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The global lithography metrology equipment market was valued at $382.6 million in 2018, and is projected to reach $681.4 million by 2026, registering a CAGR of 7.2% from 2019 to 2026.

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Global Lithography Metrology Equipment Market to Reach $681.4 Million
by 2026
“The global lithography metrology equipment market size is expected to witness considerable growth, due
to emergence of internet of things (IoT) in semiconductor manufacturing and fabrication process. The
lithography metrology equipment industry is projected to witness significant growth, especially in the
emerging economies such as Asia-Pacific and LAMEA, owing to the development of semiconductor industry
in the regions. ”
According to Divyanshi Tewari ,
Semiconductor and Electronics
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KEY FINDINGS OF THE STUDY
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Based on technology, the CD-SEM segment generated the highest revenue in the global lithography
metrology equipment market in 2018.
Based on industry, the chemical control equipment segment generated the highest revenue in the
lithography metrology equipment market share in 2018.
Based on application, the quality control and inspection segment generated the highest revenue
in the lithography metrology equipment market forecast in 2018.
Major key players profiled cover in Report:
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Nikon Metrology Nv
Canon, Inc.
Applied Materials, Inc.
Asml Holding N.V.
Nanometrics Incorporated
Hitachi High-technologies Corporation
Advantest Corporation
Market dynamics
Drivers
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High demand for miniaturized electronic devices
Increase in trends toward Internet of Things (IoT)
Growth in semiconductor industry
Restraints
 Metrology challenges for complex IC devices
Opportunities
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Increase in investment in wafer fabrication equipment and materials
⦁ Report Overview:
https://www.alliedmarketresearch.com/lithography-metrology-equipment-market
Analyst Review:
The lithography metrology market is highly competitive, owing to the strong presence of the existing
vendors. Lithography metrology equipment vendors, who have access to extensive technical and financial
resources are anticipated to gain a competitive edge over their rivals, as they have the capacity to cater to
the global market requirements. The competitive environment in this market is expected to further
intensify with increase in technological innovations, product extensions, and different strategies adopted
by the key vendors.
Lithography metrology equipment are used for various factors such as critical dimension measurement,
imaging of wafer patterns using photoresist, defect analysis, pattern process development, and material
screening. A major restraint, which affects the lithography metrology market is rapid advancement of
patterning technology, which increases its overall cost.
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