先進化學機械平坦化(CMP)研討會
Advanced CMP Seminar
April 15/2014, 13:30~17:30
台北市基隆路四段43號台灣科技大學 International Building RM 202
樹立國際產學合作典範,為台
灣半導體開創新局面的一步
開拓化學機械平坦化前進領域
CMP是半導體相當關鍵之製程,它的訴求
極為嚴苛,而且尺度只會愈來愈緊。昔日
不可行之困難,於今則為必備條件。開拓
先進CMP技術與應用需要巨大的資源與財
力,而又是不可避免之趨勢。
研究機構、學術界、廠商、終端使用者能
否群策群力,有效運用既有的資源,以達
成期望之成果?
本研討會將從技術、市場、商業合作模式
等方向探討CMP重要議題。
講員來自日本、歐盟、台灣—全球IC業的
關鍵區域,在相關產業有20年以上經驗,
分享他們對CMP研發落實的觀點。
主辦單位 Organizer
國立台灣科技大學
晶圓平坦化創新中心
Establishing international
industry-academy collaboration
model, forwarding a critical
step for Taiwan semiconductor
industry.
Exploring Frontiers of CMP
CMP, one of critical processes in IC
fabrication, is being more stringent and
demanding. What was impossible yesterday
now is must-be. To explore advanced
technologies and applications requires
tremendous resources, and formidable cost,
but unavoidable.
How can research institutes, academies,
suppliers, and end-users be linked together,
with collective effort, optimizing limited
resources, to achieve what is necessary?
This seminar will shed light on CMP issues
in various respects: technology, marketing,
and business collaborating model.
Speakers from Japan, Europe, Taiwan—key
regions of IC industry, having experience in
related industry over 20 years, will share
their perspectives of R & D realization.
協辦單位 Co-organizer
台灣平坦化應用技術協會
13:1513:30
Sign in
13:3013:40
Opening: Dr. C.J. Liao, President, Taiwan Tech
13:4013:50
Topic 1: Introduction on CIC
Dr. C.C. Chen, Distinguished Professor, Director of CMP
Innovation Center, Taiwan Tech
13:5014:30
Topic 2: Now's the time, the R&D on CMP in Taiwan
Dr. K. Kimura, Professor, Taiwan Tech
14:3015:20
Topic 3: Paradigm Shift in Semiconductor World
Dr. M. Tsujimura, President of Precision Machinery Company,
Ebara Corp
15:2015:50
Break
15: 5016:30
Topic 4: Collaborative Research : The Impact of International
Partnerships
Peter Lemmens, General Manager, IMEC Taiwan
16: 3017:10
Topic 5: Taking the rough and yielding the smooth
Dr. LC Kong, General Secretary, CMPUGTW
17: 1017:30
Open discussion
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