International Journal of Engineering Trends and Technology (IJETT) – Volume 6 Number 5 - Dec 2013 Application of Electrochemical Machining to Produce Micro Hole on Micro Structure Mahesh Gupta1 , Diwakar Singhal2, Vikas Sharma3, Lekhraj Kumawat4, Siddharth Sharma5 1, 2, 3 Department of Mechanical Engineering, MAIET, Jaipur, Rajasthan, India Department of Mechanical Engineering, JIT, Jaipur, Rajasthan, India 4, 5 Abstract— The aim of this paper to use the application of electrochemical in micromachining to produce micro hole, in which cathode is closely attached to work piece plate. In this process cathode make by patterned insulation plate coated with metal film. When potential difference is applied across the work piece and patterned plate over which the electrolyte flow at a high speed due to this process micro hole will be produce. Using this application we can reduce the lead time and cost. This application can be demonstrated by numerically and experimentally. Keywords— Micro hole, Through-mask through-mask EMM, Ansys. EMM, Modified I. INTRODUCTION Surface texturing is an attractive approach for the reduction of friction in mechanical components. Micro dimples distributed in a frictional surface are expected to act as fluid reservoirs and help to promote the retention of a lubricating thin film between mating components. It was found that a friction reduction of 30% and even more was feasible with a dimpled surface [1]. Additionally, recent progress made in the field of aviation (cooling holes in jet turbine blades), space, automobile, optics, miniature manufacturing and others has created the need for parts with small and micro-size holes in extremely hard and tough materials [2,3].Various techniques have been developed to produce micro dimples and holes in different ways, including laser machining, electrical discharge machining, electrochemical machining (ECM),etc. ECM is an electrochemical dissolution process that can remove electrically conductive materials regardless of their hardness and toughness. Application of ECM in micro fabrication is referred to as electrochemical micromachining (EMM). Micro fabrication by EMM might involve mask less or through-mask material removal [4–8]. Through-mask EMM is a high throughput process for micro device fabrication. It is now receiving considerable attention in the electronics and other high-tech industries to produce metallic parts with microstructures. The standard through-mask EMM begins by bonding a sheet of inert photo resist on the metal anode work piece. Lithography, which includes procedures of spin coating, prebaking, exposure, development, and post baking, is employed to pattern the photo resist. The photo resist, however, is only one-time mask and must be peeled off from the anode work piece after machining. Therefore, it would cost a lot for mass production [8]. ISSN: 2231-5381 In this study, a modified through-mask EMM has been developed to produce micro dimple and hole array, in which a mask with patterned insulation plate coated with metal film as cathode is closely attached to work piece plate instead of bonding photoresist layer on the work piece in the standard through-mask EMM. Compared with the standard throughmask EMM, the modified process offers unique advantages such as short lead time and low cost because the mask could be re-used. II. PRINCIPLE AND SHAPE EVOLUTION MODELLING The mask developed in the modified through-mask EMM, as shown in Fig. 1, consists of a conductive metal layer and an insulation layer. Both the conductive layer and the insulation layer have the same pattern which will be transferred to the anode work piece. The mask is not bonded to the anode. As illustrated in Fig. 2, the mask patterns the anode by simply pressing and clamping the mask against the anode during EMM. The metal layer serves as the cathode tool. The electrolyte flows onto the surface of the mask at a high speed and fills in all features in the metal and the insulation layer. Then the areas on the anode exposed in the electrolyte would dissolve when sufficient voltage was applied. After the desired microstructure is obtained, the mask is removed from the anode work piece. Since there is no tool wear in EMM, the mask is preserved and could be re-used in the production of other samples. When the flexible material of the mask is used, a cylinder or other non planar surface might be patterned by wrapping and clamping the mask on the target surface. In the proposed micromachining, the