Modern Methods in Heterogeneous Catalysis Research: Theory and Experiment Photons: In situ spectroscopy in the soft X-ray energy range Axel Knop-Gericke knop@fhi-berlin.mpg.de Outline Photons for the investigation of heterogeneous catalytic processes Synchrotron radiation diffraction : single slit, double slit, grating in situ XAS in the soft energy range examples: methanol oxidation over copper n-butane oxidation over VPO catalysts Spectrum of electromagnetic radiation Other lectures in this field: UV-vis : A. Brückner 6.12.2002 Vibrational spectroscopy (IR spectroscopy, Raman: Rupprechter 13.12.2002 ) G. Electron spectroscopy: R. Schlögl 20.12.2002 X-ray diffraktion: I. Erran 10.1.2003 EXFAS/NEXAFS in the hard X-ray range: 17.1.2003 T.Ressler Synchrotron radiation Synchrotron radiation Synchrotron radiation Synchrotron radiation Synchrotron radiation Synchrotron radiation Synchrotron radiation Synchrotron radiation Synchrotron radiation Undulator Synchrotron radiation Synchrotron radiation Single Slit Diffraction Princip of Huygens Minimum: g= k k=1,2,3,...<a/ sin k= g/a ; tan k =dk/l Diffraction Pattern Double Slit Diffraction Expected diffraction pattern: Actually observed diffraction pattern Double Slit Diffraction l>>a : waves normals related to Pk on the screen are parallel, sin k = g/a, tan k = dk/l k < 8 : sin k = tan k = dk/l = g/a dk= gl/a Maximum (g= 0, , 2, 3,...) dk= kl/a k= 0,1,2,3.. Minimum (g= /2, 3/2 , 5/2 ,...) dk=(2k+1) l/2a k=0,1,2,3,.. From single slit to grating: Diffraction pattern XAS in the soft energy range Soft energy range: 250 - 1000 eV which elements: C(1s), N(1s), O(1s), transition metal (2p).... • L edge / 2p XPS peaks of transition metal are sensitive to details of chemical •XAS is a local process not restricted to material with long range order •surface sensitive when applied in electron yield mode pellets can be investigated under reaction conditions •orientation of molecules on single crystal surfaces can be estimated Spektroskopische Methode Prinzip der Röntgenabsorptionsspektroskopie (XAS) Auger-Elektron •Anregung von Rumpfniveauelektronen mittels Röntgenstrahlung •Relaxation mittels Fluoreszenzstrahlung oder durch Aussenden eines AugerElektrons (TEY, PEY, AEY) •Untersuchung der unbesetzten Zustände Fluoreszenz I f pi 2 Mean free path of electron in solids Experimental Technique In situ methods are required to investigate heterogeneous catalytic reactions since the structure of a catalyst estimated ex situ might differ from the structure revealed by in situ studies XAS in the soft energy range represent surface sensitive spectroscopic methods, which can be applied in the mbar pressure range Material gap single crystal vs real catalyst Pressure gap UHV vs p > 1bar Transmission of 20 cm air 1.0 Transmission 0.8 0.6 0.4 0.2 0.0 0 2000 4000 6000 Energy (eV) 8000 10000 Experimental Set-Up manipulator properties of the set-up mass spektrometer 150 mm butterfly-valve •pressure up to 20 mbar 150 mm •batch- and flow-through-mode process pump sample gas inlet by MFC UHV-valve Plattenventil turbo pump f 100 mm •heating up to 900 K •angular dependent measurements In situ XAS Detector system Simultaneous detection of gas phase- and sample signal Gas phase subtraction Analysis of the Near Edge X-ray Absorption Fine Structure (NEXAFS) O K-edge 2.5 * 530.8 eV * 539.2 eV 541.4 eV 2 Intensity (a. u.) NEXAFS of the O K-edge O2 1.5 Idet 1 CH3OH + O2 Igas 537.3 eV 0.5 534.0 eV 0 Cu2O 520 CH3OH ( Idet- Igas )* 3 