Characteristics of Submicron HBTs in the 140-220 GHz Band M. Urteaga, S. Krishnan, D. Scott, T. Mathew, Y. Wei, M. Dahlstrom, S. Lee, M. Rodwell. Department of Electrical and Computer Engineering, University of California, Santa Barbara urteaga@ece.ucsb.edu 1-805-893-8044 Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois DRC, June 2001, South Bend, IN Ultra-high fmax Transferred-Substrate HBTs • Substrate transfer provides access to both sides of device epitaxy • Permits simultaneous scaling of emitter and collector widths • Maximum frequency of oscillation f max ft / 8RbbCcb • Sub-micron scaling of emitter and collector widths has resulted in record values of extrapolated fmax • New 140-220 GHz Vector Network Analyzer (VNA) extends device measurement range Mason's gain, U 3000 Å collector 400 Å base with 52 meV grading AlInAs / GaInAs / GaInAs HBT 25 Gains, dB • Extrapolation begins where measurements end 30 20 MSG 15 H21 10 5 Emitter, 0.4 x 6 mm2 Collector, 0.7 x 6 mm2 fmax = 1.1 THz ?? ft = 204 GHz Ic = 6 mA, Vce = 1.2 V 0 10 100 Frequency, GHz Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois 1000 High Frequency Device Characterization Motivation Characterize transistors to highest measurable frequency Develop an accurate methodology for ultra-high frequency transistor measurements Results Measured submicron transistors DC-45 GHz, 75-110 GHz, 140-220 GHz bands Observed singularity in Unilateral Power Gain Submicron HBTs have very high power gain, but fmax can’t be determined Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois InGaAs/InAlAs HBT Material System Layer Structure InGaAs 1E19 Si 1000 Å Band diagram at Vbe = 0.7 V, Vce = 0.9 V Grade 1E19 Si 200 Å InAlAs 1E19 Si 700 Å InAlAs 8E17 Si 500 Å Grade 8E17 Si 233 Å Grade 2E18 Be 67 Å InGaAs 4E19 Be 400 Å 2kT base bandgap grading InGaAs 1E16 Si 400 Å InGaAs 1E18 Si 50 Å InGaAs 1E16 Si 2550 Å InAlAs UID 2500 Å 400 A base, 4* 1019/cm3 3000 A collector S.I. InP Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois Transferred-Substrate Process Flow • Emitter metal • Emitter etch • Self-aligned base • Mesa isolation • Polyimide planarization • Interconnect metal • Silicon nitride insulation • Benzocyclobutene, etch vias • Electroplate gold • Bond to carrier wafer with solder • Remove InP substrate • Collector metal • Collector recess etch Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois Ultra-high fmax Submicron HBTs • Electron beam lithography used to define submicron emitters and collectors • Minimum feature sizes 0.2 mm emitter stripe widths 0.3 mm collector stripe widths • Improved collector-to-emitter alignment using local alignment marks 0.3 mm Emitter before polyimide planarization • Aggressive scaling of transistor dimensions predicts progressive improvement of fmax As we scale HBT to <0.4 um, fmax keeps increasing, measurements become very difficult Submicron Collector Stripes (typical: 0.7 um collector) Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois How do we measure fmax? Maximum Available Gain Simultaneously match input and output of device MAG S21 S12 K K 2 1 g e ne ra tor loa d R ge n Vg e n los s le s s m a tc hin g n e two rk los s le s s ma tc h in g ne two rk RL K = Rollet stability factor Transistor must be unconditionally stable or MAG does not exist Maximum Stable Gain Stabilize transistor and simultaneously match input and output of device g e ne ra tor R ge n Vg