current distribution defines the profile of micro dimple and hole. Therefore, analysis of current density has been carried out. Modelling and simulation have been done to observe the current density distribution. The assumptions were made as follows: 1. The current density distribution at the anode surface is determined solely by the Ohmic effects, 2. The conductivity of electrolyte, k, is uniform, http://www.ijettjournal.org Page 261 International Journal of Engineering Trends and Technology (IJETT) – Volume 6 Number 5 - Dec 2013 Fig. 1: Schematic of electrode arrangement of the modified through-mask EMM Fig. 3: Electric potential distribution The normalized current density is defined as i/imax ,where imax : the maximum current density and i: current density of every key point on the surface. As shown in Fig. 4, Fig. 2: Schematic of the modified through-mask EMM 3. The temperature of electrolyte, T, is uniform, 4. The concentration gradient in the bulk electrolyte is negligible. The potential ɸ obeys Laplace’s equation within gap domain Ω [9] (see Fig. 3): (in Ω) (1) Boundary conditions are as follows: (2) 3˟4˟8˟9 =0 (at the cathode tool) Γ1 =U (at the anode surface) (3) Γ2˟5˟6˟7˟10=0 (the boundary condition) (4) where U is the voltage between the anode work piece and the cathode and n is the surface normal. The current density, i, is then given by the Ohm’s law as the normal derivative of the potential, i.e. i = -K ɸ (5) The rate, r, at which the anodic surface recedes, is determined as: r= I (6) where M is the molecular weight of the anodic metal, n is the metal dissolution valence, is the density of the anodic metal, F is Faraday’s constant, and is the current efficiency of anodic metal dissolution, which was assumed to be constant at 100%. The finite element method was employed to solve this boundary problem, and the analysis was carried out in ANSYS. For a trench like structure (see Fig. 3) with the scale: w =200µm, h1 = 30 µm and h2 = 20 µm, 50 µm, 100 µm, 150 µm, respectively, the normalized current density distribution on the initially flat metal surface is shown in Fig. 4. ISSN: 2231-5381 Fig. 4: Current density distribution on the anode surface The current density distribution on each surface is uneven and the lowest current density is always on the center of the trench. The thicker the insulation layer is, the more uniform the current density distribution is observed. This non uniform current density distribution will lead to a convex dimple profile. In order to predict the shape of the evolving cavity, the boundaries were progressively updated using APDL (ANSYS Parametric Design Language) in ANSYS. At each time step, the electrode surface was displaced proportionally to current density, i, using Faraday’s Law (Eq. 6). The Program flow diagram of shape evolution simulating is shown in Fig. 5. The thickness of the insulation layer is 100 µm in the simulation. The time step is 0.2 s. With the material dissolution step by step a given cavity evolves from an initially flat shape into a hemispherical shape. The result of simulation is shown in Fig. 6. III. EXPERIMENTAL SETUP A. Electrochemical system The ECM system (see Fig. 7) was constructed to generate micro dimple and hole array in work piece. Direct current controlled by a constant voltage is provided from the power supply with 150 A maximum output current, 30 V maximum output voltage. In addition, a time relay was synchronously used to control machining time accurately during EMM. Table 1 lists the machining conditions. http://www.ijettjournal.org Page 262 International Journal of Engineering Trends and Technology (IJETT) – Volume 6 Number 5 - Dec 2013 IV. EXPERIMENTAL RESULTS AND DISCUSSIONS A. Electrochemical system effect of insulation layer thickness on dimple machining In order to optimize the insulation layer thickness experiments on the influence of insulation layer thickness on the etched dimple profile have been carried out. Fig. 8 shows a convex structure in the middle of the dimple measured by the three dimensional profile meter. The dimple is produced by a mask with an insulation layer of 50 µm thickness. The experimental result is accordant with the current density distribution on the anode surface analysed before. To solve this problem, a thicker mask is used. As shown in Fig. 9, while the thickness of the insulation layer is 100 µm, the convex in the dimple centre will disappear. Fig. 5: Program flow diagram of shape evolution simulation. Fig. 8-a: 3D