Agilent EEsof EDA Presentation on Momentum Optimization This document is owned by Agilent Technologies, but is no longer kept current and may contain obsolete or inaccurate references. We regret any inconvenience this may cause. For the latest information on Agilent’s line of EEsof electronic design automation (EDA) products and services, please go to: www.agilent.com/find/eesof EM Seminar - HP Momentum Paper 1 Moving from Analysis to Design Automation Momentum Optimization Momentum Optimization EM Seminar 1999 EM Optimization - Moving from Analysis to Design Automation EM Optimization - Moving from Analysis to Design Automation 1 Objective • To illustrate circuit design flow with HP ADS • To illustrate the use of Momentum and Momentum Optimization as part of the design flow Momentum Optimization EM Seminar 1999 page 2 of 36 This presentation will illustrate the design of a 3.2 GHz radial stub filter. The microstrip filter focuses on the use of EM simulation as a verification tool. EM Optimization - Moving from Analysis to Design Automation 2 Overview Microstrip Radial Stub Filter • Analysis - Momentum • Design Refinement - Momentum Optimization Momentum Optimization Design Refinement Model Generation Analysis Momentum Momentum Optimization EM Seminar 1999 page 3 of 36 This presentation will illustrate the design of a 3.2 GHz radial stub filter. The microstrip filter focuses on the use of EM simulation as a verification tool. EM Optimization - Moving from Analysis to Design Automation 3 Schematic-based Design D E S I G N Layout-based Design EM Simulation as an Analysis Tool Design Flow F E E D B A C K Momentum Optimization EM Seminar 1999 System Design Synthesis Post Processing Circuit Design Optimization Layout EM Simulation EM Optimization Manufacturing page 4 of 36 This diagram illustrates a typical design flow. The design flow is broadly separated into two parts: schematic-based design and layout-based design. Also represented is the design feedback path which goes throughout the entire design process. Schematic-based Design The schematic-based design starts with system design, where specifications are set and system architecture is studied to understand design tradeoffs. Once the system architecture is set, the specifications of each sub-module is set. After the system design and prior to circuit design, there is an initial investigation into the design approach. This includes literature and textbook study, as well as the use of specialized synthesis tools. The synthesis tools provide a starting point for the circuit design. Circuit Design involves the details of going from the design specification to the final schematic-based design. This process involves the circuit simulators (linear simulation, harmonic balance, transient, convolution, envelope,…), as well as design tools such as circuit optimization and post-processing of the analysis data. EM Optimization - Moving from Analysis to Design Automation 4 EM Simulation as an Analysis Tool Schematic-based Design Project Manager says “… a filter is needed to reduce the mixer LO feed-through to the amplifiers”. Proposed Solution: Design a MICROSTRIP radial stub low pass filter Momentum Optimization EM Seminar 1999 page 5 of 36 Some motivation starts the design process. In this case, a filter is needed to reduce the mixer LO feed-through to the amplifiers that follow. The proposed solution is to design a microstrip radial stub low pass filter. EM Optimization - Moving from Analysis to Design Automation 5 EM Simulation as an Analysis Tool System Design System Design Synthesis • Low Pass Filter • 1 dB corner freq = 3.2 GHz • > 25dB attenuation from 3.9-6.0 GHz IF LO Circuit Design RF 25 dB Layout EM Simulation Manufacturing Momentum Optimization EM Seminar 1999 page 6 of 36 From the system analysis, the low pass filter is determined to need a 1 dB corner frequency at 3.2 GHz, with at least 25 dB of attenuation in the 3.9-6.0 GHz. The system design portion of this project is done on the order of hours to days. EM Optimization - Moving from Analysis to Design Automation 6 EM Simulation as an Analysis Tool Synthesis System Design Synthesis • • • 7th order Chebychev fc = 3.2 GHz passband ripple 0.5 dB Circuit Design Layout EM Simulation Manufacturing Momentum Optimization EM Seminar 1999 page 7 of 36 Design Synthesis for the filter is done with E-Syn to determine the starting design. It is determined that a 7th order Chebychev filter with fc = 3.2 GHz and passband ripple of 0.5 dB will work. The ideal analysis gives slightly less than 25 dB of rejection at 3.9 GHz, but the less