Design of VLSI Circuits and Systems

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EE M216A
Fall 2010
Design of VLSI Circuits and Systems
Prof. Dejan Marković
Prof
University of California, Los Angeles, USA
Email: ee216a@gmail.com
Course Description
Š This course focuses on advanced concepts of VLSI circuit and
system design in state‐of‐the‐art CMOS technologies.
Š Topics include:
– Circuit‐level optimization using gate size, supply and threshold voltage;
layout of circuit blocks optimized for speed, power, or area.
– Advanced concepts of retiming, place and route will be employed in class
projects, in addition to the design of custom blocks.
– The applications include micro‐processors, signal and multimedia
processors, portable devices, memory and periphery.
– Course topics are continuously updated to track unique technological
features such as power leakage, interconnect, clock and power distribution,
impact of device variability on the design.
– This quarter, special focus will be given to design optimization and scaling.
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EE115C vs. EEM216A
Š EE115C (introductory material)
– Basic transistor and circuit models
– Basic circuit design styles and logic gates
– Design
g of custom blocks (adders,
(
, memories,…)
, )
Š EEM216A (advanced material)
–
–
–
–
–
Transistor models of varying accuracy
Design under constraints: power, area, performance, robustness
More advanced design techniques
Learning challenges in the coming years
Creating new solutions to challenging design problems
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Class Topics
Š Fundamentals
– Technology and modeling
– Scaling and limits of scaling
Š Design for nano‐scale
nano scale CMOS
– Static CMOS, transistor sizing, buffer design, high‐speed CMOS design styles,
(dynamic logic)
– Process variations, leakage
Š Design techniques for low power and low voltage
– Power minimization at technology, circuit, architecture levels
– Energy‐delay optimization
Š Arithmetic
ih
i circuits
i i
Š System‐level issues
– Timing strategies, logic synthesis
– Clock and power distribution
– Physical design
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Teaching Staff
Š Instructor
– Prof. Dejan Marković
– Office hours
● Tu
T & Th 10:30‐11:45am
10 30 11 45
● 56‐147E Eng‐IV Bldg.
Š
Š
Š
– Email: ee216a@gmail.com
MSOL TA
– Fang‐Li Yuan
Reader
– TBD
Admin
– Kim H
– Office: 56‐127CC Eng‐IV
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Class Material
Š Textbook:
– J. Rabaey, A. Chandrakasan, B. Nikolic, Digital Integrated Circuits:
A Design Perspective, (2nd Edition), Prentice Hall, 2003.
Š Other books:
– N. Weste, D. Harris, CMOS VLSI Design: A Circuits and Systems Perspective,
(3rd Edition), Addison Wesley, 2004.
– A. Chandrakasan, W. Bowhill, F. Fox, Design of High‐Performance
Microprocessor Circuits, IEEE Press, 2001.
– W.J. Dally and J.W. Poulton, Digital System Engineering, Cambridge
University Press, 1998.
– B. Wong,
g, A. Mittal,, Y. Cao,, G.W. Starr,, Nano CMOS Circuit and Physical
y
Design, Wiley‐Interscience, 2004.
Š Selected papers:
– Available on classwiki
● Linked from IEEE Xplore (http://ieeexplore.ieee.org)
(need to be logged in to a campus machine)
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Other Sources
Š Core material
–
–
–
–
–
–
IEEE Journal of Solid‐State Circuits (JSSC)
IEEE International Solid‐State Circuits Conference (ISSCC)
European
p
Solid‐State Circuits Conference ((ESSCIRC))
Symposium on VLSI Circuits (VLSI)
Custom Integrated Circuits Conference (CICC)
Other conferences and journals
Š CAD topics
– International Conference on Computer Aided Design (ICCAD)
– Design Automation Conference (DAC)
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EEM216A .:. Fall 2010
Class Organization & Grading
Š Grading:
–
–
–
–
–
–
Week
Homeworks (4)
Labs (2)
Project
j
Midterm
Final exam
Course survey
1
2
15%
4%
30%
25%
25%
1%
3
4
H1
H2
Fri
10/8
Mon
10/18
Class project
Phase‐1
5
Phase‐2
6
H3
8
H4
Fri
10/29 M
Wed
11/3
EEM216A .:. Fall 2010
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Fri
11/12
Final PPT
9
L1
10
L2
Mon Fri
11/22 11/26
11
S
F
Fri
12/10
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Class Website
Š EEweb: grades only
Š Classwiki: notes, handouts, assignments, CAD tools, references, …
classwiki
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Classwiki
Š Create an account: use your UCLA username!
