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Advanced Materials Interfaces
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Online ISSN: 2196-7350
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Associated Title(s): Advanced Energy Materials, Advanced Engineering
Materials, Advanced Materials, Advanced Optical Materials
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Hans M. Christen, Oak Ridge National Laboratory
Harald Fuchs, University of Münster
Karen K. Gleason, Massachusetts Institute of Technology
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Bartosz A. Grzybowski, Northwestern University
Lei Jiang, Institute of Chemistry, Chinese Academy of Sciences
Helmut Möhwald, Max-Planck-Institute of Colloids and Interfaces
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Alexander Shluger, University College London
Advisory
Board:
Yoichi Ando, Osaka University
Masakazu Aono, National Institute for Materials Science-Tsukuba
Richard Berndt, Christian Albrechts Universität zu Kiel
Robert W. Carpick, University of Pennsylvania
Paul K. Chu, City University of Hong Kong
Ulrike Diebold, Technical University Wien
Georg Duesberg, Trinity College Dublin
Hongjun Gao, IOP-CAS Beijing
Gary Hodes, Weizmann Institute
Rene A. J. Janssen, Technical University Eindhoven
Pavel Jelinek, Institute of Physics of Czech Academy of Science
Mikhail Katsnelson, Radboud University, Nijmegen
Mato Knez, nanoGUNE
Weimin Liu, Lanzhou Institute of Chemical Physics
Rodolfo Miranda, Universidad Autónoma de Madrid
Gianfranco Pacchioni, Milano - Bicocca
Karsten Reuter, Technical University München
Miquel Salmeron, Lawrence Berkeley National Lab
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Advanced Materials Interfaces - Editorial Board - Wiley Online Library
Udo Schwingenschlögl, King Abdullah University of Science and
Technology (KAUST)
Han Woong Yeom, POSTECH
Kai Wu, Peking University
Jimmy Yu, The Chinese University of Hong Kong
Han Zuilhof, Wageningen UR
Jeong Young Park, SCALE Laboratory, KAIST
Xiaohui Qiu, National Center for Nanoscience and Technology - Beijing
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