desirable alternative was to go to a 9th order filter. With the actual implementation in microstrip, the component values can be slightly modified to achieve the goal. The synthesis part of the design process can be done on the order of hours to days, depending on the amount of research needed, and the ability of a standard design to meet the design goals. EM Optimization - Moving from Analysis to Design Automation 7 EM Simulation as an Analysis Tool Circuit Design System Design Synthesis Circuit Design Layout EM Simulation Manufacturing C1 = 1.728 pF L1 = 3.129 nH Momentum Optimization EM Seminar 1999 C3 = 2.624 pF L3 = 3.343 nH C4 = 2.624 pF C2 = 1.728 pF L2 = 3.129 nH page 8 of 36 The ideal circuit is implemented in the schematic. This serves as a baseline comparison for the electrical performance. The goal for the circuit design process is to convert this ideal circuit into a physical implementation using microstrip components. EM Optimization - Moving from Analysis to Design Automation 8 EM Simulation as an Analysis Tool Convert Ideal to Physical Radial Stub 1 - C1,C2 Capacitance is 1.727pF Method 1 - Iterative Analysis / Post Process Microstrip Butterfly Radial Stub W = 40 mil Ro = 218.7 mil Angle = 60 D = 15 mil Radial Stub 2 - C3,C4 Capacitance is 2.623pF Microstrip Butterfly Radial Stub W = 40 mil Ro = 276.6 mil Angle = 45 D = 15 mil Substrate - GETEK H = open Er = 1.0 H = 59 mil Er = 4.3 Momentum Optimization EM Seminar 1999 3.7 - 4.3 manufacturers tolerance page 9 of 36 The capacitors of the filter will be implemented as microstrip butterfly radial stubs. The parameters for W and D are fixed, and through a manual process of binary search, the angle and radius are determined. The capacitor value is determined through post processing the S-parameters (illustrated on the next slide). The dimensions determined for the radial stub are as follows: C1= C2 = 1.727 pF { W = 40 mil, Ro = 218.7 mil, angle = 60, D = 15 mil } C3 = C4 = 2.623 pF { W = 40 mil, Ro = 276.6 mil, angle = 45, D = 15 mil } The substrate The substrate used is 59 mil thick GETEK. Due to manufacturing tolerance, the dielectric constant is held to a range between 3.7 and 4.3. Understanding the manufacturing tolerance is important for design. A company, as part of the design process, usually has characterized the material and the process tolerance and can provide this information to designers to improve their design accuracy. At this point the circuit is being prototyped by an outside vendor. For this example the material is considered to be an unknown; so the design is based on the manufacturing specification for the material. For the purpose of this presentation to illustrate the design process, the dielectric of 4.3 is chosen. EM Optimization - Moving from Analysis to Design Automation 9 EM Simulation as an Analysis Tool Convert Ideal to Physical Capacitance Calculation Method 1 - Iterative Analysis / Post Process Radial Stub 1 - C1,C2 Capacitance is 1.727pF Radial Stub 2 - C3,C4 Capacitance is 2.623pF Momentum Optimization EM Seminar 1999 page 10 of 36 The S-parameters from the analysis on the previous slide are converted into capacitance. The S-parameter analysis is done at the 1 dB cutoff frequency 3.2 GHz. Since microstrip is dispersive, the capacitor value determined here will appear to have different values of capacitance at other frequencies. Since it is impossible with microstrip to get the same capacitor values at all frequencies, the cutoff frequency is chosen as the design frequency. Since this is a one-port S-parameter analysis, S11 can be converted into Zin with the equation: Zin = 50*[(1 + S11) / (1 - S11)] Zin can then be converted into an equivalent capacitance with the equation: Cin = -1 / (2*pi*freq*imag(Zin)) EM Optimization - Moving from Analysis to Design Automation 10 EM Simulation as an Analysis Tool Convert Ideal to Physical Capacitor Method 2 - Circuit component optimization The same values for the radial stub can be found through Circuit Optimization Momentum Optimization EM Seminar 1999 page 11 of 36 Circuit optimization can be used as an alternative to the binary search procedure used in the previous slides. For this circuit, the radial stub (which is set up for optimization) is connected to S-parameter Port 1, and the ideal capacitor is connected to S-parameter Port 2. Two goals are set up to minimize the difference between S11 and S22 for the real and imaginary terms. Goals: -0.001 < imag(S11) - imag(S22) < 0.001 -0.001 < real(S11) - real(S22) < 0.001 EM Optimization - Moving from Analysis to Design Automation 11 EM Simulation