Atomic resolved study of defects in GaSb grown on Si

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Atomic Resolved Study of Defects in GaSb Grown on Si

By:

Shahrzad Hosseini Vajargah

Supervisor:

Dr. G. A. Botton

Jan 27, 2012

Outline

 Introduction

 Solar cell & Multijunctions

 Physical Properties & Crystal Structure

 Growth Techniques & Challenges

 Importance of defects and their Identification Techniquces

 Characterization Methods and Techniques

 Results

 Identification of Polarity Reversal and Antiphase Boundaries

 Strain Analysis

 Summary & Acknowledgment

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Solar energy-power from the Sun

• Increasing world consumption of energy

• Fossil fuel shortage

• Global warming

• Need for sustainable development

Photovoltaic Effect

Incident of Photons

Generation of carriers by p-n junction movement of electrons to the n-type side and holes to the p-type side of junction

Generation of voltage

Efficiency: Ratio of number of carriers collected by solar cell to photons of given energy

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Physical properties & applications

Sb-based Compound Semiconductors

 Wide range of bandgap energies from 0.165 eV for InSb to 1.58 eV for

AlSb

 AlSb indirect and InSb and GaSb direct bandgap

 High electron mobility and wide range of bandgap offsets

Applications:

 Multijunction solar cells

 High speed electronic devices

 Thermophotovolatic applications

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Crystal structure

Silicon (Substrate)

 Diamond structure

 Centrosymmetric

 Advantages: low cost, large-scale integration and high quality

GaSb (Film)

 Zinc-Blende structure

 Non- Centrosymmetric

 Wide range of bandgap energies

 Advantages: bandgap tunability

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Thin film growth technique

Molecular Beam Epitaxy (MBE)

Features

 Ultra high vacuum and controlled temperature condition

 Effusion cells

 Heated substrate

 Different deposition ratio

 In-situ surface analysis with

Reflection High Energy Electron Diffraction

(RHEED)

Advantages

 Abrupt interface

 Highly precise controlling of doping levels

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Growth challenges

 Lattice mismatch between film and substrate

 Misfit dislocation

 Relaxation of film

 Planar Defects

 Twins

 Anti-Phase Boundaries (APB)

 Polar on non-polar growth

 Stoichiometric and non-Stoichiometric

 Lowest formation energy {110}-type APB

(Vanderbilt et al. 1992, Rubel et al. 2009)

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D. Cohen and C. B. Carter, Journal of Microscopy, 208 (2), 84 –99 (2002).

Why are defects so important?

• Uncompleted or dangling bonds in the core of dislocations generate states near the middle of bandgap which are deep levels acting as recombination centers.

• Elastic strain field of defects changes atomic distances and hence electronic states, acting as a trap.

• Antiphase boundaries create non-radiative recombination centers.

Reduction of efficiency of solar cell

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APBs’ identification techniques with TEM

-200 200

200-type Superlattice Reflections

Gowers, J. P. (1984). Applied Physics A Solids and

Surfaces, 34(4), 231-236.

• Two beam Condition Dark Field Imaging

S. Y. Woo(2012) et al. (Submitted)

Convergent Beam Electron Diffraction

(CBED)

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A. Beyer, I. Ne ´ meth, S. Liebich, J. Ohlmann, W. Stolz, and K. Volz, J. of Appl. Phys. 109,

083529 (2011)

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APBs’ identification techniques with TEM

High Resolution Transmission Electron

Microscopy (HRTEM) images cannot be interpreted directly.

Defocus

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Simulations show that the contrast highly depends on imaging condition

APB with twin

S. H. Huang, G. Balakrishnan, A. Khoshakhlagh, L. R. Dawson, and D. L.

Huffaker, Appl. Phys. Lett. 93, 071102 (2008).

V. Narayanan, S. Mahajan , K.J. Bachmann, V. Woods, N. Dietz, Acta Materialia 50 1275 –1287 (2002)

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Research objectives

To understand:

 the atomic arrangements at antiphase boundaries

 origin of the APB at interface

 possible mechanism of APBs’ self-annihilation

In order to:

 prevent the APB formation, or

 make them to self-annihilate

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High Angle Annular Dark Field-STEM

 Transmission Electron Microscopy

Z-contrast (High angle annular dark field –

HAADF) Scanning Transmission Electron

Microscopy (STEM)

 High angle elastically scattered electrons

 Annular detector

 Composition sensitive

 Less sensitive to thickness and focus

 Resolution is limited by lens aberrations:

1-Spherical (Cs)

2-Chromatic (Cc)

 Advantages of using Aberration correctors:

 Better Resolution

 Reduced Contrast Delocalization

 Sub-Å probe for spectroscopy

 Tuning capability of Cs

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Strained-layer superlattice (SLS)

SLS

Structure of the Epilayers

Layers

Active Layer

Thickness and Composition

1000 nm GaSb

25 × 10 nm GaSb

25 × 10 nm AlSb

GaSb Layer

Buffer Layer

Substrate

1 μm GaSb

5 nm AlSb

Si (001) Flat

GaSb AlSb

(a)Experimental HAADF-STEM Image

(b) Multisclice Simulation of GaSb

(c) Multisclice Simulation of AlSb

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Polarity reversal Top views

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Side view

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Edge-on APB twin

APB

GaSb

Si

Mixed

Nucleation

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Strain measurement technique

Geometric Phase Analysis (GPA)

In an image of perfect crystal intensity at each position like (r) can be written as Fourier sum which has amplitude and phase component.

Degree of contrast of a set of fringe Lateral position fringes within image

(Geometric phase)

For a perfect crystal: Phase is constant across image

For an imperfect crystal: Any lattice distortion or displacement causes local shift of fringes and consequently phase change or phase shift.

Phase variations Local displacement field Strain Matrix

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Strain distribution twin

APB y x

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Summary

• Polarity reversal due to the formation of antiphase boundaries has identified directly for the first time with HAADF-STEM.

• The direct identification of polarity reversal with HAADF-STEM avoids the misinterpretations in characterizing the planar defects.

• The APB has formed due to the mixed nucleation at interface in spite of prior soaking with Sb.

• Different bonding length in anti-phase bonds compared to in-phase bonds induces strain and lattice rotation at APB.

• Compensating the lattice rotation by lateral shift and faceting can play an important role in the self-annihilation of the APBs.

• Simultaneous control of the substrate misorientation angle and prelayer soaking step in growth can help to suppress the APB formation.

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Acknowledgment

• My supervisor: Prof. G. A. Botton

• Research Group Fellows for helpful suggestions

• Canadian Centre for Electron Microscopy

(CCEM) staff

• Ontario Center of Excellence (OCE)

• Center of Emerging Device Technology for providing me with samples

• Arise Technology for funding this project

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Thank you !

Questions?

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