e n MSG S21 S12 Y21 Y12 1 loa d los s le s s m a tc hin g n e two rk re s is tive los s (s ta b iliz a tio n) los s le s s ma tc h in g ne two rk ωCcb R ex kT qI c Approximate value for hybrid- model To first order MSG does not depend on ft or Rbb For Hybrid- model, MSG rolls off at 10 dB/decade, MAG has no fixed slope CANNOT be used to accurately extrapolate fmax Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois RL Unilateral Power Gain Mason’s Unilateral Power Gain Use lossless reactive feedback to cancel device feedback and stabilize the device, then match input/output. U Y21 Y12 s h un t fe e d b a c k g e n e ra to r R ge n 2 lo a d lo s s le s s m a tc h in g n e tw o rk Vge n 4G11G 22 G 21G12 lo s s le s s m a tc h in g n e tw o rk s e rie s fe e d b a c k U is not changed by pad reactances 40 ALL Power Gains must be unity at fmax 30 Gains, dB For Hybrid- model, U rolls off at 20 dB/decade U: all 3 35 25 MAG/MSG common emitter 20 15 MAG/MSG common base 10 5 MAG/MSG common collector 0 1 Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois 10 Frequency, GHz 100 RL Negative Unilateral Power Gain ??? Can U be Negative? YES, if denominator is negative This may occur for device with a negative output conductance (G22) or some positive feedback (G12) U Y21 Y12 2 4G11G 22 G 21G12 What Does Negative U Mean? Device with negative U will have infinite Unilateral Power Gain with the addition of a proper source or load impedance 2-port Network AFTER Unilateralization • Network would have negative output resistance • Can support one-port oscillation • Can provide infinite two-port power gain U Y21 Y12 GL 2 4G11 G 22 G L G 21G12 Select GL such that denominator is zero: U Simple Hybrid- HBT model will NOT show negative U Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois Accurate Transistor Measurements Are Not Easy • Submicron HBTs have very low Ccb (< 5 fF) • Characterization requires accurate measure of very small S12 230 mm 230 mm • Standard 12-term VNA calibrations do not correct S12 background error due to probe-to-probe coupling Solution Transistor in Embedded in LRL Test Structure Embed transistors in sufficient length of transmission line to reduce coupling Place calibration reference planes at transistor terminals Line-Reflect-Line Calibration Standards easily realized on-wafer Does not require accurate characterization of reflect standards Characteristics of Line Standards are well controlled in transferred-substrate microstrip wiring environment Corrupted 75-110 GHz measurements due to excessive probe-to-probe coupling Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois 140-220 GHz On-Wafer Network Analysis • HP8510C VNA used with Oleson Microwave Lab mmwave Extenders • Extenders connected to GGB Industries coplanar wafer probes via short length of WR-5 waveguide • Internal bias Tee’s in probes for biasing active devices • Full-two port T/R measurement capability • 75-110 GHz measurement set-up uses same waveguide-to-probe configuration with internal HP test set UCSB 140-220 GHz VNA Measurement Set-up Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois Can we trust the calibration ? 