RN Savage
Prof. Richard N. Savage
Dept of Materials Science & Engineering
California PolyTechnical University
San Luis Obispo, CA
Academic BackGround
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Ph.D. in Analytical Chemistry, School of Chemistry, Indiana University, 1979
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Bachelor of Science in Chemistry, Juniata College, Huntingdon, PA, 1975
Professional Experience
2002-2003
VP Marketing & Technology
Physical Electronics & Charles Evans Analytical, Sunnyvale, CA
A world leader in instrumentation and analytical services for materials
characterization. Responsible for strategic/technical marketing, product
development and technical applications. Support applications and
technology development for XPS, AUGER and SIMS materials analysis
instruments for the microelectronic industry.
2000-2002
Chief Technical Officer
Olympus, San Jose, CA
Responsible for strategic business development and technical market
development for the Olympus Integrated Technologies Division of
America. Managed product development for optical inspection and defect
review in the semiconductor/thin film markets. US liaison for OlympusTokyo Corp. R/D strategic technology development projects: Laser
Thermal Processing & Nanotechnology e.g. MEMS & MOEMS fabrication
projects.
1995-2000
Watkins-Johnson/Silicon Valley Group
Vice President Research & Development
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RN Savage
SVG Thermal Systems, Scotts Valley, CA
Directed advanced technology and new product development engineering
programs for HDP & APCVD of dielectric films, Rapid Thermal Oxidation
(RTO) and deposition of low-k dielectric materials; Directed staff of 100+
engineers & scientists.
Director of Product Development Engineering
Watkins-Johnson, Semiconductor Equipment Group, Scotts Valley,
CA
Director of Systems Engineering: design, process integration and wafer
automation groups with 40+ members. Program Manager for CVD & RTO
product development teams including engineers from software, materials,
mechanical and electrical disciplines. Responsible for developing product
specifications and directing product development cycles through concept
feasibility to Alpha, Beta and production release for HDP-CVD tool
development (technology sold to Applied Materials). Directed several joint
development projects utilizing robotics (PRI/Equipe & Smart Machines),
chemical delivery (Insync) and metrology (NOVA) technologies.
Director of Technology
Silicon Valley Group, San Jose CA
R&D responsibilities for 300mm process module development of
photoresist coating systems. Directed all strategic research programs for
the Photo Processing Division. Additional responsibilities for thin-film
process engineering included management of international field process
application groups, applications development lab and advanced
technology programs. Responsible for 25+ engineers and scientists
supporting process development and materials characterization for
photolithography around the world.
1984-1995
Founder and President
SC Technology, Livermore, CA
Directed company from start-up to $2M in annual revenue. Responsible
for the development of analytical instruments directed at plasma
diagnostics for semiconductor/thin-film processes and end of process
controllers for plasma etching systems. Directed all aspects of business
development, strategic marketing/technology, engineering and operations.
Developed spectroscopic optical instrument for NASA/NOA and several
DOD funded projects.
1981-1984
Plasma-Therm, Inc.
President
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RN Savage
PT Analytical, Sunnyvale, CA
Responsible for guiding company’s growth to $1.8M in optical metrology
instruments for semiconductor process control (CVD, Etch & PVD).
Initiated $6.5M R/D program to development atomic absorption and & ICP
emission spectrometer instruments, for elemental analysis of biotech,
metallurgical, pharmaceutical, optical and environmental materials. Sold
product technology to Varian Instruments.
Analytical Products Manager
Plasma-Therm, Kresson, NJ
Directed all marketing, sales and engineering functions for developing
analytical instruments to characterize CVD & Etch thin-film processes for
the microelectronics industry. Supported development of inductively
coupled plasma (ICP) sources for materials analysis using atomic
spectroscopy and managed OEM accounts at Perkin-Elmer, Baird and
Instruments SA/JY.
1979-1981
Senior Scientist
Instrumentation Laboratory (Thermo-Jarrell Ash), Wilmington, MA
Co-inventor of pulsed background correction technique for atomic
absorption spectroscopy. Project manager in charge of developing highresolution spectrometers for plasma atomic emission and miniature
inductively coupled plasma sources used for elemental analysis of
metallurgical, biological and environmental materials.
