Nano Res.
Electronic Supplementary Material
Magnetically responsive photonic films with high
tunability and stability
Yongxing Hu, Le He, Xiaogang Han, Mingsheng Wang, and Yadong Yin ()
University of California Riverside, Department of Chemistry, California, USA
Supporting information to DOI 10.1007/s12274-015-0732-z
Table S1 Diffraction peak positions and intensities and corresponding sample–magnet distances during either the forward or reverse
movement of the magnet
Forward λ (nm)
Forward R%
Backward λ (nm)
Backward R%
Δλ (nm)
Dsample–magnet (mm)
634
7.5
633
7.4
1
42
622
10.1
622
10.1
0
40
608
15.4
608
16.8
0
38
595
22.5
593
25.6
2
36
579
29
577
33.3
2
34
561
33
553
38.3
8
32
536
36.7
528
40
8
30
512
36.4
504
39
8
28
484
34
478
36
6
26
462
34
454
34
8
24
446
34.2
440
30.6
6
22
439
34
434
29
5
20
434
32
430
27
4
18
431
30
428
25.6
3
16
429
28
422
23
7
14
427
26
421
22
6
12
Address correspondence to yadong.yin@ucr.edu
Nano Res.
Figure S1 Plots of reflectance intensity (■) and peak position (●) versus time for the magnetic photonic structure in water in an
external magnetic field of 360 G with a gradient of 115 G/cm.
Figure S2 The corresponding parameters of the cubic magnet: (a) the magnetic field strength (H) as a function of the sample–magnet
distance; (b) the gradient of magnetic field strength (H) as a function of the sample–magnet distance.
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