Soft X-Ray Microscopy Using Table-Top Pinch Plasma Sources R. Lebert1, K. Bergmann1, A. Engel1, K. Gäbel1, O. Treichel1, G. Schriever1, C. Gavrilescu3, W. Neff2 1RWTH Aachen, Lehrstuhl für Lasertechnik, Steinbachstraße 15, D-52074 Aachen, Germany, E-mail: Lebert@ILT.FHG.DE 2Fraunhofer Institut für Lasertechnik, Steinbachstraße 15, D-52074 Aachen, Germany 3AL. I. Cuza University of Iasi, Copou 11, 6600-Iasi, Romania Abstract : Table-top pinch plasma devices are intense emitters in the soft x-ray wavelength range. This paper shows the tailoring of the emission characteristics of a single pinch plasma device for the specific demands dictated by imaging, contact and fluorescence microscopy. Results obtained using these schemes demonstrate that pinch plasmas can be tuned flexibly to fulfil a variety of demands. 1 Introduction Extreme ultraviolet (EUV) radiation (often also called "soft x-rays") offers interesting features for imaging and analytical purposes with submicron resolution: 1) High contrast between elements with similar atomic numbers. 2) Adopted penetration depth for studying of some 0.1 to 10 µm thick samples 3) Highly efficient high resolution optical components allow for the extension of conventional imaging and x-ray analytical techniques to higher lateral resolution. Applications in the EUV spectral range depend critically on the availability of laboratory-sized sources. With correct optimization, compact pinch plasma devices emit both broad- and narrowband EUV-radiation. They seem well suited as user dedicated laboratory-scale equipment to supplement research activities based on synchrotrons. With typical nanosecond emission duration they allow for experiments with temporal resolution. These characteristics have prompted a study of a pinch plasma EUV source for microscopy techniques. Of particular importance is the optimization of their emission characteristics with respect to the specific requirements given by each application. 2 Demands for Sources Each application dictates a special tailoring of the source concerning the spectral range, the bandwidth, the source size etc. The tailoring of the emission characteristics will be discussed with respect to imaging x-ray microscopy, contact xray microscopy and fluorescence microscopy: I - 146 R. Lebert et al. • For imaging X-Ray microscopy using Fresnel- zone-plates only narrowband radiation can be used due to chromatic aberrations of the optics. Thus high brightness, narrowband line radiation is best suited. For imaging biological samples with single line emission in the water window Nitrogen lines (NVII Lyman-α and NVI He-α) and Carbon lines (C VI Lyman-α) can be used [1]. • For Soft X-ray contact microscopy (SXCM) of biological samples broadband radiation in the water window provides natural contrast [2]. The high flux needed to expose the photoresist is best generated using the continuous recombination emission or a line band of lithium-like ions. • Fluorescence X-ray microscopy (FXM) requires intense broadband emission in the vicinity of the absorption edge of the element to be detected. This technique is demonstrated for Vanadium emission excited with Nitrogen recombination radiation. For the discussed applications pulsed exposure is favourable, in order to capture the image before motion or radiation damage reduces the resolution. Therefore attempts were made to get a sufficient photon flux for single pulse imaging. 