Bassam Shamoun
26460 Corporate Avenue
HAyward, CA 94545, U.S.A.
510-780-2275
bassam_shamoun@amat.com
Education
1990–1995
Ph.D.
MS
1986–1988
BS
1982–1986
BS
University of Wisconsin-Madison
Major: Engineering Physics
Minor: Computer Science
Engineering Physics
University of Baghdad
Engineering Physics
Science Technology Institute
Electrical Engineering
Research Interests
Advanced micro-lithography applications used for large-scale integrated
circuits (ICs) design.
Industry
Experience
2000–present Applied Materials Company
Santa Clara
Member of Technical Staff
Advanced Technology Dept.
 Provides leadership and technical guidance to project team
members. Establish detailed project milestones, track project status,
and provide consultations to industrial institutes.
 Responsibilities also include design and integration precision
mechanical and optical systems used in advanced semiconductor
chip making technology. Participate in journal and conference
publications.
1998-2000
Etec Systems, Inc.
Hayward
Senior System Design Engineer
Product Development Dept.
 Identified products and product improvements through study, R&D,
and customer contact. Monitored and kept abreast of related
technology development in industry, government, and universities.
 Conducted research in the area of optical micro-lithography, perform
sub-system static and dynamic (structural/thermal/vibration)
analyses. Developed models using finite-element techniques,
designed engineering test stands and performed simulations and
experiments in advanced technology laboratories.
 Perform system verification and validation testing, evaluate
hardware/software components and methods of implementation,
recommend improvement and propose solutions. Specialized in
system thermal management, precision motion and control.
Academic
Experience
1996–1998 Nano-Technology center, University of Wisconsin
Staff Scientist
 Technical contributor and supervisor of academic projects funded
by professional organizations such as Intel, IBM, Lucent, Applied
Materials, etc. under SEMATECH National Consortium program
agreement. The main objective of the program was to developed
mask structures for next generation lithography used to
manufacture the state-of-the-art computer chips.
Academic
Experience
(continued)
1995–1996
University of Wisconsin-Madison Wisconsin
Post Doctorate, Nuclear Engr. & Engr. Physics Dept.
 Developed a new optical diagnostic technique using 532nm green
laser and images captured with high-speed CCD camera to study
fuel-coolant interactions and improve fuel combustion in two-phase
flow media. The same technique was used to study industry waste
management and recycling products.
 Designed and fabricated very high temperature ceramic furnaces
(~2100 K), specified and tested refractory materials, and set
requirements for designing instrumentation working at elevated
temperatures environment.
 Supervise graduate program and provide technical leadership to
three graduate students.
1990-1995
University of Wisconsin-Madison Wisconsin
Research Assistant
 Developed models based on shock-wave theory and wrote software
that simulates thermal interactions of fuel with water under severe
conditions.
 Modified and enhanced computer software packages for heat/mass
transfer, and fluid dynamics.
1988–1990
Science Technology Institute
Teaching
(3 cr. Hrs) “System Control and Design”, 5th year course
(4 cr. Hrs): “Analog and Digital Electronic Laboratory” 4 th year course
(3 cr. Hrs) Electricity and Magnetisms 4th year course
(3 cr. Hrs) heat & mass transfer courses. 4th year course
Participate in the development of undergraduate annual curriculum.
Patents Awards

Other Awards
&
1.
US 6,424,879 B1 Jul. 23, 2002
2.
US 6,521,901 B1 Feb. 18, 2003
Sponsorship for MS and Ph.D. graduate study: US Department
of Energy (DOE).
 Graduation with high distinction
In a team of four, developed the first sub-micron raster multi-beam
lithographic tool for advanced semiconductor chip making industry.
Accomplishments
Publication
1. S. T. Coyle, a) B. Shamoun, J. Maldonado, M. Yu, D. Holmgren,b) X.
Chen,b) T. Thomas,c) P. Allen, and M. Gesley, “Progress Toward a
Raster Multi-Beam Lithography Tool. 47th International
Conference on Electron, Ion and Photon Beam Technology and
Nanofabrication, May 2003, Tampa, FL, U.S.A.
