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Kurt J Lesker Company
Kurt J Lesker
Kurt J Lesker…
Is a global supplier and manufacturer
of high & ultra high vacuum solutions
Established in 1954
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Global Customer Support
6 Global distribution centres
8 Strategic Sales Offices
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Kurt J Lesker Company LTD
Kurt J Lesker
European Headquarters
Established in 1991
New facility 2008
Centre for European operations
Sales support office
Design office
Test & Assembly Clean Room
Extensive warehouse facilities
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Strategic Business Segments
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Vacuum Components
Kurt J Lesker
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Manufacturing
Vacuum Chamber Manufacturing
Kurt J Lesker
Pittsburgh- USA
Hastings – UK
Capabilities
Standard vacuum chambers
Complete bespoke Solutions
Quality Management
3D Inspection facilities
ISO Certification
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Materials Group
Kurt J Lesker support a wide
range of production groups
Solar panel manufacture
Semiconductor
Electronic devices
Optical coatings
Automotive lighting
R&D
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Complete custom
solutions available
Kurt J Lesker
Materials
Backing plates
Filaments
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Process Equipment Division
PVD Tools
21 Standard vacuum platforms
Kurt J Lesker
Custom PVD Tools
Bespoke design and process solutions
Thin Film Deposition Expertise:
Thermal
E-Beam
OLED
sputtering
Metal /Organic chemical vapour deposition
Atomic layer deposition
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Process Equipment Division
Sputtering /OLED Sources
Sputtering Linear Cathodes
Kurt J Lesker
We develop & manufacture our own
range of sputtering/ OLED sources
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In addition we are able to offer a
wide selection of linear cathodes
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System Designers…Manufacturers…Experts
Kurt J Lesker Systems
Features
• Manufacturing systems since 1974
• Chamber manufacturers
• Extensive application knowledge
• USA & UK clean room assembly areas
• KJL designed and built Magnetron Torus sputter guns
• KJL designed and built OLED sources
• 8 standard system platforms
• Custom solutions available
Deposition Techniques:
NANO 36
CMS Series
CMS-18
CMS-24
LAB-18
PVD Series
PVD 75
PVD 225
PVD 250
PVD 500
SPECTROS Series
Mini-SPECTROS
SPETROS 100/150
Super-SPECTROS 150/200
AXXIS
LUMINOS
OCTOS
ALD Series
Magnetron sputtering
Thermal evaporation
Atomic layer deposition
E-beam evaporation
Organic evaporation
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NANO36
Adaptable chamber options
Compact integrated design
High speed diffusion pump
Single wide range gauge
PLC control with touch screen interface
Film thickness monitor with thermal sources
Multi-technique options:
• Up to 3 metal thermal sources
• Torus circular magnetron sputtering sources 1”-4”
options
Options:
• SS bell jar
• SS chamber
• Dry roughing pump
• 300l/s Turbo
• Substrate rotation
• Heating to either 150 C or 350  C
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NANO36
• The Nano36 is the newest and most economical deposition
system
• It showcases our ability to provide the versatility and reliability
that the Kurt J. Lesker Company has become known for around the
world
• The Nano36 is our most affordable deposition platform available
designed with the entry to mid level user in mind
• The Nano36 will accommodate most evaporation processes as
well as magnetron sputtering
•The Nano36 has a small footprint
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Process control
PLC control
• This affordable, full feature system offers reliable PLC
control with a color touch screen interface
• Single button commands and manual operation are
accessed from the touch screen
• This offers a simple and convenient user interface
with the Nano36
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Process Chamber
16” x 16” Box Chamber as shown. Also a
12” Diameter x 18” high glass bell jar
available.
Chamber options
• The Nano36 has standard configurations to suit most
users
• Chamber choices are either a simple 12”Diameter x 18”
High glass bell jar or a 16” x 16” stainless steel box chamber
• The box chamber door opens wide for easy chamber
access
• Maintenance of the chamber, source replenishment, and
source change out can be performed in a matter of minutes
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Vacuum
Pumps
• The Nano 36 has 3 standard High Vacuum pumping options:
300L/S Turbo, 685 L/S Turbo, or a 700 L/S Diffusion Pump
High Vacuum pump
choices include 300 L/S
Turbo, 685 L/S Turbo, or
700 L/S Diffusion Pump
Dry Foreline/Roughing pumps
available (as pictured) as well as
oil sealed rotary vane pumps
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Platen
Dual Quartz Lamp Heaters
Flat plate substrate fixture
• Substrate options include primary rotation and heating up to
350 C with dual quartz lamp heaters
Substrate Plate on central twist lock hub.
Substrate can be held in a fixed position
or rotated about the central shaft.
