Chapter 1 Electrons and Holes in Semiconductors 1.1 Silicon Crystal Structure • Unit cell of silicon crystal is cubic. • Each Si atom has 4 nearest neighbors. 5.43 Å Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-1 Silicon Wafers and Crystal Planes z z z y (100) x y (011) y x (111) x (100) plane (011) flat Si (111) plane • The standard notation for crystal planes is based on the cubic unit cell. • Silicon wafers are usually cut along the (100) plane with a flat or notch to help orient the wafer during IC fabrication. Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-2 1.2 Bond Model of Electrons and Holes Si Si Si Si Si Si Si Si Si • Silicon crystal in a two-dimensional representation. Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-3 Dopants in Silicon Si Si Si Si Si Si Si As Si Si B Si Si Si Si Si Si Si • As, a Group V element, introduces conduction electrons and creates N-type silicon, and is called a donor. • B, a Group III element, introduces holes and creates P-type silicon, and is called an acceptor. • Donors and acceptors are known as dopants. Dopant ionization energy ~50meV (very low). Hydrogen: E ion = Semiconductor Devices for Integrated Circuits (C. Hu) m0 q4 8ε02h2 = 13.6 eV Slide 1-4 GaAs, III-V Compound Semiconductors, and Their Dopants Ga As Ga As Ga As Ga As Ga As Ga • GaAs has the same crystal structure as Si. • GaAs, GaP, GaN are III-V compound semiconductors, important for optoelectronics. • Which group of elements are candidates for donors? acceptors? Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-5 1.3 Energy Band Model } 2s2s Empty upper bands Lowest empty band ( conduction band) 2p2p Highest filled band (valence band) } Filled lower bands (a) (b) • Energy states of Si atom (a) expand into energy bands of Si crystal (b). • The lower bands are filled and higher bands are empty in a semiconductor. • The highest filled band is the valence band. • The lowest empty band is the conduction band . Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-6 1.3.1 Energy Band Diagram Conduction band Ec Band gap Eg Ev Valence band • Energy band diagram shows the bottom edge of conduction band, Ec , and top edge of valence band, Ev . • Ec and Ev are separated by the band gap energy, Eg . Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-7 Measuring the Band Gap Energy by Light Absorption electron Ec photons Eg photon energy: h v > E g Ev hole • Eg can be determined from the minimum energy (hν) of photons that are absorbed by the semiconductor. Bandgap energies of selected semiconductors Semiconductor PbTe Ge Si GaAs GaP Diamond E g (eV) 0.31 0.67 1.12 1.42 2.25 Semiconductor Devices for Integrated Circuits (C. Hu) 6.0 Slide 1-8 1.3.2 Donor and Acceptor Levels in the Band Model Conduction Band Donor Level Acceptor Level Ed Ec Donor ionization energy Acceptor ionization energy Ea Valence Band Ev Ionization energy of selected donors and acceptors in silicon Donors Dopant Sb Ionization energy, E c –E d or E a –E v (meV) 39 P 44 Acceptors As 54 B 45 Semiconductor Devices for Integrated Circuits (C. Hu) Al 57 In 160 Slide 1-9 1.4 Semiconductors, Insulators, and Conductors Ec E g = 1.1 eV Ec E g= 9 eV empty Ev Ev Si (Semiconductor) Top of conduction band SiO (Insulator) 2 filled Ec Conductor • Totally filled bands and totally empty bands do not allow current flow. (Just as there is no motion of liquid in a . totally empty bottle.) totally filled or • Metal conduction band is half-filled. • Semiconductors have lower Eg 's than insulators and can be doped. Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-10 increasing hole energy increasing electron energy 1.5 Electrons and Holes electron kinetic energy Ec Ev hole kinetic energy • Both electrons and holes tend to seek their lowest energy positions. • Electrons tend to fall in the energy band diagram. • Holes float up like bubbles in water. Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-11 1.5.1 Effective Mass In an electric field, , an electron or a hole accelerates. electrons holes Electron and hole effective masses m n /m 0 m p /m 0 Si 0.26 0.39 Ge 0.12 0.30 GaAs 0.068 0.50 GaP 0.82 0.60 Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-12 1.5.2 How to Measure the Effective Mass Cyclotron Resonance Technique B - Centripetal force = Lorentzian force - - - E mn v 2 = qvB r qBr v= mn v qB f cr = = 2πr 2πmn Microwave fcr is the Cyclotron resonance frequency. It is independent of v and r. Electrons strongly absorb microwaves of that frequency. By measuring fcr, mn can be found. Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-13 1.6 Density of States E ∆Ε Ec Dc Ec D Ev Ev Dv Dc ( E ) ≡ number of states in ∆E 1 3 ∆E ⋅ volume eV ⋅ cm Dc ( E ) ≡ 8πmn 2mn (E − Ec ) h3 Dv ( E ) ≡ 8πm p 2m p (Ev − E ) h3 Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-14 1.7 Thermal Equilibrium 1.7.1 An Analogy for Thermal Equilibrium Sand particles Dish Vibrating Table • There is a certain probability for the electrons in the conduction band to occupy high-energy states under the agitation of thermal energy (vibrating atoms, etc.) Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-15 1.7.2 Fermi Function–The Probability of an Energy State Being Occupied by an Electron f (E) = 1 1+ e Ef is called the Fermi energy or the Fermi level. ( E − E f ) / kT Boltzmann approximation: f (E) ≈ e E Ef + 3kT f (E) ≈ e ( − E−E f f (E) ≈ 1 − e Ef Ef + kT Ef Ef – kT Ef – 2kT f (E) ≈ 1 − e f(E) 0.5 1 ) kT E − E f >> kT ) kT Ef + 2kT Ef – 3kT ( − E−E f ( ) − E f − E kT ( ) − E f − E kT E − E f << − kT Remember: there is only one Fermi-level in a system at equilibrium. Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-16 1.8 Electron and Hole Concentrations 1.8.1 Derivation of n and p from D(E) and f(E) n=∫ top of conduction band Ec 8πmn 2mn n= h3 ∫ ∞ Ec f ( E ) Dc ( E ) dE E − Ec e ( − E−E f ) kT dE 8πmn 2mn −(Ec − E f ) kT ∞ − ( E − Ec ) kT = e E − E e dE c 3 ∫ 0 h Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-17 Electron and Hole Concentrations n = Nce − ( Ec − E f ) / kT 2πmn kT N c ≡ 2 2 h p = Nve 32 Nc is called the effective density of states (of the conduction band) . − ( E f − Ev ) / kT 32 Nv is called the effective density of states of the valence band. 2πm p kT N v ≡ 2 2 h Remember: the closer Ef moves up to N c , the larger n is; the closer Ef moves down to Nv , the larger p is. For Si, Nc = 2.8 ×1019 cm-3 and Nv = 1.04×1019 cm-3 . Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-18 1.8.2 The Fermi Level and Carrier Concentrations Where is Ef for n =1017 cm-3? And for p = 1014 cm-3? Solution: (a) n = N c e − ( Ec − E f ) / kT ( ) Ec − E f = kT ln( N c n ) = 0.026 ln 2.8 ×1019 / 1017 = 0.146 eV (b) For p = 1014cm-3, from Eq.