Technical Publications
1. R.N. Savage and G.M. Hieftje, “Enhancement of Pneumatic Nebulization
Efficiency through Application of an Electric Field”, Review of Scientific
Instrumentation, Vol.49, 1978
2. R.N. Savage, E.Sexton, and G.M. Hieftje, “Hydrodynamic Flow Patterns as a
Simple Aid to Effective Inductively Coupled Plasma Torch Design”, Applied
Spectroscopy, Vol.33, 1979
3. R.N. Savage and G.M. Hieftje, “Development and Characterization of a Miniature
Inductively Coupled Plasma Source for Atomic Emission Spectrometry”,
Analytical Chemistry, Vol.51, 1979
4. R.N. Savage and G.M. Hieftje, “ Vaporization and Ionization Interferences in a
Miniature Inductively Coupled Plasma”, Analytical Chemistry, Vol .52, 1980
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RN Savage
5. R.N. Savage, G.M. Hieftje, “Characteristics of the Background Emission
Spectrum from a Miniature Inductively Coupled Plasma”, Analytica Chimica Acta,
Vol.123, 1981
6. R.N. Savage, A.D. Weiss, G,M. Hieftje, “Development and Characterization of a
9-mm Inductively Coupled Argon Plasma Source for Atomic Emission
Spectrometry”, Analytica Chimica Acta, Vol.124, 1981
7. R.N. Savage, R.G. Schleicher, S.B. Smith, I.S. Krull and D. Bushee, “ Speciation
of Cr(III) and Cr(VI) via Reversed Phase HPLC with Inductively Coupled Plasma
Emission Spectroscopic Detection (HPLC-ICP)” Analytical Letters, Vol. 15, 1982
8. R.N. Savage, S.B. Smith, D. Bushee and I.S. Krull, “ Metal Cation/Anion
Separation vis Paired-ion Reverse Phase HPLC with Refractive Index and/or
Inductively Coupled Plasma Emission Spectroscopic Detection Methods”,
Journal of Liquid Chromatography, Vol. 5, 1982
9. R.N. Savage and Kevin Lettire, “Characterization of Reactive Plasma
Chemistries with Optical Emission Spectroscopy and Applications in Photoresist
Stripping – Photons vs Yields”, Microelectronic Manufacturing and Test, Vol.9,
November, 1986
10. R.N. Savage, “Applications of Optical Emission Spectroscopy to Semiconductor
Processing” Spectroscopy, Vol.2, 1987
11. R.N. Savage, Horace Simmons, John Davis and Thomas Metz, “Real-time In-situ
Measurements of Film Thickness and Uniformity During Plasma Ashing of
Photoresist” SPIE Vol. 1392 Advanced Techniques for Integrated Circuit Processing,
1990
12. R.N. Savage, Thomas Metz and Horace Simmons, “In-Situ Film Thickness
Measurements for Real-Time Monitoring and Control of Advanced Photoresist
Track Coating Systems”, Vol.1594, SPIE Microelectronic Processing Integration,
1991
13. R.N. Savage, T.E. Metz, H.O. Simmons, “In-situ Control of Photoresist Coating
Processes”, Semiconductor International, February, 1992
14. R.N. Savage, B. Lorefice, D. Chen, B. Mullen, E. Gurer and R.Reynolds, “How to
Minimize Resist Usage during Spin Coating”, Semiconductor International, June, 1998
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RN Savage
15. R.N. Savage, E.Gurer, T.Zhong, J.Lewellen and R.Reynolds, “Model-based Adaptive
Process Control for CD Control during Photolithography”, Solid State Technology,
1998
16. R.N. Savage and S. Tabrez, “The Transition of XPS, SIMS and Auger based Materials
Analysis Techniques from Lab-to-Fab”, Solid State Technology, 2/03 (in progress).
Patents
1. U.S. Patent No. 4,462,685
Spectro-Analytical System, granted 7/31/84
2. U.S. Patent No. 4,938,555
Fiber Optic Multiplexer, granted 7/3/90
3. U.S. Patent No. 4,977,330
On-Line Film Thickness Monitor, granted 12/11/90
4. U.S. Patent No. 5,014,217
Automatic Species Identification within Plasma Reactor, granted 5/7/91
5. U.S. Patent No. 6,027,760
Photoresist Coating Process Control with Solvent Vapor Sensor, granted 2/22/00
6. U.S. Patent No. 6,177,133
Method &Apparatus-Adaptive Process Control of CDs, granted 1/23/01
7. U.S. Patent No. 6,242,364
Plasma Deposition of Spin Chucks to Reduce Wafer Contamination, granted 6/5/01
8. U.S. Patent Pending
Stacked Reactors for Chemical Vapor Deposition – applied 1999
9. U.S. Patent Pending
Inter-Module Transfer Arm for Wafer Automation – applied 1999
10. U.S. Patent Pending
Cleaning Process Combining aHF & atomic-F for CVD Reactors – applied 1999
Honors and Awards
Undergraduate Award in Analytical Chemistry from American Chemical Society, 1974
National Science Foundation Research Participant, 1974
Member of Juniata College Honor Society, 1975
Indiana University Graduate School Fellow, 1975 and 1976
Indiana University Associate Instructor Teaching Award, 1979
IU Graduate Research Associate with Office of Naval Research, 1978
IU Graduate Research Associate with Instrumentation Labs and Perkin-Elmer Corp., 1979
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RN Savage
Professional Membership
Member of the American Chemical Society
Member of the Optical Society of America
Member of SPIE Society for Optical Engineering
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