Design and Fabrication of Novel Devices Using the Casimir Force for Non-contact Actuation Emma L Carter, Michael Ward, Carl Anthony School of Mechanical Engineering University of Birmingham Birmingham, UK The Casimir force has been found to be the cause of stiction 1 problems in MEMS devices resulting in permanent adhesion of close adjacent surfaces. However, it has also been proposed that the Casimir force can be harnessed to achieve non-contact actuation in MEMS sensors. One way of achieving this is to use the lateral component of the Casimir force through suitably constrained moving parts and designed surfaces. Three devices were designed and fabricated using UV lithography and dry etching. Device 1 is designed to demonstrate non-contact actuation using the normal Casimir force in the wafer plane, device 2 uses the lateral Casimir force for parallel motion noncontact actuation and device 3 uses the lateral Casimir force for perpendicular non-contact actuation. All devices use similar comb drives and capacitive sensors. The design of the devices, fabrication limitations and expected qualitative results are discussed. I. INTRODUCTION The Casimir force is a manifestation of the quantum electromagnetic field and can be understood as a retarded Van der Waals attraction between interacting macroscopic bodies rather than the Van der Waals interaction between constituent atoms and molecules – the retardation being a consequence of the finite velocity of light being significant with respect to the increased separation [1]. In 1958, Hendrick Casimir presented his work on the attraction between two perfectly conducting plates with its ubiquitous equation (1) relating the force, Fc, to the area, A, of the plates and the separation, d, between them [2]. electrostatic charge drowning out the relatively small Casimir force and uneven pull-down of parallel plates due to the rapid drop off of the force with separation prompting most to resort to a sphere and plate configuration [3, 4]. Also, to compare these experiments with Casimir's original theory, several modifications and approximations must be made to account for real materials with finite conductivity [5, 6], thermal effects [6, 7], varying slab thickness and material properties [6, 8], sphere-plate configuration (requiring the ‘proximity theorem’ approximation) [3, 4] and surface roughness [6]. To experimental physicists studying the gravitational effects of small bodies, however, the Casimir force is actually so relatively large as to drown out the gravitational measurements [9]. To manufacturers of MEMS1 sensors, the Casmir force can be a primary cause of stiction resulting in loss of function, and is therefore, again, something to be avoided. To others, it is a force that can be manipulated by altering surface geometry [10] or designing ‘metamaterials’ with artificial optical properties [11], which can reduce the Casimir force (thereby mitigating the problem of stiction) or even reverse it, creating a repulsion within a limited waveband [12, 13]. Also, it has been proposed that the attractive normal and lateral Casimir force can be used to achieve non-contact actuation in MEMS and more significantly in NEMS2 devices [14, 15]. This paper aims to begin to explore the feasibility, design, fabrication and proposed testing of various devices which use either normal or lateral Casimir force coupling. II. DESIGN, MODELING & FABRICATION The Casimir force is noticeable at separations of less than 500 nm and significant at separations of less than 100 nm so π =cA (1) MEMS devices are really on the borderline of being FC = − influenced by the Casimir force whereas for NEMS devices, 240d 4 the Casimir force would dominate. (However, it should be Since then it has been considered from several different noted that the Casimir force has been demonstrated at perspectives each with their corresponding challenges: Those separations between 0.6 - 6μm [3]). The greatest challenge, simply wishing to measure the force and study its dependence therefore, is to design and fabricate a device to produce on material properties and geometry etc. face the problem of measurable displacements due to Casimir force coupling, particularly the lateral Casimir force. For static displacements, 2 This work has been sponsored by the EPSRC 1 Micro Electro-Mechanical Systems 978-1-4244-5335-1/09/$26.00 ©2009 IEEE 2 229 Nano Electro-Mechanical Systems IEEE SENSORS 2009 Conference this would be very difficult, but with micro-scale devices a high Q-factor3 is achievable (in this case Q = 8000) so that when they are driven at resonance, the resulting amplification of these very small forces and correspondingly small displacements is sufficient to be measureable with capacitive sensors. In order to gauge how measurable the Casimir force is between parallel plates but with relatively large separations, an initial Matlab model was done for a parallel plate