SiGe BiCMOS Technology and Circuits for Active Safety Systems INVITED Franz Dielacher, Marc Tiebout, Rudolf Lachner*), Herbert Knapp*), Klaus Aufinger*) Willy Sansen**), Infineon Technologies Austria AG, Siemensstrasse 2, 9500 Villach Austria Infineon Technologies AG, Am Campeon 1-12, 85579 Neubiberg, Germany **) KU Leuven, &*3%"*("$$($54 61<99: +,$1"+# *) ABSTRACT This paper provides an overview of the features and capabilities of state-of-the-art SiGe devices and BiCMOS technology for applications such as high-data-rate communications and pro-active safety systems like car-radar, identification and e-safety. The capabilities offered by SiGe-BiCMOS and microwave packaging enable the integration of complete transceivers on a chip or in a package even including the antenna. The criteria and trade-off’s for the technology selection and system partitioning are described in the introduction. In addition to the electrical components performance, major criteria are addressed such as high reliability, long lifetime and high yield fabrication. Advanced packaging technologies are addressed as well, including embedded passive components and package co-design. Existing circuit design examples and future solutions for 77 GHz automotive radar are presented, followed by a multichannel receiver and a multichannel transmitter for mm-wave people scanners for airport security. Keywords – Silicon-Germanium (SiGe), BiCMOS, Heterojunction Bipolar Transistor (HBT), Automotive Radar, mm-Wave Security Scanner, mm-Wave Imaging ratio of gm over IC (gm over IDS in CMOS) of the SiGe bipolar transistor is essential to save current. The mm-wave bandwidth covers a frequency range from 30 GHz to 300 GHz. However the interest for application development is concentrated in selected bands for worldwide communication. The allocation of the ISM band around 60 GHz and the 70 GHz and 80 GHz bands are released worldwide mainly for wireless high-data-rate communication and car-radar applications, with an operating range that is limited to a few meters for indoor communications at 60 GHz, whereas it is up to around 1 km for the outdoor applications. The operating range has a direct impact on the transmitted power, which is between 0 and 10 dBm within indoor networks, whereas it needs to be much higher in the case of outdoor applications. A rough estimation gives an output power level of around 15 dBm to guarantee reliable 1-to-2-km link for data transmission in all weather conditions or to achieve a distance of >200m for long-range automotive radar [9]. As circuit design examples, a multichannel 77GHz automotive radar transmitter a multichannel receiver and a multichannel transmitter for mm-wave people scanners in the 70 to 80 GHz frequency band will be presented. INTRODUCTION RF/microwave circuits are designed in advanced CMOS, SiGeBiCMOS, GaAs and InP technologies as shown in Figure 1. In terms of RF performance InP is the best but other criteria like integration complexity and cost have to be taken into consideration. As a general rule we can say that “what can be done in silicon will be done in silicon” and “what can be done in CMOS will be done in CMOS” [2]. Today almost all the designs up to about 10GHz are in CMOS because of the multi-million volumes and SoC integration requirements. For the frequency range from 10GHz to about 100GHz where the volumes are still moderate, SiGe-BiCMOS is most attractive because of the excellent performance and overall cost trade-off. Beyond 100 GHz InP is needed but here we are talking about volumes below one k pieces and therefore the high technology cost is not an issue. In the SiGe bipolar and BiCMOS process development good progress was made [1,2,9]. Today technologies with fmax>400GHz and fT >250GHz are available as shown in table 1. This excellent RF performance is achieved with a 130nm process lithography. Extended temperature range, high reliability and long process lifetime are other important features of the SiGe technologies. According to the ITRS roadmap the next SiGe-based bipolar