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Homework #0 / Action Items
Š Get an EE account (if you haven’t already)
Š Sign up for classwiki
– Use your ee/seas username to sign up
– Once you sign up, I need to add you to ee216a group
Š Server and CAD tool info is on the wiki
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CAD Tools
Š Cadence & Synopsys software
− Phased out Electric software
− Online documentation and tutorials
Š 90nm CMOS technology
− Cadence gpdk090 & gsclib & Synopsys generic 90nm library
− 9 metal layers
Š Important tools / skills from EE115C
− Design Capture: Virtuoso Schematic / Layout Editor
− Circuit Simulation: Spectre / Ocean
− Design Verification (DRC, LVS, Extraction): Assura/Diva/QRC
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EEM216A Goals
Š Understanding the basic building blocks of VLSI
– Transistors/Wires
– Logic Gates and Layout
– Datapath
p
Blocks
Š Be able to conceptually model a system
– Logic Optimization
– State Machine Design (RTL)
Š Be able to build a system (using a subset of the tools)
– Verilog Modeling
– Synthesis
– Place and Route
Š Understanding the constraints and tradeoffs
– Delay analysis (gates and interconnects)
– Clocking methodology
– System integration issues (Power/Ground routing, Noise)
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EEM216A .:. Fall 2010
EE M216A .:. Fall 2010
Lecture 1
Digital Integrated Circuit Design:
Trends and Challenges
Prof. Dejan Marković
ee216a@gmail.com
7
Moore’s Law
Š In 1965, Gordon Moore noted that the number of transistors on a
chip doubled every 18 to 24 months
Š He made a prediction that semiconductor industry will double its
effectiveness every 18 months
“The complexity for minimum component costs has increased at a rate of roughly
a factor of two per year. Certainly over the short term, this rate can be expected
to continue, if not to increase. Over the longer term, the rate of increase is a bit
more uncertain, although there is no reason to believe it will not remain nearly
constant for at least 10 years. That means by 1975, the number of components
per integrated circuit for minimum cost will be 65,000.”
[G. Moore, Electronics, 1965]
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Moore’s Law – 1965
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Moore’s Law – 2005
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Evolution in Complexity
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Microprocessor Examples
Š Moore’s
M
’ law
l
−
−
−
−
−
Number of transistors
Logic density
Die size
Frequency
Power
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EEM216A .:. Fall 2010
#1: Number of Transistors
Š Transistors on lead microprocessors double every 2 years
Transistors (MT)
1000
100
10
1
0.1
0 01
0.01
2X growth in 11.96
96 years!
Pentium 4
Pentium Pro (P6)
Pentium® (P5)
486 (P4)
386 (P3)
286 (P2)
8086 (P1)
8085
8080
8008
4004
0.001
1970
1980
1990
2000
Source:
S. Borkar
(Intel)
2010
Year
EEM216A .:. Fall 2010
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#2: Logic Density
Š Shrinks and compactions meet density goals
− New micro‐architectures drop density
2x trend
Logic Density
Log
gic Transistors/mm2
1000
100
Pentium II (R)
10
Pentium Pro (R)
486
Pentium (R)
386
i860
Source: Intel
0.13µ
0.18µ
0.25µ
0.35µ
0.6µ
0.8µ
1.0µ
1.5µ
1
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EEM216A .:. Fall 2010
#3: Die Size Growth
Š Die size grows by 14% to satisfy Moore’s law
Die size (mm)
100
10
8080
8008
4004
1
1970
EEM216A .:. Fall 2010
8086
8085
1980
286
386
Pentium Pro
486 Pentium ®
~7% growth per year
~2X
2X growth in 10 years
1990
Year
2000
Source:
S Borkar
S.
