sample Questions:
a) Does the equipment accurately and adequately communicate the logical tracking
of exception lots and wafers to the CIM system?
b) Does the equipment physically track exception lots and wafers the same way as
production materials?
c) Has this capability been tested or characterized? In what manner and to what
extent?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.6
The equipment control system is responsible for the management of all FOUP and
material tracking within the equipment, at the load ports, within the buffer or in process,
including the storage of empty FOUPs while the associated wafers are being processed.
(GL 4.4.2)
Sample Questions:
a) Does the control system track every FOUP regardless of process status?
b) How does the system distinguish between queued, empty, and completed lots?
c) Do empty FOUPs pose a special tracking and control challenge?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
124
10.4.7
300 mm process/metrology equipment must be capable of communicating utilization
and reliability data, such as that collected in Section 6.4.17, to the host systems using
standard messages and state models. (GL 4.1.3)
Sample Questions:
a) How does this equipment communicate the reliability and utilization data to the
host system?
b) What state models and messages are being used for this data transfer?
c) Has this capability been tested while connected to a host?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.8
300 mm process/metrology equipment must be capable of fault-free processing of date
and date-related data in the 20th and 21st centuries. So the design must preclude any
issues related to the year 2000 concerns. (GL 4.1.6)
Sample Questions:
a) Is this equipment designed for fault-free date transitions?
b) What method was used?
c) Has this capability been tested?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
125
10.4.9
Reliable Data Collection – Data collected by production equipment must be timestamped at the time of collection and not at the time of transmission. (GL 4.1.4)
Sample Questions:
a) What is the smallest interval for time stamping data?
b) Describe the effect of data collection and transfer to the host on equipment
performance.
c) How was this verified?
d) Has this scenario been tested?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.10 Variable Parameter Support – Production equipment must support variable
parameters sent by the host or set from the operator interface. (GL 4.1.5)
Sample Questions:
a) What are the variable process parameters?
b) What parameters are varied to control the process?
c) What experimentation has been performed on the identified variables?
d) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
126
10.4.11 Production equipment and AMHS equipment must allow both continuous and
simultaneous hand-off (see glossary for further definition) of up to two carriers at load
ports and allow recovery from time-outs and hand-off errors. (GL 4.2.3)
Sample Questions:
a) How did you upgrade from E23 to E23.1
b) Is your parallel I/O device designed as one per port or one per two ports?
c) How many parallel I/O devices are designed into the equipment?
d) How many exclusion zones does your tool have to support multiple methods of
automated delivery? (AGV, rail, OHT)
e) What testing has been performed?
f) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.12 Any PGV must be able to dock mechanically at any standard compliant load port
through a standard PGV docking interface. (GL 4.2.4)
Sample Questions: (Note: These questions are for PGV suppliers only)
a) What equipment have you used to test your PGV?
b) What PGVs has the equipment maker used to test their docking flange?
c) What testing has been performed?
d) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
127
10.4.13 IC manufacturers will use either read-only or read/write carrier ID technologies based
on operational requirements. The carrier must be located at a different position on the
load port during an ID operation depending on the technology used. When read-only
carrier ID is specified, Fixed Buffer Equipment must support the capability to read the
carrier ID at the load/unload position on the E15.1 load port. When read/write carrier ID
is specified, Fixed Buffer Equipment must support the capability to read/write the
carrier ID at the FIMS position on the E15.1 load port. While data is being written to an
ID tag, the carrier must be physically locked relative to the read/write device. (GL 4.2.8)
Sample Questions:
a) How many exclusion zones for ID reader or reader/writer devices do you have?
b) If you have one, how can you support both read only and read/write
requirements?
c) What read and read/write devices have been tested on your equipment?
d) What types of carriers were used for these tests?
e) What were the results?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.14 To reduce factory and equipment cost of ownership, production equipment suppliers are
encouraged to implement innovative ways to minimize the number of load ports kept as
spares in 300 mm factories. (GL 4.2.9)
Sample Questions:
a) What methods are used to ensure backward compatibility for load ports?
b) What load ports have been tested for backward compatibility?
c) What was the biggest difficulty for backward compatibility?
d) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
128
10.4.15 Production equipment must accept only one Access Mode (RGV/AGV/OHT or
PGV/Operator) at a time, and allow the Access Mode to change at any time except
during carrier hand-off. The mode shall be applied by equipment, and not by individual
load ports and the Production equipment must reject all requests other than requests
within the accepted mode. Equipment that has physically separated load port groups
must allow different access modes for the different load port groups. (GL 4.3.1)
Sample Questions:
a) Describe or show the Access Mode state model for the port group?
b) How do you prevent Access Mode state change (auto to manual and vice versa)?
c) How do you define Port Groups?
d) How many Port Groups can be defined on your team?
e) Can a Port Group consist of only one load port?
f) How did you define physical separation?
g) What happened when you tried to illegally change access mode?
h) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.16 Switching between Manual Access Mode and Automatic Access Mode must be smooth
and manual carrier hand-off must be safe. Production equipment must have the
capability of handshaking during manual carrier hand-off in a manner similar to
automated hand-off. In the manual handshaking procedure, the equipment must provide
a simple input method of manual hand-off completion. (GL 4.3.2)
Sample Questions:
a) How does the operator change the Access mode to manual when at a host
interface?
b) How does the operator change the Access mode when at the equipment interface?
c) How does the operator change the Access mode when at the load port?
d) How does the operator indicate that a manual load transfer is complete?
e) How does the operator indicate that a manual unload transfer is complete?
f) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
129
10.4.17 Effective manufacturing in 300 mm factories requires the use of AMHS material
delivery to production equipment even when the production equipment is operated by
the operator. Therefore, production equipment must support automated and manual
material handling interactions independent of wafer processing and measurement
operations. (GL 4.3.4)
Sample Questions:
a) How does the equipment indicate that Automated material handling is permitted?
b) Does this vary when in the GEM online local, online remote mode, or the GEM
offline?
c) Is automated delivery allowed when in the GEM offline mode? (Yes or no, but
important!)
d) How would an automated delivery be prevented when in the GEM offline mode?
e) How do you manage independence of processing and material handling
functions?
f) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.18 The order of processing for a carrier or batch in the equipment buffer is independent of
the order of its delivery. Production equipment must be able to set and change the order
of processing as directed by the host and the operator interface. Equipment must always
maintain the association between a carrier or batch and it’s processing instructions. This
capability is especially important for supporting QTAT (quick turnaround time) for a hot
lot by putting it at the top of the order. (GL 4.3.5)
Sample Questions:
a) How will the equipment support defining a processing order for carriers?
b) How will the equipment support changing a defined order?
c) When will a change in processing order not be supported?
d) Can a carrier be prevented from processing after the FOUP is opened?
e) What testing has been performed?
f) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
130
10.4.19 To achieve consistent carrier handling within internal buffer equipment, standard carrier
handling commands (sent from the host to the equipment) must be supported by the
equipment. When the equipment’s carrier handling is controlled by the host: Carrier
movement must be controlled by using these commands, and carrier movement between
the internal buffer and the load port must remain under host control until further
specified by the host or from operator interface. (GL 4.3.6)
Sample Questions:
a) When did you implement the carrier management standard?
b) What state models from the carrier management standards are completely
installed?
c) What testing has been performed?
d) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.20 Internal Buffer Capacity Notification: Internal Buffer Equipment must report the
available buffer capacity to the host whenever the available capacity changes and when
requested by the Host. (GL 4.3.7)
Sample Questions:
a) How does the equipment notify the host of internal buffer capacity changes?
b) Will the equipment accept requests from the host to change the capacity of a
logical partition?
c) What SECS II message is used?
d) If the equipment can accept changes to the logical partition capacity, when would
it be prohibited?
e) What testing has been performed?
f) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
131
10.4.21 FOUP Open and Close Notification: Production equipment that supports FOUP must
control FOUP opening and closing and have the capability to send corresponding event
notification to the host through standard event messages. This does not apply to
equipment that supports open cassette carrier interfaces only. (GL 4.3.8)
Sample Questions:
a) How does the tool notify the host of FOUP open and close?
b) What is the SECS II message used?
c) Does the equipment control FOUP open and close?
d) How would it reject a request from the host to open the FOUP?
e) What testing has been performed?
f) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.22 Carrier Slot Verification: Prior to processing wafers, production equipment must have
the capability to detect which slots within a carrier have wafers. This information is
used to verify the carrier/slot map. (GL 4.4.3)
Sample Questions:
a) How does the tool verify which slots have wafers?
b) What are the error conditions that the equipment can detect?
c) What is the throughput detraction if any due to the wafer to slot detection?
d) Does the equipment support carrier slot verification?
e) What is the method for carrier slot verification?
f) What testing has been performed?
g) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
132
10.4.23 Host Control of Wafer Process Order: Single wafer production equipment must be able
to process some or all of the wafers in a carrier as specified by both the host and the
operator interface. Single wafer process equipment must be able to process wafers
based on an order specified by both the host and the operator interface. (GL 4.4.4)
Sample Questions:
a) What method does the equipment use to support host control of wafer process
order?
b) Does it use E40 (process management?) or a combination of E40 and control job
management?
c) How many different recipes can be defined for a carrier?
d) What testing has been performed?
e) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.24 Additional Wafer Control after Processing or Measurement: In addition to the minimum
slot and carrier integrity capability, specific single wafer production equipment must be
able to output wafers to a specific slot in a specific carrier different than the one from
which it was taken. (GL 4.4.6)
Sample Questions:
a) What method does the equipment use to support additional wafer control after
processing or measurement?
b) Does it use control job management?
c) How does the equipment support sorting of wafers?
d) How many destinations are possible for a wafer?
e) How many sorts are possible?
f) What testing has been performed?
g) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
133
10.4.25 Multi-Module Wafer Tracking Events: Multi-module single wafer processing equipment
must track the movement of each wafer through the modules and report this information
to the host. The equipment must be capable of associating data collected at a module
with the wafer being processed at that module. (GL 4.4.7)
Sample Questions:
a) What SECS II messages are used to report wafer movement through the
equipment?
b) Describe any tests that have been performed which showed evidence that the
equipment was capable of associating wafers with multiple equipment modules
during processing.
c) What testing has been performed?
d) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.26 Recipe and Variable Parameter Change between Wafers: 300-mm manufacturing
requires wafer level process control and management for higher production efficiency,
development speed and fine process control. To realize this requirement with cost
effectiveness, single wafer production equipment must support the capability to set
different recipes and/or variable parameters associated with subsets of wafers within a
carrier in a standard way. Standardizing concept, state models and communication
interfaces are necessary to fulfill this goal. (GL 4.5.1)
Sample Questions:
a) Will this equipment support both recipe changes or variable parameter changes
between wafers? Or both?
b) How many different recipes can be used to process one carrier?
c) What state models were developed during the design process that supported
variable parameter change capabilities?
d) What testing has been performed?
e) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
International SEMATECH
Technology Transfer # 98023468C-TR
134
10.4.27 Process Parameter Change between Wafers: Single wafer process equipment may
optionally need to support runtime variable parameter modification by host. When
implemented, it must be done in a standard way. (GL 4.5.2)
Sample Questions:
a) Will this equipment support both recipe changes or variable parameter changes
between wafers? Or both?
b) How many different recipes can be used to process one carrier?
c) What state models were developed during the design process that supported
variable parameter change capabilities?
d) What testing has been performed?
e) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
10.4.28 AMHS Framework: Semiconductor factories that have AMHS require an integrated
software system to realize automated material movement. This AMHS integration
system must be interoperable with AMHS equipment controllers and factory host
systems from different suppliers. In order to achieve this goal, the AMHS integration
system must conform to standard communication protocols, state models, and
interfaces. This includes coordination and integration of AMHS equipment as well as
integration with factory host systems. (GL 4.6.2)
Sample Questions:
a) What software standards does this MCS or integrator comply with.
b) What transport equipment has this software been integrated with?
c) What factory software has this MCS software been integrated with?
d) What testing has been performed?
e) What were the results of any testing that has been performed?