transistor generation will even achieve 700 GHz in a 65nm (or 90nm) technology [4]. Other SiGe-bipolar features as a 4 times higher breakdown voltage compared to CMOS (for identical fmax) are most useful for circuits like power-amplifiers and to achieve a very low phase-noise in VCO’s. For practical applications the collector base breakdown voltage (BVCBo or BVCEs) is most relevant and is about 5V in a SiGe bipolar transistor with fmax >400GHz. Further the four times better FIGURE 1. TECHNOLOGY CHOICE TABLE 1. SIGE PROCESS FOUNDRIES 978-1-4799-2217-8/14/$31.00 ©2014 IEEE Authorized licensed use limited to: Indraprastha Institute of Information Technology. Downloaded on June 30,2022 at 09:27:21 UTC from IEEE Xplore. Restrictions apply. SIGE TECHNOLOGY OVERVIEW Modern SiGe and deep sub-µm CMOS processes both provide transistors with fT/fmax well above 200/250 GHz, thus making mmwave transceivers feasible in either technology as is widely documented in the literature. Usually the choice of the fabrication process will be strictly linked to the final application specifications and to technical implementation trade-offs such as the desired level of integration, frequency bandwidth and distance operating ranges. In addition to the required fT/fmax capability this relates to output signal power, quality of on-chip passive components, noise issues, robustness to process and temperature variations, antenna cointegration, and so on. Current state of the art SiGe bipolar/BiCMOS technologies are shown in table 1. The B7HF200 process from Infineon is a bipolar SiGe HBT process featuring cut-off frequencies of 200 GHz (fT) and 250 GHz (fmax) and the next generation B11HFC achieves 250 GHz (fT) and 435 GHz (fmax) with scaled HBT geometries as shown in table 2 [1,2,3,4]. Beside the SiGe HBT key devices, both processes offer poly-silicon and metal film resistors, MIM capacitors, a hyper abrupt pn varactor diode and laser fuses. The SiGe HBT uses a classical DPSA emitter/base structure (double-poly-silicon selfaligned structure, although one of the two poly-silicon contacts – the emitter - actually is now made of mono crystalline Silicon) and a selective epitaxially grown (SEG) Silicon Germanium base layer. Shallow and deep trench isolation minimize internal parasitic capacitances and allow for dense device packing. A cross-section of the B7HF200 and the B11HFC fmax=435 GHz HBT device is shown in figure 2 in a comparison. Measured fmax and fT characteristics as a function of collector current IC for B11HFC are shown in figure 3. The metallization system of B7HF200 consists of 4 copper layers and one aluminum layer and a gold pad. The new B11HFC process is using 6 copper and one aluminum layer and it incorporates 130nm CMOS devices. Currently the B7HF200 process is extensively used for products like car-radars, mm-wave transceivers for data-links and airport security scanners. Volume production started in 2007 and B7HF200 is automotive qualified and fulfills all the extended reliability and operating conditions requirements like extended temperature range. In the future the new B11HFC BiCMOS with the improved HBT performance and the additional CMOS devices will be used. FIGURE 3: fmax AND fT VERSUS IC FOR B11HFC %!&*)%#&*,$)),$%(&&"*%$)/%$),(" :990*($*"/"+$+(%&$ &(% *7=8 *(*)*($)*('+$/#.%93?03),"%&#$*) $" / ()), )"$ % "*(" $ ,(*" , #$)%$) *%*( -* $- %$&*) %( (+ *($))*%( &()*)3 $)+##(/# %(,$*)%*%#&(*%$# (2 4 high amplification in the RF/mm-wave front-end 4 more than 10 dBm output power at mm-wave frequencies 4 passive devices with good high-frequency behaviour, including top thick metal layers and a thick oxide from this metal towards the substrate 4 the oxide thickness of SiGe processes is usually around twice the oxide thickness of CMOS 4 both modern SiGe and CMOS transistors offer good noise performance behaviour in the mm-wave range, but SiGe devices are still superior and 4 technology reliability in terms of process and temperature PACKAGING OF MM-WAVE ICS TABLE 2. DEVICE PARAMETERS OF SIGE HBTS FIGURE 2: SIGE HBT CROSS SECTION To simplify the fabrication of microwave systems and to reduce production costs, the development of surface mountable devices (SMD) was very important. A fan-out embedded wafer level ball grid array package technology (eWLB) proved to be suited and most useful [7]. Like shown in figure 3, the significant advantage compared to the standard BGA-wirebond and BGA flip-chip packages are the significantly reduced parasitic. A cross section of a packaged device is shown in figure 4. eWLB is suited for)/)*#%$ & 5%6 $*(*%$ $ )/)*# $ &! 