2. Juan R. Maldonado, Steve Coyle, Bassam Shamoun, M. Yu and
Piero Pianetta, “Cs HALIDE PHOTOCATHODE FOR MULTIELECTRON BEAM PATTERN GENERATOR”, 47th International
Conference on Electron, Ion and Photon Beam Technology and
Nanofabrication, May 2003, Tampa, Florida, U.S.A.
3. S. T. Coyle,a) D. Holmgren,b) X. Chen,b) T. Thomas,c) A. Sagle, J.
Maldonado, and B. Shamoun, “A Prototype Raster Multi-Beam
Lithography Tool”, 46th International Conference on Electron, Ion
and Photon Beam Technology and Nanofabrication, Los Angeles,
U.S.A.
4. David Crewe, Alon Litman, Ming Yu, Eugene Bullock, Bill DeVore,
Jeff Sullivan, Harald Gross, Bassam Shamoun, Avner Karpol, Moshe
Langer, “A Microcolumn for Electron Beam Inspection” APPLIED
MATERIALS ET CONFERENCE, Aug. 2001, Santa Clara, CA. U.S.A.
5.
B. Shamoun “PHOTOMASK PATTERNING AND THE INFLUENCE OF
SUBSTRATE BULK HEATING ON PLACEMENT ACCURACY,”
International Conference for Micro and Nano-Engineering, Germany,
Sept.2000.
6. B. Shamoun, D. Trost, and Frank Chilese, “A predictive and Corrective
Model for Bulk Heating Distortion in Photomasks,” to appear in
proceedings of the 2000 SPIE symposium on Optical Microlithography
XIII, U.S.A., 27 Feb. – 3 March 2000.
7. B. Shamoun and D. Trost, “Experimental and Numerical Investigation
of Photomask Substrate Heating during,” International Conference for
Micro and Nano-Engineering, Italy, Sept.1999.
8. V. Chakarian, F. Raymond III, C. A. Sauer, S. V. Babin, Robert Innes,
A. L. Sagle, U. Hofmann, B. Shamoun, D. Trost, A. Ghanbari, F. E.
Abboud, “System Architecture Choices for Advanced Mask Writer
(100-130 nm),” 19th Annual Symposium on Photomask Technology,
SPIE Vol. 3873, No. 6, pp. 228-242–3562, U.S.A., Sept. 1999.
9.
B. Shamoun et. al., “A practical View on the Assessment of
Photomask Substrate Heating for 157nm Lithography,” 1st VUV
workshop in Japan, July 9th, 1999.
10. B. Shamoun, W. Trybula, R. Engelstad, and E. Lovell, “Effects of
material properties on patterning distortions of optical reticles,” The
18th Annual Symposium on Photomask Technology and Management,
Vol.3546, 214-220, U.S.A., Sept. 16-18, 1998.
11. Shamoun B., Engelstad R., and David Trost, "Assessment of Thermal
Loading-Induced Distortions in Optical Photomasks due to E-Beam
Multipass Patterning," 42nd International Conference on Electron, Ion
and Photon Beam Technology and Nanofabrication, Chicago, U.S.A.,
May 26-29, 1998. Published in J. Vac. Sci. Technol. B 16(6), Nov/Dec
1998.
12. B. Shamoun, M. Sprague, R. Engelstad, F. Cerrina, "PHOTOMASK
IN-PLANE
DISTORTION
INDUCED
DURING
E-BEAM
PATTERNING," SPIE's 23rd Annual International Symposium on
Microlithography, Emerging Lithographic Technologies II, Vol. 3331,
275-279, Santa Clara, California, U.S.A., 22-27 February 1998.