Comments: ___________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
_____________________________________________________________________________
Technology Transfer # 98023468C-TR
International SEMATECH
11
GUIDELINE COMPLIANCE TESTING RESULTS SUMMARY (Example Only: A report will contain all items)
FIMA
Section
4.1
4.1.3.1
4.1.3.2
4.1.3.3
4.1.3.4
4.1.3.5
4.1.3.6
4.2
4.2.3.1
4.2.3.2
4.2.3.3
4.2.3.4
5.
5.3.1
5.3.2
5.3.3
5.3.4
6.
6.2.1
6.3.2
6.3.3
7.
8.
8.3.1
8.3.2
9.
10.
10.3.1
Compliance
(Yes or No)
Description
Comments/Issues
(If No, provide details)
Load Ports
FOUP Compatibility
Minimum Load Port Requirement
Permitted Auxiliary Load Ports
Load Port Features
E15.1 Compliance
FIMS Compliance
Interface for Material Delivery
OHT Exclusion Zone
Cart Docking Interface
Photocoupled Interface
AMHS/Equipment Installation Alignment
Buffering
Requirement for Buffering
Buffer FIMS Compliance
Buffer Kinematic Couplings Compliance
Simple, Reliable Buffers
Tool Capability Requirements
Slot and Carrier Integrity and Alignment
User Interfaces
Minienvironments
Productivity
Environment, Safety, and Health
ESH Standards Compliance
Minienvironment ES&H Compliance
Facilities Interfaces
Equipment Communications Interface
Communications Interface
N/A
N/A
Overall Compliance:
International SEMATECH
Technology Transfer # 98023468C-TR
135
136
Technology Transfer # 98023468C-TR
International SEMATECH
137
APPENDIX A
Reference Documents
The following standards have been endorsed by I300I member companies and are a subset of
1998 Equipment Performance Metrics.
A.1
SEMI Standards
Note: The most recently published versions of these standards apply. No version with a date earlier than
that noted below should be used. If a newer version of any document listed is available, reference
the newly published version.
A.1.1
SEMI Silicon Wafer Standards
–
SEMI M1.15-0699 – Standard for 300 mm Polished Monocrystalline Silicon Wafers
(Notched)...................................... [cited in I300I Factory Guideline (FGL) Sections 8.1, 8.2]
–
SEMI M31-0999 – Provisional Mechanical Specification for Front-Opening Shipping Box
Used to Transport and Ship 300 mm Wafers.......................... [cited in I300I FGL Section 8.3]
–
SEMI T7-0997 – Specification for Back Surface Marking of Double-Side Polished Wafers
with a Two-Dimensional Matrix Code Symbol ..................... [cited in I300I FGL Section 8.2]
A.1.2
SEMI Equipment and Automation Hardware Standards
–
SEMI E1.9-0699 – Provisional Mechanical Specification for Cassettes Used to Transport
and Store 300 mm Wafers ..........[cited in I300I FGL Sections 2.1, 2.2, 4.2, 4.4, 7.1, 7.2, 7.14]
–
SEMI E10-0699 – Standard for Definition and Measurement of Equipment Reliability,
Availability, and Maintainability (RAM) ....................... [cited in I300I FGL Sections 1.1, 4.1]
–
SEMI E15.1-0200 – Provisional Specification for 300 mm Tool Load Port ................[cited in
..... I300I FGL Sections 2.4, 2.5, 2.6, 2.9, 2.10, 2.14, 3.1, 4.2, 5.3, 5.4, 5.5, 7.4, 7.5, 7.9, 7.10]
–
SEMI E19.3-0697 – Port Standard for Mechanical Interface of Wafer Cassette Transfer,
150 mm (6 inch) Port ............................................................. [cited in I300I FGL Section 6.1]
–
SEMI E47.1-0200 – Provisional Mechanical Specification for Boxes and Pods Used to
Transport and Store 300 mm Wafers ...[cited in I300I FGL Sections 2.3, 3.1, 4.2, 5.4, 5.5, 7.3]
–
SEMI E57-0299 – Provisional Mechanical Specification for Kinematic Couplings Used to
Align and Support 300 mm Wafer Carrier ..................... [cited in I300I FGL Sections 2.2, 4.2]
–
SEMI E62-0999 – Provisional Specification for 300 mm Front-Opening Interface
Mechanical Standard (FIMS) .................... [cited in I300I FGL Sections 2.3, 2.4, 3.1, 7.3, 7.4]
–
SEMI E63-0200 – Provisional Mechanical Specification for 300 mm Box Opener/ Loader to
Tool Standard (BOLTS-M) Interface .................... [cited in I300I FGL Sections 2.4, 2.10, 7.4]
–
SEMI E64-0698 – Provisional Specification for 300 mm Cart to SEMI E15.1 Docking
Interface Port ................................................ [cited in I300I FGL Sections 2.9, 2.14, 7.9, 7.14]
–
SEMI E83-0699 – Provisional Specification for 300 mm PGV Mechanical Docking Flange
................................................................................................ [cited in I300I FGL Section 5.3]
International SEMATECH
Technology Transfer # 98023468C-TR
138
A.1.3
SEMI Information and Control Software Standards
–
SEMI E5-0200 – SEMI Equipment Communications Standard 2 Message Content
(SECS-II)...........................[cited in I300I FGL Sections 2.13, 4.1, 4.3, 4.4, 4.5, 4.6, 4.7, 7.13]
–
SEMI E23-96 – Specification for Cassette Transfer Parallel I/O Interface)
.......................................................................................[cited in I300I FGL Sections 4.6, 7.13]
–
SEMI E30-0200 – Generic Model for Communications and Control of SEMI Equipment
(GEM) ..................................... [cited in I300I FGL Sections 2.13, 4.1, 4.3, 4.4, 4.6, 4.7, 7.13]
–
SEMI E37-0298 – High-Speed SECS Message Services (HSMS) Generic Services)
..................................................[cited in I300I FGL Sections 2.13, 4.1, 4.3, 4.4, 4.6, 4.7, 7.13]
–
SEMI E37.1-96 – High-Speed SECS Message Services Single-Session Mode (HSMS-SS)
...........................................................................[cited in I300I FGL Sections 4.1, 4.4, 4.6, 4.7]
–
SEMI E40-0200 – Standard for Processing Management .........................................................
.........................................................................................[cited in I300I FGL Sections 4.5, 4.7]
–
SEMI E42-0299 – Recipe Management Standard: Concepts, Behavior, and Message
Services ...........................................................................[cited in I300I FGL Sections 4.1, 4.3]
–
SEMI E54-0997- Sensor/Actuator Network Standard .......... [cited in I300I FGL Section 1.1]
–
SEMI E58-0697 – Automated Reliability, Availability, and Maintainability Standard
(ARAMS): Concepts, Behavior, and Services ............... [cited in I300I FGL Sections 1.1, 4.1]
–
SEMI E58.1-0697 – SECS-II Protocol for Automated Reliability, Availability, and
Maintainability Standard (ARAMS): Concepts, Behavior, and Services ...................................
................................................................................................. [cited in I300I FGL Section 4.1]
–
SEMI E81-0699 – Provisional Specification for CIM Framework Domain Architecture .........
................................................................................................. [cited in I300I FGL Section 4.7]
–
SEMI E82-0999 – Intrabay AMHS SEM Specification (IBSEM)............................................
.........................................................................................[cited in I300I FGL Sections 4.6, 4.7]
–
SEMI E84-0200 – Specification for Enhanced Carrier Handoff Parallel I/O Interface
................................................................[cited in I300I FGL Sections 2.13, 4.2, 4.3, 4.6, 7.13]
–
SEMI E87-0200 – Provisional Specification for Carrier Transfer Standard (CTS)
..................................................................................[cited in I300I FGL Sections 4.3, 4.4, 4.7]
–
SEMI E88-0999 – Specification for AMHS Storage SEM (Stocker SEM)
.........................................................................................[cited in I300I FGL Sections 4.6, 4.7]
–
SEMI E90-0200 – Specification for Substrate Tracking............................................................
.........................................................................................[cited in I300I FGL Sections 4.4, 4.7]
–
SEMI E93-0999 – Provisional Specification for CIM Framework Advanced Process Control
Component .............................................................................. [cited in I300I FGL Section 4.7]
–
SEMI E94-0200 – Provisional Standard for Control Job Management .....................................
...........................................................................[cited in I300I FGL Sections 4.3, 4.4, 4.5, 4.7]
–
SEMI E96-0200 – Proposed Guide for CIM Framework Technical Architecture .....................
................................................................................................. [cited in I300I FGL Section 4.7]
Technology Transfer # 98023468C-TR
International SEMATECH
139
–
SEMI E97-0200 – Provisional Specification for CIM Framework Global Declarations and
Abstract Interfaces................................................................... [cited in I300I FGL Section 4.7]
A.1.4
SEMI Facilities Interface and Safety Standards
–
SEMI S2-93A – Safety Guidelines for Semiconductor Manufacturing Equipment...................
