Jeff Mangalin
Volcanic Ash. N.d. Photograph. USGSWeb. 11 Apr 2013. <http://volcanoes.usgs.gov/Imgs/Jpg/Tephra/SarnaSem_60-010_med.jpg>.
Nano/Micro Characterization
Portfolio
Nano 230 Spring 2013
Olympus Fluoview FV10i
Specifications
FV10i-LIV
FV10i-DOC
Ultraviolet/Visible
Laser
Light
Source
light LD lasers
405nm (18mW), 473nm (12.5mW), 635nm (10mW), 559nm
Continuously variable by the LD direct modulation (0.1%-100%,
Modulation:
0.1% inclement) Line return period-laser OFF
Scanning method
2 galvanometer scanning mirrors
Pixel size: 256 × 256 - 1024 × 1024 Scanning speed: 1.1 s /
frame (for pixel size 512 × 512, High Speed scanning mode)
Focusing scanning: High frame rate scan by Y- direction interlace
Scanning
Scanning mode
scanning (×1, ×2, ×4) Dimension: XYT, XYZ, XYZT Rotation
scanning: 0-359.9° in 0.1° increments
Fluorescence: 2 channels, Phase Contrast: 1 channel Variable
barrier filter mechanism for fluorescence channel by diffraction
Detector module
grating and slit
Detection method
Analog integration detection by Photomultiplier
Single motorized pinhole. Pinhole diameter: ø50-800μm automatic
Pinhole
setting (adjustable to ×1.0, ×1.5, ×2.0, and ×2.5)
Field number
18
10× objective: 1× – 6× in 0.1x increments
Detection
Optical zoom
60× objective: 1× – 10× in 0.1x increments
Automatic
Automatic setting of the laser intensity and photomultiplier
Exposure
sensitivity to fluorescence intensity.
Z-drive
Motorized focus with minimum increment: 0.01μm
Exclusively designed 10×
Objectives
Exclusively designed 10× phase
phase contrast objective NA
contrast objective NA 0.4
0.4 (equivalent to UPLSAPO
(equivalent to UPLSAPO 10x)
10x)
Exclusively designed 60× phase
Exclusively designed 60×
contrast water-immersion
phase contrast oil-immersion
objective NA 1.2 (equivalent to
objective NA 1.35 (equivalent
UPLSAPO 60× W)
to UPLSAPO 60× O)
Remote switching from software
Remote switching from
by electric revolver
software by electric revolver
Automatic detection of cover
glass thickness and automatic
setting of motorized correction
Focus
(1)
collar. Automatic detection of
Automatic detection of
interface between specimen and
interface between specimen
Automatic focus
cover glass by laser reflection
and cover glass by laser
(AF)
light detection
reflection light detection
Laser Scanning Confocal Microscopy
(2)
How does Confocal
Microscopy work?
Laser Confocal
Microscopy uses lasers
to fluoresce samples,
which allows features of
the sample to be seen
better.
1. A laser beam is
passed through a light
source aperture.
2. The beam is
focused by an objective lens, onto a very small part of the
specimen.
3. The laser energy excited the sample, and causes it to
fluoresce.
4. Fluorescent light and the reflected laser light then is recollected by the objective lens, and the mirror splits the
beams and sends them to the detector. This signal is collected
by a computer.
5. Since the beam is only focused on a very small point of the
sample at one time, steps 1-4 are repeated many times, until
the entire sample has been scanned.
6. The computer program takes all of the images and creates a
rasterized image, and displas it on the screen.
References:
1. "Features & Benefits - FluoView FV10i." Features & Benefits - FluoView FV10i.
N.p., n.d. Web. 23 Apr. 2013.
2. "Olympus FluoView Resource Center: Theory of Confocal
Microscopy." Olympus FluoView Resource Center: Theory of Confocal
Microscopy. N.p., n.d. Web. 23 Apr. 2013.
Nanosurf easyScan 2 AFM
"The Nanosurf® EasyScan 2 AFM Specifications." EasyScan 2 AFM Specifications. N.p., n.d. Web. 08
May 2013.
"Dictionary of Nanotechnology - Atomic Force Microscopy." Dictionary of
Nanotechnology - Atomic Force Microscopy. N.p., n.d. Web. 24 Apr. 2013.
How does an AFM work?