75-110 GHz calibration looks Great 140-220 GHz calibration looks OK S11 of open About 0.1 dB / 3o error S11 of through About –40 dB S11 of short S11 of through S11 of open freq (75.00GHz to 110.0GHz) freq (140.0GHz to 220.0GHz) 0.30 Probe-Probe coupling is better than –45 dB -40 -45 0.25 S21 of through line is off by less than 0.05 dB 0.20 0.15 0.10 -50 0.05 -55 0.00 -60 -0.05 -0.10 -65 -0.15 -70 140 75 80 85 90 95 100 105 150 160 170 180 110 freq, GHz Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois freq, GHz 190 200 210 220 0.3 mm Emitter / 0.7 mm Collector HBTs: Negative U 40 35 30 Negative U U RF Gains 25 20 15 MAG/MSG S11 h21 10 5 S22 0 -5 1E10 1E11 1E12 Freq. S21 Emitter: 0.3 x 18 mm2, Collector: 0.7 x 18.6 mm2 Ic = 5 mA, Vce = 1.1 V S12*20 -6 -4 -2 0 2 Gains are high at 200 GHz but fmax can’t be determined Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois freq (6.000GHz to 45.00GHz) 4 6 0.3 mm Emitter / 0.7 mm Collector HBTs: Negative Output Conductance Real (Y11) Real (Y12) 0.08 0.0005 0.07 0.0000 0.06 -0.0005 0.05 -0.0010 0.04 -0.0015 0.03 -0.0020 0.02 -0.0025 0.01 -0.0030 0.00 -0.0035 0 20 40 60 80 100 120 140 160 180 200 220 0 20 40 60 80 100 120 140 160 180 200 220 Freq. GHz Freq. GHz Real (Y21) 0.10 Real (Y22) 0.0005 Emitter: 0.3 x 18 mm2, Collector: 0.7 x 18.6 mm2 Ic = 5 mA, Vce = 1.1 V 0.08 Negative Y22 0.0000 0.06 -0.0005 0.04 -0.0010 0.02 0.00 0 20 40 60 80 100 120 140 160 180 200 220 -0.0015 0 20 40 60 80 100 120 140 160 180 200 220 Freq. GHz Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois Freq. GHz 0.4 mm Emitter / 1.0 mm Collector HBTs 25 20 RF Gains 15 10 U MAG/MSG S11 h21 S22 5 0 -5 1E10 1E11 S21 1E12 S12*20 Freq. Emitter: 0.4 x 6 mm2, Collector: 1.0 x 6.6 mm2 Ic = 3 mA, Vce = 1.1 V Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois -4 -3 -2 -1 0 1 2 freq (6.000GHz to 45.00GHz) 3 4 0.4 mm Emitter / 1.0 mm Collector HBTs Real (Y11) 0.030 Real (Y12) 0.0000 -0.0002 0.025 -0.0004 0.020 -0.0006 0.015 -0.0008 0.010 -0.0010 0.005 -0.0012 0.000 0 20 40 60 80 100 120 140 160 180 200 220 -0.0014 0 Freq. GHz 20 40 60 80 100 120 140 160 180 200 220 Freq. GHz Real (Y22) Real (Y21) 0.0004 0.040 0.035 Negative Y22 0.0002 0.030 0.025 0.0000 0.020 -0.0002 0.015 0.010 -0.0004 0.005 -0.0006 0.000 0 20 40 60 80 100 120 140 160 180 200 220 0 Freq. GHz Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois 20 40 60 80 100 120 140 160 180 200 220 Freq. GHz Less scaled devices show expected power gain rolloff 25 U 20 RF Gains 15 10 MAG/MSG h21 S11 S22 5 0 -5 1E10 1E11 1E12 S21 Freq. mm2, Emitter: 0.5 x 8.0 Collector: 1.2 x 8.6 Ic = 4 mA, Vce = 1.8 V InP/InGaAs/InP DHBT S12*30 mm2 Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois -10 -8 -6 -4 -2 0 2 4 freq (6.000GHz to 45.00GHz) 6 8 10 Conclusions Submicron HBTs have Extremely Low Parasitics Extremely High Power Gains High fmax HBTs are hard to measure Probe-to-Probe coupling can cause errors in S21 Highly scaled transistors show a negative unilateral power gain coinciding with a negative output conductance Cannot extrapolate fmax from measurements of U but… Device has ~ 8 dB MAG at 200 GHz Single-stage amplifiers with 6.3 dB gain at 175 GHz have been fabricated (To be presented 2001 GaAs IC Conference Baltimore, MD) Possible sources of Negative Output Conductance Dynamics of capacitance cancellation Dynamics of base-collector avalanche breakdown Measurement Errors (We hope we’ve convinced you otherwise) Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois Acknowledgements This work was supported by the ONR under grant N0014-99-1-0041 And the AFOSR under grant F49620-99-1-0079 Urteaga et al, 2001 Device Research Conference, June, Notre Dame, Illinois