as an Analysis Tool Convert Ideal to Physical Inductor Inductor 1 - L1,L2 Microstrip Transmission Line W = 40 mil L = 215 mil Inductance is 3.129 nH Inductor 2 - L3 Microstrip Transmission Line W = 40 mil L = 225.7 mil Inductance is 3.342 nH Momentum Optimization EM Seminar 1999 page 12 of 36 In a similar way, a high impedance microstrip line is used for the inductor. Binary search or optimization can be used to determine the dimensions. The dimensions determined for the inductors are as follows: L1= L3 = 3.129 nH { W = 40 mil, L = 215 mil } L2 = 3.342 nH { W = 40 mil, L = 225.7 mil } EM Optimization - Moving from Analysis to Design Automation 12 EM Simulation as an Analysis Tool Schematic with Physical Components Replace ideal components with radial stubs and inductive transmission lines Momentum Optimization EM Seminar 1999 page 13 of 36 The major components of the circuit have been individually calculated and are now assembled into the complete circuit. A 50 ohm microstrip transmission line and taper have been added to each end of the filter, and the overall length is adjusted to 1.5 inches. An S-parameter simulation is done of the complete circuit. EM Optimization - Moving from Analysis to Design Automation 13 EM Simulation as an Analysis Tool Ideal vs. Physical Comparison Ideal Physical Difference due to lumped versus distributed model Momentum Optimization EM Seminar 1999 page 14 of 36 dB(S21) and dB(S11) are shown for the comparison. Each plot shows the ideal circuit response (LC filter) and the microstrip circuit (physical) response. The response at the 1 dB cutoff frequency is very close to the ideal. The response at 3.9 GHz achieves the < -25 dB specification. The obvious difference is in the stop band loss detail above 3.9 GHz. EM Optimization - Moving from Analysis to Design Automation 14 EM Simulation as an Analysis Tool Layout Synchronize layout from Schematic System Design Synthesis Circuit Design Layout EM Simulation Manufacturing Substrate - GETEK H = open Er = 1.0 H = 59 mil Er = 4.3 Momentum Optimization EM Seminar 1999 page 15 of 36 The design flow now crosses the design flow boundary between schematic-based design and layout-based design. A layout of the schematic is produced. At this point, there is design feedback to determine if the dimensions of the radial stubs and transmission lines cause the geometry to overlap. It can also be observed if the geometry would require EM simulation to determine the effect of parasitic coupling. EM Optimization - Moving from Analysis to Design Automation 15 EM Simulation as an Analysis Tool EM Simulation Layout EM Simulation HP Momentum HP HFSS • HP Momentum - planar method of moments • HP HFSS - 3D finite elements Momentum Optimization EM Seminar 1999 page 16 of 36 At this point, the designer determines that EM analysis is required. Two choices are available: a planar EM solver or a 3D solver. HP offers Momentum as a planar method of moments solver, and HFSS as a 3D finite elements solver. HP Momentum is an integrated product which works directly from the Layout of HP ADS. HP HFSS is a separate product which has translators to directly read layout from HP ADS. If the layout is part of a solved Momentum project, then the layout and substrate information are used to form a complete HP HFSS project. If the layout is only in EGS format, then the translator provides the ability to define the substrate definition and layer mapping. EM Optimization - Moving from Analysis to Design Automation 16 EM Simulation as an Analysis Tool EM Simulation - HP Momentum System Design Synthesis Circuit Design Layout EM Simulation Manufacturing Momentum Optimization EM Seminar 1999 • Mesh frequency 3.2 GHz • Edge mesh on • 30 cells per wavelength page 17 of 36 HP Momentum works directly from the layout of HP ADS. The mesh frequency is set at 3.2 GHz. Edge mesh is enabled and the mesh is set to 30 cells per wavelength. The results of the HP Momentum simulation are written out directly in the dataset format of HP ADS, and viewed using the data display of HP ADS. EM Optimization - Moving from Analysis to Design Automation 17 Translate to 3D EM Simulator EM Simulation as an Analysis Tool HP ADS Add 3D features: •3D structures, e.g. connectors, finite dielectrics, housing features •metal thickness HP ADS - HP HFSS Translator Momentum Optimization EM Seminar 1999 HP HFSS page 18 of 36 Designs can be translated from HP ADS to HP HFSS. 3D features can be added to the geometry, such as connectors, finite dielectrics, housing features, and metal thickness. HP HFSS can write out data in CITIfile