device where one plate is fixed and the other is supported on springs with a starting separation of 4μm and with plate area dimension and spring stiffness comparable with the devices presented in this paper (Fig. 1). The free plate is moved electrostatically towards the fixed plate by increasing the applied voltage, both with and without the existence of the Casimir force (red and pink respectively). The resulting capacitance is given on the right-hand axis, both with and without the Casimir force (dark blue and light blue respectively), showing a measurable change in capacitance. The model also shows the point at which the plates latch together. As the area of the plates is increased, the Casimir force is larger but the plates latch together at a larger separation. The same comb drive system was used in all the devices for both driving one side of the device and sensing displacement from the opposite side. The finger width and gap widths were 3μm. There are 264 fingers on each section (one section can be used to drive the device and the other to measure the displacement). The whole structure had a resonant frequency of approximately 13kHz and the supporting springs had a stiffness constant of approximately 20 N/m according to FEA modeling of the 20μm device layer version. The mask layout was designed using Layout Editor and transferred onto a chrome-on-soda lime mask by Delta Mask using a Helium/Cadmium laser (0.8μm spot size). The -6 -12 Lateral Casimir device x 10 x 10 2.18 3.88 2.16 Plate displacement (m) 3.86 2.14 3.84 2.12 3.82 2.1 3.8 2.08 3.78 2.06 3.76 2.04 3.74 2.02 3.72 3.7 8.41 Capacitance (F) 3.9 8.42 8.43 8.44 8.45 8.46 8.47 Applied voltage (V) 8.48 8.49 2 8.5 Figure 1. Matlab model of Casimir attraction and capacitance between parallel plates 3 Quality Factor Figure 2. Device fabrication process smallest achievable line-width for this process is 1.5μm [16]. The fabrication methodology used is bulk micromachining of BESOI4 wafers of varying Si device layer thicknesses (10μm, 20μm and 100μm respectively) and 2um SiO2 layer (Fig. 2a). S1813 photo-resist was applied to the wafer followed by UV lithography with the mask in hard contact for an equivalent exposure time of 9 seconds. It was developed in Microposit MF-319 and then dry etched (DRIE5) to remove the parts of the device layer exposed by the pattern (Fig. 2b). After dicing into chips, the resist was removed using PG1165 remover at 80°C and O2 plasma clean. For the 100μm device layer wafer, the small component dimensions (the comb fingers and springs were only 3μm wide) resulted in an aspect ratio which was too high for the DRIE process. However, excellent results were achieved with the 10μm and 20μm device layer wafers. Due to the benefit of increased plate area with thicker device layers, future work will involve testing of a 50μm device layer wafer. To release the moving structures, the chips were placed in an HF solution6 for 6 minutes to etch the SiO2 (Fig. 2c). The chips were then rinsed in water followed by IPA which was allowed to evaporate slowly over a few days to reduce the risk of moving parts adhering to the substrate due to capillary action. This HF etch process is still being refined for the new devices. A. Parallel plate normal Casimir device The first device presented was intended as a control device designed to demonstrate non-contact actuation using the normal Casimir force in the wafer plane (similar in concept to the device presented recently by Ardito [17]). As the top part of the device is driven at resonance, the bottom part should start to move under Casimir attraction alone since both parts are connected to ground. An SEM image of one of the fabricated devices is shown in Fig. 3. Initial separations were fabricated at 2μm, 3μm and 4μm. B. Lateral Casimir friction device The second device was designed to use the lateral component of the Casimir force or Casimir friction. The parallel plates here have corrugations so that the lateral motion of one side with respect to the other induces a lateral Casimir force – or Casimir friction [18]. There are 55 corrugations in 4 Bonded and Etched back Silicon On Insulator 5 Deep Reactive Ion Etch 6 Hydrofluoric acid 230 Figure 5. SEM image of Casimir friction device showing 2 parts each supported by 4 springs with Casimir coupling between them in the middle Figure 3. SEM image of device for demonstrating Casimir attraction between parallel plates in the wafer plane. TABLE I. each device and the width of each one is 5μm, with an adjacent gap of 4μm (Fig 4). As one part of the device is driven electrostatically at resonance, the other part (a mirror image) is coupled by Casimir attraction alone, causing it to move parallel to the driven device (Fig 5). Different versions of the new device were designed with varying fixed separations between the two plates; 1.0μm, 1.5μm and 2.0μm. The friction device with a 1μm gap defined by the