13. Shamoun B., M. Sprague, F. Bedford, R. Engelstad, and F. Cerrina,
"X-RAY MASK DISTORTIONS DURING E-BEAM PATTERNING,"
23rd Micro and Nano Enginering International Conference held in
Athens, Greece, 23-25 February 1997. Published in the international
Journal
of
Semiconductor
Manufacturing
Technology
of
MICROELECTRONIC ENGINEERING 41/42 (1998) 283-286.
14. B. Shamoun, M. El.Beshbeeshy, R. Bonazza, "Light Extinction
Technique for void fraction measurements in bubbly flow",
Published in the Journal of Experiments in Fluids 26 (1999) 16-26.
U.S.A.
15. R. Bonazza and B. Shamoun, "Measurements of void fraction
based on Mie scattering light attenuation in gas-liquid flows",
SPIE's 42nd Annual Meeting, 27 July-1 August 1997, San Diego,
California, U.S.A.
16. Michael Meeks, Bassam Shamoun, Riccardo Bonazza,
"Suppression Effects of Air Injection on Freon/Water Vapor
Explosions for Small- and Large- Scale Geometries", Accepted for
publication in the Journal of Nuclear Technology, 1998, U.S.A.
17. Michael Meeks, Bassam Shamoun, Riccardo Bonazza, Michael
Corradini, "Suppression of Stratified Explosive Interactions",
OECD/CSNI Specialist Meeting on Fuel-Coolant Interactions (FCI),
JAERI-Tokai, Japan, 19th-21st May, 1997, U.S.A.
18. B. Shamoun, M. Corradini, "An experimental study of fuel-coolant
interactions in freon-water and water-molten tin systems in
stratified and injection geometries", NURETH 8 Conference,
Kyoto, Japan, Sep. 30 -Oct. 4, 1997.
19. B. Shamoun, R. Bonazza, "Measurements of Void Fraction in
Transparent Two-Phase Flows by Light Extinction," OECD/CSNI
Specialist Meeting on Advanced Instrumentation and Measurement
Techniques, Dec. 31, 1996, U.S.A.
20. Shamoun B., "Measurements of Void Fraction in a Vapor
Explosion by Light Extinction Technique," Proceeding of the 20th
International Symposium on Shock Waves, July 1995, U.S.A.
21. Shamoun B., "Test Results and Analysis of Recent KROTOS FCI
Experiments," National Heat Transfer Conference, Houston, Texas,
U.S.A., August 1996.
22. Shamoun B., Bonazza R., "Freon12-Water FCI In A Stratified
Geometry With Gas Injection," National Heat Transfer Conference,
Houston, Texas, U.S.A., August 1996.
23. Shamoun B., Corradini M., "Analytical Study Of Subcritical Vapor
Explosions," Published in the Journal of Nuclear Technology, Vol.
115, 35-45, July 1996, U.S.A.
24. Shamoun B., Corradini M., "Supercritical Vapor Explosions:
Comparisons Between Thermodynamic And Mechanistic
Models," Published in the Journal of Nuclear Technology, Vol. 120,
Nov. 1997, U.S.A.
25. Corradini M., Shamoun B., Tang J., "TEXAS-V: Fuel-Coolant
Interaction Model," Invited Paper: International Seminar of Heat and
Mass Transfer in Severe Reactor Accidents, Cesme, Turkey, May
1995.
26. Shamoun B., Corradini M., "Analysis Of Supercritical Vapor
Explosions Using Thermal Detonation Wave Theory," Proceeding
of NURETH-7, New York, U.S.A., September 1995.
27. Shamoun B., Wit R., "Parametric Study Of Recriticality In A
Boiling Water Reactor Severe Accident," Published in the Journal
of Nuclear Technology, Vol. 107, 227-235, August 1994, U.S.A.
Personal Interests
and Hobbies
Professional
Organization
Traveling, photography, reading, listening to music and playing tennis.

Member of International Society for Optical Engineering (SPIE).

Member of BACUS working groups