or Touchstone format, which can be read back into HP ADS. EM Optimization - Moving from Analysis to Design Automation 18 EM Simulation as an Analysis Tool Circuit versus EM comparison Differences due to Added Parasitics in Momentum Momentum Ideal Physical Momentum Optimization EM Seminar 1999 page 19 of 36 The results of the EM simulation can be compared to the ideal results and the microstrip schematic simulation results. Momentum shows a large deviation in the predicted stop band performance of the filter. This is due, mainly, to the additional parasitics present in the actual geometry and not accounted for in the schematic representation. EM Optimization - Moving from Analysis to Design Automation 19 EM Simulation as an Analysis Tool Manufacturing Layout translator (Gerber) used to link to Manufacturing. System Design Synthesis Circuit Design Layout EM Simulation Manufacturing Momentum Optimization EM Seminar 1999 page 20 of 36 Additional geometries needed for manufacturing are added to the layout. Layout translators, such as Gerber, GDS-II, IGES, or DXF are available to link to manufacturing. The completed prototype circuit is shown. The prototype process time for this design was on the order of 3-4 weeks. EM Optimization - Moving from Analysis to Design Automation 20 Schematic-based Design D E S I G N Layout-based Design EM Simulation as an Analysis Tool Design Flow F E E D B A C K System Design Synthesis Post Processing Circuit Design Optimization Layout EM Simulation EM Optimization Manufacturing Learning Momentum Optimization EM Seminar 1999 page 21 of 36 An important aspect of the design flow is the design feedback process. As tests and prototypes are completed, it is important to incorporate the new learning into the design. Feedback can affect all stages of the design flow, from the em simulation up through system design. EM Optimization - Moving from Analysis to Design Automation 21 EM Simulation as an Analysis Tool Measured vs. Modeled Results HP Momentum Measured •Does not meet specification •Need to account for the differences Ideal Momentum Optimization EM Seminar 1999 page 22 of 36 The prototype is measured and compared to the Momentum simulation. In this example, there is a significant difference in the filter response from the predicted. EM Optimization - Moving from Analysis to Design Automation 22 EM Simulation as an Analysis Tool Measured vs. Modeled Resolution Search for causes of discrepancy Check manufacturing • Actual Geometry vs. Ideal Geometry •Actual Substrate vs. Ideal Substrate Modify Design • EM Optimization Momentum Optimization EM Seminar 1999 page 23 of 36 Since this is an unknown substrate and manufacturing process, there are several possible causes for the differences in the simulation and measured results. It is important to check the manufacturing process for the dimensions of the actual geometry produced as well as the actual substrate properties. If both of these are in agreement with the simulation assumptions, then the designer can look into modifying the design. EM Optimization - Moving from Analysis to Design Automation 23 EM Simulation as an Analysis Tool Design Feedback - Geometry Geometry is from 0.5 mil to 1 mil over-etched in different areas Momentum Optimization EM Seminar 1999 page 24 of 36 The first design feedback is to check the geometry. Using a machinist microscope to measure the circuit, it is observed that the etching process has over-etched the circuit by varying amounts. The over-etched circuit is from 0.5 mil to 1 mil different than the intended design. This can contribute to the difference in the frequency response. EM Optimization - Moving from Analysis to Design Automation 24 EM Simulation as an Analysis Tool Design Feedback - Dielectric Dielectric Measurement - HP 85070B Dielectric Probe The measured dielectric constant: 2.7 GHz - 3.75 3.2 GHz - 3.8 3.4 GHz - 3.85 Different from er= 4.3 used in simulation Momentum Optimization EM Seminar 1999 page 25 of 36 Using the HP 85070B Dielectric Probe, a sample of the board was tested for dielectric constant. The measured dielectric value was approximately 3.8, and not 4.3 that was used in the design assumption. The dielectric constant is also seen to vary with frequency. In the range from 2.7 GHz to 3.4 GHz, the dielectric changes by 0.1 . EM Optimization - Moving from Analysis to Design Automation 25 EM Simulation as an Analysis Tool Measured vs. New Modeled Results •Have determined the process parameters •Have verified Momentum’s ability to analyze performance goal HP Momentum •Need to change design to meet specification