AFMs operate by measuring force between a probe and the sample. Normally, the probe
is a sharp tip. To acquire the image resolution, AFMs measure the vertical and lateral
deflections of the cantilever by using the optical lever. The optical lever reflects a laser
beam off the cantilever. The reflected laser beam strikes a position-sensitive photodetector consisting of four-segment photo-detector. The differences between the
segments of photo-detector of signals indicate the position of the laser spot on the
detector and the angular deflections of the cantilever
In contact mode, AFMs use feedback to regulate the force on the sample. The AFM
regulates and measures the force on the sample, which allows acquisition of images at
very low forces.
The feedback loop consists of the tube scanner, which controls the height of the tip; the
cantilever and optical lever, which measures the local height of the sample; and a
feedback circuit that attempts to keep the cantilever deflection constant by adjusting the
voltage applied to the scanner.
Mai, Wenjie. "Fundamental Theory of Atomic Force Microscopy." Fundamental Theory
of Atomic Force Microscopy. N.p., n.d. Web. 08 May 2013.
Images
Aspex Explorer SEM
Specs
Resolution: 7 nm @ 25 kV
Magnification: 25X to 50,000X
Specimen Size: Up to 75 mm by 95 mm by 63 mm (W, L, H)
Stage Type: XY/XYZ/XYR motorized
Stage Motorization: External joystick
Accelerating Voltage: 0.2 to 25 kV in 0.1 increments
Imaging Modes: SE (secondary electron) and BSE (backscatter
electron)
Applications: Manual analysis
Field of View: N/A
"Introduction." Instrumentation. N.p., n.d. Web. 23 May 2013.
For Imaging
A beam of electrons is produced at the top of the microscope by an electron gun.
The electron beam follows a vertical path through the microscope, which is held
within a vacuum. The beam travels through electromagnetic fields and lenses,
which focus the beam down toward the sample. Once the beam hits the sample,
electrons and X-rays are ejected from the sample.
Detectors collect these X-rays, backscattered electrons, and secondary electrons
and convert them into a signal that is sent to a screen similar to a television
screen. This produces the final image.
"Scanning Electron Microscope." Scanning Electron Microscope. N.p., n.d. Web. 24 May 2013.
For EDS Analysis
Detectors pick up the X-Rays that are emitted, and generates a spectrum from the
entire scan area of the SEM.
The Y-axis shows the counts (number of Xrays received and processed by the
detector) and the X-axis shows the energy level of those counts
Bruker Dektak XT Profilometer
Dektak XT Specification
System
 Measurement Technique - Stylus profilometry
 Measurement Capability - Two-dimensional surface profile measurements
 Sample Viewing - 640 x 480-pixel (1/3in.-format) camera, USB; fixed
magnification, 2.6mm DFOV (166X with 17in. monitor); optional manual zoom,
variable 0.67 to 4.29mm DFOV (644X to 100X with 17in. monitor)
 Stylus Sensor - Low-Inertia Sensor (LIS 3)
 Stylus Force - 1 to 15mg with LIS 3 sensor; 0.03 to 15mg with N-Lite sensor
option
 Stylus Options - Stylus radius options from 50nm to 25μm; High Aspect Ratio
(HAR) tips 10μm x 2μm and 200μmx 20μm
 Sample Stage - Manual X/Y/θ, 100 x 100mm X-Y translation, 360° rotation,
manual leveling; optional Y auto stage, 100mm (4in.) travel, 1μm repeatability;
optional X-Y auto stage, 150mm (6in.) travel, 1μm repeatability
 Computer System - PC with Pentium® D or AthlonTM processor
 Software - Dektak software running under Windows® XP; Step Detection
software (std.); optional Stress Measurement software; optional 3D Mapping with
Vision analysis software
 Vibration Isolation - Optional vibration isolation table; optional table-top
vibration isolation system
Performance
 Scan Length Range - 55mm (2.16in.)
 Data Points Per Scan - 60,000 maximum
 Max. Sample Thickness - Up to 90mm (3.5in.), depending on configuration
 Max. Wafer Size - 150mm (6in.)
 Step Height Repeatability - 6Å, 1 sigma on 0.1μm step
 Vertical Range - 524μm (0.02in.) standard; 1mm (0.039in.) optional
 Vertical Resolution - 1Å max. (at 6.55μm range)
Environment
 Temperature Range - Between 18 and 24°C (64 to 75°F)
 Humidity Range - 60% ±20°C, non-condensing
Dimensions
 292mm W x 508mm D x 527mm H (11.5in. W x 20in. D x 20.75in. H)
 Weight 34kg (75lbs.)