3 Experimental Set-Up All imaging techniques were studied at a Plasma Focus device [3,4,5] with 1.8 2.5 kJ electrical storage energy and 250-350 kA peak current (2 m2 foot print, ILT/LLT Aachen) to generate the pulsed radiation (τ < 10 ns; source diameter < 1 mm). The emission of the pinch is used in axial direction, with respect to the plasma column. This emission is concentrated and demagnified by a condenser mirror onto the specimen. In order to reach high transmission in the beamline, the working gas in the discharge chamber and the beamline gas are separated by a differential pumped aperture system. The spectral emission characteristics is influenced by device parameters which can easily be changed such as: 1) the choice of the working gas, 2) the plasma temperature (Te) which depends on the velocity of the plasma sheath. It has been shown that plasma temperature depends on pinch current I, radius of the anode (a) and working gas pressure (p) and is proportional to I2/(p a2) [6], 3) the maximum electron density which is proportional to p [6], 4) the type and pressure of the beamline gas or transmission filters. 4 Results 4.1 Imaging X-Ray Microscopy of Biological Samples The optimized source for an imaging x-ray microscope [7] uses nitrogen as working gas to generate the N VII 1s - 2p (Lyman-α) and N VI 1s2 - 1s3p (Helium-β) around 2.5 nm; the latter is of smaller intensity and separated by ∆λ = 0.0117 nm from the NVII Lyman-α corresponding to λ/∆λ > 200 sufficient to allow for the use of both lines simultaneously. Figure 1 shows the spectrum influenced by the Soft X-Ray Microscopy Using Table-Top Pinch Plasma Sources I - 147 beamline gas (oxygen) which filters shorter wavelength radiation. The insert shows the lines of interest with high resolution. The emitting region is about 1 mm in diameter of which about 160 µm in diameter are used for illumination. N VII 1s-2p N VII L-α N VI 1s2- 1s3p λ/∆λ=210 N VII He-α 2 µm Fig. 1. Nitrogen pinch plasma is tuned to optimized N VII Lyman-α emission with 2J (ISB = 0.8µJ/µm2/sr) in line of interest at 2.5 nm. Fig. 2. Image of bacteria Leptothrix ochracea taken with a single pulse of N VII Lyman-α radiation from the pinch plasma source. courtesy: M. Diehl, Forschungseinrichtung Röntgenphysik. In principle all ionic lines emitting into the water window can be used. K-shell lines are advantageous over L- or M-shell lines because of their larger spectral separation. Thus, additionally the Helium-α of N VI and the Lyman-α line of carbon were shown to have high brilliance in the water window and are of use for imaging microscopy. The condenser is the only optical element to illuminate the sample. In contrast to microscopes at storage rings a monochromator stage is obsolete since pinch plasmas can be optimized to emit freestanding line radiation. The continuum energy in the vicinity of the lines of interest is more than a factor of 500 smaller than the energy in the line. The source ISB reaches an average of 0.61 µJ/µm2/sr, which is reproducible within a standard deviation of less than 20%. The total yield per pulse in the line pair amounts to 80 mJ/sr rendering an overall conversion efficiency (plug in efficiency) of about 1 % into the lines of interest. The x-ray microscope has been operated at the Forschungseinrichtung Röntgenphysik (Göttingen). Figure 2 shows a single pulse image of wet specimen and sub-optical resolution as also published in [8]. The system and the optimization of the spectral characteristics for the imaging microscope operated at Forschungseinrichtung Röntgenphysik, University Göttingen is described in [1]. 4.2 Contact X-Ray Microscopy of Biological Samples Argon is best suited for contact microscopy because it emits many lines into the spectral range of the water window. E.g., in [9] one finds 188 such L-shell lines of which 75 are cited with relevant "intensity" > 100 and 6 are noted as very bright. I - 148 R. Lebert et al. Neon-Like Ar IX to Lithium-like Ar XVI contribute to the emission, so that the flux is much larger than for a single emission line and amounts to about 6 µJ/µm2/sr. The source is about 400 µm in diameter. Lines with wavelength shorter than the K-edge of oxygen are filtered by 150 Pa Oxygen gas in the beamline. This filter also absorbes longer wavelength and thus leads to the decline of the argon spectrum for λ > 3 nm. Using the contact microscope techniques described in [2] in a first experiment