APPLIED PHYSICS LETTERS VOLUME 84, NUMBER 26 28 JUNE 2004 Mobility studies of field-effect transistor structures based on anthracene single crystals A. N. Aleshina) School of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-747, Korea and A. F. Ioffe Physical-Technical Institute, Russian Academy of Sciences, St. Petersburg 194021, Russia J. Y. Lee, S. W. Chu, J. S. Kim, and Y. W. Park School of Physics and Condensed Matter Research Institute, Seoul National University, Seoul 151-747, Korea (Received 5 February 2004; accepted 5 May 2004; published online 17 June 2004) The charge carrier transport in anthracene single crystals has been studied by means of field-effect transistor 共FET兲 structure. The FET mobility 共FET兲 revealed the nonmonotonous, reliant on gate-voltage 共Vg兲, temperature dependence with the maximum FET ⬃ 0.02 cm2 / V s at T ⬃ 170– 180 K and Vg ⬃ −30 V. At temperatures below 180 K the mobility decreases and becomes thermally activated with the Vg-dependent activation energy Ea ⬃ 40– 70 meV governed by shallow traps. The space-charge-limited current is the dominant transport mechanism in FET structures based on anthracene single crystals. © 2004 American Institute of Physics. [DOI: 10.1063/1.1767282] parent crystals with a typical size ⬃1 ⫻ 2 mm and thickness of around 10– 30 m are selected for mobility studies. The substrates used for the FET structures are highly doped n-type Si wafers with a ⬃200-nm-thick thermally grown SiO2 layer. Gold electrodes are deposited on top of the SiO2 by means e-beam lithography with the channel length - 5 m and the channel width - 4 cm. SiO2 is cleaned prior to placing the anthracene single crystal on top of the substrate. To improve the electrical contact between the gold pads and the molecular crystal, the substrate is treated in a solution of 10 mM nitrobenzenethiol in acetonitrile. Such treatment significantly reduces the contact resistance, which is crucial for the low-temperature measurements.15 After the surface treatment anthracene single crystal is placed on top of the substrate, covered with polymer dielectric film— poly(dimethyl silaxan) 共PDMS兲—to protect from air and pressed by screw to establish the best electrical contact. The schematic of a FET structure fabricated following this procedure is shown in the inset to Fig. 1. The current–voltage Organic field-effect transistors 共FET兲 based on thin-film technologies have received considerable attention within the last decades.1,2 As a result the room temperature field-effect mobility 共FET兲 for the best organic thin film transistors achieved FET ⬃ 1.5 cm2 / V s,3 which is comparable with that of amorphous silicon FETs.4 Since FET mobility increases with increasing crystallinity in thin-film FETs, there is every reason to expect that FETs made on the surface of free-standing single crystals of organic molecules is the promising route to produce high-mobility devices suitable for practical applications. However, unlike thin film FETs, the investigation of single crystal organic FETs is still rare. Only a few results on tetracene, pentacene, and rubrene molecular crystals FETs have been reported recently.5–12 At the same time such typical molecular crystal as anthracene is still out of this activity. Anthracene C14H10 is a molecular solid with a band energy gap Eg ⬃ 3.9 eV composed of molecules which held together by weak van der Waals forces, thus it has rather low melting point 共⬃217 ° C兲 and poor electrical conductivity.13 The mobility behavior obtained from FET structures based on anthracene single crystals could provide a important information for a general understanding of charge carrier transport in molecular crystals. In this letter we report on fabrication and characterization of FET structures based on anthracene single crystals. The field-effect mobility studied over the temperature range T = 100– 310 K has nonmonotonous temperature dependence and reaches the maximum value FET ⬃ 0.02 cm2 / V s at T ⬃ 170– 180 K, which is comparable to those reported for regular thin films organic FETs. The observed low temperature mobility behavior is consistent with the thermally activated transport governed by shallow traps. Anthracene single crystals were grown by means of physical vapor deposition in the vertical furnace in a helium atmosphere similar to that described in Ref. 14. The temperatures of anthracene powder and crystal zone were 170 and 100 ° C, respectively. The heating time was 24 h. The trans- FIG. 1. log ISD versus log VSD at 220 K at different gate bias for the FET structure based on anthracene single crystal; arrows indicate VTFL. Inset