Power Requirements
 Input Voltage 100 to 120VAC/200 to 240VAC, 50 to 60Hz
How it works
A diamond stylus is moved vertically in contact with a sample and then
moved laterally across the sample for a specified distance and specified contact
force. The profilometer measures small surface variations in vertical stylus
displacement as a function of position. A typical profilometer can measure
features ranging in height from 10 nm to 1 mm. The height position of the
diamond stylus generates an analog signal, which is converted into a digital
signal that is stored, analyzed and displayed. The radius of diamond stylus
ranges from 20 nms to 50 μm, and the horizontal resolution is controlled by the
scan speed and data signal sampling rate.
For our experiment, we wanted to see if the lab’s sputter
coater coated a sample evenly. To do this, we coated a
glass slide with gold, made markings along the surface,
and used the profilometer to measure the thickness of the
gold from the outside edge of the slide to the center.
Distance (mm)
0.5
2.5
5
7.75
10.25
13
15
17.5
20
23.75
26.75
Thickness (nm)
115
115
115
100
90
80
60
50
45
35
30
Thickness of gold vs Distance from
edge of slide
140
Thickness (nm)
120
100
80
Thickness (nm)
60
Linear (Thickness
(nm))
40
Thickness = (-3.7837 nm/mm)(Distance)
+ 124.75 nm
20
0
0
10
20
Distance (mm)
30
Results
What we found was that the thickness of the gold was greater near the edges of
the glass slide. As you moved further towards the center of the slide, the
thickness decreases at a rate of 3.7837 nm per mm.
3D Image
The following is a 3d image of a 7 inch diameter vinyl record. We wanted to try to
measure the distance between the grooves of the record.
References
"Dektak XT Surface Profiler With the Best Performance, Best Repeatability and
Largest Standard Scanning Range." Dektak XT Surface Profiler With the Best
Performance, Best Repeatability and Largest Standard Scanning Range. N.p.,
n.d. Web. 10 June 2013.
"Profilometer." Wikipedia. Wikimedia Foundation, 05 Dec. 2013. Web. 10 June
2013.
Jeffrey A. Mangalin
8728 Phinney Ave N Apt 8
jeff.mangalin@gmail.com
Seattle, WA 98103
206-387-9055
EDUCATION
North Seattle Community College, Seattle, WA
Associate of Applied Science, Nanotechnology
Expected Graduation Fall 2013
Community College of the Air Force, Maxwell AFB, AL
Associate of Applied Science, Information Systems Technology
Fall 2008
TECHNICAL SKILLS
Technical Training: Lithography Techniques, Creation of Photovoltaic Cells, 40+ Hours Clean
Room Experience, Sputter Coating, Thermal Evaporation, Etching, Safety Procedures, Atomic
Force Microscopy (AFM), Confocal Microscopy, Excel, Data Collection, Analysis, and
Dissemination
Technical Equipment:
- Tencor AS100 Profiler
- Specialty Coating Systems Model P6204
- CVC Model CV-18 Resistance Evaporator
- ORIEL 3-inch Wafer Aligner
- EpiStar 2560 Metallographic Microscope
- Hummer VI Sputter Coater
- Cryoprobe
- 3 & 4 inch Silicon Wafers
- Nanosurf EasyScan2 AFM
- Aspex Explorer SEM / EDS
- Branson Sonicator
- Olympus FV10i Laser Scanning
Confocal Microscope
- AB SCIEX TripleTOF® 5600
Mass Spectrometer
- Eksigent Ekspert™ nanoLC 400
System
- Bruker Dektak XT Profilometer
PROJECTS
Moritz Lab, Institute for Systems Biology, Seattle, WA
Spring 2013
High Performance Liquid Chromatography/Mass Spectrometry
Compared the performance of state-of-the-art chip based HPLC vs. performance of self made
columns, in identification of peptides in E. Coli samples.
Electrical Engineering Microfabrication Lab, University of Washington Winter 2012
Nano/Microfabrication
Used lithography techniques, vacuum technology, and physical/vapor deposition techniques, in
order to fabricate novel photo-sensors on silicon wafers, in a class 10,000 clean room.
OTHER EXPERIENCE
United States Air Force
2003-2011
1C351 – Command Post Journeyman/Unit Training Manager
- Collected and disseminated of time-sensitive critical information to senior leaders and support
agencies.
- Created, and maintained the unit’s training program, to ensure that all personnel complied with
Air Force regulations in the work center.
- Directly supervised three subordinates.
- Coordinated daily aerial refueling times, and diplomatic clearances for Air Force mobility
assets.
- Reorganized the command post reference library to allow easier, more logical access to required
documents.
- Executed emergency response to in-flight emergencies, to ensure minimal loss of Air Force
personnel and Assets.
Final Project