–
................................................................................. [cited in I300I FGL Sections 1.2, 4.3, 5.2]
–
SEMI S8-0999 – Safety Guidelines for Ergonomics/Human Factors Engineering of
Semiconductor Manufacturing Equipment .. [cited in I300I FGL Sections 1.2, 2.14, 5.2, 7.14]
–
SEMI S11-1296 – Environment, Safety and Health Guidelines for Semiconductor
Manufacturing Equipment Minienvironments ....................... [cited in I300I FGL Section 2.7]
–
SEMI E6-1296 – Facilities Interface Specifications Guideline and Format ..............................
................................................................................................ [cited in I300I FGL Section 1.3]
–
SEMI E49.3-0298 – Guide for Ultrahigh Purity Deionized Water and Chemical Distribution
Systems in Semiconductor Manufacturing Equipment.......... [cited in I300I FGL Section 1.3]
–
SEMI E49.5-0298 – Guide for Ultrahigh Purity Solvent Distribution Systems in
Semiconductor Manufacturing Equipment ............................ [cited in I300I FGL Section 1.3]
–
SEMI E49.9-0298 – Guide for Ultrahigh Purity Gas Distribution Systems in Semiconductor
Manufacturing Equipment...................................................... [cited in I300I FGL Section 1.3]
–
SEMI E51-0298 – Guide for Typical Facilities Services and Termination Matrix ....................
................................................................................................. [cited in I300I FGL Section 1.3]
–
SEMI E70-0698 – Guide for Tool Accommodation Process [cited in I300I FGL Section 1.3]
–
SEMI E72-0699 – Provisional Specification and Guide for 300 mm Equipment Footprint,
Height, and Weight................................................................. [cited in I300I FGL Section 1.3]
–
SEMI E73-0299 – Specification for Vacuum Pump Interfaces – Dry Pump .............................
................................................................................................. [cited in I300I FGL Section 1.3]
–
SEMI E74-0299 – Specification for Vacuum Pump Interfaces – Turbomolecular Pump..........
................................................................................................. [cited in I300I FGL Section 1.3]
–
SEMI E76-0299 –Guide for 300 mm Process Tool Points of Connection to Facility Services.
................................................................................................. [cited in I300I FGL Section 1.3]
–
SEMI F49-0999 – Specification for Semiconductor Processing Equipment Voltage SAG
Immunity ................................................................................. [cited in I300I FGL Section 1.3]
A.2
ISO Standards
Note: The most recently published version of this standard applies.
–
ISO 14644-1 – Cleanrooms and Associated Controlled Environments – Part 1: Classification
of Airborne Particulates........................................... [cited in I300I FGL Sections 1.3, 2.7, 6.2]
International SEMATECH
Technology Transfer # 98023468C-TR
140
A.3
SEMI Draft Documents
Note: The following standardization activities are endorsed in principle as being required for 300 mm
equipment. The referenced draft documents may be in different stages of development. Copies of
the most recent draft documents known as ballots are available from SEMI to standards
participants. Active participation in document development and ballot review is recommended.
–
SEMI Draft Document 2824A – CIM Framework Material Movement Group.......................
................................................................................................. [cited in I300I FGL Section 4.7]
Technology Transfer # 98023468C-TR
International SEMATECH
141
APPENDIX B
Cross Reference Factory Guidance (GL #) to FIMA Section
GL #
Title/Description
FIMA
Section
Description
1
Factory Productivity Guidelines
1.1
Equipment Productivity and Performance
1.1.1
Relative Capital Cost
7.3.1
Inquiry regarding relative capital cost vs. 200 mm
equipment
1.1.2
Availability
7.3.2
Inquiry regarding availability of production
equipment (process and metrology)
1.1.2.1
Embedded Support of E10, E58, OEE & IEE
6.4.17
Inquiry regarding designed-in capacity to collect
and analyze productivity performance
1.1.3
Installation and Qualification Cost
7.3.3
Inquiry regarding relative equipment installation
and qualification costs to capital costs
1.1.4
Relative Installation and Qualification
Duration
7.3.4
Inquiry regarding relative equipment installation
and qualification duration compared to 200 mm
equipment
1.1.5
Relative Maintenance and Spares Cost
7.3.5
Inquiry regarding relative equipment maintenance
and spares cost compared to 200 mm equipment
1.1.6
Relative Consumable Cost
7.3.6
Inquiry regarding relative utilities (power,
compressed air, exhaust) consumption compared to
200 mm equipment
1.1.7
Relative Monitor Wafer Usage
7.3.7
Inquiry regarding relative monitor wafer usage
compared to 200 mm equipment
1.1.7.1
NPW Reduction - Advanced Process Control
Support
6.4.12
Inquiry regarding support for advanced process
control and in situ sensors
1.1.7.2
NPW Reduction – Use Inline Metrology to
Analyze Wafer Test Sites & Communicate
Data to Host
6.4.27
Inquiry related to the description of message
structures and any associated data variables that
may be present in streams and functions that
provide test site results to the host system
1.1.7.3
NPW Reduction – Equipment Parameters
Available to User Through Single
Communication Link
6.4.28
Inquiry about process set points that are provided to
the user console as well as alarmed set points for
real time monitoring
1.1.7.4
NPW Reduction - Comm/Sensor Bus
Compliance with one of the SEMI E54
Sensor Bus Communication Standards.
6.4.29
Inquiry regarding monitoring data communicated to
the host system, E54 compliance, and the process
that communicates equipment parameters to the
host system via a single communication link
1.1.8
Relative Software Reliability
7.3.8
Inquiry regarding relative reliability compared to
200 mm equipment
1.1.9
3 Mm Edge Exclusion
6.4.1
Inquiry regarding edge exclusion
1.1.10
Wafer Notch Alignment
6.2.1
Equipment requirement to return wafers to same
carrier, same slot
1.2
Environmental, Safety, and Health
1.2.1
Comply 100% with S2 and S8
8.2.1
3rd party assessment of S2, S8, and CE Mark
1.2.1.1
All National and Local Codes Met
8.4.1
Inquiry regarding compliance to all national and
local codes
1.2.1.2
SEMATECH Application Guide for SEMIS2
& S8
8.4.6
Usage of SEMI standards S2 and S8 during system
development of facilities interfaces
International SEMATECH
Technology Transfer # 98023468C-TR
142
GL #
Title/Description
FIMA
Section
Description
1.2.2
Comply 100% to EU Directives
8.2.1
3rd party assessment of S2, S8, and CE Mark
1.2.3
Relative Noise Emissions Level
8.4.2
Inquiry regarding noise emissions assessment and
compliance to S2
1.2.4
Relative HAPS Emissions
8.4.3
Inquiry regarding HAPS assessment
1.2.5
Relative PFC Emissions
8.4.4
Inquiry regarding PFCs assessment
1.2.6
Relative VOC Emissions
8.4.5
Inquiry regarding VOCs assessment
1.3
Facilities Cost and Utilities Consumption
1.3.1
Relative Footprint Calculated per SEMI E72
9.3.4
Inquiry regarding relative footprint/productivity
requirements
1.3.1.1
Support Equipment Footprint per SEMI E72
9.3.5
Inquiry regarding support equipment footprint
requirements
1.3.1.2
Equipment height, floor loading, and move-in
size per SEMI E72
9.3.3
Inquiry regarding equipment design to ceiling and
OHT height restrictions
1.3.2
Facility Utilities per SEMI E51
9.3.7
Use of SEMI E51 during development of the
facilities interfaces
1.3.2.1
Relative Utilities Consumption
7.3.11
Inquiry regarding relative utilities (power, water
and process chemicals) consumption compared to
200 mm equipment
1.3.2.2
Relative Scrubbed Exhaust Requirement
7.3.12
Inquiry regarding relative scrubbed exhaust
requirements compared to 200 mm equipment
1.3.2.3
Electrical Voltage Drop-Out Immunity
6.4.2
Inquiry regarding voltage drop-out immunity
1.3.2.4
Pressure Drop Immunity (Liquid and Gas)
6.4.3
Inquiry regarding pressure drop immunity
1.3.3
Cleanroom Class Compatibility
9.3.1
Inquiry regarding equipment compatibility with
cleanrooms Class 5-6
1.3.3.1
Temperature and Humidity Compatibility
9.3.2
Inquiry regarding equipment compatibility with
cleanroom temperature and humidity ranges
1.3.4
Relative Vibration Isolation
6.4.4
Inquiry regarding vibration isolation
1.3.5
Static Charge Dissipation
6.4.5
Inquiry regarding dissipation of ESC
1.3.6
Factory Accommodation Process
9.3.6
Inquiry regarding conformance to accommodation
process of SEMI E70 and connection layout of
SEMI PR2 and E6
1.3.6.1
Gas Delivery/Systems Requirements
6.4.8
Inquiry regarding configuration of internal gas
delivery system, Inquiry regarding gas delivery
system designed to SEMI E49.9
1.3.6.2
Liquid Systems Purity Requirements
6.4.9
Inquiry regarding configuration of internal
chemical delivery system, Inquiry regarding liquid
purity conformance to SEMI E49.5
1.3.6.3
Vacuum Pump Interface Standardization
6.4.10
Inquiry regarding standard interface for equipment
support vacuum pumps, Inquiry regarding
standardized interfaces for vacuum pump
connections
1.4
Wafer Traceability and Tracking
1.4.1
Slot-To-Slot Integrity
6.2.1
Equipment requirement to return wafers to same
carrier, same slot
Technology Transfer # 98023468C-TR
International SEMATECH
143
GL #
Title/Description
FIMA
Section
Description
2.
