Agenda for December’s Ebeam Town Hall Meeting
Friday December 2, 2005 from 2 - 4 PM in CISX 338
This forum is intended to allow lab members using the RAITH 150 and Hitachi HL-700
Ebeam exposure systems to provide feedback and inputs towards creating a supportive
community of users working together to establish best practices and methods to push the
limits of Ebeam Lithography here at SNF. This is also an opportunity to report your EBL
results, problems, and concerns and obtain feedback from the community-at-large.
Last year this forum successfully developed new reservation and system usage guidelines
that improved system access and utilization for a large user base. This effort was
successful and guided similar equipment policies on other SNF tools.
1. Welcome and Introduction – James W. Conway (5 min.)
2. Feature Presentation:
"Scanning Electron Microscopy in the IC Industry" by Bryan Tracy, PhD.
Member of the Technical Staff, Spansion, Sunnyvale, CA. (40 minutes + Q&A)
3. Raith System Resolution and performance status report (5 - 10 minutes)
- Current Performance issues and results.
- Holiday shut down plan.
4. Raith Reservation and Scheduling Issues:
(20 minutes)
- Changes or Modification to the current reservation policies in place?
- Cancellation Policy – 24-hour notice?
- Should we have penalty or charge for cancellations?
- Should we implement a Raith Users System Standby list?
5. Query of User needs for Negative Tone Ebeam resist for R&D in 2006: (20 min.)
- Microchem MaN-2403 negative tone resist review.
- User interest in HSQ and Calixarenes for High Resolution Negative Tone resist?
Note that the Agenda remains open through 10 AM Friday December 2, 2005.
Your inputs are invited.
James W. Conway
Stanford Nanofabrication Facility