shows the schematic of a single crystal anthracene FET. a) Electronic mail: aleshin@phya.snu.ac.kr 0003-6951/2004/84(26)/5383/3/$20.00 5383 © 2004 American Institute of Physics Downloaded 17 Jun 2004 to 147.46.26.110. Redistribution subject to AIP license or copyright, see http://apl.aip.org/apl/copyright.jsp 5384 Appl. Phys. Lett., Vol. 84, No. 26, 28 June 2004 共I – V兲 characteristics are measured in vacuum ⬃10−5 Torr within the temperature range 100– 310 K with a Keithley SCS4200 semiconductor characterization system. The gateinduced leakage current of gold electrodes prior to anthracene single crystal attachment is found to be ⬃10−10 A. To increase the accuracy, source, drain, and gate, is shorted before each measuring cycle. Figure 1 shows the typical plot of log ISD versus log VSD for anthracene single crystal measured at 220 K along the c axis at different gate voltages Vg. The I – V characteristics at 220 K are superlinear and similar to those at 300 K, but the ISD at 220 K is much higher (see the following for details). n As can be seen from Fig. 1, for our samples ISD ⬃ VSD , where n is strongly gate-voltage dependent and varies from n ⬃ 16.4 at Vg = 0 V down to n ⬃ 6.1 at Vg = −40 V. It means that the observed I – V behavior is characteristic of a trapfilled regime of the space-charge-limited current 共SCLC兲 transport mechanism.13–16 This I – V behavior coincides with the previous results for pristine anthracene single crystals, where SCLC transport has been considered as the main one.13 SCLC theory predicts the crossover from the Ohmic regime (at low voltages) to the rather narrow SCLC regime governed by a shallow-traps 共I ⬃ Vn , n ⬃ 2兲 and finally to a trap-filled regime 共I ⬃ Vn , n Ⰷ 2兲 with an increase of bias voltage. In our case the two former regimes are apparently under the leakage current limit, whereas the latter regime manifests itself clearly. The voltage of the trap-filling limit is given by VTFL = 2eL2Nt / 3r0, where 0 is the permittivity of free space and r is the relative dielectric constant of the active layer (for anthracene crystal r = 3.2),13 Nt is the trap concentration, and L is the distance between electrodes. The trap concentration at 300 K obtained for our samples from the VTFL value at Vg = 0 V is of the order Nt ⬃ 1014 cm−3 which is reasonable for the pristine anthracene crystal. As can be seen from Fig. 1, application of negative gate voltage affects VTFL significantly. Namely, negative Vg shifts the VTFL at 220 K to the lower values that implies the decrease from 3 ⫻ 1014 cm−3共Vg = 0 V兲 down to of Nt 13 −3 5 ⫻ 10 cm 共Vg = −40 V兲 as a result of gating. It means that the SCLC mechanism in the trap-filled regime remains the dominant one at both room and low temperatures. One may suggest that the sharp rise of ISD at VTFL cannot be attributed to simply bulk trap filling. The high field can also produce trap-emptying results in some finite slop of I – V curves. The obtained data demonstrate that the ISD increases significantly due to hole injection by the negative Vg, whereas positive gate voltage does not affect it so much. The effect of negative gate voltage becomes more pronounced as temperature decreases down to ⬃200 K [Fig. 2(a)] but it decreases gradually below 200 K [Fig. 2(b)]. The inset to Fig. 2(b) shows the low temperature 共T ⬍ 200 K兲 dependence of log ISD versus Vg at VSD = 50 V for the same FET structure. The on/off ratio calculated within the whole temperature range as the ratio between the source–drain current at Vg = −30 V (on) and at Vg = 10 V (off) is shown in the inset to Fig. 2(a). Despite the on/off values and the sharpness at room temperature being rather low, one may note that they rise to higher values up to ⬃104 at T ⬍ 200 K. As can be seen from the inset to Fig. 2(b), the field-effect onset at T ⬍ 200 K has occurred at both positive (at T = 200 K) and negative (at T = 110 K) Vg. Thereby the quality of the insulator/ semiconductor interface can be characterized by the sharp- Aleshin et al. FIG. 2. ISD vs Vg at T ⬎ 200 K (a) and T ⬍ 200 K (b). Insets show the on/off ratio vs T (a) and log ISD vs T at T ⬍ 200 K (b) for the same SC FET structure. ness of the field-effect onset, S = dVg / d共log ISD兲, and by the normalized slope, Si = SCi, which takes into account the capacitance of the insulator layer per unit area Ci. Our anthracene single crystal FET exhibits a subthreshold slope S ⬃ 6.6 V / decade at T = 170 K, which corresponds to Si ⬃ 79 V nF/ decade cm2 共Ci ⬃ 12 nF/ cm2兲.17 This value is comparable to that found for the pentacene thin film and single crystal FETs- Si ⬃ 15– 80 V nF/ decade cm2 at 300 