Elaboration of The Original I300I 14 Guidelines
2.1
Carrier Capacity
2.1.1
13 Wafer Supports Early Implementation
4.1.2.1
300 mm FOUP compatibility with equipment base
design
2.1.2
25 Wafer Supports Mass Production
4.1.2.1
300 mm FOUP compatibility with equipment base
design
2.1.3
Cost Effective Conversion Requirement
4.1.4.1
Inquiry regarding cost-effectiveness
2.2
Carrier Configuration for Wafer Handling
2.2.1
Horizontal Transfer/Storage Orientation
2.2.2
Transport Carrier 10 mm Pitch
2.2.3
Process Carrier Exception
2.2.4
Kinematic Coupling Requirement
N/A
4.1.2.4
6.4.7
4.1.2.4
5.2.3
SEMI E15.1 load port functionality
Inquiry regarding internal wafer carrier
characteristics
SEMI E15.1 load port functionality
Buffer kinematic couplings compliance
2.3
Carrier Type
2.3.1
FOUP Support Requirement
4.1.2.1
300 mm FOUP compatibility with equipment base
design
2.3.2
Automatic Pod Opener Requirement
4.1.2.6
FIMS engagement -- FOUP door open/close
2.3.3
Interoperability Requirement
4.1.4.3
Inquiry regarding interoperability of load ports
2.3.4
Robotic Handling Flange for Pods
4.1.4.4
Inquiry regarding robotic handling flange
2.3.5
Human Handles Size and Space
4.1.2.5
SEMI E15.1 dimensions
2.3.6
Internal Carrier Responsibility
6.4.6
2.4
Load Port
2.4.1-3
Load Port
4.1.2.4
Load Port Features
2.4.1
SEMI E15.1 Compliance
4.1.2.5
SEMI E15.1 dimensions
2.4.1.1
Buffer Port Exception (Height)
4.1.2.3,
4.1.2.5
Permitted auxiliary load ports, SEMI E15.1
dimensions
2.4.2
Supports Pods and Open Cassette
2.4.3
25 Wafer Base Design Requirement
2.5
Support for Overhead Transport
2.5.1
Floor Based and OHT System Compatible
2.5.1.1
Both Delivery Systems Used Concurrently
Inquiry regarding internal wafer carrier
N/A
4.1.2.1
300 mm FOUP compatibility with equipment base
design
4.2.2.1,
4.2.2.2
Equipment compatible with delivery systems
4.2.2.1
Equipment compatible with delivery systems,
Inquiry regarding concurrent but not simultaneous
access to load ports
4.2.4.1
2.5.2
Vertical OHT Easement
4.2.2.1
Equipment compatible with delivery systems
2.5.3
Load Port E15.1 Overhead Clearance
4.2.2.1
Equipment compatible with delivery systems
2.5.4
Supplemental Buffer Load Ports
4.2.4.2
Inquiry regarding load ports on internal buffers
International SEMATECH
Technology Transfer # 98023468C-TR
144
GL #
Title/Description
FIMA
Section
Description
2.6
Continuous Processing Using Buffering
2.6.1
Integral Buffer for Continuous Processing
5.4.1
Inquiry regarding design for continuous processing
2.6.1.1
Continuous Process Wafer Flow
5.4.3
Inquiry regarding wafer level continuous
processing
2.6.1.2
Continuous Process Recipe Execution
5.4.4
Inquiry regarding recipe loading for continuous
processing
2.6.1.3
Buffer Accommodates Non-Production
Wafers
5.4.5
Inquiry regarding accommodation of all wafer
types
2.6.2
Two E15.1 Load Port Minimum Buffer
4.1.2.2,
5.2.1
Inline/offline 300 mm equipment, Minimum
Buffering
2.6.2.1
Each Load Port Meets FIMS Compliance
Requirements
4.1.2.6,
5.2.2
FIMS -- FOUP door open/close, Internal equipment
buffer
2.6.2.2
Load Lock Requirement
4.1.2.6
FIMS -- FOUP door open/close
2.6.3
Additional Buffering
5.4.2
Inquiry regarding large batch or high throughput
equipment
2.6.3.1
Equipment Class Buffer Requirements
5.4.2
Inquiry regarding large batch or high throughput
equipment
2.6.4
Inline vs. Offline Load Port Requirement
4.1.2.2
2.6.5
Buffer Design Simple, Reliable and Small
5.2.4
2.6.6
Buffer Size Basis Considerations
N/A
2.6.7
Vertical Buffer Robust Recovery Support
5.4.9
Inquiry regarding buffer failure recovery capability
2.7
Integrated Minienvironment
2.7.1
Equipment Must Be Minienvironment Ready
6.2.3
Integrated minienvironment
2.7.2
Beta Equipment Include Minienvironment
6.2.3
Integrated minienvironment ease of airflow
adjustment
2.7.2.1
Pod Automatically Engages Front-Opening
Interface
4.1.2.6
FIMS -- FOUP door open/close
6.4.20
Minienvironment degradation.
2.7.2.2
Automatic Pod Open/Close Integrated
4.1.2.6
FIMS -- FOUP door open/close
2.7.3
Fab Ambient Condition Basis
N/A
2.7.3.1
Factory Cleanliness Requirements
9.3.1
Inquiry regarding equipment compatibility with
cleanrooms Class 5-6
2.7.3.2
Minienvironments Meet Process Needs
6.2.3
Minienvironment compatibility with the process
environment
2.7.4
High Speed Recovery Capability
6.4.19
Inquiry to understand if minienvironment is
designed for high speed recovery and able to attain
processing levels of cleanliness within one minute
after a down event
2.7.4.1
Minienvironment Availability Loss Definition
N/A
2.7.5
Integrated Buffering Requires
Minienvironment
N/A
2.7.6
Filter Challenge Testing Limited to PSL
Spheres
6.2.3
Usage of PSL spheres in filter challenge testing
only
2.7.7
Minienvironment to Maintain Differential
Pressure
6.4.21
The ability of the minienvironment design to
maintain differential pressure during all static and
operational equipment conditions
Technology Transfer # 98023468C-TR
Inline/offline 300 mm equipment
Simple, Reliable Buffers
International SEMATECH
145
GL #
Title/Description
FIMA
Section
Description
2.7.8
Effects of Exhausted Air
6.4.22
The exhaust function does not compromise
minienvironment performance and the
minienvironment function must not degrade
exhaust system performance
2.7.9
Eliminate Aspiration to Factory
6.2.3
Smooth and well sealed component joints,
connections, and corners
2.7.10
Constructed with Factory Compatible
Materials
6.2.3
Usage of low outgassing materials and compounds
2.7.11
Dissipation of Electrostatic Charges Both
Internal & External to the Equipment
6.4.23
Usage of dissipative materials, conductive
materials and/or dissipative methods in the design
of the minienvironment
2.7.12
Designed for Heat Dissipation
6.4.24
Design considerations for heat generated from
minienvironment components, equipment
processes, and equipment operation
2.7.13
Access Required for Test Probes
6.2.3
Presence of a port that allows for test measurement
probes to be placed within the minienvironment
2.7.14
Lighting Required to Support Operation &
Service
6.2.3
Compatibility and degradation of lighting required
to support equipment operation and service during
operation
2.7.15
Incorporation of Electrical Service within
Tool
6.2.3
Assessment of fan/filter units and associated
electrical services for the minienvironment
2.7.16
Noise and Vibration Must Meet Tool
Specifications
6.4.4
Design considerations specifically controlling and
isolating vibration
2.7.17
Include Physical Characteristics in Facilities
Cost
9.3.7
Assessment of how size, height, and weight of the
integrated minienvironment (including fan/filter
units) affected the footprint, height, floor loading,
and move-in size requirements for equipment
2.7.18
Designed for Ballroom & Bay/Chase
Configuration
6.4.25
Assessment of the differences between the
installation of a tool in a bay/chase configuration
vs. that of a ballroom layout for minienvironment
2.7.19
ES&H Compliance and SEMI S11
8.2.2
Minienvironment compliance with SEMI S11 as
well as all ES&H guidelines
2.7.20
Operational Status Indicators
6.4.26
Assessment of the means by which the
minienvironment is monitored for operational
status
2.7.21
Documentation for Operation and
Maintenance
N/A
2.7.22
Primary Equipment Responsibility as the
Integrator
N/A
2.8
Slot/Carrier Integrity
2.8.1
Wafers Return to Same Slot, Same Carrier
6.2.1
Equipment requirement to return wafers to same
carrier, same slot
2.8.2
Hardware & Software Support In Design
6.2.1
Equipment requirement to return wafers to same
carrier, same slot
2.9
Single-Side Load Ports
2.9.1
Primary Load Ports All on One Side
4.1.2.2
Inline/offline 300 mm equipment
2.9.2
Optional Exception Load Port
4.1.2.3
Permitted Auxiliary Load Ports
2.9.3
Optional Load Port PGV Compatible
4.1.2.3
Permitted Auxiliary Load Ports
International SEMATECH
Technology Transfer # 98023468C-TR
146
GL #
Title/Description
FIMA
Section
Description
2.10
Straight-Line Alignment of Load Ports
2.10.1
Equipment Front Face Alignment
4.2.2.4
Equipment compatible with delivery systems
2.10.2
SEMI E15.1 “D” & “D1” Requirement
4.1.2.5
SEMI E15.1 dimensions
2.11
Alternative User Interface Location
2.11.1
Primary User Interface Location
6.2.2
Primary and alternate user interface
2.11.2
Alternative User Interface Location/Function
6.2.2
Primary and alternate user interface
2.12
Dense Packing of Equipment In The Factory
2.12.1
Maintenance Access Recommendation
5.2.4
Simple, reliable, and minimum footprint
2.12.2
Footprint Minimization
7.3.9
Inquiry regarding minimized footprint design
2.12.3
Width (Bay Length) Control
7.3.10
Inquiry regarding design to reduce width of
equipment for efficient bay layout
2.12.4
Side-By-Side Installation Preferred
7.3.13
Inquiry regarding design for side-by-side
installation and maintenance access requirements
2.12.5
Front Access Maintenance Limitation
5.2.4
Simple, reliable, and minimum footprint
2.12.6
Side Maintenance Access Minimized
7.3.14
Inquiry regarding minimizing side maintenance
2.13
Communication Interfaces
2.13.1
Comply with SEMI SECS/GEM Standards
10.2.1
Single point of connection and link to host and
SECS-II, GEM, HSMS compliance
2.13.2
HSMS Connectivity Required
10.2.1
Single point of connection and link to host and
SECS-II, GEM, HSMS compliance
2.13.3
Parallel I/O Capability Required
4.2.2.3
Photocoupled interace.
2.13.3.1
E23 Synchronizes Load Port and AMHS
4.2.2.3
Photocoupled interface.
2.14
Cart Docking Interface
2.14.1
PGV Docking Interface Required
4.2.2.2
Equipment compatible with delivery systems
2.14.2
PGV Automation Description
4.2.2.2
Equipment compatible with delivery systems
2.14.3
Semi-Automated Docking Allowed
4.2.2.2
Equipment compatible with delivery systems
3.