56 $*(*%$ "! ) / ) $ )*!$ % ,)3 However for the eWLB package, not just accurate electrical modeling and package cosimulation but also thermal modeling and simulation is very important because all the generated heat has to be transported through the balls. % (#%, *1 %$ )%"+*%$ ) *% %$$* *%$" *(#" "")1 33 * %* )&%*)1 ** ""%- (#%," % * *% * %(3 +)1 $ *%$ ")% * (#%," (%# * %(#*('+(3 Authorized licensed use limited to: Indraprastha Institute of Information Technology. Downloaded on June 30,2022 at 09:27:21 UTC from IEEE Xplore. Restrictions apply. FIGURE 3: PACKAGE PARASITICS FIGURE 5: THREE CHANNEL TRANSMITTER FIGURE 4: eWLB PACKAGE CROSS SECTION DESIGN EXAMPLE : AUTOMOTIVE RADAR AUTOMOTIVE RADAR TRANSMITTER The market for driver assistance systems based on millimeter-wave radar sensor technology is gaining momentum. Radar is robust against environmental influences and therefore has been identified as the most promising technology for many driver assistance functions for active comfort and active safety. For the radar transceivers performance, integration, power consumption and cost are key factors. Chip sets and MMICs in GaAs technology are used in the 2nd generation of radars but for the 3rd generation highly integrated SiGe transceivers are the favorites. Figure 5 shows the block diagram of a three-channel 77 GHz radar transmitter [5]. The circuit is manufactured in Infineon’s B7HF200 SiGe process and mounted in a eWLB package. The transmitter contains a push-push VCO for the 76 – 77 GHz radar band with a phase noise of -76 dBc/Hz. Three independent output channels are available. The output power of each channel can be controlled over a wide range via a digital interface. In order to simplify the implementation of frequency control schemes, the circuit contains a versatile frequency divider block which can be configured to provide output signals in the range from 19 GHz to 50 kHz. An additional low-noise 18 GHz VCO allows the implementation of offset PLLs. Figure 6 shows a photograph of the transmitter chip in the eWLB package. The package size is 6x6 mm2 with a ball pitch of 0.5 mm. With additional balls for thermal management a thermal resistance from chip to board of less than 10 K/W was achieved. The circuit operates from a single supply voltage of 3,3 V and consumes between 205 mA and 710 mA, depending on the configuration. Measured performance data is shown in table 3. FIGURE 6: CHIP/PACKAGE PHOTOGRAPH TABLE 3: TRANSMITTER PERFORMANCE SUMMARY WIDEBAND CHIPSET FOR MM-WAVE IMAGING In this section a four channel receiver and transmitter chipset for high resolution real-time imaging systems for people screening applications operating near the W-band will be described [6, 10]. The center frequency of operation is 78GHz with a 3-dB bandwidth of at Authorized licensed use limited to: Indraprastha Institute of Information Technology. Downloaded on June 30,2022 at 09:27:21 UTC from IEEE Xplore. Restrictions apply. least 7GHz for optimal image resolution and depth of focus. Specifications are listed in Table 4. CONCLUSION It can be concluded that the potential of SiGe bipolar and BiCMOS technology is excellent to push emerging mm-wave applications to broader acceptance and market penetration. SiGe is an optimal technology choice for „medium“ volume RFIC applications like carradar, mm-wave security scanners and high data-rate transceivers. The strive for higher fT/fmax is driven by power saving needs and new applications at even higher frequencies. New