List of FYP Projects
Professor Shuyan XU
Plasma Sources and Applications Centre,
Natural Sciences and Science Education, NIE
and Institute of Advanced Studies,
Nanyang Technological University
NIE BLK7-3-89
Email: Shuyan.xu@nie.edu.sg
Phone: 6790 3818
http://www.nie.edu.sg/profile/xu-shuyan
1) Plasma Texturing Technology for Next Generation Ultra-Thin Crystalline Silicon Solar
Cells
Silicon material occupies over 50% of the total manufacturing cost. For large-scale cost
reduction, solar industry is moving toward the use of thinner silicon substrates. Plasma
texturing, allowing single-side processing, would one of the most viable solutions for
manufacturing of next-generation ultra-thin crystalline silicon solar cells. In this project,
students will involve optimization process of the plasma texturing technology for potential
implementation in the established solar production lines.
2) Surface Passivation for High efficiency Crystalline Silicon Solar Cells
Suppression of surface recombination velocity via direct saturation of the interfacial defects
is the key to achieve high conversion efficiency in crystalline silicon solar cells. In this project,
students will involve low-damage plasma synthesis of high density and low defect
amorphous hydrogenated silicon thin films for surface passivation of crystalline silicon.
3) Formation of PN Junction by High Density Plasma Immersion Ion Implantation in
Crystalline Silicon Solar Cell
Ultrathin PN junction can be formed using conventional ion implantation but the equipment
cost is too high. Hence, low cost plasma immersion ion implantation (PIII) using high density
plasma becomes an attractive alternative to produce ultrathin PN junction for high-efficiency
solar cells. In this project, students will involve the optimization process of the crystalline
silicon solar cells using this PIII approach.
4) Back Surface Field Formation via High Density Plasma Immersion Ion Implantation in
Crystalline Silicon Solar Cell
Low cost high density plasma immersion ion implantation (PIII) at rear surface of silicon
wafer based solar cell is in demand to provide extra back-surface field passivation as well as
good ohmic contact. In this project, students will involve optimization process of large-area
back-field implant for direct realization in industrial production lines.
5) Plasma Synthesis of Silicon Nitride Antireflective Thin Films of Graded Index for High
Efficiency Crystalline Silicon Solar Cells
The state of the art antireflective coating in crystalline silicon solar cell manufacturing is
utilizing single layer of silicon nitride (SiNx) with fixed reflective index. For further
improvement of the light absorption, the development of silicon nitrde (SiNx) antireflective
thin films of graded reflective index would be one of the most practical approaches that
allow fast industrial implementation. In this project, students are expected to correlate the
reflective index of silicon nitride thin films with the process parameters empirically.
6) Defect saturation of Si:H thin films in crystalline silicon solar cells
Capacitively Coupled Electrodeless Plasma (CCEP) is our proprietary cutting-edge technology
that enables low ion damage on the processing samples. In this project, student will have a
chance to work with our key researchers in Plasma Source and Application Center (PSAC) on
investigation of the defect-saturation mechanism of the CCEP-synthesized Si:H thin films in
crystalline silicon solar cells. The student will contribute to this project by characterizing the
structural and bonding properties of the Si:H thin films and investigating the microstructural
impacts on the defect passivation.
7) Minimizing incubation layer of a-SiH thin film in crystalline silicon solar cells
Capacitively Coupled Electrodeless Plasma (CCEP) is our proprietary cutting-edge technology
that enables low ion damage on the processing samples. In this project, students will have a
chance to work with our key researchers in Plasma Source and Application Center (PSAC) on
characterization of the crystalline properties of incubation layers in the CCEP-synthesized Si:H
thin films using Raman Spectroscopy and Fourier Transform Infrared Spectroscopy (FTIR) and
be involved in the process of minimizing the detrimental impact of incubation layers on the
passivation quality of a-Si:H.
8 Ultra-shallow emitter and rear surface field formation in high efficiency crystalline
silicon solar cells
High density plasma immersion ion implantation (HD-PIII) is our proprietary cutting-edge
technology that enables high dose ultra-shallow ion implantation on processing samples. In
this project, students will have a chance to work with our key researchers in Plasma Source
and Application Center (PSAC) on improving the electrical and optical performance of
crystalline silicon solar cells via ultra-shallow emitter and rear surface field formation.
9) Junction Formation and Passivation of Nanotips Solar Cells
State-of-the-art crystalline silicon solar involves multiple processes including surface
texturing, diffusion/drive-in, residue removal, passivation and metallizations. Plasma Source
and Application Centre (PSAC) in NTU has pioneered a new plasma technology for fabricating
large area of crystalline nano-tip array without pre-/post treatment. This has been
implemented in solar cells for making highly shallow PN-junctions and textured surfaces of
significantly low light reflectance. Step complexity can be reduced associated with
substantial enhancement in electrical and optical performances. Candidates will work with
researchers in PSAC to investigate/verify the underlying mechanisms of the nanotip junction
formation and develop new ways to passivate the nanotip surfaces.
10) Low-Dimensional Light Reflector in Thin Si Solar Cells
Thickness of Si solar cells has to been scaled down for reducing cost of materials. This will
lead to undesirable light loss at the back of silicon wafers. Candidates will work with
researchers in Source and Application Centre (PSAC) to investigate strong light-matter
coupling in low dimensional systems and develop cutting-edge plasma technology for
fabricating the photonic microstructures for thin Si solar cells.
11) Gradually Expanded Rotamak-Like Plasma Thruster (GER) For Small Satellites
To date, spacecraft propulsion system is using ether chemical or plasma thrusters to
accelerate spacecraft and artificial satellites. With the use of the plasma thrusters, the need
for toxic propellant system can be eliminated. The dimension of plasma thruster can be
significantly smaller than the conventional propulsion engines. For these reasons, plasma
thruster is highly preferred for in small-satellite and deep-space missions. Candidates will
work with researcher in Plasma Source and Application Center (PSAC) to develop a unique
electrodeless plasma thruster technology named Gradually Expanded Rotamak-Like (GER) for
improving the engine efficiency/lifetime and minimizing the engine footprint.
12) Real-time all-in-one plasma diagnostics
To develop novel plasma species diagnostic tools that allows simultaneous in-situ
measurement of density and energy of electrons, ions and neutral species in the plasma, as
well as series of plasma-analysis methods to provide not only in-depth understanding of
real-time plasma dynamics to plasma experts but also to non-plasma experts such as
equipment operators and process engineers . The work will also involve the development of
data acquisition and feedback control system, species identification, plasma parameter
derivation and probe integration.