Exception Lot Handling Guidelines
3.1
Handling of Exception Lots
3.1.1
Exception Wafer Type Handling Requirement
6.4.11
Inquiry regarding type 1-5 exception wafer
handling
3.1.2
Exception Lot Buffer Loading Requirement
4.1.4.2
Inquiry regarding loading and unloading of internal
buffers and exception lots
3.1.2.1
Buffer Positions Used to Store FOUPs
5.4.7
Inquiry regarding use of buffer locations for
exception wafers
3.1.3
Damaged Wafer FOUP Handling
Requirement
6.4.13
Inquiry regarding handling of FOUPs with
damaged wafers
3.1.5
AMHS Size Consideration
5.4.8
Inquiry regarding the use of buffers for exception
lots
3.1.6
CIM Tracking Requirements
10.4.5
Inquiry regarding equipment designed to physically
and logically track exception lots just like
production lots
Technology Transfer # 98023468C-TR
International SEMATECH
147
GL #
Title/Description
FIMA
Section
Description
3.1.6.1
CIM System ID and/or Carrier ID
10.4.3
Inquiry regarding equipment capability to track and
manage exception lots by assigned lot and/or
carrier IDs
3.1.6.2
CIM System Wafer ID
4.1.2.4
SEMI E15.1 load ports functionality, Inquiry
regarding equipment capability to track and
manage exception wafers by assigned wafer IDs
10.4.4
3.1.6.3
FOUP ID Reader Requirement
4.1.2.4
3.2
Handling of FOUPs During Equipment and AMHS Failures
3.2.1.1
Operator Selectable Mode for Wafer Return
6.4.14
Inquiry regarding operator selectable modes for
manual control during equipment failure
3.2.1.2
Reposition FOUP at Load Port
5.4.10
Inquiry regarding equipment failures and
repositioning the FOUP at the load port, Inquiry
regarding repositioning FOUPs at the load port
pickup point
6.4.15
SEMI E15.1 load port functionality
3.2.1.3
Buffer Local Mode Requirement
3.2.2
AMHS Failure Expectations
4.
CIM Guidelines
4.1
CIM - Production Equipment Guidelines
4.1.1
Single Communication Link
10.2.1
Single point of connection and link to host and
SECS-II, GEM, HSMS compliance
4.1.2
Compliance to Communication Standards
10.2.1
Single point of connection and link to host and
SECS-II, GEM, HSMS compliance
4.1.3
Utilization and Reliability Management
10.4.7
Inquiry regarding equipment being able to
communicate utilization and reliability date to the
host
4.1.4
Reliable Data Collection
10.4.9
Reliable data collection.
4.1.5
Variable Parameter Support
10.4.10
Variable parameter support.
4.1.6
Fault Free Date Transitions (Year 2000)
10.4.8
Fault Free processing of year 2000 dates
4.2
CIM - Load Port Guidelines
4.2.1
Bi-directional Load Port
4.1.2.4
SEMI E15.1 load ports functionality
4.2.2
Interface; Equipment to AMHS
4.2.2.3
Photocoupled interace.
4.2.3
Carrier Hand-Off Interface Enhancement
10.4.11
Inquiry about hand-off communication.
4.2.4
PGV Docking Standard
10.4.12
PGV tests performed showing compliance.
4.2.5
Carrier Sensors at E15.1 Load Port
4.1.2.4
SEMI E15.1 load ports functionality
4.2.6
Carrier ID Reader at E15.1 Load Port
4.1.2.4
SEMI E15.1 load ports functionality
4.2.7
Carrier ID Reader for Internal Buffer
Equipment
5.2.3
4.2.8
Carrier ID Reader for Fixed Buffer
Equipment
10.4.13
ID reader support and test data.
4.2.9
Load Port Backward Compatibility
10.4.14
Design for backward compatibility.
International SEMATECH
5.2.2, 6.4.16 Internal equipment buffer, Inquiry regarding
equipment with internal buffers support of
maintenance mode
N/A
Buffer Kinematic Coupling Compliance
Technology Transfer # 98023468C-TR
148
GL #
Title/Description
FIMA
Section
Description
4.3
CIM - Production Equipment Material Handling Guidelines
4.3.1
Exclusive Access Mode and Mode Change
Timing
10.4.15
Inquiry about the rejection of all access requests
except one.
4.3.2
Equivalent Handshaking for Carrier HandOff
10.4.16
Access mode switching.
4.3.3
Simultaneous OHT/PGV Interlock
10.4.1
Inquiry regarding software interlock between OHT
and PGV access to load ports
4.3.4
Independent Control of Material Handling
and Wafer Processing
10.4.17
Continuous processing transparent to operation of
material handling (both manual and automatic).
4.3.5
Processing Order Control for Equipment
Buffer
10.4.18
Tracking of buffer lots for possible priority change.
4.3.6
Carrier Transfer Control of Internal Buffer
Equipment
10.4.19
Host control of carrier movement.
4.3.7
Internal Buffer Capacity Notification
10.4.20
Inquiry regarding buffer capacity changes and
SECS-II.
4.3.8
FOUP Open and Close Control
10.4.21
Inquiry about FOUP open/close notification to host.
4.4
CIM - Production Equipment Material Management Guidelines
4.4.1
Slot Number and Load Port Numbering
6.4.18
Inquiry regarding carrier slot and load port
numbering
4.4.2
Empty Carrier Management
5.4.6
Inquiry regarding handling of empty carriers,
Inquiry regarding equipment responsibility to
manage all FOUPs at the equipment
10.4.6
4.4.3
Carrier Slot Verification
10.4.22
Inquiry regarding methods of carrier slot
verification.
4.4.4
Host Control of Wafer Process Order
10.4.23
Inquiry about host control and job management.
4.4.5
Wafer Slot and Carrier Integrity
6.2.1
Equipment requirement to return wafers to same
carrier, same slot
4.4.6
Additional Wafer Control After Processing or
Measurement
10.4.24
Inquiry surrounding the possible FOUP
destinations for wafers from single wafer tools.
4.4.7
Multi-Module Wafer Tracking Events
10.4.25
Inquiry about SECS-II messages used to single
track wafers through multiple modular tools.
4.5
CIM - Production Equipment Single Wafer Control Guidelines
4.5.1
Recipe and Variable Parameter Change
Between Wafers
10.4.26
Inquiry about variable parameter change
capabilities within a tool.
4.5.2
Process Parameter Change Between Wafers
10.4.27
Inquiry regarding recipe changes between wafers.
4.6
CIM - AMHS Equipment Guidelines
4.6.1
Interoperable AMHS Equipment
10.4.2
Inquiry regarding communicating with AMHS
equipment
4.6.2
AMHS Framework
10.4.28
Inquiry about standards compliance and integration
of MCS software.
Technology Transfer # 98023468C-TR
International SEMATECH
149
APPENDIX C
Cross Reference FIMA Section to Factory Guidance (GL #)
FIMA
Section
Title/Description
4.1
Load Port Assessment
4.1.2
Load Port Physical Testing
4.1.2.1
FOUP Compatibility
4.1.2.2
4.1.2.3
4.1.2.4
Minimum Load Port Requirements
Permitted Auxiliary Load Ports
Load Port Features
GL #
2.1.1
13 Wafer Supports Early Implementation
2.1.2
25 Wafer Supports Mass Production
2.3.1
FOUP Support Requirement
2.4.3
25 Wafer Base Design Requirement
2.6.2
Two E15.1 Load Port Minimum Buffer
2.6.4
Inline vs. Offline Load Port Requirement
2.9.1
Primary Load Ports All on One Side
2.4.1.1
Buffer Port Exception (Height)
2.9.2
Optional Exception Load Port
2.9.3
Optional Load Port PGV Compatible
2.2.2
Transport Carrier 10 mm Pitch
2.2.4
Kinematic Coupling Requirement
2.4
4.1.2.5
4.1.2.6
SEMI E15.1 Compliance
FIMS Compliance
Description
Compliance With SEMI E15.1 Load Port and
SEMI E62 FIMS Interface
3.1.6.2
CIM System Wafer ID
3.1.6.3
FOUP ID Reader Requirement
4.2.1
Bi-directional Load Port
4.2.5
Carrier Sensors at E15.1 Load Port
4.2.6
Carrier ID Reader at E15.1 Load Port
2.3.5
Human Handles Size and Space
2.4.1
SEMI E15.1 Compliance
2.4.1.1
Buffer Port Exception (Height)
2.10.2
SEMI E15.1 “D” & “D1” Requirement
2.3.2
Automatic Pod Opener Requirement
2.6.2.1
Each Load Port Meets FIMS
2.6.2.2
Load Lock Requirement
2.7.2.1
Pod Automatically Engages Front-Opening
Interface
2.7.2.2
Automatic Pod Open/Close Integrated
4.1.4
Load Port Intelligent Inquiry
4.1.4.1
Inquiry regarding cost-effectiveness
2.1.3
Cost Effective Conversion Requirement
4.1.4.2
Inquiry regarding internal buffers and exception
lots
3.1.2
Exception Lot Buffer Loading Requirement
4.1.4.3
Inquiry regarding interoperability
2.3.3
Interoperability Requirement
4.1.4.4
Inquiry regarding pod handling flange
2.3.4
Robotic Handling Flange for Pods
International SEMATECH
Technology Transfer # 98023468C-TR
150
FIMA
Section
Title/Description
4.2
Interfaces for Material Delivery
4.2.2
Material Delivery Interfaces Physical Testing
4.2.2.1
OHT Exclusion Zone
4.2.2.2
4.2.2.3
Cart Docking Interface
Photocoupled Interface
GL #
2.5.1
Floor Based and OHT System Compatible
2.5.1.1
Both Delivery Systems Used Concurrently
2.5.2
Vertical OHT Easement
2.5.3
Load Port E15.1 Overhead Clearance
2.5.1
Floor Based and OHT System Compatible
2.14.1
PGV Docking Interface Required
2.14.2
PGV Automation Description
2.14.3
Semi-Automated Docking Allowed
2.13.3
Parallel I/O Capability Required
2.13.3.1
4.2.2.4
AMHS Installation Alignment
4.2.4
Material Delivery Interfaces Intelligent Inquiry
4.2.4.1
Inquiry regarding concurrent but not simultaneous
access to load ports
4.2.4.2
Inquiry regarding load ports on internal buffers
5
Buffering
5.2
Buffering Physical Testing
5.2.1
5.2.2
5.2.3
5.2.4
Description
Synchronized Intrabay AMHS Vehicle and Load
Port Communication
4.2.2
Interface; Equipment to AMHS
2.10.1
Equipment Alignment
2.5.1.1
Both Delivery Systems Used Concurrently
2.5.4
Supplemental Buffer Load Ports
Requirement for Buffering
2.6.2
Two E15.1 Load Port Minimum Buffer
Buffer FIMS Compliance
2.6.2.1
Each Load Port Meets FIMS
3.2.1.3
Buffer Local Mode Requirement
2.2.4
Kinematic Coupling Requirement
4.2.7
Carrier ID Reader for Internal Buffer Requirement
2.6.5
Buffer Design Simple, Reliable and Small
2.12.1
Maintenance Access Recommendation
2.12.5
Front Access Maintenance Limitation
Buffer Kinematic Couplings Compliance
Simple, Reliable Buffers
5.4
Buffering Intelligent Inquiry
5.4.1
Inquiry regarding design for continuous processing
2.6.1
Integral Buffer for Continuous Processing
5.4.2
Inquiry regarding large batch or high throughput
equipment
2.6.3
Additional Buffering
2.6.3.1
Equipment Class Buffer Requirements
5.4.3
Inquiry regarding wafer level continuous
processing
2.6.1.1
Continuous Process Wafer Flow
5.4.4
Inquiry regarding recipe loading for continuous
processing
2.6.1.2
Continuous Process Recipe Execution
5.4.5
Inquiry regarding accommodation of all wafer
types
2.6.1.3