images of samples could be obtained, although neither the condensor was optimized for this purpose nor the position of the illumination was controlled to a great extent. The results are also discussed in [2]. Contact Microscopy Oxygen absorption edge Fig. 3. Argon pinch plasma emitting a quasi-continuum of L-shell lines in the water window. Spectral distribution is tuned by the use of oxygen gas in the beamline, acting as a filter for shorter wavelengths. Fig. 4. Contact microscopy image of Chlamydomonas taken with a single pulse of Argon L-shell radiation in the water window from the pinch plasma source. Courtesy: A. Ford, T. Stead, Royal Holloway College, University of London. 4.3 Fluorescence Microscopy Fluorescence microscopy needs a tailoring of broadband radiation in order to achieve an emission maximum at wavelengths shorter than the absorption edge of the element to be studied. In this respect the argon source for contact microscopy could be used for fluorescence microscopy of carbon. Another way is to optimise the emission of recombination radiation. Recombination radiation is dominating when the pinch plasma has higher temperatures and densities which can be controlled by the device parameters as described above. Tailored Nitrogen recombination radiation for the excitation of Vanadium was accomplished in such a way using the source for imaging and contact x-ray microscopy. Hydrogen was used as the beamline gas instead of oxygen to avoid the absorption of the continuous radiation. Figure 5 shows the emission spectrum used for excitation of the x-ray fluorescence of a structured vanadium foil. The fluorescence radiation was then imaged with a KZP 7 zone plate [10] onto a CCD camera showing single pulse resolution of better than 100 µm. Soft X-Ray Microscopy Using Table-Top Pinch Plasma Sources I - 149 5 Summary Pinch plasma x-ray sources were developed and optimized with respect to single pulse microscopy techniques. The emission characteristics of the pinch plasma source was successfully tailored to meet the demands of each application. 500 µm Nitrogen Emission Vanadium L-absoption Fig. 5. Nitrogen pinch plasma can also be tuned to emit mainly recombination continuum of hydrogen-like ions which is suitable to excite Vanadium fluorescence. compare to Fig. 1. Fig. 6. Image of vanadium distribution using its L-shell fluorescence at λ=2.5 nm excited with a single pulse from the pinch plasma source and imaged with a KZP 7 zone plate onto a CCD-camera. Acknowledgements This work was supported by the Deutsche Forschungsgemeinschaft (DFG) (He 979/17-1, Le-904/1-1), the Bundesministerium für Forschung und Technologie (13N6489/3). The authors wish to express their thanks to Prof. G. Schmahl and Dr. D. Rudolph and Dr. A.D. Stead and Dr. T.W. Ford for advice and the pictures. References 1 2 3 4 5 6 7 R. Lebert, D. Rothweiler, W. Neff, J. X-ray Sci. and Technol. 6 (1996), 107–140 T.W. Ford, A.M. Page, R. Rondot, R. Lebert, K. Bergmann, W. Neff, C. Gavrilescu, A.D. Stead, this vol. D. Rothweiler, PhD. Thesis, RWTH Aachen (1994) ISBN: 3-89588-067-1 R. Lebert, D. Rothweiler, A. Engel, K. Bergmann, W. Neff, Opt. Quant. Electr. 278 (1995) 241-259 R. Lebert, PhD. Thesis, RWTH Aachen (1990) ISBN: 3-86073-004-5 K. Bergmann, R. Lebert, J. Appl. Phys. , Vol. 28, 1579 (1995) B. Niemann, D. Rudolph, G. Schmahl, M. Diehl, J. Thieme, W. Neff, R. Holz, R. Lebert, F. Richter, G. Herziger, Optik, 1, 35 (1989) I - 150 8 R. Lebert et al. D. Rudolph, G. Schmahl, B. Niemann, M. Diehl, J. Thieme, T. Wilhein, C. David, and K. Michelmann, in X-Ray Microscopy IV (Institute Of Microelectronics Technology, Chernoglovka, Russia (1994) 9 R. L. Kelly, L. J. Palumbo, NRL Report 7599, Naval Research Laboratory, Washington D. C. (1973) 10 D. Rudolph, B. Niemann, G. Schmahl, O. Christ, in G. Schmahl, D. Rudolph (eds.), "X-Ray Microscopy", Springer Series on Optical Sciences, Vol. 43, Springer, Berlin 1984 , 192 (1984)