SiGe BiCMOS with fmax > 400 GHz will be in volume production soon and research projects with the goal to achieve fmax= 700 GHz have been initiated. REFERENCES [1] TABLE 4: CHIPSET SPECIFICATIONS Figure 7 shows the block diagram of the four-channel receiver, Fig. 8 the block diagram of the four channel transmitter. The circuits are manufactured in Infineon’s B7HF200 SiGe process, die size is 2x2.2mm². The frequency generation consists of a frequency quaddrupler consisting of 2 cascaded active Gilbert mixers. The receiver RFIC contains 4 channels including LO generation and distribution. The measured receiver conversion gain is 23dB with a SSB NF below 10dB over a wide frequency range from 70GHz up to 82GHz. Transmitter output power is 5dBm over a 3dB bandwidth ranging from 72GHz to 84GHz. The chip is supplied from a single 3,3V supply voltage and the power consumption per channel is below 180mW/channel for the receiver and below 145mw/channel for the transmitter. The analog front ends are built of custom made four-channel receiver and transmitter chips, which are connected to aperture-coupled patch excited horn antennas. Those elements are embedded in a RF multilayer PCB. The chips are mounted in multilevel cavities, as the antenna’s differential feed lines run on an inner layer of the PCB, and for RF performance reasons, vias and longer bond wires have been avoided. FIGURE 7: RECEIVER BLOCK DIAGRAM Lachner, R., "Industrialization of mmWave SiGe technologies: Status, future requirements and challenges," SiRF, 2013 IEEE 13th Topical Meeting on , vol., no., pp.105,107, 21-23 Jan. 2013 [2] Lachner, R. “SiGe-Technology: State-of-the-Art and Road Map for Future Applications”, Workshop Proceedings, European Microwave Week, Oct. 2013 [3] http://www.dotfive.eu [4] http://www.dotseven.eu [5] Knapp, H.; Treml, M.; Schinko, A.; Kolmhofer, E.; Matzinger, S.; Strasser, G.; Lachner, R.; Maurer, L.; Minichshofer, J., "Three-channel 77 GHz automotive radar transmitter in plastic package," Radio Frequency Integrated Circuits Symposium (RFIC), 2012 IEEE , vol., no., pp.119,122, 17-19 June 2012 [6] Tiebout, M.; Wohlmuth, H.-D.; Knapp, H.; Salerno, R.; Druml, M.; Rest, M.; Kaeferboeck, J.; Wuertele, J.; Ahmed, S.S.; Schiessl, A.; Juenemann, R.; Zielska, A., "Low Power Wideband Receiver and Transmitter Chipset for mm-Wave Imaging in SiGe Bipolar Technology," Solid-State Circuits, IEEE Journal of , vol.47, no.5, pp.1175,1184, May 2012 [7] Wojnowski, M.; Lachner, R.; Bock, J.; Wagner, C.; Starzer, F.; Sommer, G.; Pressel, K.; Weigel, R., "Embedded wafer level ball grid array (eWLB) technology for millimeter-wave applications," Electronics Packaging Technology Conference (EPTC), 2011 IEEE 13th , vol., no., pp.423,429, 7-9 Dec. 2011 [8] Camillo-Castillo, R.A.; Liu, Q.Z.; Adkisson, J.W.; Khater, M.H.; Gray, P.B.; Jain, V.; Leidy, R.K.; Pekarik, J.J.; Gambino, J.P.; Zetterlund, B.; Willets, C.; Parrish, C.; Engelmann, S.U.; Pyzyna, A.M.; Cheng, P.; Hamare, D.L., "SiGe HBTs in 90nm BiCMOS technology demonstarating 300GHz/420GHz fT/fmax through reduced RB and CCB parasitic," IEEE BCTM 13.2, 978-1-4799-0129-6/13/$31.00 ©2013 IEEE [9] Hasch, J.; Topak, E.; Schnabel, R.; Zwick, T.; Weigel, R.; Walschmidt, C., "Millimeter-Wave Technologyfor Automotive Radar Sensors in the 77 GHz Frequency Band", 1 3>91 3<1 ;9:; [10] Sherif-Sayed, A.; Schiessl, A.; Gumbmann, F.; Tiebout, M.; Methfessel, S.; Schmidt, L.P., “Advanced Microwave Imaging”, IEEE Microwave Magazine, 10.1109/MMM.2012.2205772, 13 Sept. 2012 [11] Böck, J.; Schäfer, H.; Aufinger, K.; Stengl, R.; Boguth, S.; Schreiter, R.; Rest, M.; Knapp, H.; Wurzer, M.; Perndl, W.; Bottner, T.; Meister, T.F., "SiGe bipolar technology for automotive radar applications," Bipolar/BiCMOS Circuits and Technology, 2004. Proceedings of the 2004 Meeting , vol., no., pp.84,87, 13-14 Sept. 2004 FIGURE 8: TRANSMITTER BLOCK DIAGRAM Authorized licensed use limited to: Indraprastha Institute of Information Technology. Downloaded on June 30,2022 at 09:27:21 UTC from IEEE Xplore. Restrictions apply.