Buffer Accommodates Non-Production Wafers
5.4.6
Inquiry regarding handling of empty carriers
Technology Transfer # 98023468C-TR
4.4.2
Empty Carrier Management
International SEMATECH
151
FIMA
Section
Title/Description
GL #
5.4.7
Inquiry regarding use of buffer locations for
exception lots
5.4.8
Inquiry regarding design consideration for internal
equipment buffers
3.1.5
AMHS Size Consideration
5.4.9
Inquiry regarding buffer failure recovery capability
2.6.7
Vertical Buffer Robust Recovery Support
5.4.10
Inquiry regarding equipment failures and
repositioning the FOUP at the load port
6
Equipment Capability Requirements
6.2
Equipment Capability Requirement Physical Testing
6.2.1
Slot and Carrier Integrity and Alignment
6.2.2
6.2.3
User Interface
Minienvironments
3.1.2.1
Description
3.2.1.2
Buffer Positions Used to Store Foups
Reposition FOUP at Load Port
1.1.10
Wafer Notch Alignment
1.4.1
Slot-to-Slot Integrity
2.8.1
Wafers Return to Same Slot, Same Carrier
2.8.2
Hardware & Software Support In Design
4.4.5
Slot and Carrier Integrity
2.11.1
Primary User Interface Location
2.11.2
Alternative User Interface Location/Function
2.7.1
Equipment Must Be Minienvironment Ready
2.7.2
Beta Equipment Include Minienvironment
2.7.3.2
Minienvironment Must Be Compatible with
Process Needs
2.7.6
Filter Challenge Testing Limited to PSL Spheres
2.7.9
Eliminate Aspiration to Factory
2.7.10
Constructed with Factory Compatible Materials
2.7.13
Access Required for Test Probes
2.7.14
Lighting Required to Support Operation & Service
2.7.15
Incorporation of Electrical Service within Tool
6.4
Equipment Capability Requirement Intelligent Inquiry
6.4.1
Inquiry regarding edge exclusion
6.4.2
Inquiry regarding voltage drop-out immunity
1.3.2.3
Electrical Voltage Drop-Out Immunity
6.4.3
Inquiry regarding pressure drop immunity
1.3.2.4
Pressure Drop Immunity (Liquid and Gas)
6.4.4
Inquiry regarding vibration isolation
1.1.9
3 Mm Edge Exclusion
1.3.4
Relative Vibration Isolation
2.7.16
Noise and Vibration Must Meet Tool
Specifications
6.4.5
Inquiry regarding dissipation of ESC
1.3.5
Static Charge Dissipation
6.4.6
Inquiry regarding internal wafer carrier
2.3.6
Internal Carrier Responsibility
6.4.7
Inquiry regarding internal wafer carrier
characteristics
2.2.3
Process Carrier Exception
6.4.8
Inquiry regarding configuration of internal gas
delivery system
1.3.6.1
Gas Delivery/Systems Requirements
6.4.9
Inquiry regarding configuration of internal
chemical delivery system
1.3.6.2
Liquid Systems Purity Requirements
6.4.10
Inquiry regarding standard interface for equipment
support vacuum pumps
1.3.6.3
Vacuum Pump Interface Standardization
International SEMATECH
Technology Transfer # 98023468C-TR
152
FIMA
Section
Title/Description
GL #
Description
6.4.11
Inquiry regarding handling of exception wafer
types 1-5
3.1.1
6.4.12
Inquiry regarding support for advanced process
control and in situ sensors
1.1.7.1
6.4.13
Inquiry regarding handling of FOUPs with
damaged wafers
6.4.14
Inquiry regarding operator selectable modes for
manual control during equipment failure
3.2.1.1
Operator Selectable Mode for Wafer Return
6.4.15
Inquiry regarding repositioning FOUPs at the load
port pickup point
3.2.1.2
Reposition FOUP at Load Port
6.4.16
Inquiry regarding equipment with internal buffers
support of maintenance mode
3.2.1.3
Buffer Local Mode Requirement
6.4.17
Inquiry regarding designed in capacity to collect
and analyze productivity performance
1.1.2.1
Embedded Support of E10, E58, OEE & IEE
6.4.18
Inquiry regarding carrier slot and load port
numbering
4.4.1
Slot Number and Load Port Numbering
6.4.19
Inquiry regarding minienvironment capability for
high speed recovery
2.7.4
Minienvironment High Speed Recovery
6.4.20
Assessment of minienvironment degradation
6.4.21
Minienvironment designs must maintain
differential pressure during all static and
operational equipment conditions
2.7.7
Minienvironment to Maintain Differential Pressure
6.4.22
The exhaust function does not compromise
minienvironment performance and the
minienvironment function must not degrade
exhaust system performance
2.7.8
Effects of Exhausted Air
6.4.23
Usage of dissipative materials, conductive
materials and/or dissipative methods in the design
of the minienvironment
2.7.11
Dissipation of Electrostatic Charges Both Internal
& External to the Equipment
6.4.24
Design considerations for heat generated from
minienvironment components, equipment
processes, and equipment operation
2.7.12
Designed for Heat Dissipation
6.4.25
Assessment of the differences between the
installation of a tool in a bay/chase configuration
vs. that of a ballroom layout for minienvironment
2.7.18
Designed for Ballroom & Bay/Chase
Configuration
6.4.26
Assessment of the means by which the
minienvironment is monitored for operational
status
2.7.20
Operational Status Indicators
6.4.27
Inquiry related to the use of data from product
wafer test sites and how results are provided to the
host system
1.1.7.2
NPW Reduction – Use Inline Metrology to
Analyze Wafer Test Sites & Communicate Data to
Host
6.4.28
Inquiry about process data and parameters that are
supplied to the host system to support equipment
self-diagnosis
1.1.7.3
NPW Reduction – Equipment Parameters
Available to User Through Single Communication
Link
6.4.29
Inquiry process that communicates equipment
parameters to the host system via a single
communication link
1.1.7.4
NPW Reduction - Comm/Sensor Bus Compliance
with one of the SEMI E54 Sensor Bus
Communication Standards
Technology Transfer # 98023468C-TR
3.1.3
2.7.2.1
Exception Wafer Type Handling Requirement
Advanced Process Control Support
Damaged Wafer FOUP Handling Requirement
Pod Automatically Engages Front-Opening
Interface
International SEMATECH
153
FIMA
Section
Title/Description
GL #
Description
7
Productivity
7.3
Productivity Intelligent Inquiry
7.3.1
Data collection regarding relative capital cost vs.
200 mm equipment
1.1.1
Relative Capital Cost
7.3.2
Data collection regarding availability of
production equipment (process and metrology)
1.1.2
Availability
7.3.3
Data collection regarding relative equipment
installation and qualification costs to capital costs
1.1.3
Installation and Qualification Cost
7.3.4
Data collection regarding relative equipment
installation and qualification duration compared to
200 mm equipment
1.1.4
Relative Installation and Qualification Duration
7.3.5
Data collection regarding relative equipment
maintenance and spares cost compared to 200 mm
equipment
1.1.5
Relative Maintenance and Spares Cost
7.3.6
Data collection regarding relative utilities (power,
compressed air, exhaust) consumption compare to
200 mm equipment
1.1.6
Relative Consumable Cost
7.3.7
Data collection regarding relative monitor wafer
usage compared to 200 mm equipment
1.1.7
Relative Monitor Wafer Usage
7.3.8
Data collection regarding relative reliability
compared to 200 mm equipment
1.1.8
Relative Software Reliability
7.3.9
Inquiry regarding minimized footprint design
2.12.2
Footprint Minimization
7.3.10
Inquiry regarding design to reduce width of
equipment for efficient bay layout
2.12.3
Width (Bay Length) Control
7.3.11
Data collection regarding relative utilities (power,
water and process chemicals) consumption
compared to 200 mm equipment
1.3.2.1
Relative Utilities Consumption
7.3.12
Data collection regarding relative scrubbed
exhaust requirements compared to 200 mm
equipment
1.3.2.2
Relative Scrubbed Exhaust Requirement
7.3.13
Inquiry regarding design for side-by-side
installation and maintenance access requirements
2.12.4
Side-By-Side Installation Preferred
7.3.14
Inquiry regarding minimizing side maintenance
2.12.6
Side Maintenance Access Minimized
8
Environmental, Safety, and Health
8.2
Environmental, Safety, and Health Physical Testing
8.2.1
3rd party assessment of S2, S8, and CE Mark
1.2.1
Comply 100% with S2 and S8
1.2.2
Comply 100% to European Union (EU) Directives
2.7.19
ES&H Compliance and SEMI S11
8.2.2
Minienvironment compliance with SEMI S11 as
well as all ES&H guidelines
8.4
Environmental, Safety, and Health Intelligent Inquiry
8.4.1
Inquiry regarding compliance to all national and
local codes
8.4.2
Data collection regarding noise emissions
assessment and compliance to S2
1.2.3
Relative Noise Emissions Level
8.4.3
Data collection regarding HAPS assessment
1.2.4
Relative HAPS Emissions
8.4.4
Data collection regarding PFCs assessment
1.2.5
Relative PFC Emissions
International SEMATECH
1.2.1.1
All National and Local Codes Met
Technology Transfer # 98023468C-TR
154
FIMA
Section
Title/Description
8.4.5
Data collection regarding VOCs assessment
8.4.6
Usage of SEMI standards S2 and S8 during system
development of facilities interfaces
9
Facilities Interfaces
9.3
Facilities Interfaces Intelligent Inquiry
9.3.1
Inquiry regarding equipment compatibility with
cleanrooms Class 5-6
GL #
1.2.6
1.2.1.2
1.3.3
Description
Relative VOC Emissions
SEMATECH Application Guide for SEMI S2 &
S8
Cleanroom Class Compatibility
2.7.3.1
Factory Cleanliness Requirements
9.3.2
Inquiry regarding equipment compatibility with
cleanroom temperature and humidity ranges
1.3.3.1
Temperature and Humidity Compatibility
9.3.3
Inquiry regarding equipment design to ceiling and
OHT height restrictions
1.3.1.2
Equipment Height that Affects Ceiling Height
9.3.4
Inquiry regarding relative footprint/productivity
requirements
9.3.5
Inquiry regarding support equipment footprint
requirements
9.3.6
Inquiry regarding conformance to accommodation
process of SEMI E70 and connection layout of
SEMI PR2 and E6
1.3.6
Factory Accommodation Process
9.3.7
Inquiry on how size, height, and weight of the
integrated minienvironment (including fan/filter
units) affected the footprint, height, floor loading,
and move-in size requirements for equipment
2.7.17
Include Physical Characteristics in Facilities Cost
9.3.7
Use of SEMI E51 during development of the
facilities interfaces
1.3.2
Facility Utilities per SEMI E51
10.