mask was beyond the resolution capability of the UV lithography process and resulted in the opposing corrugations being mostly joined together. However, on measuring the separations of the actual fabricated devices on the SEM, it was found that the actual gap size was significantly smaller than that dictated by the mask – in this instance an advantageous result of the fabrication process (Table 1). Another effect of the DRIE process etch / passivation cycle is the scalloped side wall as seen clearly in Fig. 4. As surface roughness has a significant effect on the Casimir force [6], this is something that should be addressed, either through tuning the etch / passivation time, to create smaller scallops, or by skimming the walls with the FIB to create a smooth surface. FRICTION DEVICE PLATE SEPARATION Mask 1.5 μm 2.0 μm 2.5 μm 3.0 μm 4.0 μm Actual 0.85 μm 1.20 μm 1.90 μm 2.20 μm 3.20 μm Also different plate depths were fabricated (defined by the device layer thickness); 10μm, 20μm and 100μm. The lateral Casimir force was modeled for all three device thicknesses for both a 0.5μm and 1.0μm fixed separation. The plot for the 20μm device layer and 0.5μm separation is presented in Fig. 6, showing the estimated lateral Casimir force between corrugations (y-axis) as one part of the device is moved laterally with respect to the other. An earlier version of the friction device was dry etched without the gap which was subsequently milled by the FIB with a 5000pA beam current in order to achieve a closer separation (Fig. 7). Although a much smaller plate separation can be achieved using the FIB, it was very difficult to maintain a parallel cut at such a high aspect ratio for the entire length of the device (500μm). For this reason, the feasibility of minimizing this separation using only UV lithography and DRIE etching was used in the newer devices. Figure 4. SEM image: DRIE etched Casimir friction device (gap of 850nm) 231 Figure 6. Model of lateral Casimir force for 20μm device layer at 0.5μm separation [19] Figure 7. SEM image showing FIB milled gap measuring 400nm C. Lateral Casmir ratchet device The third device is also designed to harness the lateral component of the Casimir force but using asymmetric teeth as shown in Fig. 8. As the SEM image of the whole device shows (Fig. 9), the two outer sections are constrained to move only vertically and the middle section is constrained to move only horizontally. As the two outer sections are driven in the direction shown, the two ratchets provide lateral Casimir coupling, causing the middle section to move in the perpendicular direction as shown in Fig. 9. As the outer sections are moved back again, the restoring spring force will return the middle section in the opposite direction, causing it to oscillate at the same frequency. The first attempt at fabricating such a ratchet designed with teeth 10μm across and 2μm high (Fig. 10a) resulted in a rounded etched geometry where the top and bottom surfaces were in phase which would have resulted in no lateral motion (Fig. 10b). Although attempts were made to mill the desired profile using the FIB, this proved difficult due to the high aspect ratio, the high degree of parallelism required for both opposing surfaces, and the long processing time. The design was revised with ratchet teeth 20μm across and 4μm high on a glass mask to improve resolution, resulting in well-defined ratchet teeth with the same slope angle as before (Fig. 10c). Since the lateral Casimir device involves driving the plates together to induce the lateral force, the problem of fabricating a sufficiently small initial plate separation is less important. This device is therefore probably the most promising. Figure 8. Mask showing asymmetric teeth of ratchet device and resulting perpendicular motion of plates Figure 9. SEM image of Lateral Casimir ratchet device Figure 10. Progression of ratchet tooth design and fabrication 232 III. [3] CONCLUSIONS AND FURTHER WORK This work has presented a couple of ideas for microdevices which use the lateral Casimir force for non-contact actuation. It also highlights some of the limitations of making devices which use the Casimir force with tradition MEMS fabrication technology and indeed the difficulty of producing a measurable Casimir force in the larger sub-micron regime. The main conclusion of the modeling is that larger plate areas and smaller separations are required for measurable lateral Casimir forces. Tests of the devices are still ongoing and will hopefully give more data on the size of both the normal and lateral Casimir force in real devices, particularly with regard to the influence of DRIE scalloped surfaces compared with smoother FIB-milled surfaces. A new design for the Casimir friction device is underway which enables reduction of the plate separation electrostatically after the device has been fabricated. 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