K.5,11,18 The charge carrier mobility is obtained at each temperature from the transconductance, gm, characteristics: gm = 共ISD / Vg兲兩VSD=const = −共Z / L兲FETCiVSD. Z is the channel width, L is the channel length, and Ci is the capacitance per unit area.17 Typical temperature dependencies of the FET mobility, FET共T兲, at different gate voltages are shown in Fig. 3(a). As can be seen the temperature dependence of FET mobility is nonmonotonous and strongly gate-voltagedependent. The mobility increases reaching the maximum at T ⬃ 170– 250 K (depends on Vg) and then decreases with further temperature decrease. The maximum of FET ⬃ 0.02 cm2 / V s is obtained at T ⬃ 170– 180 K at sufficiently large gate voltage Vg = −30 V. The same data plotted as log FET versus 103 / T are presented in Fig. 3(b). It is noteworthy that such nonmonotonous FET共T兲 dependence is similar to that reported recently for tetracene single crystal FETs5,6 and moreover at T ⬎ 200 K it is typical of band-like transport in organic crystals. At the same time FET共T兲 is not consistent with that usually observed in organic thin film Downloaded 17 Jun 2004 to 147.46.26.110. Redistribution subject to AIP license or copyright, see http://apl.aip.org/apl/copyright.jsp Aleshin et al. Appl. Phys. Lett., Vol. 84, No. 26, 28 June 2004 5385 quasicontinuous trap distribution to the imperfection of the crystal structure. One may suggest that both chemical and structural traps are present to some extent in anthracene crystals. However because we did not introduce any specific impurities or dopants into the crystals, one can expect that structural traps related to some irregularities of the lattice are dominant and affect I – V characteristics. Further improvement of the anthracene crystal quality and the anthracene– SiO2 interface may result in more pronounced I – V characteristics and higher mobility values. In conclusion, we have studied the charge carrier transport in anthracene single crystals by means of field-effect transistor structure. The FET mobility revealed the nonmonotonous temperature dependence with the maximum mobility FET ⬃ 0.02 cm2 / V s at T ⬃ 170– 180 K and Vg ⬃ −30 V. At temperatures below 180 K the mobility decreases and becomes thermally activated with Vg-dependent activation energy Ea ⬃ 40– 70 meV governed by shallow traps. The space-charge-limited current is the dominant transport mechanism in FET structures based on anthracene single crystals. The authors are grateful to M. Schaer for help with anthracene crystals storage. This work was supported by KISTEP, under Contract No. M6-0301-00-0005, Korea. Support from the Brain Pool Program of Korean Federation of Science and Technology Societies for A.N.A. is gratefully acknowledged. 1 FIG. 3. Mobility vs T (a) and 1000/ T (b) at different Vg for anthracene SC FET. Inset shows Ea vs Vg at T ⬍ 200 K for the same structure. FETs, where the mobility decreases with decreasing temperature within an entire temperature range.1,2 The observed FET共T兲 at T ⬍ 200 K is qualitatively similar to the one expected for the organic crystals in the presence of shallow traps, which is given by FET ⬃ T−mexp共−Ea / kBT兲.13,19 The activation energy Ea, estimated from the slope of the log FET versus 103 / T plot, is higher than kBT at room temperature and decreases with increasing Vg [inset to Fig. 3(b)]. Note that both Ea values and Ea versus Vg behavior are similar to those obtained for the large-grain pentacene thin film FET.20 At higher temperatures T ⬃ 180– 280 K the mobility increases very sharply, FET ⬃ T−m with m ⬃ 10 at Vg ⬃ −20 to −30 V. This power exponent is much higher than that expected for anthracene crystals 共m ⬃ 1 – 2兲 and reflects the strong influence of traps which resulted in a strong gate voltage dependence.13 Thus all the above-mentioned experimental data will show that shallow traps play the major role in handling of mobility values. As regards the nature of these traps, one may note that traps created by all types of imperfections are always present in molecular crystals and interact with injected carriers from the contacts. Two types of carrier trap distributions have been reported for anthracene crystals: (a) traps confined in discrete energy levels in the band gap, and (b) traps with a quasicontinuous distribution of energy levels (exponential or Gaussian) having a maximum trap density near the band edges.16 Despite the physical nature of traps still being discussion, one can relate the discrete trap levels to chemical impurities introduced into the lattice, and the G. Horowitz, Adv. Mater. 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