Ebeam Town Hall Meeting
Friday December 2, 2005
Your Chance to Provide Input and
Suggestions to Create Community
Within the SNF Ebeam Lab.
12-02-2005
Ebeam Town Hall Meeting
Ebeam Town Hall Meeting
This forum is intended to allow Lab Members
using the RAITH 150 and Hitachi HL-700 Ebeam
exposure systems to provide feedback and inputs
towards creating a supportive community of Users
working together to establish best practices and
methods to push the limits of Ebeam lithography.
This is also your opportunity to report your EBL
results, problems, and concerns obtaining
feedback from the Raith Community-at-Large.
12-02-2005
Ebeam Town Hall Meeting
Today’s Agenda
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Welcome and Introduction – James W. Conway (5 min.)
Feature Presentation:
“Scanning Electron Microscopy in the IC Industry"
Bryan Tracy, PhD. (40 minutes + Q&A)
Raith system Resolution and Performance status report (5 - 10 minutes)
- Current performance issues and results.
- Holiday shut down plan.
Raith Reservation and Scheduling issues:
(20 minutes)
- Changes or modification to the current reservation policies in place?
- Cancellation policy – 24-hour notice?
- Should we have penalty or charge for cancellations without notice?
- Should we implement a Raith Users system Standby List?
Query of User needs for Negative Tone Ebeam resist for R&D in 2006
(20 min.)
- Microchem MaN-2403 negative tone resist review.
- Query of User interest in HSQ and Calixarenes for High Resolution
Negative Tone Resist?
12-02-2005
Ebeam Town Hall Meeting
Feature Presentation:
"Scanning Electron Microscopy in the
IC Industry"
Bryan Tracy, PhD.
Spansion, Sunnyvale, CA
12-02-2005
Ebeam Town Hall Meeting
Raith System Resolution and
Performance Status
• New SEM Column replacement in June.
System performance remains within
specifications with most users obtaining
quality results.
• Decision not to perform a column PM
routine over the holiday shut down period.
12-02-2005
Ebeam Town Hall Meeting
Recent Results of PCM Testing
on RAITH 150 System
• Normally write PCM test
on 2% 950K PMMA-A.
In August we ran several
runs characterizing the 5%
495K MW PMMA-A.
Result:
Single Pixel Lines to
14 nm on 300 nm
5% 495K MW PMMA-A.
20:1 Aspect ratio!
12-02-2005
Ebeam Town Hall Meeting
PCM Testing on RAITH 150
• SPL10X10 Line array
with increasing dose
from Left to Right.
• SPL threshold of resist
clearing at 10 nm.
• Typical Result:
22.3 nm Linewidth on
5% 495K PMMA-A
12-02-2005
Ebeam Town Hall Meeting
PCM Testing on RAITH 150
• Post RIE etch using
P-5000 PolySi etch
Note: 300 nm PMMA
survives the 1 minute
process with some
lateral etching of the
mask. Thickness loss
was measured at
1349A or - 43%
12-02-2005
Ebeam Town Hall Meeting
PCM Testing on RAITH 150
• The 20 nm2 Gap test
still proves to be the
toughest test to write in
our PCM test patterns.
• 2 % 950K PMMA-A
d = 93 nm, 10 kV 30 um
Dose = 115 uC/cm2
• Result: Gap measures
22 x 40 nm
12-02-2005
Ebeam Town Hall Meeting
Holiday Shut Down Plan
• Last EBL Write will be
completed by 10 AM Friday
December 16.
• System off line and not
available to Users over entire
holiday shutdown.
• System Qualification 1-10-05
There may be some access
late the week of January 5/6
after system start-up.
12-02-2005
Ebeam Town Hall Meeting
Raith Reservation and Scheduling
Issues:
• Changes or modification to the current reservation policies
in place?
• Cancellation policy – 24-hour notice required?
• Should we have penalize or charge Users for cancellations
without notice? Is there another idea in the group to
reduce the amount of loss of machine access/opportunity
due to last minute cancellations?
• Should we implement a Raith Users system Standby List?
How can we implement?
12-02-2005
Ebeam Town Hall Meeting
Query of User’s needs for Negative Tone
Ebeam resist for R&D in 2006
• Microchem ma-N 2403 Negative Tone Resist Technical Review.
A number of Users have been using this resist with good
results!
Should we make this material a stocked resist item here at
SNF?
12-02-2005
Ebeam Town Hall Meeting
Characteristics of Ma-N 2403
• Robust process latitude,
• NOT chemically amplified, NO PEB!,
• High structural resolution capability up to μm and
down to ~ 80 – 100 nm range,
• No swelling in aqueous developers,
• Excellent Etch resistance to acids and bases and to
normal RIE chemistries used at SNF.
• Can employ Optical DUV, laser, and EBL
exposures methods to perform exposure.
12-02-2005
Ebeam Town Hall Meeting
User interest in HSQ and Calixarenes
for High Resolution Negative Tone
Patterning?
• These are negative tone High resolution resist materials.
But the are very slow and need very high exposure doses.
• Share cost of small amount of these materials for R&D and
Characterization purposes here at SNF?
• Other Polymeric materials of current interest by Users?
12-02-2005
Ebeam Town Hall Meeting
Thank You for Your Participation!
Your comments are important to SNF!
12-02-2005
Ebeam Town Hall Meeting