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Platen
Flat plate substrate fixture
• The Nano36 can accommodate up to an 8” diameter
substrate mounting plate
• One single 8” wafer or multiple smaller wafers can be
held in place
• The substrate plate can be easily removed or placed into
the system with either a “lift up and out” hub mount or a
twist-lock mounting
Pin/Hub mounted platen
can easily be lifted and
removed with one hand.
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Film Thickness
Film thickness control
• Evaporation methods are controlled via a quartz crystal
sensor in conjunction with a thin film controller
• The controller offers ease of use and reliability that is
Twist-Lock platen with
quartz crystal monitor
head.
necessary to control the most demanding evaporation
processes
Front Panel Film Thickness
Controller
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Evaporation
Thermal Evaporation Source
• The Nan36 can be configured with three thermal
evaporation sources on the base plate
• The evaporation sources are sufficiently isolated
from each other by shields to prevent cross
contamination
•The sources also are stood off of the base plate of
the chamber and are mounted on water cooled
posts to limit excess heating of the chamber
•Thermal sources can be filament, basket heaters,
box heaters, boats (coated and uncoated), rods, and
screens
Up to Three thermal evaporation sources
can be accommodated. The thermal
sources are well shielded from each other
and the chamber by the use of shielding.
• Easy access to the boats and the mounting posts
makes these sources very user friendly
• The Kurt J. Lesker Company is a global supplier of a
large range of deposition sources and deposition
materials
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Sputtering

Torus Sputtering Source
•
The Nan36 can be configured with two
thermal evaporation sources on the base
plate
•
Pneumatic shutters
• DC, RF or Pulsed DC
• Easy access for target change
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Utilities
Utilites
• The Nano36 has a small footprint and comes with
heavy duty wheels and retractable mounting pads.
This makes the system very easy to wheel into place,
set up, and level
• Utilities are accessed from central point on the back
of the system so utilities hook up is easy and straight
forward
• This makes the Nano36 very portable. It is easy to
move and set up anywhere
Utilities located across the back panel of
the systems frame
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Service and warranty
Yearly service package
• One day
• Two days
• Three days
• Four days
• Five days
Package includes:
• Service/preventative maintenance and/or Training
Excludes:
• Parts, Travel and subsistence
Warranty
• 12 months on all systems
Options within warranty period:
• 1 year extended warranty
• 2 years extended warranty
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NANO 36 benefits
Designed for:
Universities
Industrial and Government laboratories
 R&D applications
• Compact footprint design
• Multiple chamber options
• Easy to use
• Plug & Play Installation
• Quick Deliver
• Cost Effective Price
• A professional and attractive system that is self contained and ready
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to work, the Nano36 is manufactured with quality components
supplied and stocked by the Kurt J. Lesker Company. We provide the
quality, availability, and economy that our customers have come to
expect from us
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PVD 75
Features
D-shaped 304 stainless steel chamber
Aluminium door with rectangular viewport
Turbomolecular or cryogenic pumping
Manual touch-screen
Single, multiple or custom substrate fixtures
Fully enclosed “zero” clean room footprint design
Multi-technique options:
• up to 3 Torus circular magnetron sputtering
sources
• multi-pocket electron beam evaporation
source
• multiple thermal evaporation sources
Options:
•Recipe-controlled PC based process automation
•Glow discharge / RF Bias
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Framework
Fully enclosed system cabinet
•Can be flush mounted in clean room wall
•Utilities: Single service drop (220VAC, 50Hz, single phase,
30 Amps-- based on configuration). Dedicated earth ground required
•E-beam power supply: 400V AC/ 3phase/ 50Hz/ 40amps
•Compressed air ¼” Swagelok @ 80 psi
•Dry Nitrogen Vent Gas ¼” Swagelok @ 10 psi
•Water: Typically 2 to 3 gpm, 25 C @ 50 psi
•Process Gas ¼” Swagelok @ 5 to 7 psi (if applicable)
•Leveling pads
Options:
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•400VAC, 50/60Hz, 3 phase, 5-wire, 30 Amps power distribution
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Process Chamber
D-shaped
• 304 SS chamber
• 14" x 24" D-shaped
• ISO-250 top-plate & base plate ports
• Aluminum Door with 5.25”x 3.25” viewing area
• ISO 100 & 160 gauging & pumping ports
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Sputtering
Up to 3 Torus Magnetron sources
• 1”- 4” diameter
• Axial, right angle, flex and custom mounts
• Integral flip or swing shutters
• RF, DC, pulsed DC power
• Mass flow controlled gas inlet
• Manual or automatic upstream pressure