HP Momentum Measured •Modified Geometry HP HFSS (thick metal) Momentum Optimization EM Seminar 1999 •Dielectric constant = 3.8 page 26 of 36 The layout geometry is modified based on the microscope measurements, and the new dielectric constant is used from the dielectric probe measurement. The resulting Momentum analysis now compares favorably with the measured results. This filter design does not meet the original design specification, but the learning that resulted from the design feedback will help with the further design iterations. The design process is a series of design and re-design steps that are used to gain an understanding of the circuit and of the manufacturing considerations. Simulation time: Momentum - 4.5 min/freq 10 frequencies, total time 45 minutes (23 MB) HP HFSS - 11 min/freq 6 frequencies, total time 70 minutes, thick metal (560 MB) EM Optimization - Moving from Analysis to Design Automation 26 EM Optimization as a Design Tool Overview Microstrip Radial Stub Filter • Analysis - Momentum • Design Refinement - Momentum Optimization Momentum Optimization Design Refinement Model Generation Analysis Momentum Momentum Optimization EM Seminar 1999 page 27 of 36 The existing design can now be used as a starting point for design refinement. Momentum Optimization automates EM simulation and controls the geometric parameters to improve the circuit performance toward the design goals. This filter will be used to illustrate the Momentum Optimization process. EM Optimization - Moving from Analysis to Design Automation 27 EM Optimization as a Design Tool Define Parameters Optimize L1 (L3 not shown) Optimize L2 L1 L2 ind2 ind1 Optimize C3 (C4 not shown) Optimize C1 (C2 not shown) C3 C1 rad2 Momentum Optimization EM Seminar 1999 rad1 page 28 of 36 The parameters for this optimization are illustrated. Each graphic shows and overlay of the nominal geometry with the perturbed geometry. Each of these perturbed geometries exists in their own separate layout file. The four parameters for optimization are: •The length of inductor L1 (L3 is changed at the same time as L1) •The length of inductor L2 •The radius of the radial stub C1 (C2 is changed at the same time at C1) •The radius of the radial stub C3 (C4 is changed at the same time at C3) The two rules to remember for defining an optimization parameter are: •There must be no change in the number of vertices. •The defined parameter represents a linear translation of the vertices EM Optimization - Moving from Analysis to Design Automation 28 EM Optimization as a Design Tool The Solution Process - Parameters Parameter for Radius is defined: •Allow to vary during optimization •Lower and Upper Bound for parameter •‘Add’ makes a copy of the nominal design Momentum Optimization EM Seminar 1999 page 29 of 36 The Momentum Optimization process is started from the Momentum menu. The general process to start an optimization is the following: •Define candidate parameters for optimization •Specify the design goals •Setup and run the optimization The parameters for this example are the radius of the radial stubs, and the length of the inductive transmission lines. From the parameters dialog, define the following: •variable name •nominal value •perturbed value •starting value. With the advanced options, the lower and upper limit can be set for the variable. When ‘Add’ is selected, a copy of the nominal design is automatically made to define the perturbed design. EM Optimization - Moving from Analysis to Design Automation 29 EM Optimization as a Design Tool Momentum Optimization Geometry Capture • Define Nominal Design • Define a Perturbed Design • Move the affected vertices on the Perturbed Design to define the parameter for optimization Momentum Optimization EM Seminar 1999 page 30 of 36 Momentum Optimization uses a process called geometry capture to specify a candidate parameter for optimization. Geometry capture can be defined by the following process: • Define the nominal design - the geometry of interest will serve as a start • Define the perturbed design - simply define the parameter name to add, and Momentum makes a copy of the nominal design in a new layout window. • Move the affected vertices on the perturbed design to define the parameter for optimization. The difference between the nominal design and the perturbed design will define the parameter. EM Optimization - Moving from Analysis to Design Automation 30 EM Optimization as a Design Tool The Solution Process - Specification Specification goals for the optimization: •frequency point or sweep •Goal and Weight Momentum