W W W . M K S I N S T . C O M Plasma Sources Enabling Clean, energized Reactive Gas PLASMA SOURCES FOR NF3 AND FLUORINE-BASED GASES PLASMA SOURCES FOR O2, N2, H2, H2O ASTRON® Paragon Remote Plasma Source — The ASTRON® Paragon AX7700 Reactive Gas Generator is the latest platform in the industry leading family of ASTRON remote plasma sources. Paragon is designed with improvements and enhancements enabling next generation process development. The Paragon reactive gas generator is designed for NF3 flows up to 6 slm and pressures up to 10 Torr while maintaining a high gas dissociation rate, allowing for added process flexibility, decreased processing time, as well as, increased throughput. Based on the MKS patented Low-Field-Toroidal plasma technology, the Paragon incorporates a new PEO coating that offers superior particle performance and extended block life. ASTRON®hf-s Remote Plasma Source — The ASTRONhf-s remote plasma source is designed for increased flexibility for process and cost optimization. Based on the patented Low-Field Toroidal plasma technology, the ASTRONhf-s source offers a broad operating range with up to 15 slm of NF3 and high flows of other reactive gases. A separate, lid-mountable plasma section and rack-mountable power supply provide more options for installation. The compact plasma section allows closer coupling to the customer’s chamber improving overall process efficiency and lowering operating costs. ASTRON®i and ASTRON®ex Remote Plasma Source The ASTRONi and ASTRONex reactive gas generators are designed for increased flow capability and process flexibility. Using the patented Low-Field Toroidal plasma technology, these generators are more efficient, have lower cost of ownership, and effectively dissociate multiple source gases. The high reliability, field-proven design combines the power source, control module and plasma chamber into a compact, lid-mountable design for easy integration onto both new and existing production tools. These ASTRON models are used primarily as a remote source for reactive gas to clean undesired deposits from interior walls of process chambers using alternative gases. R*evolution® III Remote RF Plasma Source — Reactive gas radicals are essential in many processes such as photoresist removal, wafer pre-clean, and thin film nitridation and oxidation. The MKS R*evolution® III is an integrated remote plasma source that provides the highest performing and cleanest source of reactive gas radicals required for semiconductor wafer processing. The AX7695 integrates a quartz plasma applicator, RF power supply and all necessary controls into a compact, self-contained unit for easy installation directly on the tool chamber for an extremely clean, low cost source of atomic radicals at a reduced level of complexity. SmartPower® Microwave Plasma Source — MKS provides microwave plasma sources and microwave matching units as well as integrated microwave plasma delivery subsystems used in semiconductor processing for photoresist removal, passivation, chamber cleaning, and other advanced processes. The SmartPower® series of intelligent microwave power generators build on proven experience in producing rugged, reliable microwave power generators for demanding semiconductor fabrication and industrial applications. The SmartPower Series design architecture incorporates the best of field-proven technology and combines new design features aimed at improved performance and lower cost of ownership. Chemical Downstream Plasma Source — The AX7610 is a microwave plasma source for downstream chemical etch applications, such as photoresist stripping and hard mask removal. With replaceable quartz or sapphire tubes, the AX7610 downstream source offers flexibility of configuration to meet the most demanding application process parameters. The quartz tube version, AX7610Q, is ideally suited for production of atomic oxygen for resist stripping. The sapphire tube version, AX7610S, is compatible with much more severe CF4 and NF3 as well as Hydrogen chemistries for isotopic etch and other applications. MKSāPlasma Sources MKS, ASTeX Products 90 Industrial Way Wilmington, MA 01887-4610 Tel:978.284.4000 Global Headquarters 2 Tech Drive, Suite 201 Andover, MA 01810 Tel:978.645.5500 800.227.8766 (in USA) Web: www.mksinst.com Plasma Sources Line Card - 12/2012 Specifications are subject to change without notice. © 2012 MKS Instruments, Inc. All rights reserved. MKS products provided subject to the US Export Regulations. Diversion or transfer contrary to US law is prohibited. ASTRON®, R*evolution®, and SmartPower® are registered trademarks and mksinst™ is a trademark of MKS Instruments, Inc.