532.8 eV 540 Photon Energy / eV 560 • Total electron yield of the gas phase dominates all signals, therefore only small differences in the detector signals •Substraction allows to separate the absorption signal of the surface of the catalyst Methanol oxidation 2 CH3OH + O2 CH3OH 2 CH3OH + 3 O2 2 CH2O + 2 H2O oxidative dehydrogenation CH2O + H2 dehydrogenation 2 CO2 + 4 H2O total oxidation Cu L3- NEXAFS NEXAFS at the Cu L3-edge Catalytic Activity Conversion CH 3OH (%) 100 80 60 40 0.2 0.4 0.6 Flow ratio O 2 0.8 1 / CH3OH Increased activity for gas flow ratios: O2 / CH3OH 0.5 Transition from an oxidic copper-phase to the metallic state Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany NEXAFS at the O K-edge O K-edge Flow ratio O2 / CH3OH 531.6 eV Temperature 10 536.6 eV 0.6 • 2 oxidic- and 1 suboxidic species can be distinguished 670 K Total Electron Yield (a. u.) •NEXAFS of the active state is completly different from the NEXAFS of the known copper-oxides less active 8 0.2 670 K 6 0.2 570 K 4 2 Reference Cu2O 532.8 eV 0 300 K 520 530 540 550 Photon Energy / eV 560 570 very active Correlation between the SuboxideSpecies and CH2O Variation of temperature at O2 / CH3OH = 0.2 •Intensity of the suboxide species increases with increasing temperature •Intensity of the suboxide species is positively correlated to the yield of CH2O and CO Correlations between oxidic species and CO2 •Intensity of the oxidic species Oxsurf decreases with increasing CO2-yield •2 areas of activity can be distinguished Model Proposed model of the copper surface under reaction conditions for methanol oxidation CO+ H2 CO2+ H2 O CH3OH CH3OH CH3 OH CH2O+ H2 Subox Oxsurf CH2O+ H2O Cu 0 O+ O lk u Ox b Ovol O2 n-Butane Oxidation to MA by Vanadium Phosphorus Catalysts O + 3,5 O2 VPO O 400 °C, 1 bar + 4 H2O O 1,5 Vol% Maleic Anhydride (MA) air C4H10 + 6,5 O2 4 CO2 + 5 H2O C4H10 + 4,5 O2 4 CO + 5 H2O Active phase: highly ordered vanadyl pyrophosphate (VO)2P2O7) ? Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany The VPO V L3-NEXAFS Total Electron Yield (norm. u.) Analysis of spectral shape by unconstrained least squares fit 6 V5 V L3-edge V valence V6 V4 Details of the local chemical bonding 4 V3 V2 2 Local geometric structure V7 V1 0 512 514 516 518 520 Photon Energy / eV Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany Interpretation of V L3 NEXAFS NEXAFS resonances appear in a sequence of V-O bond lengths 3 2 Relative Resonance Position / eV Relative Resonance Position / eV Experimental finding: * V6 V5* V4* 1 V4 3 V2O5 V3 2 V2 1 V1 0 V6 -1 1.6 1.8 2 2.2 2.4 2.6 2.8 Bond Length / Å V3* 0 V2* VPO V1* -1 1.6 1.8 2 2.2 2.4 Bond Length / †Å 2.6 2.8 Relative spectral Intensity of V5 at V L3-edge RT 400°C RT 400°C Proportion of int. intensity of V5 0,55 Total Electron Yield (norm. u.) Changes of NEXAFS while heating 6 V L3-edge 4 RT 2 0 512 514 516 518 Photon Energy / eV 0,50 0,45 V5 0,40 0,35 0,30 Spectra number Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany 520 Interpretation of V L3 NEXAFS Identification of resonances (V5, V6): O(1a) V2O5 as model substance for VPO DFT calculation of DOS (V2O5 !)*: O(3) O(2) V V2O5: Close relationship between geometric and electronic structure at V L3-absorption edge O(3) O(2) O(1b) main contributions to NEXAFS resonances appear in a sequence of V-O bond length V6: O(1a) V5: ? (estimated value of bond length between O(2) and O(1a): 1.72 Å) Electronic Structure, Dept. AC, Fritz-Haber-Institut (MPG), Berlin, Germany