Low resistance indium tin oxide
films on large scale glass substrate
學生:葉榮陞
指導老師:林克默
OUTLINE
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Introduction
Experimental
Result and Discussion
Summary
Introduction
 TCO coatings have been widely and intensively studied
for many years.
 There are two important restrictions for large scale
applications, they are substrate size and substrate
temperature.
 In this paper, we report the result of ITO coating by a
plasma deposition technique newly developed for the
coating on the large scale glass substrate for
architectural applications.
Experimental
 The essential feature of the deposition technique used
here is low voltage high current electron beam (EB)
deposition.
 All coatings in this experiment were carried out at the
constant discharge current of 250 A.
 The maximum glass size was 1.8 m X 3.2 m with
thickness of 6-15 mm.
Result and Discussion(I)
A. Deposition rate
The deposition rate was
as high as 4000 Ǻ /min
with the Ar flow rate of
30 sccm.
Result and Discussion(II)
B. Effects of the substrate
temperature
1. Resistivity and haze
As shown in the figure, the
haze value of the film has a
maximum around the initial
substrate temperature of
125°C.
Result and Discussion(III)
B. Effects of the substrate
temperature
2. Crystallinity and surface
morphology
Film B (haze value of 9.2%)
deposited on the substrate
preheated at 125°C showed the
coexistence of amorphous and
crystalline phases, which is
clearly demonstrated by the halo
pattern around the (222) peak of
In2O3 in the XRD chart (Fig. 3).
Result and Discussion(IV)
B. Effects of the substrate temperature
2. Crystallinity and surface morphology
Figure 4 shows the STM images and surface profiles of
these films.
Result and Discussion(V)
B. Effects of the substrate
temperature
2. Crystallinity and surface
morphology
Figure 5 is a 60° inclined
SEM image of the ITO film
surface deposited at 100
°C , showing the onset of
the recrystallization.
Result and Discussion(VI)
C. low resistance ITO
coating on large scale
Substrate
1.Film structure
The photographs of the
cross-sectional SEM
image of the film are
shown in Fig. 6.
Result and Discussion(VII)
C. low resistance ITO
coating on large scale
Substrate
2. Optical properties
Figure 7 shows the
spectral transmittance
and reflectance of the
coating.
Result and Discussion(VIII)
C. low resistance ITO
coating on large scale
Substrate
3. Uniformity
The results of the
measurements are shown
in Fig. 8 as contour plots.
Result and Discussion(IX)
C. low resistance ITO coating on large scale Substrate
4. Durability
The hardness of the film was greater than that of the glass
itself by 68%. The adhesion strength of the film to the
substrate was sufficiently good and no failure took place
on the tape peel off tests.
Summary
A large scale plasma deposition system has been
developed to form low resistance ITO films with high
deposition rate on architectural size glass substrate. A set
of low voltage high current EB sources were used for the
deposition.
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