optical profile of a dimple with convex structure Fig. 6: Shape evolution at the anode. Fig. 8-b: The cross-sectional shape of a dimple with convex Fig. 7. Sketch of ECM experimental system. The size and spacing of the obtained dimple and hole were measure with three-dimensional profile meter and scanning electron microscope (SEM). B. Friction tests To verify the effect of micro-dimples array on the hard chrome coating sample, friction tests were carried out using a friction tester. The sample was driven by a motor to a certain rotational speed which could be adjusted between 0 r/min and 1000 r/min. The sliding contact zone was fully soaked in diesel oil. The temperature was kept at 25o C throughout the tests. Each friction test was carried out with a normal load of 500 N, which was detected and controlled by load cells. ISSN: 2231-5381 The parameters influencing the dimple dimensions, such as cell voltage, current density, and machining time, were studied and optimized. By controlling these parameters, micro-dimple array with hundreds of micrometers in diameter and several micrometers in depth, was produced as shown in Fig. 10. The proposed method could also be used to produce hole array on thin metal sheet. For smaller taper of the hole and shorter machining time, the modified through-mask EMM is introduced in both the sides of the anode work piece plate (see Fig. 11). The patterned features on the couple masks are perfectly aligned by a special fixture. Electrochemical etching is simultaneously taking place on both sides of the work piece during machining. The SEM photograph of Fig. 12 shows that http://www.ijettjournal.org Page 263 International Journal of Engineering Trends and Technology (IJETT) – Volume 6 Number 5 - Dec 2013 hole array with good circularity can be obtained by two-sided process of modified through-mask EMM. The material of the work piece is 1Cr18Ni9Ti. The thickness of the work piece is 0.3 mm. The cell voltage applied is 18 V. In this way, the proposed method is a low cost and efficient process in the production of metallic parts with micro hole array. (a) 3D optical profile of a dimple centre will disappear of a single dimple Fig. 13: Effect of micro-dimple array on the friction coefficient under a normal load of 500 N (b) The cross-sectional shape of a single dimple. Fig. 9: Profiles of a single dimple in chrome coated surface. (a) 3D optical profile of a dimple center will disappear.single dimple, (b) the cross-sectional shape of a single dimple. Fig. 10: SEM micrograph of micro-dimple array in chrome coated surface. Fig. 11: Schematic of two-sided process of modified through-mask EMM. dimple depth of 10 mm. It was thus verified that the micro-dimples B. Effect of micro-dimple array on friction coefficient In order to assess the effectiveness of micro-dimple array on friction coefficient, changes in friction coefficient under a normal load of 500 N were evaluated using two types of samples: one was the hard chrome coated surface without micro dimples, and another was with micro-dimple array. The dimple size was 240 µm in diameter and 4 µm, 10µm and 22 µm in depth, respectively. The test results for the samples are shown in Fig. 13. Compared to the non-dimpled surface, the samples with micro-dimples array reduced friction coefficient successfully. The friction coefficient decreases gradually with the dimple depth when it ranges from 4 µm to 10 µm. However, it rapidly increases as the dimple depth further increased to 22 µm. In addition, with the sliding velocity increasing, the reduction in friction coefficient was obvious with dimple depth of 10 µm. It was thus verified that the micro-dimples array had a great potential for reducing friction, if the micro dimples was set at appropriate dimension. V. CONCLUSIONS A modified through-mask EMM has been developed. Numerical simulation and experiments have demonstrate that a sheet of insulation layer, coated with conductive metal layer and perforated with through holes, could be used as a mask to electrochemically etch microstructures while it is closely attached to a work piece surface instead of being bonded to work piece. Arrays of holes or dimples in the scale of several hundred microns have been produced. REFERENCES (a) Hole array, (b) Amplified SEM photo of hole array, (c) Cross- sectional shape of a single hole Fig. 12: Photography of hole array fabricated by two-sided process of modified through-mask EMM. 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