(1.8.8), ( ) E f − Ev = kT ln( N v p ) = 0.026 ln 1.04 ×1019 / 1014 = 0.31 eV 0.146 eV Ec Ec Ef Ef Ev (a) 0.31 eV Ev (b) Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-19 1.8.2 The Fermi Level and Carrier Concentrations Ec 300K ped o d r o n Ef, Do Ef , Acce 400K n = Nce − ( Ec − E f ) / kT E f = Ec − kT ln ( N c n ) ptor-dop ed 400K 300K Ev 1013 1014 1015 1016 1017 1018 1019 1020 N a or N d (cm-3) Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-20 1.8.3 The np Product and the Intrinsic Carrier Concentration Multiply n = N c e − ( Ec − E f ) / kT np = N c N v e and − ( Ec − Ev ) / kT np = ni p = Nve = Nc Nve − ( E f − Ev ) / kT − E g / kT 2 ni = N c N v e − E g / 2 kT • In an intrinsic (undoped) semiconductor, n = p = ni . • ni is the intrinsic carrier concentration, ~1010 cm-3 for Si. Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-21 EXAMPLE: Carrier Concentrations Question: What is the hole concentration in an N-type semiconductor with 1015 cm-3 of donors? Solution: n = 1015 cm-3. 2 ni 10 20 cm -3 ≈ 15 −3 = 105 cm -3 p= n 10 cm After increasing T by 60°C, n remains the same at 1015 cm-3 while p − E / kT increases by about a factor of 2300 because ni 2 ∝ e g . Question: What is n if p = 1017cm-3 in a P-type silicon wafer? Solution: 2 ni 10 20 cm -3 ≈ 17 −3 = 103 cm -3 n= p 10 cm Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-22 EXAMPLE: Complete ionization of the dopant atoms Nd = 1017 cm-3. What fraction of the donors are not ionized? Solution: First assume that all the donors are ionized. n = N d = 1017 cm −3 ⇒ E f = Ec − 146meV 45meV 146 meV Ed Ec Ef Ev Probability of non-ionization ≈ 1 1+ e ( E d − E f ) / kT = 1 1+ e ((146 − 45 ) meV ) / 26 meV = 0.02 Therefore, it is reasonable to assume complete ionization, i.e., n = Nd . Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-23 1.9 General Effects of Doping on n and p Charge neutrality: n + Na = p + Nd np = ni 2 N a − N d N a − N d 2 p= + + ni 2 2 2 1/ 2 N d − N a N d − N a 2 n= + + ni 2 2 2 Semiconductor Devices for Integrated Circuits (C. Hu) 1/ 2 Slide 1-24 1.9 General Effects of Doping on n and p I. N d − N a >> ni (i.e., N-type) n = Nd − Na 2 p = ni n If N d >> N a , n = Nd II. N a − N d >> ni (i.e., P-type) If N a >> N d , p = Na p = ni and 2 Nd p = Na − Nd n = ni and 2 p 2 n = ni N a Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-25 EXAMPLE: Dopant Compensation What are n and p in Si with (a) Nd = 6×1016 cm-3 and Na = 2×1016 cm-3 and (b) additional 6×1016 cm-3 of Na? (a) n = N d − N a = 4 ×1016 cm −3 2 p = ni / n = 10 20 / 4 × 1016 = 2.5 × 103 cm −3 (b) Na = 2×1016 + 6×1016 = 8×1016 cm-3 > Nd! p = N a − N d = 8 × 1016 − 6 × 1016 = 2 × 1016 cm −3 2 n = ni / p = 10 20 / 2 × 1016 = 5 × 103 cm −3 n = 4×1016 cm-3 ++++++ ...... ++++++ Nd = 6×1016 cm-3 . . . .N.a .=.2×10 . . . . cm 16 -3 ...... Nd = 6×1016 cm-3 Na = 8×1016 cm-3 - - - - - - - -. . . . . . p = 2×1016 cm-3 Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-26 Infrared Detector Based on Freeze-out To image the black-body radiation emitted by tumors requires a photodetector that responds to hν’s around 0.1 eV. In doped Si operating in the freeze-out mode, conduction electrons are created when the infrared photons provide the energy to ionized the donor atoms. electron photon Ec Ed Ev Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-27 1.10 Carrier Concentrations at Extremely High and Low Temperatures ln n intrinsic regime n = Nd freeze-out regime 1/T high temp. room temperature cryogenic temperature high T: n = p = ni = Nc Nv e − E g / 2 kT 1/ 2 N c N d −( Ec − Ed ) / 2 kT low T: n = 2 e Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-28 1.11 Chapter Summary Energy band diagram. Acceptor. Donor. mn, mp. Fermi function. Ef. n = Nce − ( Ec − E f ) / kT p = Nve − ( E f − Ev ) / kT n = Nd − Na p = Na − Nd np = ni 2 Semiconductor Devices for Integrated Circuits (C. Hu) Slide 1-29