Nanoparticle Devices S. A. Campbell, ECE C. B. Carter, CEMS H. Jacobs, ECE J. Kakalios, Phys. U. Kortshagen, ME Institute of Technology Applications of nanoparticles Flash Memory Vertical Transistors Tiwari et al., Appl. Phys. Lett. 68, 1377, 1996. Nishigushi and Oda, J. Appl. Phys. 88, 4186, 2000 . Silicon LEDs Quantum Phosphor Silicon Laser Rowher et al., Sandia Natl. Lab., 2003. Canham, Nature 408, 411, 2000. Park et al., Appl. Phys. Lett., 78, 2575, 2001. Institute of Technology The Vision: Nanoparticle Transistors ¾ Vertical Schottky Barrier FET Does not require doping Can be built on any kind of substrate 3D integration Scales easily to very small size Source Gate oxide Gate Drain Schottky Barrier FET ¾ What is needed? Single crystal, defect-free silicon nanoparticles Institute of Technology Improved Solar Cells ¾Light-induced defect creation (Staebler-Wronski effect) limits efficiency of solar cells. ¾New materials appear promising: “nanostructured silicon” Institute of Technology Systems Devices Campbell microscale Characteriztion nanoscale Characterization Carter Jacobs Kakalios Synthesis Institute of Technology Kortshagen Uwe Kortshagen Silicon nanoparticles for electronic devices Dept. of Mechanical Eng. ¾ Novel electronic devices such as vertical transistors ¾ Solid-state lighting: silicon quantum dots as environmentally benign material ¾ More efficient solar cells with increased stability ~ 2-nm silicon crystallite in amorphous silicon matrix Institute of Technology Uwe Kortshagen ¾ Nonthermal plasmas for silicon nanocrystals ¾ Design plasma properties for optimal particle properties silicon particles for electronic devices ¾ nanoparticles with ~1 trap site / particle ¾ nonagglomerated silicon nanocrystals with narrow size distribution. Institute of Technology C. Barry Carter Nanoparticles of Silicon Dept. of Ch. E. & Materials Science ¾ Structure by high-resolution TEM ¾ Ceramics, semiconductors and metals ¾ Link to properties through collaborations ¾ The new HRTEM Shape of nanoparticles Defects and surface reactions TEM: the essential tool for nanoparticle research Institute of Technology C. Barry Carter Crystal of Si in amorphous Si Devices and True Nanoparticles ¾ ¾ ¾ ¾ Link to Devices Morphology and Perfection Crystals in Amorphous Films Phase transformations Stacking fault in a 2nm particle! Students: Chris Perrey & Julia Deneen Twin boundary in a 1.5nm particle! The new HRTEM Institute of Technology Jim Kakalios Opto-Electronic Properties of Nanostructured Silicon Thin Films School of Physics and Astronomy ¾ Thin Film PECVD Amorphous Silicon (a-Si:H) Preferred for TFT’s and Solar Cells ¾ Light-Induced Defect Creation Major Liability ¾ Silicon Nanocrystals Embedded Within Amorphous Silicon (a/nc-Si:H) Resist LightInduced Degradation Institute of Technology Jim Kakalios ¾ TEM confirms nanocrystals in a/nc-Si:H films ¾ Optical and Electrical Properties of Nanostructured Material Comparable to Best Quality a-Si:H ¾ Light-Induced Decay of Photosensitivity (Ratio of Photo-to-Dark Conductivity) Reduced in a/nc-Si:H Films Institute of Technology Steve Campbell Nanoparticle Devices Electrical and Computer Engineering ¾ Limits to the scaling of planar CMOS in sight ¾ Possible new directions: 3D integrated circuits Mixing electronics/optics /magnetics/etc. on the same chip ¾ Single crystal nanoparticles can be used for both purposes Institute of Technology Steve Campbell Metal ¾ Methods for making single crystal semiconductor nanoparticles ¾ Building and characterizing nanoparticle devices MSM structures Silicon transistors Metal Silicon Nanoparticle Source Gate oxide Gate Drain Schottky Barrier FET ¾ NP properties highly dependent on surface ¾ Good interfaces possible ¾ Outstanding performance expected due to low C Institute of Technology Heiko O. Jacobs Self-Assembly of Nanoparticle Building Blocks Electrical and Computer Engineering Dept. ¾ Electrostatic interaction can be used to position 5 nm - 50 μm sized components ¾ Sub-100 nm resolution has been accomplished ¾ Programmability will be possible using programmable electrodes/receptors charged area RIGID SUPPORT Institute of Technology Heiko O. Jacobs ¾ Parallel charge patterning by Electric Nanocontact Lithography ¾ Electrostatically driven self-assembly of nanoparticles from the liquid and gas phases SWNT Rope bundle ¾ Developed a technique to pattern charge with 100 nm resolution ¾ Developed a nanoxerographic printer to print nanoparticles with ~60 nm resolution Institute of Technology