W W W . M K S I N S T . C O M
Plasma Sources
Enabling
Clean, energized
Reactive Gas
PLASMA SOURCES FOR NF3 AND FLUORINE-BASED GASES
PLASMA SOURCES FOR O2, N2, H2, H2O
ASTRON® Paragon Remote Plasma Source — The ASTRON®
Paragon AX7700 Reactive Gas Generator is the latest platform in the industry
leading family of ASTRON remote plasma sources. Paragon is designed
with improvements and enhancements enabling next generation process
development. The Paragon reactive gas generator is designed for NF3 flows up
to 6 slm and pressures up to 10 Torr while maintaining a high gas dissociation
rate, allowing for added process flexibility, decreased processing time, as
well as, increased throughput. Based on the MKS patented Low-Field-Toroidal
plasma technology, the Paragon incorporates a new PEO coating that offers
superior particle performance and extended block life.
ASTRON®hf-s Remote Plasma Source — The ASTRONhf-s
remote plasma source is designed for increased flexibility for process
and cost optimization. Based on the patented Low-Field Toroidal
plasma technology, the ASTRONhf-s source offers a broad operating
range with up to 15 slm of NF3 and high flows of other reactive gases.
A separate, lid-mountable plasma section and rack-mountable power
supply provide more options for installation. The compact plasma
section allows closer coupling to the customer’s chamber improving
overall process efficiency and lowering operating costs.
ASTRON®i and ASTRON®ex Remote Plasma Source
The ASTRONi and ASTRONex reactive gas generators are
designed for increased flow capability and process flexibility.
Using the patented Low-Field Toroidal plasma technology, these
generators are more efficient, have lower cost of ownership, and
effectively dissociate multiple source gases. The high reliability,
field-proven design combines the power source, control module
and plasma chamber into a compact, lid-mountable design for
easy integration onto both new and existing production tools.
These ASTRON models are used primarily as a remote source
for reactive gas to clean undesired deposits from interior walls
of process chambers using alternative gases.
R*evolution® III Remote RF Plasma Source —
Reactive gas radicals are essential in many processes
such as photoresist removal, wafer pre-clean, and thin
film nitridation and oxidation. The MKS R*evolution® III
is an integrated remote plasma source that provides the
highest performing and cleanest source of reactive gas
radicals required for semiconductor wafer processing.
The AX7695 integrates a quartz plasma applicator, RF
power supply and all necessary controls into a compact,
self-contained unit for easy installation directly on the
tool chamber for an extremely clean, low cost source of
atomic radicals at a reduced level of complexity.
SmartPower® Microwave Plasma Source — MKS provides
microwave plasma sources and microwave matching units as well as
integrated microwave plasma delivery subsystems used in semiconductor
processing for photoresist removal, passivation, chamber cleaning, and
other advanced processes. The SmartPower® series of intelligent microwave
power generators build on proven experience in producing rugged, reliable
microwave power generators for demanding semiconductor fabrication
and industrial applications. The SmartPower Series design architecture
incorporates the best of field-proven technology and combines new design
features aimed at improved performance and lower cost of ownership.
Chemical Downstream Plasma Source — The AX7610
is a microwave plasma source for downstream chemical etch
applications, such as photoresist stripping and hard mask
removal. With replaceable quartz or sapphire tubes, the AX7610
downstream source offers flexibility of configuration to meet the
most demanding application process parameters. The quartz
tube version, AX7610Q, is ideally suited for production of atomic
oxygen for resist stripping. The sapphire tube version, AX7610S,
is compatible with much more severe CF4 and NF3 as well as
Hydrogen chemistries for isotopic etch and other applications.
MKS Plasma Sources
MKS, ASTeX Products
90 Industrial Way
Wilmington, MA 01887-4610
Tel:978.284.4000
Global Headquarters
2 Tech Drive, Suite 201
Andover, MA 01810
Tel:978.645.5500
800.227.8766 (in USA)
Web: www.mksinst.com
Plasma Sources Line Card - 12/2012 Specifications are subject to change without notice. © 2012 MKS Instruments, Inc. All rights reserved.
MKS products provided subject to the US Export Regulations. Diversion or transfer contrary to US law is prohibited.
ASTRON®, R*evolution®, and SmartPower® are registered trademarks and mksinst™ is a trademark of MKS Instruments, Inc.