Optimization EM Seminar 1999 page 31 of 36 The next step in the Momentum Optimization process is to define the specification goals. For this radial stub filter example, we need to express the two design goals of interest: dB(S21) at 3.2 GHz = -1dB dB(S21) at 3.9 GHz = -25 dB Other frequencies (or ranges of frequencies) as well as other inequalities could be specified in the above goals were not sufficient to achieve the needed performance. EM Optimization - Moving from Analysis to Design Automation 31 EM Optimization as a Design Tool The Solution Process - Run Optimization setup: •Optimization type •Interpolation type •Stopping criteria Momentum Optimization EM Seminar 1999 page 32 of 36 The last step for Momentum Optimization is to define the type of optimization and stopping criteria. Then select the ‘start’ button. Momentum Optimization starts the optimization process, and displays a window that shows the error function result of each iteration. EM Optimization - Moving from Analysis to Design Automation 32 EM Optimization as a Design Tool The Solution Process - Results optimal values displayed •increase rad1 by 17.51 •increase rad2 by 4.26 •increase ind1 by 5 •increase ind2 by 5 Momentum Optimization EM Seminar 1999 Before and after optimization page 33 of 36 After the stopping criteria is met, the optimization parameter dialog is updated to show the optimal value. Select ‘back annotate optimal values’ to make the starting values the same as the optimal values. Then select ‘view start design’ to open a layout window with the geometry that represents the new starting values. This process can be done for each geometry and each parameter of interest. EM optimization could also be performed for the width of the high impedance transmission lines (the inductors), or for the angle parameter of the radial stubs. EM Optimization - Moving from Analysis to Design Automation 33 EM Analysis of entire structure EM Optimization as a Design Tool Goals: 1dB loss at 3.2 GHz > 25 dB loss 3.9-6.0 GHz Momentum before opt goal Ideal Momentum after opt Momentum Optimization EM Seminar 1999 page 34 of 36 The simulation of the optimal filter shows good agreement with the design goal. EM Optimization - Moving from Analysis to Design Automation 34 Schematic-based Design D E S I G N Layout-based Design Design Flow - Time Optimization F E E D B A C K Momentum Optimization EM Seminar 1999 ~ 1-2 days System Design Synthesis Circuit Design Post Processing Optimization ~ 1-2 hrs Layout EM Simulation ~ 1 day EM Optimization Manufacturing ~ 1-2 days ~ 2-4 weeks page 35 of 36 EM optimization has been shown to be a vital part of the complete design flow. EM Optimization - Moving from Analysis to Design Automation 35 Summary Momentum • EM Analysis is a vital part of the design flow • Improve Time To Market • Integrated with HP Advanced Design System Momentum Optimization •With the addition of Momentum Optimization, Momentum moves from being an analysis tool to a design tool. Momentum Optimization EM Seminar 1999 page 36 of 36 Summary Momentum - EM Analysis is a vital part of the design flow - Momentum simulation was used for design verification, and served as the basis for uncovering the incorrect design assumptions. Once the correct assumptions were used for the Momentum simulation, there was good agreement between measured and modeled performance. - Improve Time to Market - Momentum, when used as part of the complete design flow, can help reduce the number of design iterations and thus improve time to market - Integrated with HP Advanced Design System - Momentum was shown to be integrated with the complete design environment, and so saves time and effort in the design flow. Momentum Optimization - moves Momentum from Analysis to Design Refinement - With the addition of Momentum Optimization, Momentum is no longer simply an analysis tool: it is a design tool. - Automation improves time to market - Integrated with Momentum EM Optimization - Moving from Analysis to Design Automation 36 For more information about Agilent EEsof EDA, visit: Agilent Email Updates www.agilent.com/find/emailupdates www.agilent.com/find/eesof Get the latest information on the products and applications you select. www.agilent.com For more information on Agilent Technologies’ products, applications or services, please contact your local Agilent office. The complete list is available at: www.agilent.com/find/contactus Agilent Direct www.agilent.com/find/agilentdirect Quickly choose and use your test equipment solutions with confidence. 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