Equipment Communication Interfaces
10.2
Equipment Communication Interfaces Physical Testing
10.2.1
Communications Interface
1.3.1
1.3.1.1
Relative Footprint
Support Equipment Footprint
2.13.1
Comply with SEMI SECS/GEM Standards
2.13.2
HSMS Connectivity Required
4.1.1
Single Communication Link
4.1.2
Compliance to Communication Standards
10.4
Equipment Communication Interfaces
Intelligent Inquiry
10.4.1
Inquiry regarding software interlock between OHT
and PGV access to load ports
4.3.3
Simultaneous OHT/PGV Interlock
10.4.2
Inquiry regarding communicating with AMHS
equipment
4.6.1
Interoperable AMHS Equipment
10.4.3
Inquiry regarding equipment capability to track
and manage exception lots by assigned lot and/or
carrier IDs
3.1.6.1
CIM System ID and/or Carrier ID
10.4.4
Inquiry regarding equipment capability to track
and manage exception wafers by assigned wafer
IDs
3.1.6.2
CIM System Wafer ID
10.4.5
Inquiry regarding equipment designed to
physically and logically track exception lots just
like production lots
3.1.6
Technology Transfer # 98023468C-TR
CIM Tracking Requirements
International SEMATECH
155
FIMA
Section
Title/Description
GL #
Description
10.4.6
Inquiry regarding equipment responsibility to
manage all FOUPs at the equipment
4.4.2
Empty Carrier Management
10.4.7
Inquiry regarding equipment being able to
communicate utilization and reliability date to the
host
4.1.3
Utilization and Reliability Management
10.4.8
Inquiry regarding equipment capability for faultfree date transitions
4.1.6
Fault-Free Date Transitions
10.4.9
Inquiry regarding time stamping of data collection
4.1.4
Reliable Data Collection
10.4.10
Inquiry regarding variable parameters set by the
host or operator
4.1.5
Variable Parameter Support
10.4.11
Inquiry regarding allowances for both continuous
and simultaneous hand-off of up to two carriers at
load ports
4.2.3
Carrier Hand-Off Interface Enhancement
10.4.12
Questions that address mechanical docking at any
standard compliant load port through a standard
PGV docking interface
4.2.4
PGV Docking Standard
10.4.13
Inquiry about the position of the carrier ID reader
dependent upon reader technology
4.2.8
Carrier ID Reader for Fixed Buffer Equipment
10.4.14
Inquiry about the minimization of load port spares
in 300 mm factories
4.2.9
Load Port Backward Compatibility
10.4.15
Inquiry as to how a tool allows for only one access
mode to be accepted during normal production
runs
4.3.1
Exclusive Access Mode and Mode Change Timing
10.4.16
Questions about switching between manual access
mode and automatic access mode
4.3.2
Equivalent Handshaking for Carrier Hand-Off
10.4.17
Inquiry that addresses the support of automated
and manual material handling interactions
independent of wafer processing and measurement
operations
4.3.4
Independent Control of Material Handling and
Wafer Processing
10.4.18
Inquiry about the ability to set and change the
processing order as directed by the host from the
operator interface
4.3.5
Processing Order Control for Equipment Buffer
10.4.19
Inquiry regarding the support of standard carrier
handling commands by the equipment
4.3.6
Carrier Transfer Control of Internal Buffer
Equipment
10.4.20
Inquiry about how the host is notified of capacity
changes
4.3.7
Internal Buffer Capacity Notification
10.4.21
Query surrounding notification of FOUP status to
the host
4.3.8
FOUP Open and Close Control
10.4.22
Questions regarding how a tool verifies open or
occupied slots in a FOUP
4.4.3
Carrier Slot Verification
10.4.23
Inquiry about how equipment supports host control
of wafer process orders
4.4.4
Host Control of Wafer Process Order
10.4.24
Inquiry about the methods that equipment uses to
support additional wafer control after processing
or measurement
4.4.6
Additional Wafer Control After Processing or
Measurement
10.4.25
Inquiry regarding the methods that equipment uses
to track multi-module single wafer processing
4.4.7
Multi-Module Wafer Tracking Events
International SEMATECH
Technology Transfer # 98023468C-TR
156
FIMA
Section
Title/Description
GL #
10.4.26
Questions on how equipment supports both recipe
changes or variable parameter changes between
wafers
4.5.1
Recipe and Variable Parameter Change Between
Wafers
10.4.27
Questions that address how equipment supports
runtime variable parameter modification by host
4.5.2
Process Parameter Change Between Wafers
10.4.28
Inquiry regarding the integration of AMHS system
with equipment controllers
4.6.2
AMHS Framework
Technology Transfer # 98023468C-TR
Description
International SEMATECH
157
APPENDIX D
Acronyms
The acronyms used in this document are defined below.
Acronym
Definition
AGV
Automatic Guided Vehicle
FIMA
Factory Integration Maturity Assessment
FIMS
Front Opening Interface Mechanical Standard
FOSB
Front Opening Shipping Box
FOUP
Front Opening Unified Pod
HAP
Hazardous Air Pollutant
I/O
Input/Output
OHT
Overhead Hoist Transport
PFC
Perflourocarbon
POU
Point-of-use
PGV
Person Guided Vehicles
RSP
Reticle SMIF Pod
SEMI
Semiconductor Equipment and Materials International
SMIF
Integrated Standard Mechanical Interface
U/I
User Interface
UPW
Ultra Pure Water
VOC
Volatile Organic Compound
International SEMATECH
Technology Transfer # 98023468C-TR
158
Technology Transfer # 98023468C-TR
International SEMATECH
159
APPENDIX E
Glossary
The terms used in this document are defined below.
Term
Definition
Bilateral datum plane
A vertical plane that bisects the wafers and that is perpendicular to
both the horizontal and facial datum planes. See Figure 9 and
Figure 17, Datum Point Reference.
Buffer
Physical FOUP storage locations on the process or metrology
equipment, where the next lot(s) to be processed wait while the
current lot(s) are processed.
Chimney exclusion zone
A SEMI defined exclusion zone, or volume, above the load port that
ensures the capability of loading from overhead systems.
Exclusion zone
A volume of “air” that no part of the equipment can enter in any
way.
Equipment boundary
The outermost part of the equipment defines the equipment
boundary. For example, if a button or user interface screen protrudes
from the panel of the equipment, the equipment boundary is defined
by an invisible plane at the edge of the protrusion and is not
physically realized as a surface.
Horizontal datum plane
A horizontal plane from which projects the kinematic coupling pins
on which the FOUP sits. On equipment load ports, it is at the load
height specified in SEMI E15 and might not be physically realized
as a surface.
Kinematic coupling
A registering mechanism commonly employed in 300 mm
equipment, consisting of three pins and corresponding mating
surfaces that provide an order of magnitude improvement in wafer
registration and placement accuracy compared to the traditional Hbar in 200 mm.
Load Port
A defined location on the process and metrology equipment, located
at the front of the equipment, where the FOUP is loaded for
processing or unloaded from after processing is complete.
Load face plane
The load face plane is defined as the furthest physical vertical
boundary plane from the FOUP centroid (marked on fixture) on the
front of the equipment.
Minienvironment
In a factory-employing minienvironment, only the wafer processing
zone and its closest vicinity is kept very clean, while the other areas
are sealed off and allowed to remain at Class 100 or worse.
International SEMATECH
Technology Transfer # 98023468C-TR
160
Term
Definition
Photocoupled interface
or I/O
Low level communications handshake between the equipment load
ports and intrabay robots. This interface permits the safe exchange
and transfer of FOUPs between load ports and intrabay robots.
Uni-Cassette
A term first originated in 200 mm, signifying the capability of the
process or metrology equipment to return wafers to the same slot of
the same carrier after processing. Such a capability greatly improves
cascading ability and improves the effective run rate of the
equipment.
Technology Transfer # 98023468C-TR
International SEMATECH
161
APPENDIX F
Minienvironment Parametric Test Methods
F.1
Purpose of the Assessment
This assessment is to determine the performance capabilities of the integrated minienvironment
in meeting the I300I requirements stated in Guideline 7 and the guideline elaboration statements.
Since, each IC manufacturer will have different criteria for the minienvironment, this assessment
plan will determine the characteristics of the minienvironment and report the characteristics in a
standard format. SEMI E44-96 is to be used as the standard report format for data.
F.2
Instrumentation/Tools/Prerequisites
F.2.1
Instrumentation/Tools
1. Airborne Particulate – Met One laser particle counter or equivalent. Sensitivity of 0.1 µm and
a counting efficiency of at least 90%.
2. Pressure/Velocity – Shortridge ADM-870, Solomat MPM 4000, or equivalent.
3. Metric tape measure.
4. Set of metric feeler gauges.
F.2.2
Supplies
1. One 25-wafer FOUP.
F.2.3
Prerequisite/Reference Material
1. Plan diagram of equipment (three copies – designating wafer stop/pause locations,
doors/access points, filter coverage).
2. ISO 14644-1 Cleanrooms and associated controlled environments.
3. SEMI E14 Measurement of Particle Contamination Contributed to the Product from the
Process or Support Tool.
4. SEMI E44-96 Guide for Procurement and Acceptance of Mini-environments.
5. Detailed FIMA Guideline Conformance Procedure (Document 3).
F.3
Setup Procedures
F.3.1
Inspection at Equipment Supplier (non-clean room)
1. Equipment must have an operational loadport, wafer handler, fan/filter unit, exhaust units (if
applicable).
2. The equipment should be on a raised floor. Indicate in Table 2 of SEMI E44, the test
conditions. (Unknown how much influence a solid floor will have on testing - differential
pressure, air flow, etc.)
International SEMATECH
Technology Transfer # 98023468C-TR
162
F.3.2
Inspection in a Clean Room Facility
1. Equipment must have an operational loadport, wafer handler, fan/filter unit, exhaust units.
2. The equipment installed and in operation as per manufacturing use. Indicate in Table 2 of
SEMI E44, the test conditions.