control
• Compression fittings to adjust source to
substrate distance
• VHV compatible
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Options:
• High strength magnet upgrade for use when depositing
magnetic materials
• Gas injection ring and deposition chimney
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E-Beam
Electron Beam Evaporation Source
• KJLC 4 pocket (8cc) E-Beam gun
• 5kW solid state power supply with
programmable sweep and automatic crucible
indexing
• High voltage discharge hook
• Includes all electrical and water feedthroughs
and shielding
• One pneumatically actuated source shutter
• 14” throw distance
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Evaporation
Thermal Evaporation Source Module
• Up to 3 Thermal Source assembly with water
cooled high current feedthroughs (for sequential
deposition)
• 2 kW Power Supply
• Computer controlled 3-Position Source Selection
Switch
• 1 pneumatically actuated shutter covers all
sources
• Cross contamination shielding
Options:
• Additional 2 kW power supply and transformer to
allow
co-deposition
• Upgrade to 4kW power supply and transformer in
place of 2 kW
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Organic
Low temperature organic evaporation source
• KJLC 10cc LTE organic material evaporation
source with integrated pneumatic flip shutter
(Up to 6 sources may be configured in the
system)
• KJLC LTE evaporation source power supply
Options:
• LTE sources
- 1cc
- 30cc
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Platen
Substrate holder
•Non-rotating, top mounted substrate platen
(12”) using KJLC multi-site substrate fixture
• Single or multiple substrates
Options:
• Rotary drive (up to 20rpm) for platen, variable
speed
• Pneumatically actuated flip style substrate
shutter (compatible with substrates up to 8”)
•Pneumatically actuated swing style substrate
shutter (compatible with substrates up to 4”)
• Custom configurations are available
Substrate heating options:
• 150  C - 350 C (quartz lamp)
• Up to 600 C (resistive element, compatible with
only substrates up to 4”)
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Vacuum
Pumps
• 260 l/s Pfeiffer turbomolecular pump standard
Backing/roughing pump
• Rotary vane mechanical pump
Options:
• 685 l/s Pfeiffer turbomolecular
• 1500 l/s CTI cryogenic pump
• Oil free Scroll Pump
Base Pressure
• 5 x 10-7 mbar or less with 260 l/s turbo
• 2 x 10-7 mbar or less with 685 l/s turbo
• 5 x 10-8 mbar or less with 1500 l/s cryo pump
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Pressure
Gauges
• Wide range vacuum gauge reads from
atmosphere to 10-10 mbar (Ion gauge and Pirani)
• Pirani gauge in Cryo / foreline (when
applicable)
• Readout is displayed on system control panel
Options:
• Capacitance manometer for sputtering
applications
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Pumping
260 l/s turbomolecular pump (standard)
•5 x 10-6 in 18 minutes
•5 x 10-7 Overnight
•Base Pressure 3 x 10-7 mbar
685 l/s turbomolecular pump (option)
•5 x 10-6 in 16 minutes
•2 x 10-7 in 35 minutes
•Base pressure 1 x 10-7 mbar
1500 l/s cryogenic pump (option)
•5 x 10-6 in 4 minutes
•5 x 10-7 in 10 minutes
•5 x 10-8 in 65 minutes
•Base pressure 2 x 10-8 mbar
Pump down times based on clean and dry
properly conditioned chamber
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Process control
Process
• PC based with optional Recipe-Control
• Touch screen controller
• Film thickness monitor/controller
• Automatic pump down and vent
• Integrated power distribution
• Mass flow controlled gas inlet
Options:
• Heating
• Cooling
• Substrate bias
• Ion Source
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Computer control
PC-based control system
• KJLC “C-Ware” Visual Basic based software (Windows
XP)
• Screen layouts follow the guidelines of SEMI E95-0200
Includes Graphical User Interface (When applicable):
• Vacuum
• Deposition
• Gas
• Motion
• Cooling
• Heating
Options:
Recipe driven computer control
• Creation and storage using Microsoft Access
database
• Selection of “pre-written” recipe
• Edit, copy of existing recipes
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Service and warranty
Yearly service package
• One day
• Two days
• Three days
• Four days
• Five days
Package includes:
• Service/preventative maintenance and/or
Training
Excludes:
• Parts, Travel and subsistence
Warranty
• 12 months on all systems
Options within warranty period:
• 1 year extended warranty
• 2 years extended warranty
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PVD 75 benefits
Designed for:
Universities
Industrial, Government laboratories
R&D applications
Small batch production
• “zero” clean room footprint design
• Plug & play installation
• Quick delivery
• Cost effective price:
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Thermal $65K - $120
Sputter $90K - $180K
E-beam $150K - $220K
Organic on request
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Kurt J Lesker website and catalogue
Over 14,000 standard products
are found in our catalogue
Kurt J Lesker
Our website offers “real time” information
on all our products & services
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