B k
(Intel)
2010
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#4: Frequency
Š Lead microprocessor frequency doubles every 2 years
Frequency (Mhz)
F
10000
Doubles every
2 years
1000
100
10
8085
1
0.1
1970
8086 286
386
486
Pentium 4
Pentium Pro
Pentium ®
Source:
S. Borkar
(Intel)
8080
8008
4004
1980
1990
Year
2000
2010
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EEM216A .:. Fall 2010
Processor Frequency Trend
Š Frequency doubles each generation
− Number of gates/clock reduce by 25%
100
Intel
IBM Power PC
DEC
Gate delays/clock
Processor freq
scales by 2X per
generation
Game over!
21264S
1,000
Mhz
21164A
21264
Pentium(R)
21064A
21164
II
21066
MPC750
604
604+
10
Pentium Pro
(R)
Pentium(R)
100
601, 603
486
386
1
EEM216A .:. Fall 2010
Source:
V. De, S. Borkar
ISLPED’99
2005
2003
2001
1999
1997
1995
1993
1991
1989
1987
10
Gate Delays/ Clock
10 000
10,000
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Technology Roadmap (2002)
International Technology Roadmap for Semiconductors (ITRS)
Year
2001
2003
2005
2007
2010
2013
2016
DRAM ½ pitch [nm]
130
100
80
65
45
32
22
MPU transistors/chip
97M
153M
243M
386M
773M
1.55G
3.09G
Wiring levels
8
8
10
10
10
11
11
High-perf. phys. gate [nm]
65
45
32
25
18
13
9
High-perf. VDD [V]
1.2
1.0
0.9
0.7
0.6
0.5
0.4
Local clock [GHz]
1.7
3.1
5.2
6.7
11.5
19.3
28.8
High-perf. power [W]
130
150
170
190
218
251
288
Low-power phys. gate [nm]
90
65
45
32
22
16
11
Low-power VDD [V]
1.2
1.1
1.0
0.9
0.8
0.7
0.6
Low-power power [W]
2.4
2.8
3.2
3.5
3.0
3.0
3.0
Node years: 2007/65nm, 2010/45nm, 2013/32nm, 2016/22nm
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EEM216A .:. Fall 2010
Technology Scaling
ISSCC data
x4
1
0.1
0.01
80
MPU
DSP
85
90
Year
(a) Power dissipation vs. year.
95
0.7
κ
3
ars
ye
3
/
100
∝
Power Dissipation (W)
10
∝κ
1000
Power Density (mW/mm2 )
P
ears
x1.4 / 3 y
100
10
1
1
Scaling Factor κ
(normalized by 4µm design rule)
(b) Power density vs. scaling factor.
10
Source: T. Kuroda
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New Trend: Parallel Hardware
Š Higher logic throughput, yet lower power
Vdd
Logic Block
Freq = 1
Throughput = 1
Active Power = 1
SD Lkg Power = 1
0.7 x Vdd
Logic
g Block
Source:
S. Borkar
(Intel)
Logic Block
Freq
q = 0.7
Throughput = 1.4
Active Power = 0.7
SD Lkg Power = 0.7
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EEM216A .:. Fall 2010
Dual Core
Rule of thumb
Voltage
Frequency
1%
1%
Power
Performance
3%
0.66%
In the same process technology…
Cache
Core
Source:
S. Borkar
(Intel)
EEM216A .:. Fall 2010
Voltage
V
lt
=1
Freq = 1
Area = 1
Power = 1
Perf
=1
Cache
Core
Core
Voltage
V
lt
= ‐15%
15%
Freq = ‐15%
Area = 2
Power = 1
Perf
= ~1.8
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Future Multi‐core Platform
Š Heterogeneous Multi‐Core Platform—SOC
GPC
GPC
GPC
GPC
GPC
SPC
GPC
SPC
C
SP
C
GP
GPC
SPC
C
GP
C
GP
GPC
GPC
General Purpose Cores
Special Purpose HW
Interconnect fabric
Source:
S. Borkar
(Intel)
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Software Challenge
Source: ITRS 2007
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Impact of Process Variations
Š 130nm data (getting worse with scaling)
Source:
S. Borkar
(Intel)
No
ormalized Frequency
y
1.4
1.3
30%
Frequency
~30%
1.2
Leakage
Power
~5‐‐10X
~5
1.1
10
1.0
0.9
5X
1
2
3
4
Normalized Leakage
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Implications
Š Reliability
– Extreme variations (Static & Dynamic) will result in unreliable
components