F.3.3
Documentation
For either setup, document all wafer stop/pause locations during wafer handling operations such
as:
1. Extracted from FOUP #1 through ‘N’ (at each FIMS)
2. Notch finder
3. Wafer ID reader
4. Placement into internal equipment cassette
5. XY Stage
6. Process Chamber
7. Cool down
8. Internal wafer buffer
Also document each enclosure opening which requires daily opening for operation or
maintenance (reference Table 15 of SEMI E44).
F.4
Test Procedures
F.4.1
Visual Inspection
Table F-1
Test
Guideline
Reference
Visual Inspection
Tool
SEMI E44
Table
Result
Verify equipment can engage a FOUP.
Visual
N/A
[P] [F]
Check FIMS and FOUP interface for
gaps. Indicate seal/gasket information in
SEMI E44 Table 16. Criteria: Gaps
should be < 0.5 mm.
Visual
Table 16
[P] [F]
Verify that the FOUP does not lift off
kinematic pins as it engages the FIMS
door seal.
Visual
N/A
[P] [F]
Verify FIMS is operational. Indicate
automated I/O Information in SEMI E44
Table 17.
Visual
Table 17
[P] [F]
Verify minienvironment coverage for all
exposed wafer areas.
Visual
N/A
[P] [F]
Verify that FOUP storage (internal buffer)
and internal exposed wafer movement
areas do not share the same environment.
Visual
N/A
[P] [F]
Definition
Technology Transfer # 98023468C-TR
International SEMATECH
163
Test
Guideline
Reference
SEMI E44
Table
Definition
Tool
Result
Check frame and panel surfaces for finish
integrity, smoothness, scratches and
defects. Record information in SEMI E44
Tables 13 and 14
Visual
Tables 13
and 14
[P] [F]
Verify materials used for wall and frame.
Record information in SEMI E44 Tables
13 and 14.
Visual
Tables 13
and 14
[P] [F]
Verify that no bare metal surfaces exist in
the minienvironment. All surfaces shall
be anodized, stainless or painted using
powder coat paint.
Visual
Tables 13
and 14
[P] [F]
Check component joints, connections and
corners for strength, integrity, tightness
and smoothness. Record information in
SEMI E44 Table 16.
Visual
Table 16
[P] [F]
Check operation of seals on doors,
hinges, latches and removable panels.
Record information in SEMI E44
Table 15
Visual
Table 15
[P] [F]
Verify operation and ease of adjustment
of relief Grilles (diffusers) and baffles
(dampers) for Adjusting air balance and
pressurization. Record information in
SEMI E44 Table 15.
Visual
Table 15
[P] [F]
Verify maintenance accessibility, fanmotor and equipment interference.
Record information in SEMI E44 Table
15.
Visual
Table 15
[P] [F]
Verify minienvironment dimensions.
Record information in SEMI E44 Table 1.
Criteria: Dimensions - must be no larger
than and included in the equipment
footprint. Height - Cannot exceed 3500
mm (Reference SEMI PR1
Visual
Table 1
[P] [F]
Tape Measure
Table 23
[P] [F]
Visual
N/A
[P] [F]
Documentation
Table 11
[P] [F]
(Doc 2708))
Verify enclosure lighting meets
requirements for the specific piece of
equipment. Record information in SEMI
E44 Table 23 as “Others”.
Verify that electrical services for the
Minienvironment fan/filter units are
incorporated in the equipment electrical
service and are not separate.
Verify filter documentation. Record type
and certification in SEMI E44 Table 11.
Criteria: Efficiency of filter = 99.99995%
at 0.1 µm particle size and the MPPS
International SEMATECH
Technology Transfer # 98023468C-TR
164
Guideline
Reference
Test
Tool
SEMI E44
Table
Result
Verify filter media is solvent and acid
resistant and low boron, or boron free
such as PTFE.
Documentation
N/A
[P] [F]
Verify that filter challenge testing did not
use DOP or Mineral Oil
Documentation
N/A
[P] [F]
Verify fan documentation. Record type
and certification in SEMI E44 Table 12.
Indicate if variable speed control in
“Others”.
Documentation
Table 12
[P] [F]
Documentation
Inspect and indicate any selfmeasurement or Control systems in SEMI
E44 Table 19.
Table 19
[P] [F]
Documentation
Table 19
[P] [F]
Definition
Indicate the existence of any differential
pressure visual indicators on the
equipment.
F.4.2
Air Velocity and Adjustability
1. Using the Shortridge or equivalent, measure the air velocity over the center of the wafer
handler, holding the probe at the wafer level for a minimum of 5 seconds. Measure the
location 3 times.
2. Set the velocity adjustment to High setting. Record measurements.
3. Set the velocity adjustment to Low setting. Record measurements.
4. Record values for Velocity in Table 10 of SEMI E44.
M/E Air Velocity Range
High Velocity (FPM)
Low Velocity (FPM)
90 ft/min ±10 %
40 ft/min ±10 %
Test #1
Test #2
Test #3
Average (Sum/3)
Criteria
Technology Transfer # 98023468C-TR
International SEMATECH
165
For tools with exhaust systems, the following additional testing is required.
Complete the following matrix by setting the M/E air velocity and exhaust system accordingly.
Record the values for Air Velocity in the table.
Criteria: With the exhaust system at the min and max settings, the measured minienvironment air
velocity should be adjustable to the following values.
M/E @ High Velocity Setting
M/E Air Velocity Measurement Air Velocity Criteria (FPM)
Exhaust @ Maximum Setting
90 ±10 %
Exhaust @ Minimum Setting
90 ±10 %
M/E @ Low Velocity Setting
M/E Air Velocity Measurement Air Velocity Criteria (FPM)
Exhaust @ Maximum Setting
40 ±10 %
Exhaust @ Minimum Setting
40 ±10 %
F.4.3
Static Pressure
1. Using the Shortridge or equivalent, place a low pressure sensor outside of the equipment
minienvironment.
2. Place a high-pressure sensor inside the minienvironment above the center of the wafer
handler.
3. Open all air flow dampers.
4. Measure with FOUP opened on FIMS.
5. Repeat measurement with FIMS port closed. (No FOUP)
6. Record values for Velocity in Table 10 of SEMI E44.
7. Verify the pressure readings are the same as displayed on the differential pressure indicator if
applicable (see Visual Inspection section).
Criteria: static pressure ≥ 0.005” H20 above cleanroom ambient
Static Pressure Measurements
M/E Static Pressure Measurement
Static Pressure Criteria (in H20)
No FOUP engaged
≥ 0.005”
FOUP engaged @ loadport
≥ 0.005”
For tools with exhaust systems, the following additional testing is required.
Complete the following matrix by setting the M/E air pressure and exhaust system accordingly.
Record the values for Static Pressure in the table which follows.
Static Pressure Measurements
M/E Static Pressure Measurement
Static Pressure Criteria (in H20)
Exhaust @ Maximum Setting
≥ 0.005”
Exhaust @ Minimum Setting
≥ 0.005”
International SEMATECH
Technology Transfer # 98023468C-TR
166
F.4.4
Installed Filter Test
1. Using the Met One (or equivalent) measure the airborne particulate of the filter by scanning
the entire face of the filter(s) with overlapping strokes.
2. The probe shall be held 1 inch from the face of the filter and traversed at no more than
2.0 inches per second.
3. All filters, grids and gasket areas are to be scanned.
4. Re-check any areas that produce particulate counts.
Criteria: No areas found with repeated, high particulate counts
F.4.5
Airborne Particulate Test
Equipment should be installed in a Class ISO-7 (Class 10K) or simulated ambient environment
to provide a sufficient challenge to the minienvironment. Therefore, the ambient environment
must be measured to ascertain the challenge conditions.
F.4.6
Recovery Test
1. Obtain baseline data from Air Velocity, Static Pressure and Airborne Particulate Test.
2. Open the minienvironment to the ambient for 5 minutes.
3. Close the minienvironment and record the amount of time required for the minienvironment
to return to the baseline data values. Repeat tests.
Criteria: The minienvironment is required to recovery to baseline performance values within one
minute (reference Guideline 7.4).
Air Velocity Recovery
[P] [F]
Static Pressure Recovery
[P] [F]
Airborne Particulate Recovery
[P] [F]
F.5
Ambient Air Classification
1. Using the Met One (or equivalent) measure the airborne particulate around the process tool.
Establish at least three measurement locations (more may be required based on size of
equipment) and sample the challenge air for 1 min. (minimum) in each location. This time is
based on a sample rate of 1 ft3/min. and provides a sample sufficient to detect 20 particles of
the targeted size.
2. Record the number of particles for sizes 0.5 µm and 1.0 µm.
Ambient Air Classification
0.5 µm particles/m3
1.0 µm particles/m3
≥ 352,000
≥ 83,200
Test #1
Test #2
Test #3
Average (Sum/3)
Criteria (ISO-7)
Technology Transfer # 98023468C-TR
International SEMATECH
167
F.6
M/E Air Classification
1. Using the Met One (or equivalent) measure the airborne particulate above the center of the
wafer handler and other areas where bare wafers reside. Take 3 measurements, each sampling
for 8 minutes (minimum). This time is based on a sample rate of 1 ft3/min. and provides a
sample sufficient to detect 20 particles of the targeted size.
2. Record the values for Cleanliness of Equipment at Rest in Table 9 of SEMI E44.
M/E Air Classification
0.1
P
0.2
P
Additional bins
Test #1
Test #2
Test #3
Average (Sum/3)
Criteria (ISO-2) particles/m3
≤ 100
≤ 24
F.7
Action Items for Equipment Supplier
1. Supply airflow modeling diagrams. Attach to Table 10 of SEMI E44 for air flow direction.
2. Supply thermal modeling diagrams. Attach to Table 10 of SEMI E44 for temperature data.
3. Supply Noise and Vibration data for Table 23 of SEMI E44.
4. Supply self obtained minienvironment data.
5. Supply Operation manual.
6. Supply Maintenance manual.
7. Supply Spare Parts manual.
F.8
QA/Measurement Access Port
The following is a suggested design for the QA/Measurement Access Port.
3 holes, #8-32 threaded insert
equally spaced on 2.6" diam.
2" diam. access
hole in ME wall
Note: Materials to comply with
design best practices document
International SEMATECH
3 holes, 0.188" diam. equally
spaced on 2.6" diam.
Access hole
cover plate
3" diam.
min. 0.0625" thk.
Technology Transfer # 98023468C-TR
International SEMATECH Technology Transfer
2706 Montopolis Drive
Austin, TX 78741
http://www.sematech.org
e-mail: info@sematech.org