– Impossible to design reliable system as we know today
● Transient errors (Soft Errors)
● Gradual errors (Variations)
● Time dependent (Degradation)
Š Test
–
–
–
–
Source:
S. Borkar
(Intel)
One time factory testing will be out
One‐time‐factory
Burn‐in to catch chip infant‐mortality will not be practical
Test HW will be part of the design
Dynamically self‐test, detect errors, reconfigure, & adapt
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In a Nut‐shell…
100 BT integration capacity
100
Billion
Transistors
Billions unusable (variations)
Some will fail over time
Intermittent failures
Source:
S. Borkar
((Intel))
Š Yet, deliver high performance in the power & cost envelope…
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EEM216A .:. Fall 2010
Parallel Data Processing
Š Power limited technology scaling
– Increased impact of process variations
– More leakage power, multiple threshold devices
Š Single dimensional Æ Multidimensional data
Multi-core Processors
MIMO Communications
IBM / Sony / Toshiba
Belkin
EEM216A .:. Fall 2010
Neuroscience
www.sci.utah.edu
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Energy‐Delay Optimization
Š Same principle, different optimization goals
Š Processors
Š Communications
VDD scaling
Energy
y
−M
Maximize
i i performance
f
− Highest VDD required
Processors
Communications
− Minimize energy & area
− Typically, sensitivity ~ 1
Š Neuroscience
− Power density: 0.8mWmm2
− Aggressive VDD scaling
Neural
0
EEM216A .:. Fall 2010
Delay
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ASICs on The Road to Extinction?
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The Age of Concurrency and Flexibility
UCB Pleiades
Heterogeneous
reconfigurable
fabric
Xilinx Vertex 4
Intel Montecito
Courtesy:
C
t
J. Rabaey
(UCB)
ARM
AMD DualCore
NTT Video codec
(4 Tensilica cores)
IBM/Sony Cell Processor
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EEM216A .:. Fall 2010
FPGAs going Multi‐core…
BEE2 compute
module
14”x17”
22 layer PCB
Courtesy:
J. Wawrzynek (UCB)
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Moore’s Law and the Long Term
What
level?
1965
2005
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EEM216A .:. Fall 2010
Moore’s Law and the Long Term
What
level?
Within your
working life?
1965
EEM216A .:. Fall 2010
2005?
When?
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Silicon Technology Reaches Nanoscale
Source: Intel
EEM216A .:. Fall 2010
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Sub‐wavelength Optical Lithography
EEM216A .:. Fall 2010
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Scaling Toward 10 nm Node
Bulk/SOI CMOS
Post‐Silicon
Multi‐gate CMOS
5 nm
55 n m
65nm
45nm
32nm
22nm
16nm
12nm
Š Technology: scaling, alternative structures and
Š
materials, post‐silicon devices
Design: billion transistors, GHz operation
Source:
K. Cao
(ASU)
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EEM216A .:. Fall 2010
Design of Nanoelectronics
[TI]
1948
1958
???
[IBM]
Carbon Nanotube
FET
1993
2006
[UCB]
Coming soon
2008
EEM216A .:. Fall 2010
2010
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Moore’s Law Challenge
Š
Š
Š
Š
Double transistors every two years
Stay within the expected power trend
Still deliver the expected performance
P
Power‐limited
li it d scaling
li regime
i
Š Two key issues:
– Design complexity
– Power efficiency
Looking at solutions to these challenges is
what this course is all about!
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